Abstract: Processes are provided herein for deposition of organic films. Organic films can be deposited, including selective deposition on one surface of a substrate relative to a second surface of the substrate. For example, polymer films may be selectively deposited on a first metallic surface relative to a second dielectric surface. Selectivity, as measured by relative thicknesses on the different layers, of above about 50% or even about 90% is achieved. The selectively deposited organic film may be subjected to an etch process to render the process completely selective. Processes are also provided for particular organic film materials, independent of selectivity. Masking applications employing selective organic films are provided. Post-deposition modification of the organic films, such as metallic infiltration and/or carbon removal, is also disclosed.

Abstract: A reactor for processing substrates and methods for manufacturing and using the reactor are disclosed. Specifically, the reactor can include a material that forms gas compounds. The gas compounds are then easily removed from the reactor, thus reducing or avoiding contamination of the substrates in the reactor that would otherwise arise.

Abstract: A database system populates various fields with information from a plurality of data sources which is matched to geographic and segment information for different reference identifiers. A series of data unions provide a selectable result set. A selection of elements from the selectable result set are used to generate qualifiers that are monitored in real time to determine when the qualifiers have been satisfied in order to set a semaphore allowing access to the selection of elements.

Abstract: Thermal atomic layer etching processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase halide reactant and a second vapor halide reactant. In some embodiments, the first reactant may comprise an organic halide compound. During the thermal ALE cycle, the substrate is not contacted with a plasma reactant.

Abstract: Thermal atomic layer etching processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase halide reactant and a second vapor halide reactant. In some embodiments, the first reactant may comprise an organic halide compound. During the thermal ALE cycle, the substrate is not contacted with a plasma reactant.

Abstract: Atomic layer etching (ALE) processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase non-metal halide reactant and a second vapor phase halide reactant. In some embodiments both the first and second reactants are chloride reactants. In some embodiments the first reactant is fluorinating gas and the second reactant is a chlorinating gas. In some embodiments a thermal ALE cycle is used in which the substrate is not contacted with a plasma reactant.

Abstract: Processes are provided herein for deposition of organic films. Organic films can be deposited, including selective deposition on one surface of a substrate relative to a second surface of the substrate. For example, polymer films may be selectively deposited on a first metallic surface relative to a second dielectric surface. Selectivity, as measured by relative thicknesses on the different layers, of above about 50% or even about 90% is achieved. The selectively deposited organic film may be subjected to an etch process to render the process completely selective. Processes are also provided for particular organic film materials, independent of selectivity.

Abstract: A database system populates various fields with information from a plurality of data sources which is matched to geographic and segment information for different reference identifiers. A series of data unions provide a selectable result set. A selection of elements from the selectable result set are used to generate qualifiers that are monitored in real time to determine when the qualifiers have been satisfied in order to set a semaphore allowing access to the selection of elements.

Abstract: Thermal atomic layer etching processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase halide reactant and a second vapor halide reactant. In some embodiments, the first reactant may comprise an organic halide compound. During the thermal ALE cycle, the substrate is not contacted with a plasma reactant.

Abstract: Atomic layer etching (ALE) processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase non-metal halide reactant and a second vapor phase halide reactant. In some embodiments both the first and second reactants are chloride reactants. In some embodiments the first reactant is fluorinating gas and the second reactant is a chlorinating gas. In some embodiments a thermal ALE cycle is used in which the substrate is not contacted with a plasma reactant.

Abstract: Thermal atomic layer etching processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase halide reactant and a second vapor halide reactant. In some embodiments, the first reactant may comprise an organic halide compound. During the thermal ALE cycle, the substrate is not contacted with a plasma reactant.

Abstract: A chemical dispensing apparatus for providing a chlorine vapor to a reaction chamber is disclosed. The chemical dispensing apparatus may include: a chemical storage vessel configured for storing a chlorine-containing chemical species, a reservoir vessel in fluid communication with the chemical storage vessel, the reservoir vessel configured for converting the chlorine-containing chemical species to the chlorine vapor, and a reaction chamber in fluid communication with the reservoir vessel. Methods for dispensing a chlorine vapor to a reaction chamber are also disclosed.

Abstract: A method and a system are provided to manage analytics assets associated with at least one computer accessible to an organization using operating system (OS) containers. The method comprising receiving a request to process of a task on the user computing device. The method further select a set of analytics assets from a first category, based on at least one of a role of the user in the organization and a historical usage of the one or more analytics assets or a second category that corresponds to the user and are included in the container image associated with the user. The method further update the container image of the user, based on at least the selection of the set of analytics assets from the first category. The method further render the selected set of analytics assets through the updated container image on the user computing device of the user.

Abstract: Passivation layers to inhibit vapor deposition can be used on reactor surfaces to minimize deposits while depositing on a substrate housed therein, or on particular substrate surfaces, such as metallic surfaces on semiconductor substrates to facilitate selective deposition on adjacent dielectric surfaces. Passivation agents that are smaller than typical self-assembled monolayer precursors can have hydrophobic or non-reactive ends and facilitate more dense passivation layers more quickly than self-assembled monolayers, particularly over complex three-dimensional structures.

Abstract: A system and method to communicate individualized/customized messages to a vehicle based on the location of the vehicle, operation statuses the vehicle, and/or mobile devices of occupants of the vehicle.

Abstract: Systems and methods offer an efficient approach to computing similarity rankings in bipartite graphs. An example system includes at least one processor and memory storing a bipartite graph having a first set and a second set of nodes, with nodes in the first set being connected to nodes in the second set by edges. The memory also stores instructions that, when executed by the at least one processor, cause the system to assign each node in the second set to one of a plurality of categories and, for each of the plurality of categories, generate a subgraph. The subgraph comprises of a subset of nodes in the first set and edges linking the nodes in the subset, where the nodes in the subset are selected based on connection to a node in the second set that is assigned to the category. The system uses the subgraph to respond to queries.

Abstract: A method and a system for recommending services to a requestor over a communication network. A request comprising one or more keywords and one or more service level agreements (SLAs), is received from a requestor computing device over the communication network, to process one or more tasks. One or more first services from one or more available services are selected based on the request. For a first service from the one or more first services, a first score and a second score is determined. The one or more first services are ranked based on the first score and the second score. A recommendation of the one or more first services is transmitted to the requestor based on the ranking.

Abstract: A database system populates various fields with information from a plurality of data sources which is matched to geographic and segment information for different reference identifiers. A series of data unions provide a selectable result set. A selection of elements from the selectable result set are used to generate qualifiers that are monitored in real time to determine when the qualifiers have been satisfied in order to set a semaphore allowing access to the selection of elements.

Abstract: Atomic layer etching (ALE) processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially exposed to a first vapor phase non-metal halide reactant and a second vapor phase halide reactant. In some embodiments both the first and second reactants are chloride reactants. In some embodiments the first reactant is fluorinating gas and the second reactant is a chlorinating gas. In some embodiments a thermal ALE cycle is used in which the substrate is not contacted with a plasma reactant.

Abstract: Described herein is a system and method for estimating wait times at various resource providers based on transaction information submitted to a processing network. In some embodiments, the system identifies a time distance between a target resource provider and a plurality of other resource providers in order to identify resource providers local to the target resource provider. Additionally, the system may identify segments for each of a plurality of users on the system. The processing network may identify recent transaction requests received from each of the resource providers local to the target resource provider. The processing network may then identify users associated with each of those transaction requests. Based on the segments assigned to each of those users, the system may estimate and arrival rate, and subsequently an estimated wait time, for the target resource provider.