Patents by Inventor Tsutomu Nakanishi

Tsutomu Nakanishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140349421
    Abstract: According to one embodiment, a semiconductor light emitting device includes a structure including a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type and a light emitting layer provided between the first semiconductor layer and the second semiconductor layer. The device also includes an electrode layer provided on the second semiconductor layer side of the structure. The electrode layer includes a metal portion with a thickness of not less than 10 nanometers and not more than 100 nanometers. A plurality of openings pierces the metal portion, each of the openings having an equivalent circle diameter of not less than 10 nanometers and not more than 5 micrometers. The device includes an inorganic film providing on the metal portion and inner surfaces of the openings, the inorganic film having transmittivity with respect to light emitted from the light emitting layer.
    Type: Application
    Filed: August 8, 2014
    Publication date: November 27, 2014
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Akira FUJIMOTO, Ryota KITAGAWA, Kumi MASUNAGA, Kenji NAKAMURA, Tsutomu NAKANISHI, Koji ASAKAWA, Takanobu KAMAKURA, Shinji NUNOTANI
  • Patent number: 8840258
    Abstract: The present invention provides such a formation method that an antireflection structure having excellent antireflection functions can be formed in a large area and at small cost. Further, the present invention also provides an antireflection structure formed by that method. In the formation method, a base layer and particles placed thereon are subjected to an etching process. The particles on the base layer serve as an etching mask in the process, and hence they are more durable against etching than the base layer. The etching rate ratio of the base layer to the particles is more than 1 but not more than 5. The etching process is stopped before the particles disappear. It is also possible to produce an antireflection structure by nanoimprinting method employing a stamper. The stamper is formed by use of a master plate produced according to the above formation method.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: September 23, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Tsutomu Nakanishi, Akira Fujimoto, Koji Asakawa, Takeshi Okino, Shinobu Sugimura
  • Patent number: 8841615
    Abstract: An electron microscope which utilizes a polarized electron beam and can obtain a high contrast image of a sample is provided. The microscope includes: a laser; a polarization apparatus that polarizes a laser beam into a circularly polarized laser beam; a semiconductor photocathode that is provided with a strained superlattice semiconductor layer and generates a polarized electron beam when irradiated with the circularly polarized laser beam; a transmission electron microscope that utilizes the polarized electron beam; an electron beam intensity distribution recording apparatus arranged at a face reached by the polarized electron beam that has transmitted through the sample. An electron beam intensity distribution recording apparatus records an intensity distribution before and after the polarization of the electron beam is reversed, and a difference acquisition apparatus calculates a difference therebetween.
    Type: Grant
    Filed: February 22, 2011
    Date of Patent: September 23, 2014
    Assignee: National University Corporation Nagoya University
    Inventors: Nobuo Tanaka, Tsutomu Nakanishi, Yoshikazu Takeda, Hidefumi Asano, Koh Saitoh, Toru Ujihara, Makoto Kuwahara
  • Patent number: 8835954
    Abstract: According to one embodiment, a semiconductor light emitting device includes a structure including a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type and a light emitting layer provided between the first semiconductor layer and the second semiconductor layer. The device also includes an electrode layer provided on the second semiconductor layer side of the structure. The electrode layer includes a metal portion with a thickness of not less than 10 nanometers and not more than 100 nanometers. A plurality of openings pierces the metal portion, each of the openings having an equivalent circle diameter of not less than 10 nanometers and not more than 5 micrometers. The device includes an inorganic film providing on the metal portion and inner surfaces of the openings, the inorganic film having transmittivity with respect to light emitted from the light emitting layer.
    Type: Grant
    Filed: August 30, 2011
    Date of Patent: September 16, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Akira Fujimoto, Ryota Kitagawa, Kumi Masunaga, Kenji Nakamura, Tsutomu Nakanishi, Koji Asakawa, Takanobu Kamakura, Shinji Nunotani
  • Patent number: 8770025
    Abstract: A physical quantity sensor includes a beam-like vibrating body and a fixing part supporting both ends of the beam-like vibrating body. A driving element is formed on a central portion of the beam-like vibrating body, and feedback elements are formed on both ends. A physical quantity acting on the beam-like vibrating body is detected by causing natural vibration in the beam-like vibrating body and detecting a natural frequency of the vibrating body. This enables reliable detection of a physical quantity, such as a strain or load, acting on an object.
    Type: Grant
    Filed: May 26, 2010
    Date of Patent: July 8, 2014
    Assignee: Panasonic Corporation
    Inventors: Tsutomu Nakanishi, Yasunobu Kobayashi, Koumei Hujita
  • Publication number: 20140182677
    Abstract: A photoelectric conversion element according to an embodiments includes: a first metal layer; a semiconductor layer formed on the first metal layer; a second metal layer formed on the semiconductor layer, the second metal layer comprising a porous thin film with a plurality of openings each having a mean area not smaller than 80 nm2 and not larger than 0.8 ?m2 or miniature structures having a mean volume not smaller than 4 nm3 and not larger than 0.52 ?m3; and a wavelength converting layer formed between the semiconductor layer and the second metal layer, at least a refractive index of a portion of the wavelength converting layer being lower than a refractive index of a material of the semiconductor layer, the portion being at a distance of 5 nm or shorter from an end portion of the second metal layer.
    Type: Application
    Filed: March 10, 2014
    Publication date: July 3, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Akira FUJIMOTO, Eishi Tsutsumi, Tsutomu Nakanishi, Kumi Masunaga, Kenji Nakamura, Koji Asakawa
  • Patent number: 8754431
    Abstract: According to one embodiment, a semiconductor light emitting device includes first and second electrode layers, a and second semiconductor layers, a light emitting layer and a first intermediate layer. The first electrode layer has a metal portion having through-holes. The second electrode layer is stacked with the first electrode layer along a stacked direction, and light-reflective. The first semiconductor layer is provided between the first and second electrode layers, and has a first conductivity type. The second semiconductor layer is provided between the first semiconductor layer and the second electrode layer, and has a second conductivity type. The light emitting layer is provided between the first and second semiconductor layers. The first intermediate layer is provided between the second semiconductor layer and the second electrode layer, transmissive to light emitted from the light emitting layer, and includes first contact portions and a first non-contact portion.
    Type: Grant
    Filed: March 5, 2012
    Date of Patent: June 17, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Akira Fujimoto, Tsutomu Nakanishi, Ryota Kitagawa, Kenji Nakamura, Shinji Nunotani, Takanobu Kamakura
  • Publication number: 20140151326
    Abstract: The present invention provides a light-transmitting metal electrode including a substrate and a metal electrode layer having plural openings. The metal electrode layer also has such a continuous metal part that any pair of point-positions in the part is continuously connected without breaks. The openings in the metal electrode layer are periodically arranged to form plural microdomains. The plural microdomains are so placed that the in-plane arranging directions thereof are oriented independently of each other. The thickness of the metal electrode layer is in the range of 10 to 200 nm.
    Type: Application
    Filed: February 6, 2014
    Publication date: June 5, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Eishi Tsutsumi, Tsutomu Nakanishi, Akira Fujimoto, Koji Asakawa
  • Publication number: 20140139714
    Abstract: A solid state imaging device according to an embodiment includes a photo detector arranged two-dimensionally in a semiconductor substrate, a readout circuit provided in the semiconductor substrate, a first photoelectric conversion layer provided above the photo detector, a plurality of first metal dots provided above the first photoelectric conversion layer, a second photoelectric conversion layer provided above the first metal dots, and a plurality of second metal dots provided above the second photoelectric conversion layer.
    Type: Application
    Filed: March 13, 2013
    Publication date: May 22, 2014
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Ikuo FUJIWARA, Hideyuki FUNAKI, Kenji TODORI, Akira FUJIMOTO, Tsutomu NAKANISHI, Kenji NAKAMURA
  • Patent number: 8692283
    Abstract: According to one embodiment, a light-transmitting metal electrode includes a metal layer. The metal layer is provided on a major surface of a member and includes a metal nanowire and a plurality of openings formed with the metal nanowire. The thin layer includes a plurality of first straight line parts along a first direction and a plurality of second straight line parts along a direction different from the first direction. A maximum length of the first line parts along the first direction and a maximum length of the second line parts along the direction different from the first direction are not more than a wave length of visible light. A ratio of an area of the metal layer viewed in a normal direction of the surface to an area of the metal layer viewed in the normal direction is more than 20% and not more than 80%.
    Type: Grant
    Filed: February 28, 2012
    Date of Patent: April 8, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Tsutomu Nakanishi, Akira Fujimoto, Ryota Kitagawa, Kumi Masunaga, Kenji Nakamura, Koji Asakawa, Shinji Nunotani, Takanobu Kamakura
  • Patent number: 8686459
    Abstract: The present invention provides a light-transmitting metal electrode including a substrate and a metal electrode layer having plural openings. The metal electrode layer also has such a continuous metal part that any pair of point-positions in the part is continuously connected without breaks. The openings in the metal electrode layer are periodically arranged to form plural microdomains. The plural microdomains are so placed that the in-plane arranging directions thereof are oriented independently of each other. The thickness of the metal electrode layer is in the range of 10 to 200 nm.
    Type: Grant
    Filed: September 23, 2008
    Date of Patent: April 1, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Eishi Tsutsumi, Tsutomu Nakanishi, Akira Fujimoto, Koji Asakawa
  • Publication number: 20140024165
    Abstract: A solar cell having on a light incident surface side an electrode with both low resistivity and high transparency to promote efficient excitation of carriers using inexpensive materials. The solar cell includes a photoelectric conversion layer, a first electrode layer arranged on the light incident surface side, and a second electrode layer arranged opposed to the first electrode layer. The first electrode layer has a thickness in the range of 10 to 200 nm, and plural penetrating openings, each of which occupies an area in the range of 80 nm2 to 0.8 ?m2, and has an aperture ratio in the range 10 to 66%. The first electrode layer can be produced by etching using an etching mask in the form of a single particle layer of fine particles, or of a dot pattern formed by self-assembly of a block copolymer, or of a stamper.
    Type: Application
    Filed: September 27, 2013
    Publication date: January 23, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Kumi MASUNAGA, Akira Fujimoto, Tsutomu Nakanishi, Eishi Tsutsumi, Ryota Kitagawa, Koji Asakawa, Hideyuki Nishizawa
  • Publication number: 20130248912
    Abstract: According to one embodiment, a semiconductor light emitting element includes a stacked body and an optical layer. The stacked body has a major surface and includes a light emitting layer. The optical layer is in contact with the surface and includes a dielectric body, first particles, and second particles. The optical layer includes a first region including the dielectric body and the first particles and does not include the second particles and a second region including the dielectric body and the second particles. A sphere-equivalent diameter of the first particle is not less than 1 nanometer and not more than 100 nanometers. A sphere-equivalent diameter of the second particle is more than 300 nanometers and less than 1000 nanometers. An average refractive index of the first region is larger than a refractive index of the stacked body and smaller than a refractive index of the second particle.
    Type: Application
    Filed: March 25, 2013
    Publication date: September 26, 2013
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kenji NAKAMURA, Akira Fujimoto, Tsutomu Nakanishi, Ryota Kitagawa, Koji Asakawa, Takanobu Kamakura, Shinji Nunotani
  • Publication number: 20130135746
    Abstract: The present invention provides such a formation method that an antireflection structure having excellent antireflection functions can be formed in a large area and at small cost. Further, the present invention also provides an antireflection structure formed by that method. In the formation method, a base layer and particles placed thereon are subjected to an etching process. The particles on the base layer serve as an etching mask in the process, and hence they are more durable against etching than the base layer. The etching rate ratio of the base layer to the particles is more than 1 but not more than 5. The etching process is stopped before the particles disappear. It is also possible to produce an antireflection structure by nanoimprinting method employing a stamper. The stamper is formed by use of a master plate produced according to the above formation method.
    Type: Application
    Filed: December 21, 2012
    Publication date: May 30, 2013
    Inventors: Tsutomu Nakanishi, Akira Fujimoto, Koji Asakawa, Takeshi Okino
  • Patent number: 8450768
    Abstract: The present invention provides a semiconductor light-emitting element comprising an electrode part excellent in ohmic contact and capable of emitting light from the whole surface. An electrode layer placed on the light-extraction side comprises a metal part and plural openings. The metal part is so continuous that any pair of point-positions in the part is continuously connected without breaks, and the metal part in 95% or more of the whole area continues linearly without breaks by the openings in a straight distance of not more than ? of the wavelength of light emitted from an active layer. The average opening diameter is of 10 nm to ? of the wavelength of emitted light. The electrode layer has a thickness of 10 nm to 200 nm, and is in good ohmic contact with a semiconductor layer.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: May 28, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Ryota Kitagawa, Koji Asakawa, Akira Fujimoto, Tsutomu Nakanishi, Eishi Tsutsumi
  • Patent number: 8450824
    Abstract: According to one embodiment, an optically transmissive metal electrode includes a plurality of first and second metal wires. The first metal wires are disposed along a first direction, and extend along a second direction intersecting the first direction. The second metal wires are disposed along a third direction parallel with a plane including the first and second directions and intersecting the first direction, contact the first metal wires, and extend along a fourth direction parallel with the plane and intersecting the third direction. A first pitch between centers of the first metal wires is not more than a shortest wavelength in a waveband including visible light. A second pitch between centers of the second metal wires exceeds a longest wavelength in the waveband. A thickness of the first and second metal wires along a direction vertical to the plane is not more than the shortest wavelength.
    Type: Grant
    Filed: February 27, 2012
    Date of Patent: May 28, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kenji Nakamura, Akira Fujimoto, Tsutomu Nakanishi, Ryota Kitagawa, Shinji Nunotani, Takanobu Kamakura
  • Publication number: 20130092219
    Abstract: The present invention provides a solar cell comprising a laminate of a photoelectric conversion layer, a metal porous membrane and a refractive index adjusting layer. The metal porous membrane is positioned on the light-incident side, is directly in contact with the photoelectric conversion layer, and has plural openings bored though the membrane. The refractive index adjusting layer covers at least a part of the surface of the metal porous membrane and of the inner surfaces of the openings, and has a refractive index of 1.35 to 4.2 inclusive. If adopting a nano-fabricated metal membrane as an electrode, the present invention enables to provide a solar cell capable of realizing efficient photoelectric conversion by use of electric field-enhancement effect.
    Type: Application
    Filed: September 14, 2012
    Publication date: April 18, 2013
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Eishi TSUTSUMI, Kumi Masunaga, Ryota Kitagawa, Tsutomu Nakanishi, Akira Fujimoto, Koji Asakawa
  • Publication number: 20130081683
    Abstract: The present invention provides a photoelectric conversion element having high efficiency in propagating carrier excitation by use of enhanced electric fields. The photoelectric conversion element comprises a photoelectric conversion layer including two or more laminated semiconductor layers placed between two electrode layers, and is characterized by having an electric field enhancing layer placed between the semiconductor layers in the photoelectric conversion layer. The electric field enhancing layer is provided with a metal-made minute structure, and the minute structure is, for example, a porous membrane or a group of nano-objects such as very small spheres.
    Type: Application
    Filed: September 27, 2012
    Publication date: April 4, 2013
    Inventors: Kumi MASUNAGA, Akira FUJIMOTO, Eishi TSUTSUMI, Koji ASAKAWA, Tsutomu NAKANISHI, Hideyuki NISHIZAWA, Ryota KITAGAWA
  • Publication number: 20130075778
    Abstract: According to one embodiment, a light-transmitting metal electrode includes a metal layer. The metal layer is provided on a major surface of a member and includes a metal nanowire and a plurality of openings formed with the metal nanowire. The thin layer includes a plurality of first straight line parts along a first direction and a plurality of second straight line parts along a direction different from the first direction. A maximum length of the first line parts along the first direction and a maximum length of the second line parts along the direction different from the first direction are not more than a wave length of visible light. A ratio of an area of the metal layer viewed in a normal direction of the surface to an area of the metal layer viewed in the normal direction is more than 20% and not more than 80%.
    Type: Application
    Filed: February 28, 2012
    Publication date: March 28, 2013
    Inventors: Tsutomu NAKANISHI, Akira FUJIMOTO, Ryota KITAGAWA, Kumi MASUNAGA, Kenji NAKAMURA, Koji ASAKAWA, Shinji NUNOTANI, Takanobu KAMAKURA
  • Publication number: 20130075771
    Abstract: According to one embodiment, a semiconductor light emitting device includes first and second electrode layers, a and second semiconductor layers, a light emitting layer and a first intermediate layer. The first electrode layer has a metal portion having through-holes. The second electrode layer is stacked with the first electrode layer along a stacked direction, and light-reflective. The first semiconductor layer is provided between the first and second electrode layers, and has a first conductivity type. The second semiconductor layer is provided between the first semiconductor layer and the second electrode layer, and has a second conductivity type. The light emitting layer is provided between the first and second semiconductor layers. The first intermediate layer is provided between the second semiconductor layer and the second electrode layer, transmissive to light emitted from the light emitting layer, and includes first contact portions and a first non-contact portion.
    Type: Application
    Filed: March 5, 2012
    Publication date: March 28, 2013
    Inventors: Akira FUJIMOTO, Tsutomu NAKANISHI, Ryota KITAGAWA, Kenji NAKAMURA, Shinji NUNOTANI, Takanobu KAMAKURA