Abstract: The invention relates to an apparatus for tilting a carrier for optical elements with two optical faces which are arranged together on a carrier and are fixed at a fixed angle to one another, the carrier being fastened on a base plate via articulated connections. The carrier can be pivoted about three tilting axes, a first tilting axis preferably being located in the plane of the first optical face and extending normal to the plane of the second optical face, the second tilting axis preferably being located in the plane of the second optical face and extending normal to the plane of the first optical face, and the third tilting axis being located parallel to the line of intersection between the two planes of the optical element.

Abstract: An objective, in particular a projection objective in microlithography for producing semiconductor components, is assembled from a number of individual housing structures (4, 5), optical elements being arranged in each housing structure (4, 5), and a number of optical axes (15, 16, 18, 35) being formed by the housing structures (4, 5). At least one first housing structure (4) is provided with seats (22, 23, 24, 25) on which one or more further housing structures (5) and/or optical subassemblies (6, 8, 11, 14) are adjusted and are connected to the first housing structure (4).

Abstract: In a holding and positioning apparatus for an optical element, the optical element is mounted in a mounting ring and the mounting ring is mounted via at least one manipulator unit. The manipulator unit has a linear actuating element. The manipulator unit has a manipulator head, a movable manipulator part and a manipulator foot, the manipulator head being connected to the movable manipulator part via a solid body joint. The movable manipulator part is connected to the manipulator foot via an actuator and at least one solid body joint, the linear actuating element being coupled to the manipulator foot and the actuator.

Abstract: An objective is provided with a plurality of lenses, mirrors and at least one beam splitter element (20) inserted in an objective housing (1). One or more surfaces (26, 27, 28), situated in the beam path, of the beam splitter element (20) are provided as correction aspherics. The beam splitter element (20) can be provided with manipulators (22) that are arranged on a manipulator carrier (23) which is permanently connected to the objective housing.

Abstract: In an apparatus for positioning an optical element in a structure, particularly in an objective housing of a projection objective for microlithography, the optical element is connected to the structure via fastening elements. The position of the optical element is set by means of adjusting fasteners. The fastening elements are arranged in such a way and the adjusting fasteners can be actuated in such a way that the optical element can be tilted about three mutually independent axes and can additionally be displaced in a translatory fashion in one axial direction.

Abstract: The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.

Abstract: An objective (2) with at least one optical element (4), which is mounted in an inner ring (3). The inner ring (3) is connected to an outer mount (1). A manipulator (10) is provided for displacing the optical element (4) in at least a direction perpendicular to an optical axis. The inner ring (3) is connected to the outer mount (1) by means of at least two adjusting joints (5) with manipulators (10) and at least one swivel joint (6). The at least two adjusting joints (5) and the at least one swivel joint (6) are provided with joint arms (8) extending at least approximately in a tangential direction with respect to the inner ring (3), by means of which arms the inner ring (3) is elastically connected to the outer mount (1).

Abstract: The invention relates to a device for manipulation of the angular position of an object relative to a fixed structure, into which the object, in particular an optical element of a lens group for microlithography, is introduced, about three rotational axes, intersecting at a point. The object can also be held in a support frame. The support frame, with the object is connected to the fixed structure by means of three connection limbs each with three rotational degrees of freedom and one translational degree of freedom. The angular position of the support frame is adjustable about each one of the three rotational axes by means of one of the connection limbs.

Abstract: The invention relates to an ion beam scanning system having an ion source device, an ion acceleration system and an ion beam guidance system comprising an ion beam outlet window for a converging centered ion beam, and a mechanical alignment system for the target volume to be scanned. For that purpose, the ion acceleration system can be set to an acceleration of the ions required to obtain a maximum depth of penetration. The scanning system also has energy absorption means arranged in the path of the ion beam between the target volume and the ion beam outlet window transverse to the center of the ion beam. The energy absorption means can be displaced transverse to the center of the ion beam in order to vary the energy of the ion beam, so enabling, in the target volume, depth modulation of the ion beam, which is effected by means of a linear motor and the transverse displacement of the energy absorption means, with depth-staggered scanning of volume elements of the target volume in rapid succession.

Abstract: A low-deformation mounting device of a rotationally asymmetric optical element, particularly an optical element in a projection lens used in semiconductor lithography. Said optical element is mounted in a frame and is provided with at least three connection surfaces that are positioned perpendicular to each other. Frame-connecting members are disposed in such a way that at least one but no more than two degrees of translational freedom and at least one but no more than two degrees of rotational freedom are obtained by means of said connecting members.

Abstract: An energy filter device for beams which are used in the course of ion beam therapy, wherein at least one passive modulator is provided. The modulator comprises a scattering film for the beams and a collimator with an opening for controlling the beams.

Abstract: A catadioptric objective comprises a plurality of lenses and at least two deflecting mirrors that have reflecting surfaces that are at a specific angle, in particular of 90°, to one another. The two deflecting mirrors are arranged with their reflecting surfaces on a common base member whose position in the objective can be set.

Abstract: An imaging device (7) in a projection exposure machine (1) for microlithography has at least one optical element (10, 33, 34) and at least one manipulator (9, 36, 41), having a linear drive (11), for manipulating the position of the optical element (10, 33, 34). The linear drive (11) has a driven subregion (14) and a nondriven subregion (15), which are movable relative to one another in the direction of a movement axis (17). The subregions (14, 15) are interconnected at least temporarily via functional elements (18) with an active axis (17) [sic] and via functional elements (19) with an active direction at least approximately parallel to the movement axis (17).

Abstract: A bearing arrangement comprises an optical element and a mount which are provided, in particular, for a projection objective in microlithography, the optical element being connected to the mount. The optical element and the mount are connected to one another in such a way that owing to a thermally induced expansion of the optical element and/or of the mount a tilting of the optical element relative to the mount results in it being possible to compensate aberrations which occur.

Abstract: A mount for an optical element in an optical imaging device, in particular in a lens system (4) for semiconductor lithography, has at least one mounting ring (2) which bears the optical element (6). The mounting ring (2) is of at least partially hollow design in cross section.

Abstract: An objective, in particular a projection lens for microlithography, is provided with at least one optical element (8) that is mounted in an inner mount (9a), the inner mount (9a) being connected to the outer mount (9b). A manipulator device (21) performs a displacement of the optical element (8), preferably in at least one direction that lies at least approximately parallel to the optical axis. At least one elastically deformable strip (13) is arranged in a gap (12) between the inner mount (9a) and the outer mount (9b), the strip being connected in each case via a fastening section (15) to the inner mount (9a) and the outer mount (9b), and the two fastening sections (15) being connected to one another by an arcuate section (18, 19) and free bearing parts (16, 17) situated therebetween.

Abstract: The invention relates to an apparatus and a method for irradiating tumor tissue (3) of a patient (10) by means of an ion beam (2). For that purpose, the apparatus has a deflecting device (1) for the ion beam (2) for slice-wise and area-wise scanning of the tumor tissue (3) and an ion beam energy control device for slice-wise and depth-wise scanning of the ion beam (2). An electromechanically driven ion-braking device (11, 12) is provided as a depth-wise scanning adaptation apparatus (5) for adapting the range of the ion beam (2) and has faster depth-wise adaptation than the energy control device of an accelerator. The movement of a patient is monitored by means of a movement detection device (7) for detecting a temporal and positional change in the location of the tumor tissue (3) in a treatment space (8).

Abstract: An ion beam therapy system and method for operating the system includes a source of ions (300), an accelerator system (400) and an ion beam transport system (60) for directing an ion beam to a plurality of treatment stations (100) to treat patients. The ion beam transport system (60) includes a gantry (8) carrying a vertical deflection system (45) and horizontal deflection system (55) positioned upstream from a last bending magnet (65) so as to provide a parallel scanning mode by an edge focusing effect.

Abstract: In an apparatus for positioning an optical element in a structure, particularly in an objective housing of a projection objective for microlithography, the optical element is connected to the structure via fastening elements. The position of the optical element is set by means of adjusting fasteners.

Abstract: An objective, in particular a projection lens for microlithography, is provided with at least one optical element (8) that is mounted in an inner mount (9a), the inner mount (9a) being connected to the outer mount (9b). A manipulator device (21) performs a displacement of the optical element (8), preferably in at least one direction that lies at least approximately parallel to the optical axis. At least one elastically deformable strip (13) is arranged in a gap (12) between the inner mount (9a) and the outer mount (9b), the strip being connected in each case via a fastening section (15) to the inner mount (9a) and the outer mount (9b), and the two fastening sections (15) being connected to one another by an arcuate section (18, 19) and free bearing parts (16, 17) situated therebetween.