Abstract: The present disclosure provides a transistor structure and a semiconductor layout structure. The transistor structure includes an active region, a buried gate structure disposed in the active region, a plurality of first dielectric layers disposed over sidewalls of the buried gate structure, and a source/drain region disposed in the active region at two opposite sides of the buried gate structure. In some embodiments, the buried gate structure includes a first portion and a second portion perpendicular to the first portion. In some embodiments, the buried gate structure is separated from the source/drain region by the first dielectric layers as viewed in a top view.

Abstract: The present disclosure provides a semiconductor memory structure including a substrate including a first isolation structure and at least one active region defined by the first isolations structure, a second isolation structure disposed in the active region, a first buried word line and a second buried word line disposed in the second isolation structure, and at least one buried digit line disposed in the active region. Topmost portions of the first buried word line and the second buried word line are lower than a top surface of the second isolation structure, and a top surface of the buried digit line is lower than bottom surfaces of the first buried word line and the second buried word line.

Abstract: The present disclosure provides a transistor device and a semiconductor layout structure. The transistor device includes an active region disposed in a substrate, a gate structure disposed over the active region, and a source/drain region disposed at two opposite sides of the gate structure. The active region includes a first region including a first length, a second region including a second length less than the first length, and a third region between the first region and the second region. The gate structure includes a first portion extending in a first direction and a second portion extending in a second direction perpendicular to the first direction. The first portion is disposed over at least the third region of the active region, and the second portion is disposed over at least a portion of the third region and a portion of the second region.

Abstract: The present disclosure provides a semiconductor ESD protection device. The semiconductor ESD protection device includes a substrate including a first conductivity type, a gate formed on the substrate, a source region and a drain region formed in the substrate, and a body region formed in the substrate. The substrate and the body region include a first conductivity type. The source region and the drain region include a second conductivity type. And the first conductivity type and the second conductivity type are complementary to each other. The body region is electrically connected to the gate.

Abstract: The present disclosure provides a semiconductor ESD protection device. The semiconductor ESD protection device includes a substrate including a first conductivity type, a gate formed on the substrate, a source region and a drain region formed in the substrate, and a body region formed in the substrate. The substrate and the body region include a first conductivity type. The source region and the drain region include a second conductivity type. And the first conductivity type and the second conductivity type are complementary to each other. The body region is electrically connected to the gate.

Abstract: The invention provides a method for fabricating a semiconductor device, including: forming a dummy gate on a substrate, forming an inter-layer dielectric layer (ILD) on the dummy gate and the substrate, forming a metal layer on the upper surface of the dummy gate, removing the dummy gate to form a trench in the inter-layer dielectric layer (ILD), conformally forming a gate dielectric layer in the trench, conformally forming a first conductive type metal layer on the gate dielectric layer, anisotropic etching the first conductive type metal layer and the gate dielectric layer over the metal layer to form a gap in the inter-layer dielectric layer (ILD), and filling a second conductive type metal layer in the gap.

Abstract: The invention provides a method for fabricating a semiconductor device, including: forming a dummy gate on a substrate, forming an inter-layer dielectric layer (ILD) on the dummy gate and the substrate, forming a metal layer on the upper surface of the dummy gate, removing the dummy gate to form a trench in the inter-layer dielectric layer (ILD), conformally forming a gate dielectric layer in the trench, conformally forming a first conductive type metal layer on the gate dielectric layer, anisotropic etching the first conductive type metal layer and the gate dielectric layer over the metal layer to form a gap in the inter-layer dielectric layer (ILD), and filling a second conductive type metal layer in the gap.

Abstract: A vertical transistor device includes a line of active area adjacent a line of dielectric isolation. A buried data/sense line obliquely angles relative to the line of active area and the line of dielectric isolation. A pair of gate lines is outward of the buried data/sense line and obliquely angle relative to the line of active area and the line of dielectric isolation. A vertical transistor channel region is within the active area between the pair of gate lines. An outer source/drain region is in the active area above the channel region and an inner source/drain region is in the active area below the channel region. The inner source/drain region is electrically coupled to the buried data/sense line. Other devices and structures are contemplated, as are methods of forming a plurality of vertical transistor devices.

Abstract: A semiconductor device with neck fins comprises a substrate, a plurality of fins having a lower portion and a neck upper portion on the substrate, and insulators disposed between each fin and flush with the lower portion of the fins.

Abstract: A trench extends from a main surface of a semiconductor substrate to a predetermined depth. A gate oxide layer is formed in the trench. A buried gate electrode is formed at a lower portion of the trench. The buried gate electrode is capped with a dielectric layer. A pad layer and hard mask layer are formed on the semiconductor substrate. A recess through the pad layer and hard mask layer and into the semiconductor substrate is formed on one side of the trench. A portion of the dielectric layer is revealed within the recess. The hard mask layer is then removed. An ion implantation process is performed to implant dopants on both sides of the trench, thereby forming a source doping region and a drain doping region. The source doping region has a junction depth that is deeper than that of the drain doping region.

Abstract: A semiconductor device with neck fins comprises a substrate, a plurality of fins having a lower portion and a neck upper portion on the substrate, and insulators disposed between each fin and flush with the lower portion of the fins.

Abstract: A vertical transistor device includes a line of active area adjacent a line of dielectric isolation. A buried data/sense line obliquely angles relative to the line of active area and the line of dielectric isolation. A pair of gate lines is outward of the buried data/sense line and obliquely angle relative to the line of active area and the line of dielectric isolation. A vertical transistor channel region is within the active area between the pair of gate lines. An outer source/drain region is in the active area above the channel region and an inner source/drain region is in the active area below the channel region. The inner source/drain region is electrically coupled to the buried data/sense line. Other devices and structures are contemplated, as are methods of forming a plurality of vertical transistor devices.

Abstract: A vertical transistor device includes a line of active area adjacent a line of dielectric isolation. A buried data/sense line obliquely angles relative to the line of active area and the line of dielectric isolation. A pair of gate lines is outward of the buried data/sense line and obliquely angle relative to the line of active area and the line of dielectric isolation. A vertical transistor channel region is within the active area between the pair of gate lines. An outer source/drain region is in the active area above the channel region and an inner source/drain region is in the active area below the channel region. The inner source/drain region is electrically coupled to the buried data/sense line. Other devices and structures are contemplated, as are methods of forming a plurality of vertical transistor devices.

Abstract: A trench extends from a main surface of a semiconductor substrate to a predetermined depth. A gate oxide layer is formed in the trench. A buried gate electrode is formed at a lower portion of the trench. The buried gate electrode is capped with a dielectric layer. A pad layer and hard mask layer are formed on the semiconductor substrate. A recess through the pad layer and hard mask layer and into the semiconductor substrate is formed on one side of the trench. A portion of the dielectric layer is revealed within the recess. The hard mask layer is then removed. An ion implantation process is performed to implant dopants on both sides of the trench, thereby forming a source doping region and a drain doping region. The source doping region has a junction depth that is deeper than that of the drain doping region.

Abstract: A recessed channel access transistor device is provided. A semiconductor substrate having thereon a trench is provided. The trench extends from a main surface of the semiconductor substrate to a predetermined depth. A buried gate electrode is disposed at a lower portion of the trench. A gate oxide layer is formed between the buried gate electrode and the semiconductor substrate. A drain doping region on a first side (cell side) of the trench in the semiconductor substrate and a source doping region on a second side (digit side) of the trench are formed. The source doping region has a junction depth that is deeper than that of the drain doping region. An L-shaped channel is defined along a sidewall surface on the first side and along a bottom surface of the trench between the drain doping region and the source doping region.

Abstract: A method of fabricating a semiconductor device is described. A substrate having first and second areas is provided. A first patterned mask layer having at least one first opening in the first area and at least one second opening in the second area is formed over the substrate, wherein the first opening is smaller than the second opening. A portion of the substrate is removed with the first patterned mask layer as a mask to form first and second trenches respectively in the substrate in the first and second areas, wherein the width and the depth of the first trench are less than those of the second trench. A first dielectric layer is formed at least in the first and second trenches. A conductive structure is formed on the first dielectric layer on at least a portion of the sidewall of each of the first and second trenches.

Abstract: The invention provides a semiconductor device, including: a substrate; a U-shaped gate dielectric layer formed on the substrate; and a dual work function metal gate layer on the inner surface of U-shaped gate dielectric layer, wherein the dual work function metal gate layer includes a first conductive type metal layer and a second conductive type metal layer.

Abstract: Provided is a transistor device including at least a vertical transistor structure. The vertical transistor structure includes a substrate, a dielectric layer, a gate, a first doped region, a second doped region, a third doped region, and a fourth doped region. The dielectric layer is disposed in a trench of the substrate. The gate is disposed in the dielectric layer. The gate defines, at both sides thereof, a first channel region and a second channel region in the substrate. The first doped region and the third doped region are disposed in the substrate and located below the first channel region and the second channel region, respectively. The second doped region and the fourth doped region are disposed in the substrate and located above the first channel region and the second channel region, respectively.

Abstract: A method of fabricating a semiconductor device is described. A substrate having first and second areas is provided. A first patterned mask layer having at least one first opening in the first area and at least one second opening in the second area is formed over the substrate, wherein the first opening is smaller than the second opening. A portion of the substrate is removed with the first patterned mask layer as a mask to form first and second trenches respectively in the substrate in the first and second areas, wherein the width and the depth of the first trench are less than those of the second trench. A first dielectric layer is formed at least in the first and second trenches. A conductive structure is formed on the first dielectric layer on at least a portion of the sidewall of each of the first and second trenches.

Abstract: Provided is a transistor device including at least a vertical transistor structure. The vertical transistor structure includes a substrate, a dielectric layer, a gate, a first doped region, a second doped region, a third doped region, and a fourth doped region. The dielectric layer is disposed in a trench of the substrate. The gate is disposed in the dielectric layer. The gate defines, at both sides thereof, a first channel region and a second channel region in the substrate. The first doped region and the third doped region are disposed in the substrate and located below the first channel region and the second channel region, respectively. The second doped region and the fourth doped region are disposed in the substrate and located above the first channel region and the second channel region, respectively.