Patents by Inventor Vivek Singh

Vivek Singh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Thermal proximity effects in lithography
    Publication number: 20050030495
    Abstract: A proximity correction tool receives an indication of a feature in a lithographic design. The proximity correction tool predicts a film edge placement for the feature in a resist film based at least in part on thermal proximity effects in the resist film.
    Type: Application
    Filed: August 8, 2003
    Publication date: February 10, 2005
    Inventors: David Fryer, Vivek Singh, Thanh Phung
  • Phase shifting mask having a phase shift that minimizes critical dimension sensitivity to manufacturing and process variance
    Patent number: 5840448
    Abstract: A reticle having only one phase delay value for a given wavelength of incident radiation. The reticle includes a first and second region, both transparent to incident radiation. The second region being adjacent to said first region. The incident radiation transmitted by the second region has a phase delay of other than an integer multiple of 90 degrees relative to said incident radiation transmitted by the first region.
    Type: Grant
    Filed: December 31, 1996
    Date of Patent: November 24, 1998
    Assignee: Intel Corporation
    Inventors: Yan Borodovsky, Vivek Singh