Patents by Inventor Wataru Hoshino

Wataru Hoshino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160170114
    Abstract: The present invention provides a luminance-enhancing film including a ?/4 plate, and a reflection polarizer, including a first light reflection layer, a second light reflection layer, and a third light reflection layer from the ?/4 plate side sequentially, the light reflection layers being light reflection layers formed by fixing a cholesteric liquid crystalline phase, and including blue, green and red light reflection layers, and Rth(550) of the first light reflection layer and Rth(550) of the second light reflection layer having inverse signs; and a luminance-enhancing film including a ?/4 plate and a reflection polarizer including at least a light reflection layer formed of a rod-like cholesteric liquid crystal material and a light reflection layer formed of a disk-like cholesteric liquid crystal material. The luminance-enhancing film has high luminance and is able to suppress an oblique change in the color.
    Type: Application
    Filed: February 24, 2016
    Publication date: June 16, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Akiko WATANO, Yukito SAITOH, Katsufumi OHMURO, Mitsuyoshi ICHIHASHI, Hiroyuki ISHIKAWA, Kotaro YASUDA, Hideyuki NISHIKAWA, Yuki MATSUDA, Wataru HOSHINO
  • Patent number: 9347047
    Abstract: The present invention provides a means and method useful for measurement of a total branched-chain amino acid concentration. Specifically, the present invention provides a modified enzyme in which at least one amino acid residue is mutated so as to improve a property of a leucine dehydrogenase which is associated with the measurement of the total branched-chain amino acids, such as, for example, substrate specificities of leucine dehydrogenase for total branched-chain amino acids, activity of leucine dehydrogenase for any branched-chain amino acids, and thermal stability of leucine dehydrogenase; and a method of analyzing the total branched-chain amino acids, comprising measuring the total branched-chain amino acids contained in a test sample using the modified enzyme.
    Type: Grant
    Filed: September 19, 2014
    Date of Patent: May 24, 2016
    Assignee: AJINOMOTO CO., INC.
    Inventors: Wataru Hoshino, Yuya Kodama, Toshimi Mizukoshi, Uno Tagami
  • Publication number: 20160002610
    Abstract: The present invention provides a novel enzyme and methods of using the enzyme for measuring glycine concentration. Specifically, the present invention provides an enzyme in which at least one amino acid residue is mutated so as to improve a property of a glycine oxidase which is associated with the measurement of glycine (e.g., activity of glycine oxidase for glycine, thermal stability of glycine oxidase, and substrate specificity of glycine oxidase for glycine,); and a method of analyzing glycine, that includes measuring glycine contained in a test sample using the modified enzyme; and the like.
    Type: Application
    Filed: September 23, 2015
    Publication date: January 7, 2016
    Applicant: AJINOMOTO CO., INC.
    Inventors: Yuya Kodama, Wataru Hoshino, Kazutoshi Takahashi, Moemi Ito
  • Patent number: 9034403
    Abstract: A yeast extract containing a peptide, such as ?-Glu-X and ?-Glu-X-Gly, wherein X can represent an amino acid or an amino acid derivative other than Cys and derivatives thereof, is prepared by culturing a yeast in a medium containing a peptide such as ?-Glu-X, ?-Glu-X-Gly and X-Gly, and preparing a yeast extract from the obtained cells.
    Type: Grant
    Filed: August 24, 2012
    Date of Patent: May 19, 2015
    Assignee: AJINOMOTO CO., INC.
    Inventors: Hiroaki Nishiuchi, Wataru Hoshino, Junko Yamazaki, Toshimi Mizukoshi, Vsevolod Aleksandovich Serebryanyy, Olga Aleksandrovna Sofyanovich, Dmitriy Aleksandrovich Cheshev, V. Elena Matrosova
  • Publication number: 20150010936
    Abstract: The present invention provides a means and method useful for measurement of a total branched-chain amino acid concentration. Specifically, the present invention provides a modified enzyme in which at least one amino acid residue is mutated so as to improve a property of a leucine dehydrogenase which is associated with the measurement of the total branched-chain amino acids, such as, for example, substrate specificities of leucine dehydrogenase for total branched-chain amino acids, activity of leucine dehydrogenase for any branched-chain amino acids, and thermal stability of leucine dehydrogenase; and a method of analyzing the total branched-chain amino acids, comprising measuring the total branched-chain amino acids contained in a test sample using the modified enzyme.
    Type: Application
    Filed: September 19, 2014
    Publication date: January 8, 2015
    Applicant: AJINOMOTO CO., INC.
    Inventors: Wataru Hoshino, Yuya Kodama, Toshimi Mizukoshi, Uno Tagami
  • Patent number: 8603733
    Abstract: A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.
    Type: Grant
    Filed: August 2, 2011
    Date of Patent: December 10, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Shinji Tarutani, Hideaki Tsubaki, Kazuyoshi Mizutani, Kenji Wada, Wataru Hoshino
  • Publication number: 20130280381
    Abstract: A yeast extract containing 0.2% or more of ?-Glu-Abu based on dry weight of the yeast extract is produced by culturing a yeast, such as Saccharomyces cervisiae or Candida utilis, in a medium containing a compound selected from Abu (L-2-aminobutyric acid) and ?-Glu-Abu (L-?-glutamyl-L-2-aminobutyric acid), and preparing a yeast extract from the obtained cells.
    Type: Application
    Filed: March 15, 2013
    Publication date: October 24, 2013
    Inventors: Hiroaki Nishiuchi, Misato Morita, Wataru Hoshino, Junko Yamazaki, Takayuki Ito, Kazuo Yamagishi
  • Patent number: 8431330
    Abstract: A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film on the first resist pattern to form a second resist pattern, and a pattern-forming method uses the surface-treating agent.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: April 30, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Wataru Hoshino, Hideaki Tsubaki, Masahiro Yoshidome
  • Publication number: 20130045305
    Abstract: A yeast extract containing a peptide, such as ?-Glu-X and ?-Glu-X-Gly, wherein X can represent an amino acid or an amino acid derivative other than Cys and derivatives thereof, is prepared by culturing a yeast in a medium containing a peptide such as ?-Glu-X, ?-Glu-X-Gly and X-Gly, and preparing a yeast extract from the obtained cells.
    Type: Application
    Filed: August 24, 2012
    Publication date: February 21, 2013
    Applicant: Ajinomoto Co., Inc.
    Inventors: Hiroaki NISHIUCHI, Wataru Hoshino, Junko Yamazaki, Toshimi Mizukoshi, Vsevolod Aleksandovich Serebryanyy, Olga Aleksandrovna Sofyanovich, Dmitriy Aleksandrovich Cheshev, V. Elena Matrosova
  • Patent number: 8241840
    Abstract: A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group.
    Type: Grant
    Filed: June 28, 2010
    Date of Patent: August 14, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Shinji Tarutani, Kazuyoshi Mizuyoshi, Kenji Wada, Wataru Hoshino
  • Publication number: 20120076991
    Abstract: A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film on the first resist pattern to form a second resist pattern, and a pattern-forming method uses the surface-treating agent.
    Type: Application
    Filed: November 30, 2011
    Publication date: March 29, 2012
    Applicant: FUJIFILM Corporation
    Inventors: Wataru HOSHINO, Hideaki Tsubaki, Masahiro Yoshidome
  • Patent number: 8088566
    Abstract: A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film on the first resist pattern to form a second resist pattern, and a pattern-forming method uses the surface-treating agent.
    Type: Grant
    Filed: March 24, 2008
    Date of Patent: January 3, 2012
    Assignee: Fujifilm Corporation
    Inventors: Wataru Hoshino, Hideaki Tsubaki, Masahiro Yoshidome
  • Publication number: 20110305992
    Abstract: A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.
    Type: Application
    Filed: August 2, 2011
    Publication date: December 15, 2011
    Applicant: FUJIFILM Corporation
    Inventors: Shinji TARUTANI, Hideaki TSUBAKI, Kazuyoshi MIZUTANI, Kenji WADA, Wataru HOSHINO
  • Patent number: 8034547
    Abstract: A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group.
    Type: Grant
    Filed: June 24, 2008
    Date of Patent: October 11, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Shinji Tarutani, Kazuyoshi Mizutani, Kenji Wada, Wataru Hoshino
  • Patent number: 8017304
    Abstract: A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.
    Type: Grant
    Filed: October 13, 2009
    Date of Patent: September 13, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Shinji Tarutani, Hideaki Tsubaki, Kazuyoshi Mizutani, Kenji Wada, Wataru Hoshino
  • Publication number: 20100330507
    Abstract: A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group.
    Type: Application
    Filed: June 28, 2010
    Publication date: December 30, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Hideaki TSUBAKI, Shinji Tarutani, Kazuyoshi Mizuyoshi, Kenji Wada, Wataru Hoshino
  • Publication number: 20100203445
    Abstract: An object of the present invention is to solve the technical task of enhancing the performance in micro-photofabrication using far ultraviolet light, particularly ArF excimer laser at a wavelength of 193 nm, and more specifically, provide a negative resist composition hardly allowing occurrence of pattern collapse and exhibiting good resolution even in the formation of a fine pattern, and a resist pattern forming method using the composition, which are a negative resist composition comprising (A) an alkali-soluble resin, (B) a compound that contains a low molecular compound having a molecular weight of 2,000 or less and having an oxetane structure, and (C) a cationic photopolymerization initiator, and a resist pattern forming method using the composition.
    Type: Application
    Filed: September 22, 2008
    Publication date: August 12, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Wataru Hoshino, Masahiro Yoshidome
  • Publication number: 20100040972
    Abstract: A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.
    Type: Application
    Filed: October 13, 2009
    Publication date: February 18, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Shinji TARUTANI, Hideaki Tsubaki, Kazuyoshi Mizutani, Kenji Wada, Wataru Hoshino
  • Publication number: 20100040971
    Abstract: A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.
    Type: Application
    Filed: October 13, 2009
    Publication date: February 18, 2010
    Applicant: FUJIFILM Corporaion
    Inventors: Shinji TARUTANI, Hideaki TSUBAKI, Kazuyoshi MIZUTANI, Kenji WADA, Wataru HOSHINO
  • Publication number: 20090011366
    Abstract: A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group.
    Type: Application
    Filed: June 24, 2008
    Publication date: January 8, 2009
    Applicant: FUJIFILM Corporation
    Inventors: Hideaki TSUBAKI, Shinji Tarutani, Kazuyoshi Mizutani, Kenji Wada, Wataru Hoshino