Patents by Inventor Wataru Machiyama

Wataru Machiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7837425
    Abstract: A transfer apparatus (20) for a target substrate (W) includes a rotatable rotary base (24). First and second arm mechanisms (26, 28) are attached to the rotary base and configured to bend and stretch. Each of the first and second arm mechanisms has a proximal end arm (26A, 28A), an intermediate arm (26B, 28B), and a pick (26C, 28C) which are pivotally coupled to each other sequentially from the rotary base. The picks are disposed to support the target substrate. A link mechanism (30) is coupled to the proximal end arms of the first and second arm mechanisms to drive the first and second arm mechanisms. A first driving source (32) is disposed to rotatably drive the rotary base. A second driving source (34) is disposed to drive the link mechanism so as to bend or stretch the first and second arm mechanisms.
    Type: Grant
    Filed: July 9, 2004
    Date of Patent: November 23, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Hiroaki Saeki, Shigeru Ishizawa, Takehiro Shindo, Tsutomu Hiroki, Wataru Machiyama
  • Patent number: 7406360
    Abstract: A dummy substrate (17) differs from a substrate to be processed in having a first guide (G1) for assisting centering, however, it can be handled as a substitute of the substrate to be processed. In a process chamber (2), a second guide (G2) is arranged to assist the dummy substrate (17) to center. To detect a transfer shift of a transfer mechanism (TRM), at first, the dummy substrate (17) is centered to a placing table (14) on the placing table (14) or at an upper position thereof by engagement of the first and the second guides (G1, G2). The dummy substrate (17) centered in such a manner is received by the transfer mechanism (TRM) and transferred to a detector (11). Then, a detection value of a decentering quantity and that in a decentering direction of the dummy substrate (17) are obtained by the detector (11), and a transfer shift of the transfer mechanism (TRM) is obtained based on the detection values.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: July 29, 2008
    Assignee: Tokyo Elctron Limited
    Inventor: Wataru Machiyama
  • Publication number: 20070276533
    Abstract: A dummy substrate (17) differs from a substrate to be processed in having a first guide (G1) for assisting centering, however, it can be handled as a substitute of the substrate to be processed. In a process chamber (2), a second guide (G2) is arranged to assist the dummy substrate (17) to center. To detect a transfer shift of a transfer mechanism (TRM), at first, the dummy substrate (17) is centered to a placing table (14) on the placing table (14) or at an upper position thereof by engagement of the first and the second guides (G1, G2). The dummy substrate (17) centered in such a manner is received by the transfer mechanism (TRM) and transferred to a detector (11). Then, a detection value of a decentering quantity and that in a decentering direction of the dummy substrate (17) are obtained by the detector (11), and a transfer shift of the transfer mechanism (TRM) is obtained based on the detection values.
    Type: Application
    Filed: February 22, 2005
    Publication date: November 29, 2007
    Applicant: Tokyo Electron Limited
    Inventor: Wataru Machiyama
  • Patent number: 7286890
    Abstract: A processing system includes a transfer chamber, a plurality of chambers connected to the transfer chamber, a transfer apparatus disposed in the transfer chamber, and a control section configured to control the transfer apparatus. The transfer apparatus includes a base and transfer arm configured to perform a slide motion and a swing motion, respectively. The control section includes a storage portion and an operational controller. The storage portion stores pattern model data concerning a plurality of motion patterns each indicative of a composite motion of the slide motion and the swing motion, and track model data concerning time-based motion tracks respectively corresponding to the motion patterns. The operational controller is configured to retrieve necessary data from the pattern model data and the track model data and control the transfer apparatus in accordance therewith.
    Type: Grant
    Filed: June 27, 2006
    Date of Patent: October 23, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Wataru Machiyama, Shigeru Ishizawa, Hiroshi Koizumi, Tsutomu Hiroki, Keisuke Kondoh
  • Publication number: 20060291988
    Abstract: A processing system includes a transfer chamber, a plurality of chambers connected to the transfer chamber, a transfer apparatus disposed in the transfer chamber, and a control section configured to control the transfer apparatus. The transfer apparatus includes a base and transfer arm configured to perform a slide motion and a swing motion, respectively. The control section includes a storage portion and an operational controller. The storage portion stores pattern model data concerning a plurality of motion patterns each indicative of a composite motion of the slide motion and the swing motion, and track model data concerning time-based motion tracks respectively corresponding to the motion patterns. The operational controller is configured to retrieve necessary data from the pattern model data and the track model data and control the transfer apparatus in accordance therewith.
    Type: Application
    Filed: June 27, 2006
    Publication date: December 28, 2006
    Inventors: Wataru Machiyama, Shigeru Ishizawa, Hiroshi Koizumi, Tsutomu Hiroki, Keisuke Kondoh
  • Publication number: 20060210387
    Abstract: A transfer apparatus (20) for a target substrate (W) includes a rotatable rotary base (24). First and second arm mechanisms (26, 28) are attached to the rotary base and configured to bend and stretch. Each of the first and second arm mechanisms has a proximal end arm (26A, 28A), an intermediate arm (26B, 28B), and a pick (26C, 28C) which are pivotally coupled to each other sequentially from the rotary base. The picks are disposed to support the target substrate. A link mechanism (30) is coupled to the proximal end arms of the first and second arm mechanisms to drive the first and second arm mechanisms. A first driving source (32) is disposed to rotatably drive the rotary base. A second driving source (34) is disposed to drive the link mechanism so as to bend or stretch the first and second arm mechanisms.
    Type: Application
    Filed: July 9, 2004
    Publication date: September 21, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hiroaki Saeki, Shigeru Ishizawa, Takehiro Shindo, Tsutomu Hiroki, Wataru Machiyama
  • Patent number: D562524
    Type: Grant
    Filed: January 5, 2005
    Date of Patent: February 19, 2008
    Assignee: Tokyo Electron Limited
    Inventors: Tsutomu Hiroki, Wataru Machiyama, Takehiro Shindo
  • Patent number: D766850
    Type: Grant
    Filed: September 12, 2014
    Date of Patent: September 20, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Eisuke Morisaki, Wataru Machiyama, Hirokatsu Kobayashi, Masayuki Harashima, Yukio Sano