Patents by Inventor Wataru NIHASHI

Wataru NIHASHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150147688
    Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having a repeating unit represented by the specific formula, (2) a step of exposing the film by using an actinic ray or radiation, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of the repeating unit represented by the specific formula is 25 mol % or more based on all repeating units in the resin (P).
    Type: Application
    Filed: January 23, 2015
    Publication date: May 28, 2015
    Applicant: FUJIFILM Corporation
    Inventors: Natsumi YOKOKAWA, Shuji HIRANO, Wataru NIHASHI, Hiroo TAKIZAWA
  • Publication number: 20150140484
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin containing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit represented by the first specific formula is 35 mol % or more based on all repeating units in the resin (A), a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition.
    Type: Application
    Filed: January 26, 2015
    Publication date: May 21, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Hiroo TAKIZAWA, Shuji HIRANO, Natsumi YOKOKAWA, Wataru NIHASHI
  • Publication number: 20150132688
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.
    Type: Application
    Filed: January 26, 2015
    Publication date: May 14, 2015
    Applicant: FUJIFILM Corporation
    Inventors: Natsumi YOKOKAWA, Shuji HIRANO, Hiroo TAKIZAWA, Wataru NIHASHI
  • Publication number: 20150132687
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin containing a repeating unit represented by the specific formula (1) and a repeating unit represented by the specific formula (A); a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film from the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.
    Type: Application
    Filed: January 26, 2015
    Publication date: May 14, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Shuji HIRANO, Natsumi YOKOKAWA, Hiroo TAKIZAWA, Wataru NIHASHI
  • Publication number: 20140363758
    Abstract: There is provided a pattern forming method comprising (A) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin containing a repeating unit having a phenol skeleton and a repeating unit having a group capable of decomposing by the action of an acid to produce an alcoholic hydroxy group; (B) exposing the film; and (C) developing the exposed film by using an organic solvent-containing developer.
    Type: Application
    Filed: August 22, 2014
    Publication date: December 11, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Wataru NIHASHI, Hiroo TAKIZAWA, Shuji HIRANO