Patents by Inventor Varun Sharma

Varun Sharma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210051153
    Abstract: A least-privilege role is automatically assigned to a service principal in order to ensure that a service principal is able to perform actions on a resource of a subscription in a multi-tenant environment as intended without additional access and usage rights. The assignment of the least-privilege role is based on actions previously performed on the resources of a subscription by the service principal that match those actions within a role having the bare minimum permissions needed to perform those actions.
    Type: Application
    Filed: August 14, 2019
    Publication date: February 18, 2021
    Inventors: VERA BOGDANICH ESPINA, NICHOLAS PATRICK BROWN, VARUN SHARMA
  • Patent number: 10923361
    Abstract: Processes are provided herein for deposition of organic films. Organic films can be deposited, including selective deposition on one surface of a substrate relative to a second surface of the substrate. For example, polymer films may be selectively deposited on a first metallic surface relative to a second dielectric surface. Selectivity, as measured by relative thicknesses on the different layers, of above about 50% or even about 90% is achieved. The selectively deposited organic film may be subjected to an etch process to render the process completely selective. Processes are also provided for particular organic film materials, independent of selectivity. Masking applications employing selective organic films are provided. Post-deposition modification of the organic films, such as metallic infiltration and/or carbon removal, is also disclosed.
    Type: Grant
    Filed: October 21, 2019
    Date of Patent: February 16, 2021
    Assignee: ASM IP Holding B.V.
    Inventors: Eva E. Tois, Hidemi Suemori, Viljami J. Pore, Suvi P. Haukka, Varun Sharma, Jan Willem Maes, Delphine Longrie, Krzysztof Kachel
  • Publication number: 20210044586
    Abstract: A technique for embedding and utilizing credentials in a network address may include requesting a network address for a client device by providing an account identifier to a server computer associated with a service provider. A network address that is mapped to the account identifier can be assigned to the client device. The network address may include a routing prefix field and a network interface identifier field. The routing prefix field may include an issuer identifier of an issuer of the account, and the network interface identifier field may include an interface identifier that maps to the account identifier. By embedding credentials such as an account identifier in the network address, the actual account identifier need not be transmitted to perform actions on the account.
    Type: Application
    Filed: August 5, 2019
    Publication date: February 11, 2021
    Inventors: Varun Sharma, Hanna Endrias, Ajit Vilasrao Patil, Nandakumar Kandaloo
  • Patent number: 10914500
    Abstract: An icemaker for a refrigerated appliance is provided. The icemaker includes an ice tray having a plurality of ice-forming compartments and a duct for directing chilled air operably coupled with a diverter. The diverter includes a base having first and second sides and defining a plurality of variously sized slots. A centerline of the base is aligned with a centerline of the ice tray. At least one spacing portion extends between two of the plurality of variously sized slots. A plurality of fins extend away from a top surface of the base.
    Type: Grant
    Filed: December 4, 2018
    Date of Patent: February 9, 2021
    Assignee: Whirlpool Corporation
    Inventors: Jose R. Aranda, Darci Cavali, Chao-Yi Chen, Milind Devle, Dewei Guan, Benjamin G. Jimenez, Varun Deepak Kotecha, Rishikesh Vinayak Kulkarni, Mahalingappa Mulimani, N S Ayodhya Ram, Rogerio Rodrigues, Jr., Anuj Sharma, Richard A. Spletzer, Shailesh Wani
  • Patent number: 10900120
    Abstract: Passivation layers to inhibit vapor deposition can be used on reactor surfaces to minimize deposits while depositing on a substrate housed therein, or on particular substrate surfaces, such as metallic surfaces on semiconductor substrates to facilitate selective deposition on adjacent dielectric surfaces. Passivation agents that are smaller than typical self-assembled monolayer precursors can have hydrophobic or non-reactive ends and facilitate more dense passivation layers more quickly than self-assembled monolayers, particularly over complex three-dimensional structures.
    Type: Grant
    Filed: July 12, 2018
    Date of Patent: January 26, 2021
    Assignee: ASM IP HOLDING B.V.
    Inventors: Varun Sharma, Eva Tois
  • Publication number: 20210020468
    Abstract: To create constant partial pressures of the by-products and residence time of the gas molecules across the wafer, a dual showerhead reactor can be used. A dual showerhead structure can achieve spatially uniform partial pressures, residence times and temperatures for the etchant and for the by-products, thus leading to uniform etch rates across the wafer. The system can include differential pumping to the reactor.
    Type: Application
    Filed: July 16, 2020
    Publication date: January 21, 2021
    Inventors: Tom E. Blomberg, Varun Sharma
  • Publication number: 20210020469
    Abstract: A semiconductor vapor etching device is disclosed. The device can include an intermediate chamber between a vapor source and a reaction chamber. Etch reactant vapor can be pulsed from the intermediate chamber to the reaction chamber to etch a substrate.
    Type: Application
    Filed: July 16, 2020
    Publication date: January 21, 2021
    Inventors: Tom E. Blomberg, Varun Sharma
  • Publication number: 20210004398
    Abstract: Methods, systems, and media for identifying abusive user accounts based on playlists are provided. In accordance with some embodiments of the disclosed subject matter, a method for identifying abusive content is provided, the method comprising: determining at least one feature associated with a playlist created by a user-generated channel; calculating a playlist score associated with the playlist based on a playlist classifier, wherein the playlist classifier comprises a function that maps the at least one feature to the playlist score; calculating a channel score associated with the user-generated channel based at least on the calculated playlist score; determining that one or more content items associated with the user-generated channel is to be demoted based on the calculated channel score, wherein the one or more content items comprises the playlist; and causing the one or more content items to be demoted.
    Type: Application
    Filed: November 6, 2019
    Publication date: January 7, 2021
    Inventors: Luca Chiarandini, Varun Sharma
  • Patent number: 10854460
    Abstract: Processes are provided herein for deposition of organic films. Organic films can be deposited, including selective deposition on one surface of a substrate relative to a second surface of the substrate. For example, polymer films may be selectively deposited on a first metallic surface relative to a second dielectric surface. Selectivity, as measured by relative thicknesses on the different layers, of above about 50% or even about 90% is achieved. The selectively deposited organic film may be subjected to an etch process to render the process completely selective. Processes are also provided for particular organic film materials, independent of selectivity.
    Type: Grant
    Filed: July 8, 2019
    Date of Patent: December 1, 2020
    Assignee: ASM IP Holding B.V.
    Inventors: Eva E. Tois, Hidemi Suemori, Viljami J. Pore, Suvi P. Haukka, Varun Sharma
  • Publication number: 20200334592
    Abstract: Described are a system, method, and computer program product for generating and applying a predictive wait time estimate using predictive modeling. The method includes receiving initial transaction data representative of a plurality of transactions between a plurality of transaction accounts and at least one merchant. The method also includes generating, for each subinterval, training data including at least one of the following: service rate during the subinterval, number of transactions during the subinterval, total transaction value during the subinterval, mean transaction value during the subinterval, year, month, day of week, or any combination thereof. The method further includes generating a predictive model that generates an output of arrival rate for an input of at least one time parameter. The method further includes generating the predictive wait time estimate for a designated time.
    Type: Application
    Filed: December 20, 2017
    Publication date: October 22, 2020
    Inventors: Richa Garg, Walker Carlson, Varun Sharma, Nandakumar Kandaloo, Srijoy Aditya
  • Publication number: 20200308709
    Abstract: Thermal atomic layer etching processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase halide reactant and a second vapor halide reactant. In some embodiments, the first reactant may comprise an organic halide compound. During the thermal ALE cycle, the substrate is not contacted with a plasma reactant.
    Type: Application
    Filed: May 22, 2020
    Publication date: October 1, 2020
    Inventors: Tom E. Blomberg, Varun Sharma, Suvi P. Haukka, Marko J. Tuominen, Chiyu Zhu
  • Publication number: 20200308710
    Abstract: Thermal atomic layer etching processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase halide reactant and a second vapor halide reactant. In some embodiments, the first reactant may comprise an organic halide compound. During the thermal ALE cycle, the substrate is not contacted with a plasma reactant.
    Type: Application
    Filed: May 22, 2020
    Publication date: October 1, 2020
    Inventors: Tom E. Blomberg, Varun Sharma, Suvi Haukka, Marko Tuominen, Chiyu Zhu
  • Publication number: 20200312620
    Abstract: Atomic layer etching (ALE) processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase non-metal halide reactant and a second vapor phase halide reactant. In some embodiments both the first and second reactants are chloride reactants. In some embodiments the first reactant is fluorinating gas and the second reactant is a chlorinating gas. In some embodiments a thermal ALE cycle is used in which the substrate is not contacted with a plasma reactant.
    Type: Application
    Filed: May 22, 2020
    Publication date: October 1, 2020
    Inventors: Tom E. Blomberg, Varun Sharma, Suvi Haukka, Marko Tuominen, Chiyu Zhu
  • Publication number: 20200302423
    Abstract: Techniques for managing communications sessions between multiple user devices is provided. The computer system may support a capability of automatically establishing communications sessions between the user devices. For example, the computer system may receive audio data from a voice controlled device (VCD). The audio data may indicate an utterance of a user confirming that information of a payment instrument is needed for transaction. The computer system may initiate a second communications session with a second device of the user to receive the information required for the transaction. In some examples, the computer system may execute the script to synthesize text-to-speech content that requests user input for the information from the second device. Once received, the information may be stored in a user account associated with the user. The VCD may be instructed to resume communications with the user upon termination of the second communications session with the second device.
    Type: Application
    Filed: March 18, 2019
    Publication date: September 24, 2020
    Inventors: Aravindhan Vijayaraghavan, Jacob Daniel Robert Harding, Varun Sharma
  • Publication number: 20200279758
    Abstract: A chemical dispensing apparatus for providing a chlorine vapor to a reaction chamber is disclosed. The chemical dispensing apparatus may include: a chemical storage vessel configured for storing a chlorine-containing chemical species, a reservoir vessel in fluid communication with the chemical storage vessel, the reservoir vessel configured for converting the chlorine-containing chemical species to the chlorine vapor, and a reaction chamber in fluid communication with the reservoir vessel. Methods for dispensing a chlorine vapor to a reaction chamber are also disclosed.
    Type: Application
    Filed: May 15, 2020
    Publication date: September 3, 2020
    Inventor: Varun Sharma
  • Patent number: 10701163
    Abstract: Described herein is a system and method for estimating wait times at various resource providers based on transaction information submitted to a processing network. In some embodiments, the system identifies a time distance between a target resource provider and a plurality of other resource providers in order to identify resource providers local to the target resource provider. Additionally, the system may identify segments for each of a plurality of users on the system. The processing network may identify recent transaction requests received from each of the resource providers local to the target resource provider. The processing network may then identify users associated with each of those transaction requests. Based on the segments assigned to each of those users, the system may estimate and arrival rate, and subsequently an estimated wait time, for the target resource provider.
    Type: Grant
    Filed: December 16, 2016
    Date of Patent: June 30, 2020
    Assignee: Visa International Service Association
    Inventors: Varun Sharma, Patrick Egbuchulam, Zian Huang, Nandakumar Kandaloo, Srijoy Aditya
  • Publication number: 20200194268
    Abstract: Methods for forming a rhenium-containing film on a substrate by a cyclical deposition are disclosed. The method may include: contacting the substrate with a first vapor phase reactant comprising a rhenium precursor; and contacting the substrate with a second vapor phase reactant. Semiconductor device structures including a rhenium-containing film formed by the methods of the disclosure are also disclosed.
    Type: Application
    Filed: December 13, 2018
    Publication date: June 18, 2020
    Inventor: Varun Sharma
  • Patent number: 10678874
    Abstract: A method and a system for recommendation of a succession of one or more services for a service workflow are disclosed. In an embodiment, a query is received to retrieve one or more services from a repository of a plurality of services stored in a hierarchical structure. The hierarchical structure comprises a plurality of hierarchical levels, each hierarchical level in the plurality of hierarchical levels comprising a set of nodes. Each node in the set of nodes in each hierarchical level, stores a first semantic information and a second semantic information. Further, the query is compared with the first semantic information and the second semantic information associated with a first node. The first node or the second node is selected based on the comparison. Further, the first set of services or the combination of services, associated with the selected node is recommended, as the service workflow, to the user.
    Type: Grant
    Filed: April 28, 2016
    Date of Patent: June 9, 2020
    Assignee: CONDUENT BUSINESS SERVICES, LLC
    Inventors: Tridib Mukherjee, Varun Sharma, Aditya Hegde, Shruti Kunde
  • Patent number: 10662534
    Abstract: Thermal atomic layer etching processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase halide reactant and a second vapor halide reactant. In some embodiments, the first reactant may comprise an organic halide compound. During the thermal ALE cycle, the substrate is not contacted with a plasma reactant.
    Type: Grant
    Filed: April 22, 2019
    Date of Patent: May 26, 2020
    Assignee: ASM IP Holding B.V.
    Inventors: Tom E. Blomberg, Varun Sharma, Suvi Haukka, Marko Tuominen, Chiyu Zhu
  • Patent number: 10665425
    Abstract: Atomic layer etching (ALE) processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase non-metal halide reactant and a second vapor phase halide reactant. In some embodiments both the first and second reactants are chloride reactants. In some embodiments the first reactant is fluorinating gas and the second reactant is a chlorinating gas. In some embodiments a thermal ALE cycle is used in which the substrate is not contacted with a plasma reactant.
    Type: Grant
    Filed: April 22, 2019
    Date of Patent: May 26, 2020
    Assignee: ASM IP Holding B.V.
    Inventors: Tom E. Blomberg, Varun Sharma, Suvi P. Haukka, Marko J. Tuominen, Chiyu Zhu