Abstract: This disclosure describes a multiaxis gyroscope comprising a first proof mass quartet centered around a first quartet center point and a second proof mass quartet centered around a second quartet center point. In the primary oscillation mode all masses in each proof mass quartet move simultaneously either radially toward and away from the corresponding quartet center point, or in the same tangential direction in relation to the corresponding quartet center point.

Abstract: This disclosure describes a microelectromechanical multiaxis gyroscope comprising a proof mass quartet, a central suspension arrangement for suspending the proof mass quartet from the central anchor point. The gyroscope also comprises a synchronization frame and a detection mass quartet. One or more lateral corner springs extends to each detection mass from the laterally adjacent proof mass, and one or more transversal corner springs extends to each detection mass from the transversally adjacent proof mass.

Abstract: The disclosure relates to a microelectromechanical gyroscope which comprises first and second proof masses which form a first proof mass pair and third and fourth proof masses which form a second proof mass pair. The oscillation of the first and second proof mass pairs is synchronized by a synchronization element which comprises a ringlike body and torsion bars which extend along the x-axis from the ringlike body to the first, second, third and fourth proof masses.

Abstract: This disclosure describes a multiaxis gyroscope comprising a first proof mass quartet centered around a first quartet center point and a second proof mass quartet centered around a second quartet center point. The phase of the primary oscillation of each proof mass in the first proof mass quartet in relation to the first quartet center point is anti-phase in relation to the phase of the primary oscillation of the corresponding proof mass in the second proof mass quartet in relation to the second quartet center point. The phase of the primary oscillation of the first and second proof masses in each proof mass quartet in relation to the corresponding quartet center point is anti-phase in relation to the phase of the primary oscillation of the third and fourth proof masses in the same proof mass quartet in relation to the same quartet center point.

Abstract: An improved design for a microelectromechanical device that enables multi-axis detection but is also more robust in demanding operating conditions. The device has a balanced structure formed of two oscillating inertial masses, coupled in a way that optimally utilizes inherent stiffnesses of spring structures to increase robustness of the combined device structure.

Abstract: The disclosure relates to a microelectromechanical device where the device structure includes a rotating mass structure and a linear mass structure. The rotating mass structure is formed of two rotating mass parts elastically coupled to the support through one or more springs that enable rotary motion of each of the rotating mass parts about respective rotary axes that extend parallel to each other along a first in-plane direction (IP1). The linear mass structure includes at least one elongate rigid body that extends in a second in-plane direction (IP2). One end of the linear mass structure is coupled to the first rotating mass part and the other end of the linear mass structure is coupled to the second rotating mass part such that rotary motions of the first and second masses result into linear motion of the linear mass structure in the out-of-plane direction (OP).

Abstract: A microelectromechanical device that comprises a first structural layer, and a movable mass suspended to a primary out-of plane motion relative the first structural layer. A cantilever motion limiter structure is etched into the movable mass, and a first stopper element is arranged on the first structural layer, opposite to the cantilever motion limiter structure. Improved mechanical robustness is achieved with optimal use of element space.

Abstract: A robust microelectromechanical structure that is less prone to internal or external electrical disturbances. The structure includes a mobile element with a rotor suspended to a support, a first frame anchored to the support and circumscribing the mobile element, and a second frame anchored to the support and circumscribing the mobile element between the mobile element and the first frame, electrically isolated from the first frame. The rotor and the second frame are galvanically coupled to have a same electric potential.

Abstract: A scanning microelectromechanical reflector system comprising a mobile reflector mass and a mobile frame mass which surrounds the mobile reflector mass when the reflector plane coincides with the mobile frame plane. The mobile frame mass is suspended from a fixed frame which at least partly surrounds the mobile frame mass when the mobile frame plane coincides with the fixed frame plane. The reflector system further comprises a pair of first torsion beams aligned on a first axis in the mobile frame plane, and one or more first actuation units which can be configured to rotate the reflector mass and the mobile frame mass about the first axis.

Abstract: A microelectromechanical device includes a semi-flexible proof-mass comprising a primary part, a secondary part and a stiff spring suspending the primary part and the secondary part. The spring causes the parts to move as a single entity when the device is in its normal range. A first stopper structure stops the primary part. The proof-mass is configured to deform through deflection of the spring, when the device is subjected to a shock having a force that is beyond the normal operation range. While the shock causes motion of the proof-mass in one direction along an axis of movement, the spring is configured to cause a restoring force causing the secondary part of the proof-mass to be driven into a restoring motion in a direction opposite to motion along an axis caused by the shock. Momentum of the secondary part causes the primary part to dislodge from the first stopper structure.

Abstract: The MEMS sensor of the invention has movable and fixed components for measuring acceleration in a rotational mode in a direction in-plane perpendicular to spring axis. The components include an element frame, a substrate, a proof-mass a spring connected to the proof-mass and to the substrate, and comb electrodes. The MEMS sensor is mainly characterized by an arrangement of the components causing an inherent sensitivity for measuring accelerations in a range covering longitudinal and transversal accelerations. One or more of the components are tilted compared to the element frame. The semiconductor package of the invention comprises at least one MEMS sensor.

Abstract: This disclosure describes a capacitive micromechanical accelerometer with at least a first sensor which comprises a rotor which is a two-sided seesaw frame. The rotor comprises one or more first damping plates on the first side of its rotation axis and one or more first damping plates on the second side of its rotation axis. One or more second damping plates are fixed to the inner package plane above or below at least some of the one or more first damping plates, so that at least one first damping plate overlaps with the projection of a second damping plate on each side of the axis. The frame-shaped rotor may surround second and third acceleration sensors located in the substrate plane.

Abstract: A micromechanical accelerometer comprises a sensor for measuring acceleration along a vertical axis perpendicular to a substrate plane, and an accelerometer package with at least one inner package plane adjacent and parallel to the substrate plane. The first sensor comprises a rotor which is mobile in relation to the substrate, a rotor suspender and one or more stators which are immobile in relation to the substrate. The rotor is a seesaw frame where longitudinal rotor bar comprise one or more first deflection electrodes, and second deflection electrodes are fixed to the inner package plane above or below each of the one or more first deflection electrodes, so that they overlap. The accelerometer can perform a self-test by applying a test voltage to at least one first deflection electrode and at least one second deflection electrode. A self-test response signal can be read with a measurement between rotor and stator electrodes.

Abstract: The present invention relates to A MEMS sensor with movable and fixed components for measuring linear acceleration. The MEMS sensor includes at least two mutually independent differential sensor elements disposed inside a common frame structure providing walls for hermetic sealing of the MEMS sensor. The mutually independent differential sensor elements are pairwise configured to perform double differential detection of linear acceleration. The MEMS sensor includes a common anchoring area to which the at least two differential sensor elements are anchored. The common anchoring area is located at the centroid of the pairwise configured differential sensor elements. A self-test capability of the MEMS sensor is also provided.

Abstract: A microelectromechanical sensor device that comprises a seismic mass, and a spring structure that defines for the seismic mass a drive direction, and a sense direction that is perpendicular to the drive direction. A capacitive transducer structure includes a stator to be anchored to a static support structure, and a rotor mechanically connected to the seismic mass. The capacitive transducer structure is arranged into a slanted orientation where a non-zero angle is formed between the drive direction and a tangent of the stator surface. The slated capacitive transducer structure creates an electrostatic force to decrease quadrature error of the linear oscillation.

Abstract: The present invention relates to a micromechanical device comprising a multi-layer micromechanical structure including only homogenous silicon material. The device layer comprises at least a rotor and at least two stators. At least some of the rotor and at least two stators are at least partially recessed to at least two different depths of recession from a first surface of the device layer and at least some of the rotor and at least two stators are at least partially recessed to at least two different depths of recession from a second surface of the device layer.

Abstract: A MEMS-sensor structure comprising first means and second means coupled for double differential detection and positioned symmetrically to provide quantities for the double differential detection in a phase shift. If the sensor deforms, due to a specifically symmetric positioning of the first and second means, the effect of the displacement is at least partly eliminated.

Abstract: A microelectromechanical device includes a semi-flexible proof-mass comprising a primary part, a secondary part and a stiff spring suspending the primary part and the secondary part. The spring causes the parts to move as a single entity when the device is in its normal range. A first stopper structure stops the primary part. The proof-mass is configured to deform through deflection of the spring, when the device is subjected to a shock having a force that is beyond the normal operation range. While the shock causes motion of the proof-mass in one direction along an axis of movement, the spring is configured to cause a restoring force causing the secondary part of the proof-mass to be driven into a restoring motion in a direction opposite to motion along an axis caused by the shock. Momentum of the secondary part causes the primary part to dislodge from the first stopper structure.

Abstract: The invention relates to a capacitive micromechanical acceleration sensor comprising a first sensor, a second sensor, and a third sensor. The first sensor comprises a rotor electrode and stator electrode. The sensor comprises a first beam that is connected to a rotor electrode support structure and that is connected to the rotor electrode. The sensor comprises a second beam that is connected to the rotor electrode support structure and that is connected to the rotor electrode. The second sensor is situated in a first space circumscribed by the first beam, the first sensor, and the rotor electrode support structure. The third sensor is situated in a second space circumscribed by the second beam, the first sensor, and the rotor electrode support structure.

Abstract: The invention relates to a capacitive micromechanical sensor structure comprising a stator structure rigidly anchored to a substrate and a rotor structure movably anchored by means of spring structures to the substrate. The stator structure has a plurality of stator finger support beams and the rotor structure has a plurality of rotor finger support beams. Stator fingers along the stator finger support beam of the stator structure extend into rotor gaps along the rotor finger support beam of the rotor structure, and rotor fingers along the rotor finger support beam of the rotor structure extend into stator gaps along the stator finger support beam of the stator structure.