Patents by Inventor Wataru NIHASHI

Wataru NIHASHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180181003
    Abstract: The pattern forming method includes forming an actinic ray-sensitive or radiation-sensitive film using an actinic ray-sensitive or radiation-sensitive composition, forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film using a composition for forming an upper layer film, exposing the actinic ray-sensitive or radiation-sensitive film having the upper layer film formed thereon, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer, in which the composition for forming an upper layer film includes a solvent and a crosslinking agent; and in which the content of a solvent having a hydroxyl group is 80% by mass or less with respect to all the solvents included in the composition for forming an upper layer film. The method for manufacturing an electronic device includes the pattern forming method. The laminate has an actinic ray-sensitive or radiation-sensitive film, and an upper layer film including a crosslinking agent.
    Type: Application
    Filed: February 26, 2018
    Publication date: June 28, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Wataru NIHASHI, Hideaki TSUBAKI, Toru TSUCHIHASHI, Kei YAMAMOTO
  • Publication number: 20180120708
    Abstract: Provided are a rinsing liquid which is used for rinsing a resist film obtained from an actinic ray-sensitive or radiation-sensitive composition and includes a hydrocarbon-based solvent having a branched alkyl group. The hydrocarbon-based solvent having a branched alkyl group contains at least one of isodecane or isododecane.
    Type: Application
    Filed: December 21, 2017
    Publication date: May 3, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Hideaki TSUBAKI, Toru TSUCHIHASHI, Wataru NIHASHI
  • Publication number: 20180120705
    Abstract: Provided are a positive tone pattern forming method in which development is carried out using a developer containing an organic solvent with use of a composition containing (A) a resin which has a repeating unit containing a moiety capable of forming a polar interaction and whose polarity is decreased due to release of the polar interaction by the action of an acid or a base, or a composition containing (A?) a resin having a repeating unit containing a polar group and (B) a compound capable of forming a polar interaction with the polar group of the resin (A?); and an electronic device manufacturing method including such a pattern forming method.
    Type: Application
    Filed: December 26, 2017
    Publication date: May 3, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Wataru NIHASHI, Toru TSUCHIHASHI, Hideaki TSUBAKI
  • Publication number: 20180101100
    Abstract: A treatment liquid for rinsing and patterning a resist film obtained from an actinic ray-sensitive composition includes an organic solvent in which a content of a compound containing a sulfur atom in the treatment liquid is 10 mmol/L or lower, and the organic solvent is a hydrocarbon solvent. A pattern forming method includes: forming a resist film using an actinic ray-sensitive or radiation-sensitive composition; exposing the resist film; and treating the exposed resist film with the treatment liquid.
    Type: Application
    Filed: December 12, 2017
    Publication date: April 12, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Hideaki TSUBAKI, Toru TSUCHIHASHI, Wataru NIHASHI
  • Publication number: 20180017872
    Abstract: Provide are a pattern forming method including a step (1) of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition including a resin having an acid-decomposable repeating unit capable of decomposing by the action of an acid to generate an acid having a pKa of 3.0 or less, a step (2) of exposing the film using actinic rays or radiation, and a step (3) of carrying out development using a developer including an organic solvent after the exposure to form a negative tone pattern; and a method for manufacturing an electronic device, including the pattern forming method.
    Type: Application
    Filed: September 28, 2017
    Publication date: January 18, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Wataru NIHASHI, Hideaki TSUBAKI, Toru TSUCHIHASHI, Tomotaka TSUCHIMURA
  • Publication number: 20170153545
    Abstract: There is provided a pattern forming method including (1) a step of forming a film with an active-light-sensitive or radiation-sensitive resin composition containing the following (A) to (C): (A) a resin having a repeating unit having a phenolic hydroxyl group, and having a group that decomposes by the action of an acid to generate a polar group, (B) a compound that generates an acid upon irradiation with active light or radiation, and (C) a compound having a cationic site and an anionic site in the same molecule, in which the cationic site and the anionic site are linked to each other via a covalent bond; (2) a step of exposing the film; and (3) a step of developing the exposed film using a developer including an organic solvent to form a negative tone pattern.
    Type: Application
    Filed: February 14, 2017
    Publication date: June 1, 2017
    Applicant: FUJIFILM Corporation
    Inventor: Wataru NIHASHI
  • Patent number: 9651863
    Abstract: The pattern forming method includes (1) forming a film using an active light sensitive or radiation sensitive resin composition, (2) exposing the film to active light or radiation, and (3) developing the exposed film using a developer including an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) having a group which generates a polar group by being decomposed due to the action of an acid, the resin (A) has a phenolic hydroxyl group and/or a phenolic hydroxyl group protected with a group leaving due to the action of an acid, and the developer including the organic solvent contains an additive which forms at least one interaction of an ionic bond, a hydrogen bond, a chemical bond, and a dipole interaction, with the polar group.
    Type: Grant
    Filed: October 13, 2015
    Date of Patent: May 16, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Hiroo Takizawa, Shuji Hirano, Natsumi Yokokawa, Wataru Nihashi
  • Publication number: 20170075222
    Abstract: A pattern forming method includes, in this order, forming a film on a substrate, using an active-light-sensitive or radiation-sensitive resin composition containing a resin (A) which has a repeating unit having a phenolic hydroxyl group, and a repeating unit having a group that decomposes by the action of an acid to generate a carboxyl group, and a compound (B) that generates an acid upon irradiation with active light or radiation; exposing the film; and developing the exposed film using a developer including an organic solvent, in which the developer including an organic solvent contains an organic solvent having 8 or more carbon atoms and 2 or less heteroatoms in the amount of 50% by mass or more.
    Type: Application
    Filed: November 22, 2016
    Publication date: March 16, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Toru TSUCHIHASHI, Wataru NIHASHI, Hideaki TSUBAKI
  • Patent number: 9551933
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin containing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit represented by the first specific formula is 35 mol % or more based on all repeating units in the resin (A), a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition.
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: January 24, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Hiroo Takizawa, Shuji Hirano, Natsumi Yokokawa, Wataru Nihashi
  • Patent number: 9527809
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by the following formula (1) or (2), and the formula (1) and (2) are defined as herein, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising a step of exposing the resist film, and a step of developing the exposed film, and a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.
    Type: Grant
    Filed: September 29, 2015
    Date of Patent: December 27, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Natsumi Yokokawa, Hiroo Takizawa, Shuji Hirano, Wataru Nihashi, Hideaki Tsubaki
  • Patent number: 9423690
    Abstract: There is provided a pattern forming method, including: (a) forming a film by using an electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition containing a resin (A) having a repeating unit represented by Formula (1-0) and a repeating unit represented by Formula (1-2); (b) exposing the film by using an electron beam or extreme ultraviolet ray; and (c) developing the exposed film by using a developer containing an organic solvent to form a negative pattern, wherein a content of the repeating unit represented by Formula (1-0) is 45 mol % or more based on a whole repeating units in the resin (A).
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: August 23, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Hiroo Takizawa, Shuji Hirano, Natsumi Yokokawa, Wataru Nihashi
  • Publication number: 20160147154
    Abstract: There are provided a pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2) exposing the film to active light or radiation; and (3) developing the exposed film using a developer including an organic solvent, wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific repeating units, and a crosslinking agent (C).
    Type: Application
    Filed: February 1, 2016
    Publication date: May 26, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Hiroo TAKIZAWA, Toru FUJIMORI, Wataru NIHASHI, Shuji HIRANO, Natsumi YOKOKAWA
  • Patent number: 9291896
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin containing a repeating unit represented by the specific formula (1) and a repeating unit represented by the specific formula (A); a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film from the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: March 22, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Shuji Hirano, Natsumi Yokokawa, Hiroo Takizawa, Wataru Nihashi
  • Patent number: 9291898
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: March 22, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Natsumi Yokokawa, Shuji Hirano, Hiroo Takizawa, Wataru Nihashi
  • Patent number: 9291897
    Abstract: There is provided a pattern forming method comprising, in order, (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (Ab) a resin having specific repeating units, (2) a step of exposing the film by using an electron beam or an extreme-ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: March 22, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Shuji Hirano, Natsumi Yokokawa, Hiroo Takizawa, Wataru Nihashi
  • Publication number: 20160041465
    Abstract: The pattern forming method includes (1) forming a film using an active light sensitive or radiation sensitive resin composition, (2) exposing the film to active light or radiation, and (3) developing the exposed film using a developer including an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) having a group which generates a polar group by being decomposed due to the action of an acid, the resin (A) has a phenolic hydroxyl group and/or a phenolic hydroxyl group protected with a group leaving due to the action of an acid, and the developer including the organic solvent contains an additive which forms at least one interaction of an ionic bond, a hydrogen bond, a chemical bond, and a dipole interaction, with the polar group.
    Type: Application
    Filed: October 13, 2015
    Publication date: February 11, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Hiroo TAKIZAWA, Shuji HIRANO, Natsumi YOKOKAWA, Wataru NIHASHI
  • Publication number: 20160024005
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by the following formula (1) or (2), and the formula (1) and (2) are defined as herein, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising a step of exposing the resist film, and a step of developing the exposed film, and a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.
    Type: Application
    Filed: September 29, 2015
    Publication date: January 28, 2016
    Inventors: NATSUMI YOKOKAWA, HIROO TAKIZAWA, SHUJI HIRANO, WATARU NIHASHI, HIDEAKI TSUBAKI
  • Publication number: 20150185610
    Abstract: There is provided a pattern forming method comprising, in order, (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (Ab) a resin having specific repeating units, (2) a step of exposing the film by using an electron beam or an extreme-ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.
    Type: Application
    Filed: January 26, 2015
    Publication date: July 2, 2015
    Applicant: FUJIFILM Corporation
    Inventors: Shuji HIRANO, Natsumi YOKOKAWA, Hiroo TAKIZAWA, Wataru NIHASHI
  • Publication number: 20150168834
    Abstract: There is provided a pattern forming method, including: (a) forming a film by using an electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition containing a resin (A) having a repeating unit represented by Formula (1-0) and a repeating unit represented by Formula (1-2); (b) exposing the film by using an electron beam or extreme ultraviolet ray; and (c) developing the exposed film by using a developer containing an organic solvent to form a negative pattern, wherein a content of the repeating unit represented by Formula (1-0) is 45 mol % or more based on a whole repeating units in the resin (A).
    Type: Application
    Filed: February 19, 2015
    Publication date: June 18, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Hiroo TAKIZAWA, Shuji HIRANO, Natsumi YOKOKAWA, Wataru NIHASHI
  • Publication number: 20150147688
    Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having a repeating unit represented by the specific formula, (2) a step of exposing the film by using an actinic ray or radiation, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of the repeating unit represented by the specific formula is 25 mol % or more based on all repeating units in the resin (P).
    Type: Application
    Filed: January 23, 2015
    Publication date: May 28, 2015
    Applicant: FUJIFILM Corporation
    Inventors: Natsumi YOKOKAWA, Shuji HIRANO, Wataru NIHASHI, Hiroo TAKIZAWA