Abstract: In one embodiment, a semiconductor memory device includes a plurality of resistive switching memory cells, where each resistive switching memory cell can include: (i) a programmable impedance element having an anode and a cathode; (ii) a word line pair configured to control access to the programmable impedance element, where the word line pair comprises first and second word lines; (iii) a PMOS transistor having a source coupled to the cathode, a drain coupled to a bit line, and a gate coupled to the first word line; and (iv) an NMOS transistor having a source coupled to the bit line, a drain coupled to the cathode, and a gate coupled to the second word line.

Abstract: A memory device can include a plurality of memory cells formed over a substrate, each memory cell including a tunnel access device that enables current flow in at least one direction predominantly due to tunneling, and a storage element programmable between different impedance states by a reduction-oxidation reaction within at least one memory layer formed between two electrodes; wherein the tunneling access device and programmable impedance element are vertically stacked over one another.

Abstract: A memory device can include a plurality of two terminal conductive bridging random access memory (CBRAM) type memory elements; at least one program transistor configured to enable a program current to flow through at least one memory element in response to the application of a program signal at its control terminal and a program bias voltage to the memory element; and an erase load circuit that includes at least one two-terminal diode-like load element, the erase load circuit configured to enable an erase current to flow through the load element and at least one memory element in a direction opposite to that of the program current.

Abstract: In one embodiment, a capacitive circuit can include: (i) a resistive storage element having a solid electrolyte, a first electrode coupled to a first side of the solid electrolyte, and a second electrode coupled to a second side of the solid electrolyte; (ii) the resistive storage element being configured to be programmed to a low resistance state by application of a program voltage in a forward bias direction to form a conductive path between the first and second electrodes, and being configured to be erased to a high resistance state by application of an erase voltage in a reverse bias direction to substantially dissolve the conductive path; and (iii) a first capacitor having the first electrode coupled to a first side of a first oxide layer, and a third electrode coupled to a second side of the first oxide layer.

Abstract: In one embodiment of the present invention, a resistive switching device includes a first electrode disposed over a substrate and coupled to a first potential node, a switching layer disposed over the first electrode, a conductive amorphous layer disposed over the switching layer, and a second electrode disposed on the conductive amorphous layer and coupled to a second potential node.

Abstract: A method can include determining at least one use characteristic for the memory cells comprising a solid electrolyte, the use characteristic corresponding to a number of times the memory cells have been programmed to at least one impedance level; and adjusting a read threshold level for the memory cells based on at least the use characteristic, the read threshold level determining data values stored in the memory cells in a read operation.

Abstract: A memory device can include a plurality of programmable impedance elements programmable between a low impedance state in response to a program voltage and a higher impedance state in response to an erase voltage having a different polarity than the program voltage; a programming circuit configured to apply the program and erase voltages to selected elements; and a pre-condition path configured to apply a pre-condition voltage only of the erase voltage polarity to fresh elements in a pre-condition operation; wherein fresh elements are elements that have not been subject to any programming voltages. The pre-condition electrical conditions can also include high voltage low current conditions that apply a greater magnitude voltage and smaller current than the first or second electrical conditions, or high voltage low current conditions that apply a greater magnitude voltage and greater current than the first or second electrical conditions.

Abstract: Structures and methods for recovering data in a semiconductor memory device are disclosed herein. In one embodiment, a method of recovering data in a semiconductor memory device, can include: (i) pre-conditioning a first memory cell on the semiconductor memory device by using a formation voltage to program a first data state in the first memory cell; (ii) storing a second data state in a second memory cell on the semiconductor memory device by maintaining the second memory cell in a virgin state; (iii) mounting the semiconductor memory device on a printed-circuit board (PCB) by using a high temperature process that increases a resistance of the first memory cell; and (iv) performing a recovery of the first data state by reducing the resistance of the first memory cell.

Abstract: A memory element programmable between different impedance states can include a first electrode; a switching layer formed in contact with the first electrode and including at least one metal oxide; and a buffer layer in contact with the switching layer. A buffer layer can include a first metal, tellurium, a third element, and a second metal distributed within the buffer layer. A second electrode can be in contact with the buffer layer.

Abstract: A memory device can include a load circuit coupled in series with at least one memory element between two nodes and configured to enable a programming current to flow through the memory element to lower its impedance, and configured to enable an erase current to flow through the element in a direction opposite to the program current, the erase current varying in response to an erase voltage applied across the two nodes as the memory element impedance increases.

Abstract: A method can include determining at least one use characteristic for the memory cells comprising a solid electrolyte, the use characteristic corresponding to a number of times the memory cells have been programmed to at least one impedance level; and adjusting a read threshold level for the memory cells based on at least the use characteristic, the read threshold level determining data values stored in the memory cells in a read operation.

Abstract: Embodiments of a device (such as a computer system or a circuit tester), a method, and a computer-program product (i.e., software) for use with the device are described. These systems and processes may be used to statistically characterize interdependencies between sub-circuits in an integrated circuit (which are referred to as ‘aggressor-victim relationships’). In particular, statistical relationships between the aggressors and victims are determined from values of a performance metric (such as clock speed) when the integrated circuit fails for a group of state-change difference vectors. Using these statistical relationships, a worst-case sub-group of the state-change difference vectors, such as the worst-case sub-group, is selected. This sub-group can be used to accurately test the integrated circuit.

Abstract: Provided are methods and composition for forming a multi-layer isolation structure on an integrated circuit substrate. A process can include selecting a lower dielectric material for the lower dielectric layer and selecting an upper dielectric material for the upper dielectric layer. A range of effective dielectric constants that correspond to the thicknesses the lower and upper dielectric materials are selected. A range of thicknesses for each of the lower and upper dielectric layers are determined from a range of acceptable dielectric constants using information indicating an effective dielectric constant corresponding to thicknesses of the materials for both the lower upper dielectric layers, enabling the formation of the multi-layer isolation structure.

Abstract: Embodiments of a device (such as a computer system or a circuit tester), a method, and a computer-program product (i.e., software) for use with the device are described. These systems and processes may be used to statistically characterize interdependencies between sub-circuits in an integrated circuit (which are referred to as ‘aggressor-victim relationships’). In particular, statistical relationships between the aggressors and victims are determined from values of a performance metric (such as clock speed) when the integrated circuit fails for a group of state-change difference vectors. Using these statistical relationships, a worst-case sub-group of the state-change difference vectors, such as the worst-case sub-group, is selected. This sub-group can be used to accurately test the integrated circuit.

Abstract: Broadly speaking, the embodiments of the present invention fill the need for a method of designing semiconductor device chips with reduced power consumption. The embodiments describe methods that are activity-based and are used for power optimization. The embodiments provide methods of selecting instances of a block of a chip to be replaced by either gate-length bias (GBIAS) cells or high-threshold-voltage (HVT) cells with minimal impact (little or no impact) on the overall performance of the chip. Only instances not on the critical path(s) are selected. Instances with low activities and high slack thresholds are chosen to be replaced by either GBIAS cells or HVT cells. By replacing the instances with low activities and high slack threshold, the performance impact on the block and chip is minimized. The replacement results in net power reduction, which is critical to advanced device technologies.

Abstract: A novel scheme for screening weak memory cell includes a cell coupled to a leakage stress delivery circuitry (LSDC), which, in turn, is coupled to an induced leakage adjustment control (ILAC). The LSDC includes a combination of PMOS transistors, NMOS transistors or both PMOS and NMOS transistors that are controlled by a plurality of stress inducing signals. The PMOS and/or NMOS transistors of the LSDC are coupled to a pair of complementary data lines. The complementary data lines are inputs to a sense amplifier and are outputs of a write driver. The ILAC controls the quantity of the leakage stress applied through the LSDC to the pair of complementary data lines. The ILAC further includes a leakage varying circuitry that is configured to adjust the leakage stress applied to the complementary data lines through the LSDC.

Abstract: Provided are methods and composition for forming an isolation structure on an integrated circuit substrate. First, a trench is etched in the integrated circuit substrate. A lower dielectric layer is then formed in the trench such that the lower dielectric layer at least partially fills the trench. An upper dielectric layer is then formed over the lower dielectric layer to create an isolation structure, the upper dielectric layer and the lower dielectric layer together having an effective dielectric constant that is less than that of silicon dioxide, thereby enabling capacitance associated with the isolation structure to be reduced.

Abstract: Dual trench depths are achieved on the same wafer by forming an initial trench having a depth corresponding to the difference in final depths of the shallow and deep trenches. A second mask is used to open areas for the deep trenches over the preliminary trenches and for the shallow trenches at additional locations. Etching of the shallow and deep trenches then proceeds simultaneously.

Abstract: A method of producing an antifuse includes introducing nitrogen by ion implantation means into the substrate. An oxide dielectric layer is then formed on the nitrided substrate in a wet oxidation ambient. The conditions of the ion implantation and the oxidation are controlled to generate a dielectric with uniform thickness and a low breakdown voltage when subjected to a high electric field.

Abstract: Provided are methods and composition for forming an isolation structure on an integrated circuit substrate. First, a trench is etched in the integrated circuit substrate. A lower dielectric layer is then formed in the trench such that the lower dielectric layer at least partially fills the trench. An upper dielectric layer is then formed over the lower dielectric layer to create an isolation structure, the upper dielectric layer and the lower dielectric layer together having an effective dielectric constant that is less than that of silicon dioxide, thereby enabling capacitance associated with the isolation structure to be reduced.