Patents by Inventor Wei Chao

Wei Chao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11742196
    Abstract: In an embodiment, a method includes: receiving a wafer from a first dilution tank; immersing the wafer in a deionization tank, wherein the deionization tank comprises a tank solution that comprises a deionizing solution; determining a metal ion concentration within the tank solution; performing remediation within the deionization tank in response to determining that the metal ion concentration is greater than a threshold value; and moving the wafer to a second dilution tank.
    Type: Grant
    Filed: May 24, 2018
    Date of Patent: August 29, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chih-Wei Chao, Shu-Yen Wang
  • Patent number: 11734320
    Abstract: A log processing device and a log processing method thereof are provided. The log processing device divides the original log data into a plurality of block data, transforms a numeric variable of each of the block data into a representative code, and determines whether to perform a combination process for continuous block data to generate a plurality of combinational block data according to a data integrity of each of the block data. The log processing data takes the combinational block data as a log template, and each of the combinational block data corresponds to an event.
    Type: Grant
    Filed: November 22, 2020
    Date of Patent: August 22, 2023
    Assignee: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Yen-Wen Huang, Wei-Chao Hsu
  • Publication number: 20230256580
    Abstract: A power tool includes a housing, a drive assembly including an output shaft extending from the housing such that a tool element for performing work on a workpiece is attachable to the output shaft, and a bushing rotatably supporting the output shaft. The bushing includes an outer surface having a knurled texture.
    Type: Application
    Filed: February 14, 2023
    Publication date: August 17, 2023
    Inventors: Zhen Bo YANG, Kentez L. CRAIG, Wei Chao XU, Zhao Qing ZHANG
  • Publication number: 20230234233
    Abstract: Apparatuses, systems, and techniques to place one or more objects in a location and orientation. In at least one embodiment, one or more circuits are to use one or more neural networks to cause one or more autonomous devices to place one or more objects in a location and orientation based, at least in part, on one or more images of the location and orientation.
    Type: Application
    Filed: January 26, 2022
    Publication date: July 27, 2023
    Inventors: Ankit Goyal, Arsalan Mousavian, Christopher Jason Paxton, Yu-Wei Chao, Dieter Fox
  • Publication number: 20230202031
    Abstract: A robotic control system directs a robot to take an object from a human grasp by obtaining an image of a human hand holding an object, estimating the pose of the human hand and the object, and determining a grasp pose for the robot that will not interfere with the human hand. In at least one example, a depth camera is used to obtain a point cloud of the human hand holding the object. The point cloud is provided to a deep network that is trained to generate a grasp pose for a robotic gripper that can take the object from the human's hand without pinching or touching the human's fingers.
    Type: Application
    Filed: March 1, 2023
    Publication date: June 29, 2023
    Inventors: Wei Yang, Christopher Jason Paxton, Yu-Wei Chao, Dieter Fox
  • Publication number: 20230207773
    Abstract: An anode passivation slurry of anti-dendritic lithium and a method of preparation are provided. The method comprises the steps of dissolving a divalent copper metal compound and a non-ionic polymer to obtain a first solution, dissolving trimesic acid to obtain a second solution, and mixing the first and second solutions to obtain a copper-based metal-organic framework. The dried precursor are mixed with ionic liquid, which has contained a first lithium salt, and then dried to obtain an anion impregnated copper-based metal-organic framework. Thereafter, an anion impregnated copper-based metal-organic framework, a second lithium salt, polymer materials, and a second solvent are mixed to obtain the anode passivation slurry. The anode passivation slurry homogenizes the concentration of conduction of lithium ions and improves ionic conductivity, reducing the formation of lithium dendrites, and improving the cycle life of batteries. A battery with the anode passivation slurry dried on an anode is also disclosed.
    Type: Application
    Filed: March 15, 2022
    Publication date: June 29, 2023
    Inventors: WEI-CHAO CHEN, HONG-ZHENG LAI, TSENG-LUNG CHANG
  • Patent number: 11658031
    Abstract: Implantation mask formation techniques described herein include increasing an initial aspect ratio of a pattern in an implantation mask by non-lithography techniques, which may include forming a resist hardening layer on the implantation mask. The pattern may be formed by photolithography techniques to the initial aspect ratio that reduces or minimizes the likelihood of pattern collapse during formation of the pattern. Then, the resist hardening layer is formed on the implantation mask to increase the height of the pattern and reduce the width of the pattern, which increases the aspect ratio between the height of the openings or trenches and the width of the openings or trenches of the pattern. In this way, the pattern in the implantation mask may be formed to an ultra-high aspect ratio in a manner that reduces or minimizes the likelihood of pattern collapse during formation of the pattern.
    Type: Grant
    Filed: June 1, 2021
    Date of Patent: May 23, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wei-Chao Chiu, Yong-Jin Liou, Yu-Wen Chen, Chun-Wei Chang, Ching-Sen Kuo, Feng-Jia Shiu
  • Patent number: 11656909
    Abstract: A tensor accelerator includes two tile execution units and a bidirectional queue. Each of the tile execution units includes a buffer, a plurality of arithmetic logic units, a network, and a selector. The buffer includes a plurality of memory cells. The network is coupled to the plurality of memory cells. The selector is coupled to the network and the plurality of arithmetic logic units. The bidirectional queue is coupled between the selectors of the tile execution units.
    Type: Grant
    Filed: April 15, 2021
    Date of Patent: May 23, 2023
    Assignee: National Taiwan University
    Inventors: Shao-Yi Chien, Yu-Sheng Lin, Wei-Chao Chen
  • Publication number: 20230145208
    Abstract: Apparatuses, systems, and techniques to train a machine learning model. In at least one embodiment, a first machine learning model is trained to infer a concept based on first information, training data is labeled using the first machine learning model, and a second machine learning model is trained to infer the concept using the labeled training data.
    Type: Application
    Filed: November 7, 2022
    Publication date: May 11, 2023
    Inventors: Andreea Bobu, Balakumar Sundaralingam, Christopher Jason Paxton, Maya Cakmak, Wei Yang, Yu-Wei Chao, Dieter Fox
  • Publication number: 20230119423
    Abstract: The present disclosure provides a method for treating hypertension by using a compound, wherein the compound is selected from the group consisting of: (E)-4-(3-(3-methyl benzyloxy)benzylidene)-1-phenylpyrazolidine-3,5-dione, (2R)-2-amino-3-(2,3-dihydro-1H-inden-1-yl)-N?-((E)-quinolin-7-ylmethylene)propane hydrazide, and a combination thereof. The present disclosure uses a small molecule compound (E)-4-(3-(3-methyl benzyloxy)benzylidene)-1-phenylpyrazolidine-3,5-dione, (2R)-2-amino-3-(2,3-dihydro-1H-inden-1-yl)-N?-((E)-quinolin-7-ylmethylene)propane hydrazide or a combination thereof, which can be developed as a therapeutic drug for lowering blood pressure, whether it is taken orally or injected.
    Type: Application
    Filed: November 3, 2021
    Publication date: April 20, 2023
    Inventors: Fu-Tien Chiang, Wei-Chao Chiu
  • Publication number: 20230112508
    Abstract: A nanocomposite layer includes a carbon nanotube composite material and a lithium salt polymer composite. The carbon nanotube composite material includes a surface modified carbon nanotube with a positively charged group and a plurality of nanoparticles with a negatively charged group. The plurality of nanoparticles are attached to the surface modified carbon nanotube. The lithium salt polymer composite wraps the carbon nanotube composite material, and includes a first polymer, a second polymer, and a lithium salt.
    Type: Application
    Filed: March 10, 2022
    Publication date: April 13, 2023
    Inventors: Wei-Chao CHEN, Hong-Zheng LAI, Tseng-Lung CHANG
  • Patent number: 11615518
    Abstract: A method for generating reconstruction a reconstructed image is adapted to an input image having a target object. The method comprises converting the input image into a feature map with vectors by an encoder; performing a training procedure according to training images of reference objects to generate feature prototypes associated with the training images and store the feature prototypes to a memory; selecting a part of feature prototypes from the feature prototypes stored in the memory according to similarities between the feature prototypes and the feature vectors; generating a similar feature map according the part of feature prototypes and weights, wherein the weights represents similarities between the part of feature prototypes and the feature vectors; and converting the similar feature map into the reconstructed image by a decoder; wherein the encoder, the decoder and the memory form an auto-encoder.
    Type: Grant
    Filed: February 9, 2021
    Date of Patent: March 28, 2023
    Assignees: INVENTEC (PUDONG) TECHNOLOGY CORPORATION, INVENTEC CORPORATION
    Inventors: Daniel Stanley Young Tan, Yi-Chun Chen, Trista Pei-Chun Chen, Wei-Chao Chen
  • Publication number: 20230079986
    Abstract: A method for establishing a complex motion controller includes following steps: obtaining a source controller and a destination controller, wherein the source controller is configured to generate a source motion, and the destination controller is configured to generate a destination motion; determining a transition tensor between the source controller and the destination controller, wherein the transition tensor has a plurality of indices, one of the plurality of indices corresponds to a plurality of phases of the source motion; calculating a plurality of transition outcomes of the transition tensor and recording the plurality of transition outcomes according to the plurality of indices; calculating a plurality of transition qualities according to the plurality of transition outcomes; and searching for an optimal transition quality from the plurality of transition qualities to establish a complex motion controller for generating a complex motion corresponding to one of the plurality of phases.
    Type: Application
    Filed: December 10, 2021
    Publication date: March 16, 2023
    Inventors: Ying-sheng Luo, Jonathan Hans Soeseno, Trista Pei-Chun Chen, Wei-Chao Chen
  • Patent number: 11597078
    Abstract: A robotic control system directs a robot to take an object from a human grasp by obtaining an image of a human hand holding an object, estimating the pose of the human hand and the object, and determining a grasp pose for the robot that will not interfere with the human hand. In at least one example, a depth camera is used to obtain a point cloud of the human hand holding the object. The point cloud is provided to a deep network that is trained to generate a grasp pose for a robotic gripper that can take the object from the human's hand without pinching or touching the human's fingers.
    Type: Grant
    Filed: July 28, 2020
    Date of Patent: March 7, 2023
    Assignee: NVIDIA CORPORATION
    Inventors: Wei Yang, Christopher Jason Paxton, Yu-Wei Chao, Dieter Fox
  • Publication number: 20230054842
    Abstract: Embodiments of the disclosure provide for improved print position compensation, for example to improve accuracy of print job(s) performed by a printer. The print position compensation enables an offset of the time until printing occurs on a print media to account for changes and/or erroneous movement in a print media, such as due to slippage and/or other results of a force applied to the print media. Particular embodiments determine data values derived both for an output phase and a retraction phase of the printer's operation. Various embodiments generate a print position compensation based on sensor-based edge position distances determined during each of a media output phase and a media retraction phase. Alternatively or additionally various embodiments generate a print position compensation based on sensor-based media movement phase timestamp differentials determined during each of a media output phase and a media retraction phase.
    Type: Application
    Filed: August 26, 2022
    Publication date: February 23, 2023
    Inventors: Cheng Khoon NG, Heng Yew LIM, Shufeng ZHENG, Jang Wei CHAO
  • Patent number: 11583930
    Abstract: An apparatus (100) for additive manufacturing of a part of an article from a first material comprising particles having a first composition is provided. The apparatus (100) comprises a layer providing means (110) for providing a first support layer from a second material comprising particles having a second composition, wherein the first composition and the second composition are different. The apparatus (100) comprises a concavity defining means (120) for defining a first concavity in an exposed surface of the first support layer. The apparatus (100) comprises a depositing means (130) for depositing a part of the first material in the first concavity defined in the first support layer. The apparatus (100) comprises a levelling means (140) for selectively levelling the deposited first material in the first concavity.
    Type: Grant
    Filed: April 26, 2018
    Date of Patent: February 21, 2023
    Assignee: THE UNIVERSITY OF MANCHESTER
    Inventors: Li Lin, Wei Chao, Zhang Xiaoji
  • Publication number: 20220415891
    Abstract: A capacitor includes cup-shaped lower electrodes disposed on a substrate, a capacitor dielectric layer conformally covering inner surfaces and outer surfaces of the cup-shaped lower electrodes, and a support layer disposed between outer surfaces of the cup-shaped lower electrodes to connect the cup-shaped lower electrodes. The capacitor further includes an annealed oxide layer, which is interposed between the inner surfaces of the cup-shaped lower electrodes and the capacitor dielectric layer, and is also interposed between a portion of the outer surfaces of the cup-shaped lower electrodes and the capacitor dielectric layer. A method for forming the capacitor is also provided.
    Type: Application
    Filed: February 4, 2022
    Publication date: December 29, 2022
    Inventors: Yu-Ping HSIAO, Cheol-Soo PARK, Chun-Hung CHENG, Wei-Chieh CHUANG, Wei-Chao CHOU, Yen-Min JUAN
  • Publication number: 20220362815
    Abstract: The present disclosure describes a wafer cleaning process in which a drained cleaning solution, which is used to remove metal contaminants from the wafer, is sampled and analyzed to determine the concentration of metal ions in the solution. The wafer cleaning process includes dispensing, in a wafer cleaning station, a chemical solution on one or more wafers; collecting the dispensed chemical solution; determining a concentration of contaminants in the chemical solution; in response to the concentration of the contaminants being greater than a baseline value, adjusting one or more parameters in the cleaning process; and in response to the concentration of the contaminants being equal to or less than the baseline value, transferring the one or more wafers out of the wafer cleaning station.
    Type: Application
    Filed: July 28, 2022
    Publication date: November 17, 2022
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chih-Wei Chao, Shu-Yen Wang
  • Publication number: 20220359188
    Abstract: In an embodiment, a method includes: receiving a wafer from a first dilution tank; immersing the wafer in a deionization tank, wherein the deionization tank comprises a tank solution that comprises a deionizing solution; determining a metal ion concentration within the tank solution; performing remediation within the deionization tank in response to determining that the metal ion concentration is greater than a threshold value; and moving the wafer to a second dilution tank.
    Type: Application
    Filed: July 22, 2022
    Publication date: November 10, 2022
    Inventors: Chih-Wei CHAO, Shu-Yen WANG
  • Publication number: 20220359588
    Abstract: A method includes performing a first lithography process using a first pattern of a first photomask to form a first photoresist pattern on a front side of a device substrate; performing a first implantation process using the first pattern as a mask to form first isolation regions in the device substrate; after performing the first implantation process, performing a second lithography process using a second pattern of a second photomask to form a second photoresist pattern on the front side of the device substrate, the second pattern being shifted from the first pattern by a distance less than the first pitch and in the first direction; performing a second implantation process using the second photoresist pattern as a mask to form second isolation regions in the device substrate and spaced apart from the first isolation regions; and forming pixels between the first and second isolation regions.
    Type: Application
    Filed: July 25, 2022
    Publication date: November 10, 2022
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Wei-Chao CHIU, Chun-Wei CHANG, Ching-Sen KUO, Feng-Jia SHIU