Patents by Inventor Wei-Hao Huang

Wei-Hao Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11062998
    Abstract: A semiconductor package includes dies, a redistribution structure, a conductive structure and connectors. The conductive plate is electrically connected to contact pads of at least two dies and is disposed on redistribution structure. The conductive structure includes a conductive plate and a solder cover, and the conductive structure extend over the at least two dies. The connectors are disposed on the redistribution structure, and at least one connector includes a conductive pillar. The conductive plate is at same level height as conductive pillar. The vertical projection of the conductive plate falls on spans of the at least two dies.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: July 13, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chung-Hao Tsai, Chen-Hua Yu, Chuei-Tang Wang, Wei-Ting Chen, Chien-Hsun Chen, Shih-Ya Huang
  • Publication number: 20210151666
    Abstract: A semiconductor device includes a first magnetic tunneling junction (MTJ) and a second MTJ on a substrate, a passivation layer on the first MTJ and the second MTJ, and an ultra low-k (ULK) dielectric layer on the passivation layer. Preferably, a top surface of the passivation layer between the first MTJ and the second MTJ is lower than a top surface of the passivation layer directly on top of the first MTJ.
    Type: Application
    Filed: January 4, 2021
    Publication date: May 20, 2021
    Inventors: Hui-Lin Wang, Tai-Cheng Hou, Wei-Xin Gao, Fu-Yu Tsai, Chin-Yang Hsieh, Chen-Yi Weng, Jing-Yin Jhang, Bin-Siang Tsai, Kun-Ju Li, Chih-Yueh Li, Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Yu-Tsung Lai, Wei-Hao Huang
  • Patent number: 10998428
    Abstract: Examples of an integrated circuit and a method for forming the integrated circuit are provided herein. In some examples, a method includes receiving a substrate that includes: a plurality of fins extending above a remainder of the substrate; a first region that includes a first fence region that contains a first subset of the plurality of fins; and a second region that includes a second fence region that contains a second subset of the plurality of fins. The first region has a first performance characteristic, and the second region has a second performance characteristic that is different from the first. Based on the first performance characteristic, the first subset of the plurality of fins is recessed to a first height, and based on the second performance characteristic, the second subset of the plurality of fins is recessed to a second height that is less than the first height.
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: May 4, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Che-Cheng Chang, Chih-Han Lin, Wei-Chiang Hung, Wei-Hao Huang
  • Publication number: 20210119115
    Abstract: A method for fabricating semiconductor device includes the steps of: forming a first magnetic tunneling junction (MTJ) on a substrate; forming a first ultra low-k (ULK) dielectric layer on the first MTJ; performing a first etching process to remove part of the first ULK dielectric layer and forming a damaged layer on the first ULK dielectric layer; and forming a second ULK dielectric layer on the damaged layer.
    Type: Application
    Filed: December 27, 2020
    Publication date: April 22, 2021
    Inventors: Hui-Lin Wang, Tai-Cheng Hou, Wei-Xin Gao, Fu-Yu Tsai, Chin-Yang Hsieh, Chen-Yi Weng, Jing-Yin Jhang, Bin-Siang Tsai, Kun-Ju Li, Chih-Yueh Li, Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Yu-Tsung Lai, Wei-Hao Huang
  • Patent number: 10916694
    Abstract: A method for fabricating semiconductor device includes the steps of: forming a first magnetic tunneling junction (MTJ) on a substrate; forming a first ultra low-k (ULK) dielectric layer on the first MTJ; performing a first etching process to remove part of the first ULK dielectric layer and forming a damaged layer on the first ULK dielectric layer; and forming a second ULK dielectric layer on the damaged layer.
    Type: Grant
    Filed: January 23, 2019
    Date of Patent: February 9, 2021
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Hui-Lin Wang, Tai-Cheng Hou, Wei-Xin Gao, Fu-Yu Tsai, Chin-Yang Hsieh, Chen-Yi Weng, Jing-Yin Jhang, Bin-Siang Tsai, Kun-Ju Li, Chih-Yueh Li, Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Yu-Tsung Lai, Wei-Hao Huang
  • Patent number: 10854520
    Abstract: The present invention provides a method for forming a semiconductor structure. The method including: Firstly, a substrate is provided, a first region and a second region are defined thereon, next, a gate dielectric layer and a work function metal layer are sequentially formed on the substrate within the first region and within the second region. Afterwards, a dielectric layer is formed on the work function metal layer within the second region, a hydrogen gas treatment is then performed on the substrate, and the work function metal layer is removed within the first region.
    Type: Grant
    Filed: May 20, 2019
    Date of Patent: December 1, 2020
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Chun-Hsien Lin, Wei-Hao Huang, Kai-Teng Cheng
  • Publication number: 20200218038
    Abstract: An optical lens system using ultraviolet for imaging includes, in order from a magnified side to a minified side, a first lens group of positive refractive power and a second lens group of positive refractive power. The second lens group includes at least one cemented lens and at least one aspheric lens. The optical lens system satisfies the condition of TE(?=400)>94%, where TE(?=400) denotes an overall transmittance of all of the lenses in the optical lens system measured at a wavelength of 400 nm and is equal to a product of respective internal transmittances of all of the lenses measured at a wavelength of 400 nm.
    Type: Application
    Filed: March 17, 2020
    Publication date: July 9, 2020
    Inventors: Hung-You CHENG, Yu-Hung CHOU, Ching-Lung LAI, Yi-Hua LIN, Wei-Hao HUANG
  • Publication number: 20200212290
    Abstract: A method for fabricating semiconductor device includes the steps of: forming a first magnetic tunneling junction (MTJ) on a substrate; forming a first ultra low-k (ULK) dielectric layer on the first MTJ; performing a first etching process to remove part of the first ULK dielectric layer and forming a damaged layer on the first ULK dielectric layer; and forming a second ULK dielectric layer on the damaged layer.
    Type: Application
    Filed: January 23, 2019
    Publication date: July 2, 2020
    Inventors: Hui-Lin Wang, Tai-Cheng Hou, Wei-Xin Gao, Fu-Yu Tsai, Chin-Yang Hsieh, Chen-Yi Weng, Jing-Yin Jhang, Bin-Siang Tsai, Kun-Ju Li, Chih-Yueh Li, Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Yu-Tsung Lai, Wei-Hao Huang
  • Patent number: 10656397
    Abstract: An optical lens system includes, in order from a magnified side to a minified side, a first lens group and a second lens group. The first lens group of negative refractive power has at least one aspheric surface, and the second lens group of positive refractive power has at least one aspheric surface. Each of the lenses in the optical lens system is a singlet lens, and the condition: TE(?=365)>70% is satisfied, where TE(?=365) denotes an overall transmittance of all of the lenses in the optical lens system measured at a wavelength of 365 nm.
    Type: Grant
    Filed: December 28, 2015
    Date of Patent: May 19, 2020
    Assignee: YOUNG OPTICS INC.
    Inventors: Hung-You Cheng, Yu-Hung Chou, Ching-Lung Lai, Yi-Hua Lin, Wei-Hao Huang
  • Publication number: 20200013881
    Abstract: Examples of an integrated circuit and a method for forming the integrated circuit are provided herein. In some examples, a method includes receiving a substrate that includes: a plurality of fins extending above a remainder of the substrate; a first region that includes a first fence region that contains a first subset of the plurality of fins; and a second region that includes a second fence region that contains a second subset of the plurality of fins. The first region has a first performance characteristic, and the second region has a second performance characteristic that is different from the first. Based on the first performance characteristic, the first subset of the plurality of fins is recessed to a first height, and based on the second performance characteristic, the second subset of the plurality of fins is recessed to a second height that is less than the first height.
    Type: Application
    Filed: August 26, 2019
    Publication date: January 9, 2020
    Inventors: Che-Cheng Chang, Chih-Han Lin, Wei-Chiang Hung, Wei-Hao Huang
  • Patent number: 10520709
    Abstract: A projection system includes a long-focus lens that is able to generate an image independently with a focal length between 70-300 mm, a short-focus lens that is able to generate an image independently with a focal length between 3-8 mm and shares an optical axis with the long-focus lens and at least one reflector to reflect the optical axis for direction change. When the long-focus lens generates an image, the short-focus lens then generates the image to a pre-determined position thereby.
    Type: Grant
    Filed: September 26, 2018
    Date of Patent: December 31, 2019
    Assignees: Sun Yang Optics Development Co., Ltd., Shenzhen Anhua Optoelectronics Technology Co., Ltd.
    Inventors: Sheng-Che Wu, Yu-Hung Chou, Wei-Hao Huang
  • Publication number: 20190279909
    Abstract: The present invention provides a method for forming a semiconductor structure. The method including: Firstly, a substrate is provided, a first region and a second region are defined thereon, next, a gate dielectric layer and a work function metal layer are sequentially formed on the substrate within the first region and within the second region. Afterwards, a dielectric layer is formed on the work function metal layer within the second region, a hydrogen gas treatment is then performed on the substrate, and the work function metal layer is removed within the first region.
    Type: Application
    Filed: May 20, 2019
    Publication date: September 12, 2019
    Inventors: Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Chun-Hsien Lin, Wei-Hao Huang, Kai-Teng Cheng
  • Publication number: 20190272426
    Abstract: A localization method includes capturing a current image by a mobile device; transferring the current image to a remote end; performing image recognition on the current image according to a stored model trained by machine learning at the remote end, the model being generated beforehand by machine learning according to environmental images and corresponding labels, thereby obtaining a corresponding recognized label that includes localization information; and transferring the recognized label to the mobile device.
    Type: Application
    Filed: April 23, 2018
    Publication date: September 5, 2019
    Inventor: Wei Hao Huang
  • Patent number: 10396184
    Abstract: Examples of an integrated circuit and a method for forming the integrated circuit are provided herein. In some examples, a method includes receiving a substrate that includes: a plurality of fins extending above a remainder of the substrate; a first region that includes a first fence region that contains a first subset of the plurality of fins; and a second region that includes a second fence region that contains a second subset of the plurality of fins. The first region has a first performance characteristic, and the second region has a second performance characteristic that is different from the first. Based on the first performance characteristic, the first subset of the plurality of fins is recessed to a first height, and based on the second performance characteristic, the second subset of the plurality of fins is recessed to a second height that is less than the first height.
    Type: Grant
    Filed: January 31, 2018
    Date of Patent: August 27, 2019
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Che-Cheng Chang, Chih-Han Lin, Wei-Chiang Hung, Wei-Hao Huang
  • Publication number: 20190252259
    Abstract: The present invention provides a method for forming a semiconductor structure. The method including: Firstly, a substrate is provided, a first region and a second region are defined thereon, next, a gate dielectric layer and a work function metal layer are sequentially formed on the substrate within the first region and within the second region. Afterwards, a dielectric layer is formed on the work function metal layer within the second region, a hydrogen gas treatment is then performed on the substrate, and the work function metal layer is removed within the first region.
    Type: Application
    Filed: February 11, 2018
    Publication date: August 15, 2019
    Inventors: Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Chun-Hsien Lin, Wei-Hao Huang, Kai-Teng Cheng
  • Publication number: 20190148520
    Abstract: Examples of an integrated circuit and a method for forming the integrated circuit are provided herein. In some examples, a method includes receiving a substrate that includes: a plurality of fins extending above a remainder of the substrate; a first region that includes a first fence region that contains a first subset of the plurality of fins; and a second region that includes a second fence region that contains a second subset of the plurality of fins. The first region has a first performance characteristic, and the second region has a second performance characteristic that is different from the first. Based on the first performance characteristic, the first subset of the plurality of fins is recessed to a first height, and based on the second performance characteristic, the second subset of the plurality of fins is recessed to a second height that is less than the first height.
    Type: Application
    Filed: January 31, 2018
    Publication date: May 16, 2019
    Inventors: Che-Cheng Chang, Chih-Han Lin, Wei-Chiang Hung, Wei-Hao Huang
  • Patent number: 10199374
    Abstract: A method for fabricating semiconductor device is disclosed. A substrate having a first transistor on a first region, a second transistor on a second region, a trench isolation region, a resistor-forming region is provided. A first ILD layer covers the first region, the second region, and the resistor-forming region. A resistor material layer and a capping layer are formed over the first region, the second region, and the resistor-forming region. The capping layer and the resistor material layer are patterned to form a first hard mask pattern above the first and second regions and a second hard mask pattern above the resistor-forming region. The resistor material layer is isotropically etched. A second ILD layer is formed over the substrate. The second ILD layer and the first ILD layer are patterned with a mask and the first hard mask pattern to form a contact opening.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: February 5, 2019
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Hsiang-Hung Peng, Wei-Hao Huang, Ching-Wen Hung, Chih-Sen Huang
  • Patent number: 10192825
    Abstract: A semiconductor device includes a first gate line, a second gate line and a first bar-shaped contact structure. The first gate line has a first long axis extending along a first direction. The second gate line is parallel to the first gate line. The first bar-shaped contact structure has a second axis forming an angle substantially greater than 0° and less than 90° with the first long axis.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: January 29, 2019
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Wei-Hao Huang, Chun-Lung Chen, Kun-Yuan Liao, Ying-Chih Lin, Chia-Lin Lu
  • Patent number: 10109525
    Abstract: A method for fabricating a semiconductor device is provided including providing a substrate, on which a plurality of elements is formed. A first inter-dielectric layer is formed over the substrate, covering the elements. A first plug structure is formed in the first inter-dielectric layer, including performing a polishing process over the first inter-dielectric layer to have a dishing on top and extending from a sidewall of the first plug structure. A hard mask layer is formed to fill the dishing. A second inter-dielectric layer is formed over the hard mask layer. A second plug structure is formed in the second inter-dielectric layer to electrically contact the first plug structure, wherein the second plug structure has at least an edge portion extending on the hard mask layer.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: October 23, 2018
    Assignee: United Microelectronics Corp.
    Inventors: Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Jiunn-Hsiung Liao, Wei-Hao Huang, Kai-Teng Cheng
  • Patent number: 10103250
    Abstract: A semiconductor device and a method of forming the same, the semiconductor device includes a fin shaped structure, a gate structure, an epitaxial layer, an interlayer dielectric layer, a first plug and a protection layer. The fin shaped structure is disposed on a substrate, and the gate structure is across the fin shaped structure. The epitaxial layer is disposed in the fin shaped structure, adjacent to the gate structure. The interlayer dielectric layer covers the substrate and the fin shaped structure. The first plug is formed in the interlayer dielectric layer, wherein the first plug is electrically connected to the epitaxial layer. The protection layer is disposed between the first plug and the gate structure.
    Type: Grant
    Filed: August 15, 2017
    Date of Patent: October 16, 2018
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Feng-Yi Chang, Wei-Hao Huang