Patents by Inventor Wai-Fan Yau

Wai-Fan Yau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for depositing antireflective coating
    Patent number: 5968324
    Abstract: A stable process for depositing an antireflective layer. Helium gas is used to lower the deposition rate of plasma-enhanced silane oxide, silane oxynitride, and silane nitride processes. Helium is also used to stabilize the process, so that different films can be deposited. The invention also provides conditions under which process parameters can be controlled to produce antireflective layers with varying optimum refractive index, absorptive index, and thickness for obtaining the desired optical behavior.
    Type: Grant
    Filed: June 28, 1996
    Date of Patent: October 19, 1999
    Assignee: Applied Materials, Inc.
    Inventors: David Cheung, Joe Feng, Judy H. Huang, Wai-Fan Yau