Abstract: A method, system and computer program product for performing a drilling operation for an oil field, the oil field having a subterranean formation with geological structures and reservoirs therein. The method involves creating a finite-difference model to simulate behavior of a drilling assembly used to drill a wellbore in the drilling operation, performing a simulation of the drilling operation using the finite-difference model, analyzing a result of the simulation, and selectively modifying the drilling operation based on the analysis.

Abstract: The invention relates to a method of performing a drilling operation for an oilfield, which has a subterranean formation with geological structures and reservoirs. The method includes collecting oilfield data, at least a portion of the oilfield data being generated from a wellsite of the oilfield, selectively manipulating the oilfield data for real-time analysis according to a defined configuration, comparing the real-time drilling data with oilfield predictions based on the defined configuration, and selectively adjusting the drilling operation based on the comparison.

Abstract: Systems and techniques to quickly and accurately model a transmitted electromagnetic field through a mask, to design a mask, and to create a library of corrections including edge corrections, edge-to-edge corrections, and corner corrections.

Abstract: Faster synthesis of photolithography mask modifications is described. In one embodiment, the invention includes synthesizing a first binary photolithography mask, developing perturbations to an estimated electric field generated by the first mask in use, and synthesizing a second binary photolithography mask by applying the perturbations to the first mask.

Abstract: Two acids may be formed per exposed photon using free radical promotion so that two acid products are produced via two parallel pathways. This results in increased fabrication facility throughput. In some embodiments, this may be achieved while reducing side-lobe defect liability.

Abstract: Systems and techniques to quickly and accurately model a transmitted electromagnetic field through a mask, to design a mask, and to create a library of corrections including edge corrections, edge-to-edge corrections, and corner corrections.

Abstract: Some embodiments of the present invention include apparatuses and methods relating to pixelated masks for high resolution photolithography.

Abstract: The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile being opaque to the light, the third tile having a third characteristic linear dimension that is 15% or less of the wavelength of the light.

Abstract: The present invention discloses a mask including: a first region near a corner of a feature, the first region including a first element, the first element being transparent to a light, the first element having a side that is smaller than a wavelength of said light; a second region near the corner of the feature, the second region including a second element, the second element being transparent to the light, the second element having a side that is smaller than the wavelength of the light; and a third region near the corner of the feature, the third region including a third element, the third element being opaque to the light, the third element having a side that is smaller than the wavelength of the light.

Abstract: A pixelated photolithography mask is optimized for high resolution microelectronic processing. In one embodiment, the invention includes synthesizing a pixelated photolithography mask, applying a pixel flipping function to the mask, comparing the resulting mask to a desired result, and synthesizing an optimized pixelated binary photolithography mask using the function.

Abstract: The present invention relates to a method for the conversion of a DNA sequence into a number string. More particularly, the present invention relates to a method for the conversion of a DNA sequence into a number string using a genomic numbering system in order to extract and/or analyze biological information. The method of the invention is particularly useful in the development of new drugs or active chemical agents.

Abstract: Faster synthesis of photolithography mask modifications is described. In one embodiment, the invention includes synthesizing a first binary photolithography mask, developing perturbations to an estimated electric field generated by the first mask in use, and synthesizing a second binary photolithography mask by applying the perturbations to the first mask.

Abstract: Systems, techniques, and approaches to quickly generate mask patterns, synthesize near-fields, and design masks. In one aspect, a mask may be designed by modeling the transmitted field using a library of corrections and a fast field model.

Abstract: Systems and techniques to quickly and accurately model a transmitted electromagnetic field through a mask, to design a mask, and to create a library of corrections including edge corrections, edge-to-edge corrections, and corner corrections.

Abstract: As system for navigating primary media and meta-data on a computer system is described. The system involves accessing primary media from a primary media source, and accessing meta-data from a meta-data source. The system also involves generating a graphical user interface (GUI) for providing interaction between a user and the system in relation to the primary media. The GUI includes means for facilitating control of the primary media currently being played, and means for displaying a multidimensional graphical representation for depicting a timeline for indicating the current location of the primary media being played relative to a reference location in the primary media, and providing information relating to the meta-data associated with the primary media at the current location.

Abstract: A proximity correction tool receives an indication of a feature in a lithographic design. The proximity correction tool predicts a film edge placement for the feature in a resist film based at least in part on thermal proximity effects in the resist film.

Abstract: A reticle having only one phase delay value for a given wavelength of incident radiation. The reticle includes a first and second region, both transparent to incident radiation. The second region being adjacent to said first region. The incident radiation transmitted by the second region has a phase delay of other than an integer multiple of 90 degrees relative to said incident radiation transmitted by the first region.