Patents by Inventor Wang Nang Wang

Wang Nang Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6380050
    Abstract: A method for growth of strain free epitaxial layers of semiconductors on highly lattice mismatched substrates is suggested using a buffer layer with a solid-liquid phase transition to accommodate high mismatch between substrate and semiconductor.
    Type: Grant
    Filed: July 14, 2000
    Date of Patent: April 30, 2002
    Assignee: Arima Optoelectronics Corporation
    Inventors: Wang Nang Wang, Yurii Georgievich Shreter, Yurii Toomasovich Rebane
  • Publication number: 20010024086
    Abstract: Parallel cathode electrodes extend across the base plate of a display. Each electrode has teeth projecting from both sides, the teeth of adjacent electrodes being closely spaced from one another by a gap that is bridged by a dot of an electron emitter material. A glass screen spaced by a vacuum gap above the base plate carries transparent anode stripes extending transversely of the cathode electrodes and a fluorescent layer of coloured phosphors on the anode stripes. A voltage applied between adjacent cathode electrodes and gates conduction via each electron emitter dot. A voltage applied to an anode stripe causes a part of the current from the emitter directly below the stripe to be directed towards the anode, thereby illuminating the phosphor pixel above the emitter.
    Type: Application
    Filed: March 22, 2001
    Publication date: September 27, 2001
    Applicant: SMITHS GROUP PLC
    Inventors: Neil Anthony Fox, Wang Nang Wang
  • Patent number: 6284556
    Abstract: A diamond grit surface is formed on a substrate (1) having a metal surface (2), such as nickel, by applying a paste (4) of low-grade diamond grit in a binder to the surface. After driving off the binder, the diamond coated surface is placed in a reactor chamber (10) having a microwave plasma reactor (11) and connected to a hydrogen gas pump (12). The substrate (1) is heated in the hydrogen atmosphere at a reduced pressure. The metal surface (2) acts as a catalyst in the presence of the hydrogen plasma to cause regrowth of the diamond (6), giving an improved size, shape and adhesion. The method may be used to make diamond surfaces in electron emitter devices, circuit boards or abrasive devices.
    Type: Grant
    Filed: July 8, 1999
    Date of Patent: September 4, 2001
    Assignee: Smiths Group PLC
    Inventors: Wang Nang Wang, Neil Anthony Fox
  • Patent number: 6130445
    Abstract: A semiconductor light emitting device includes two AlGaAs and AlGaInP Bragg reflector layers below an active layer.
    Type: Grant
    Filed: December 2, 1999
    Date of Patent: October 10, 2000
    Assignee: Arima Optoelectronics Corporation
    Inventors: Wang Nang Wang, Stephen Sen-Tien Lee
  • Patent number: 5952772
    Abstract: An electron emitter (2) has a semiconductor substrate (20) doped with an n-type region (21). A diamond layer (24) is doped by ion implantation with a p-type dopant to form a graded dopant profile region (27) that increases away from the upper surface of the diamond layer (24) and a thin insulating region (28) separating the p-type region (27) from the n-type region (21). The emitter (2) has a first electrical contact (23) on a lower surface of the substrate (20) and a second electrical contact (25) on the upper surface of the diamond layer (24) such that a voltage can be applied across the emitter (2) to cause tunneling of electrons from the n-type region (21) through the insulating region (28) into the p-type region (27), causing emission of electrons from an exposed surface (29).
    Type: Grant
    Filed: January 21, 1998
    Date of Patent: September 14, 1999
    Assignee: Smiths Industries Public Limited Company
    Inventors: Neil Anthony Fox, Wang Nang Wang
  • Patent number: 5484853
    Abstract: A two-part adhesive composition having superior adhesive strength at cryogenic temperatures contains a urethane resin composition part and a hardener part. The urethane resin composition part comprises 50 to 99% by weight of a modified polyurethane prepolymer having an epoxy group at each of its respective ends and 1 to 50% by weight of a modified urethane compound having substantially no ether cyanate (NCO) groups and at least two epoxy groups per molecule and a molecular weight of less than 800 daltons. The hardener part is a polyamine containing primary or secondary amine groups. The equivalent ratio of the amine groups of the polyamine to the epoxy groups of the urethane resin composition part is 0.5 to 2.0.
    Type: Grant
    Filed: July 28, 1993
    Date of Patent: January 16, 1996
    Assignee: China Technical Consultants, Inc.
    Inventors: Der-Shyang Chen, Hung-Chung Hsia, Chen-Chi M. Ma, Wang-Nang Wang
  • Patent number: 5066636
    Abstract: A citrate/ethylenediamine gel method for forming oxide superconductors of the Y-Ba-Cu-O, Bi-Ca-Sr-Cu-O, Tl-Ca-Ba-Cu-O system by employing the nitrates of the individual metals and citric acid. Ethylenediamine is then added to form gels. These materials then undergo calcination and sintering processes. The respective superconductors obtained possess a superconducting zero resistance temperature at 93K, 78K and 118K respectively.
    Type: Grant
    Filed: August 15, 1990
    Date of Patent: November 19, 1991
    Assignee: Industrial Technology Research Institute
    Inventors: Ru-Shi Liu, Wang-Nang Wang, Chan-Ting Chang