Abstract: A method of controlling a wafer stage includes moving the wafer stage to position an immersion hood over a first sensor in the wafer stage. The method further includes moving the wafer stage to position the immersion hood over a second sensor in the wafer stage. The method further includes moving the wafer stage to position the immersion hood over a first particle capture area on the wafer stage after moving the wafer stage to position the immersion hood over the second sensor. The method further includes moving the wafer stage to define a routing track over the first particle capture area. The method further includes moving the wafer stage to position the immersion hood over an area for receiving a wafer on the wafer stage after defining the routing track over the first particle capture area.

Abstract: The present disclosure provides an immersion cooling system for a server cabinet including a plurality of server boxes, a cooling tank and a plurality of liquid connecting pipes. Each server box includes an electronic device immersed in the cooling liquid, and the electronic device generates a thermal energy so that part of the cooling liquid evaporates into a hot vapor. The cooling tank is connected to the plurality of server boxes and includes a condenser and a storage part. The condenser is connected to each server box and condenses the hot vapor to form the cooling liquid. The storage part storages the cooling liquid from the condenser. Two ends of the liquid connecting pipe is connected to the storage part and the server box respectively. The cooling liquid in the storage part and the cooling liquid of each server box are maintained in a same liquid level.

Abstract: A buffer for holding a pipe adapted to transport a fluid includes a base. The buffer further includes a plurality of fingers extending outwardly from a first side of the base, wherein a first finger of the plurality of fingers and a second finger of the plurality of fingers define a cavity for receiving the pipe, the first finger extends outwardly from a first end of the base, and the second finger extends outwardly from a central portion of the base, and a third finger of plurality of fingers extends outwardly from a second end of the base opposite the first end, wherein the second finger is between the first finger and the third finger. The buffer further includes at least one roller on a second side of the base opposite the first side.

Abstract: A method of monitoring wear of a buffer includes holding a pipe for transporting a fluid and an electrical cable using a buffer placed on a support plate. The buffer includes a base, a plurality of fingers, and a roller contacting the support plate. The plurality of fingers includes a first finger, a second finger, and a third finger. The first finger and the second finger define a first cavity for receiving the pipe, and the second finger and the third finger defines a second cavity for receiving the electrical cable. The method includes detecting acoustic waves generated by the roller on the support plate. The method further includes analyzing changes in frequencies of the acoustic waves to determine an extent of the wear of the roller over time. The method includes triggering an alert when an increase in the frequencies of the acoustic waves exceeds a pre-determined threshold value.

Abstract: A buffer for holding a pipe adapted to transport a fluid is provided. The buffer includes a base, a plurality of fingers extending outwardly from a first side of the base. A first finger of the plurality of fingers and a second finger of the plurality of fingers define a cavity for receiving the pipe. The buffer further includes at least one roller on a second side of the base opposite the first side.

Abstract: In some embodiments, the present disclosure relates to a process tool that includes a lithography apparatus arranged over a wafer chuck and an immersion hood apparatus laterally around the lithography apparatus. The lithography apparatus includes a photomask arranged between a light source and a lens. The immersion hood apparatus comprises input piping, output piping, and extractor piping. The input piping is arranged on a lower surface of the immersion hood apparatus and configured to distribute a liquid between the lens and the wafer chuck. The output piping is arranged on the lower surface of the immersion hood apparatus and configured to contain the liquid arranged between the lens and the wafer chuck. The extractor piping is arranged on an outer sidewall of the immersion hood apparatus and configured to remove any liquid above the wafer chuck that is outside of the immersion hood apparatus.

Abstract: A display system includes a display device. The display device is arranged to receive a video signal and a control signal from a host system, and includes a processing circuit and a display screen, wherein the processing circuit is arranged to process an original frame corresponding to the video signal according to the control signal, to generate a magnified frame, and generate a processed frame according to the magnified frame and the original frame, and the display screen is coupled to the processing circuit, and is arranged to display the processed frame.

Abstract: A measurement system for measuring a motion picture response time (MPRT) of a liquid crystal display (LCD) has a computer and a measurement device. The computer controls a display panel of the LCD to switch between a plurality of different gray levels. The measurement device measures variations of brightness of the display panel when the display panel switches its gray level. The computer obtains at least a gray level response time (GLRT) normalized curve according to results of measuring the variations of the brightness. The computer integrates the at least a GLRT normalized curve to obtain at least an MPRT normalized curve, obtains at least a time interval of the at least an MPRT normalized curve, and calculates an average of the at least a time interval to obtain the MPRT of the LCD.

Abstract: An immersion cooling system includes a tank, a first condenser, an enclosure, a second condenser and a connecting pipe. The tank has a first space. The first space is configured to accommodate a cooling liquid for at least one electronic equipment to immerse therein. The first condenser is disposed inside the tank. The enclosure is disposed outside the tank. The enclosure forms a second space together with the tank. The second condenser is disposed in the second space. The connecting pipe includes a first end and a second end opposite to the first end. The first end is connected with the second condenser. The second end is communicated with the first space.

Abstract: An immersion cooling system includes a cooling tank and a filtration system. The cooling tank is configured to accommodate a liquid coolant and an electronic device immersed in the liquid coolant. The filtration system includes a pipeline, a pump, a filter and a cooling device. The pipeline is in fluid communication with the cooling tank. The pump is disposed in the pipeline and is configured to drive the liquid coolant to flow through the pipeline. The filter is disposed in the pipeline and is configured to filter the liquid coolant. The cooling device is connected to the pipeline and is configured to cool the liquid coolant. The pipeline has an inlet connected to the cooling tank. The cooling device is located between the pump and the inlet of the pipeline.

Abstract: An immersion cooling system includes a cooling tank, a housing and a valve. The coolant tank is configured to accommodate a liquid coolant and an electronic device immersed in the liquid coolant. The housing covers a side of the cooling tank and thereby forms an enclosure. The valve has two ports, one of which communicates with the enclosure and the other communicates with a part of the cooling tank above the liquid coolant. The valve is configured to open in response to a gas pressure inside the cooling tank exceeding an upper limit.

Abstract: An immersion cooling system includes a tank, an isolation plate and a condenser. The tank includes a base plate and a sidewall connected with the base plate. The sidewall defines with the base plate a space configured to accommodate a cooling liquid. The isolation plate connects with the sidewall or the base plate and divides the space into a first subsidiary space and a second subsidiary space. The first subsidiary space is configured to accommodate electronic equipment which is immersed in the cooling liquid. The isolation plate and the base plate are separated from each other. The sidewall surrounds the condenser. A vertical projection of the condenser towards the base plate at least partially overlaps with the second subsidiary space. The electronic equipment evaporates a portion of the cooling liquid to form a vapor. The condenser is configured to condense the vapor into a liquid form.

Abstract: In some embodiments, the present disclosure relates to a process tool that includes a lithography apparatus arranged over a wafer chuck and an immersion hood apparatus laterally around the lithography apparatus. The lithography apparatus includes a photomask arranged between a light source and a lens. The immersion hood apparatus comprises input piping, output piping, and extractor piping. The input piping is arranged on a lower surface of the immersion hood apparatus and configured to distribute a liquid between the lens and the wafer chuck. The output piping is arranged on the lower surface of the immersion hood apparatus and configured to contain the liquid arranged between the lens and the wafer chuck. The extractor piping is arranged on an outer sidewall of the immersion hood apparatus and configured to remove any liquid above the wafer chuck that is outside of the immersion hood apparatus.

Abstract: In some embodiments, the present disclosure relates to a process tool that includes a lithography apparatus arranged over a wafer chuck and an immersion hood apparatus laterally around the lithography apparatus. The lithography apparatus includes a photomask arranged between a light source and a lens. The immersion hood apparatus comprises input piping, output piping, and extractor piping. The input piping is arranged on a lower surface of the immersion hood apparatus and configured to distribute a liquid between the lens and the wafer chuck. The output piping is arranged on the lower surface of the immersion hood apparatus and configured to contain the liquid arranged between the lens and the wafer chuck. The extractor piping is arranged on an outer sidewall of the immersion hood apparatus and configured to remove any liquid above the wafer chuck that is outside of the immersion hood apparatus.

Abstract: A display system includes a display device. The display device is arranged to receive a video signal and a control signal from a host system, and includes a processing circuit and a display screen, wherein the processing circuit is arranged to process an original frame corresponding to the video signal according to the control signal, to generate a magnified frame, and generate a processed frame according to the magnified frame and the original frame, and the display screen is coupled to the processing circuit, and is arranged to display the processed frame.

Abstract: A method of monitoring wear of a buffer includes holding a pipe for transporting a fluid and an electrical cable using a buffer placed on a support plate. The buffer includes a base, a plurality of fingers, and a roller contacting the support plate. The plurality of fingers includes a first finger, a second finger, and a third finger. The first finger and the second finger define a first cavity for receiving the pipe, and the second finger and the third finger defines a second cavity for receiving the electrical cable. The method includes detecting acoustic waves generated by the roller on the support plate. The method further includes analyzing changes in frequencies of the acoustic waves to determine an extent of the wear of the roller over time. The method includes triggering an alert when an increase in the frequencies of the acoustic waves exceeds a pre-determined threshold value.

Abstract: A wafer stage includes an area for receiving a wafer. The wafer stage further includes a first sensor outside of the area for receiving the wafer. The wafer stage further includes a second sensor outside of the area of receiving the wafer, wherein the second sensor is spaced from the first sensor. The wafer stage further includes a first particle capture area outside of the area for receiving the wafer, wherein the first particle capture area is spaced from both the first sensor and the second sensor, a dimension of the first particle capture area in a first direction parallel to a top surface of the wafer stage is at least 26 millimeters (mm), a dimension of the first particle capture area in a second direction parallel to the top surface of the wafer stage is at least 33 mm, and the second direction is perpendicular to the first direction.

Abstract: A control method of a document image capturing device cooperates with a storage unit. The control method includes an image capturing process, a default image detection process, a command judgment process, and an operation execution process. The image capturing process being to continuously capture an image. The default image detection process being to generate a recognition image when the image contains a default image. The command judgment process being to obtain a first feature command and a second feature command in accordance with the recognition image. The first feature command being corresponding to a specific block address of storage blocks of the storage unit, and the second feature command being corresponding to a control command. The operation execution process being to perform operations on the storage block of the specific block address of the storage unit according to the first feature command and the second feature command.

Abstract: Provided include a beam modulation apparatus for modulating an input light field and a projection system containing the apparatus. The input light field has a first light field and a second light field, having a difference of 90° in their polarization states. The apparatus includes a PBS prism, a first LCOS panel and a second LCOS panel. The first and the second LCOS panel are respectively over a side surface of the PBS prism opposing to an optical incident surface and an optical exit surface. Each LCOS panel comprises a plurality of pixels over a reflective surface thereof, with each pixel controllably switched on or off such that a polarity state of a light beam reflected by a portion of the reflective surface corresponding thereto is changed or remains unchanged. This beam modulation apparatus can be applied in a projection system, such as a laser TV projection system.

Abstract: A processor is configured to be coupled to a display panel. The processor includes a first storage circuit, a converter circuit, and an overdrive circuit. The first storage circuit is configured to store input video data. The converter circuit is configured to receive the input video data, and adjust a frame rate of the input video data, to generate adjusted video data. The overdrive circuit is configured to perform an overdrive process according to the adjusted video data, to generate a driving signal, such that the display panel displays a video according to the adjusted video data and the driving signal.