Patents by Inventor Wen-Hsin Lin

Wen-Hsin Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250107353
    Abstract: Sub-pixel circuits and methods of forming sub-pixel circuits that may be utilized in a display such as an organic light-emitting diode (OLED) display. In one example, a device includes a substrate, pixel-defining layer (PDL) structures disposed over the substrate and defining sub-pixels of the device, and a plurality of overhang structures. The first sub-pixel includes a first anode, OLED material, a first cathode, and a first encapsulation layer having a gap defined by a first portion of the first encapsulation layer disposed over the first cathode, a second portion of the first encapsulation layer disposed over a sidewall of the body structure, and a third portion of the first encapsulation layer under an underside surface of the top extension of the top structure, the first portion of the first encapsulation layer contacting the third portion of the first encapsulation layer.
    Type: Application
    Filed: December 11, 2024
    Publication date: March 27, 2025
    Inventors: Chung-Chia CHEN, Ji Young CHOUNG, Dieter HAAS, Yu-Hsin LIN, Jungmin LEE, Wen-Hao WU, Si Kyoung KIM
  • Patent number: 12252608
    Abstract: An ethylene-vinyl alcohol copolymer (EVOH) resin particle composition, an EVOH film formed therefrom, and a multilayer structure containing the same. The EVOH resin particle composition includes: a first EVOH resin particle having a surface core void volume (Vvc) of 0.002˜14 ?m3/?m2; and a second EVOH resin particle having a surface core void volume (Vvc) of 0.010˜48 ?m3/?m2. This can improve the thermoformability of EVOH compositions.
    Type: Grant
    Filed: June 16, 2022
    Date of Patent: March 18, 2025
    Assignee: CHANG CHUN PETROCHEMICAL CO., LTD.
    Inventors: Chih Chieh Liang, Wen Hsin Lin
  • Patent number: 12234396
    Abstract: An optical adhesive film structure having an alignment function is provided. The optical adhesive film structure includes an optical adhesive layer and a release film. The release film is disposed on the optical adhesive layer. A first film surface of the release film facing away from the optical adhesive layer has a plurality of marks. The marks are recessed into the release film relative to the first film surface and do not run through the release film. A stitching display module and a manufacturing method of the stitching display module are also provided.
    Type: Grant
    Filed: December 8, 2022
    Date of Patent: February 25, 2025
    Assignee: AUO CORPORATION
    Inventors: Yi-Hsin Lin, Wen-Lung Chen, Yu-Chin Wu, Wei-Lung Liau
  • Patent number: 12227865
    Abstract: A plating apparatus for electroplating a wafer includes a housing defining a plating chamber for housing a plating solution. A voltage source of the apparatus has a first terminal having a first polarity and a second terminal having a second polarity different than the first polarity. The first terminal is electrically coupled to the wafer. An anode is within the plating chamber, and the second terminal is electrically coupled to the anode. A membrane support is within the plating chamber and over the anode. The membrane support defines apertures, wherein in a first zone of the membrane support a first aperture-area to surface-area ratio is a first ratio, and in a second zone of the membrane support a second aperture-area to surface-area ratio is a second ratio, different than the first ratio.
    Type: Grant
    Filed: July 25, 2022
    Date of Patent: February 18, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
    Inventors: Che-Min Lin, Hung-San Lu, Chao-Lung Chen, Chao Yuan Chang, Chun-An Kung, Chin-Hsin Hsiao, Wen-Chun Hou, Szu-Hung Yang, Ping-Ching Jiang
  • Patent number: 12224739
    Abstract: A fast-transient buffer is shown. The fast-transient buffer has a flipped voltage follower coupled between the input terminal and the output terminal of the fast-transient buffer, and a first MOS transistor coupled to the flipped voltage follower as well as the output terminal of the fast-transient buffer. The first MOS transistor regulates the output voltage of the output terminal of the fast-transient buffer, in the opposite direction in comparison with an output voltage regulation direction due to the flipped voltage follower.
    Type: Grant
    Filed: April 13, 2023
    Date of Patent: February 11, 2025
    Assignee: MEDIATEK INC.
    Inventors: Yueh-Min Chen, Ting-Yang Wang, Yu-Hsin Lin, Wen-Chieh Wang
  • Patent number: 12107415
    Abstract: An electrostatic discharge protection circuit is provided. The electrostatic discharge protection circuit includes first, second, and third transistors and a discharge circuit. The first transistor has a first gate, a first drain coupled to the bonding pad, and a first source coupled to a first node. The second transistor has a second gate coupled to a power terminal, a second drain coupled to the first gate, and a second source coupled to a ground. The third transistor has a third gate coupled to the power terminal, a third drain coupled to the first node, and a third source coupled to the ground. The discharge circuit is controlled by a driving voltage at the first node. In response to an electrostatic discharge event occurring on the bonding pad, the discharge circuit provides a discharge path between the bonding pad and the ground according to the driving voltage.
    Type: Grant
    Filed: November 17, 2022
    Date of Patent: October 1, 2024
    Assignee: Vanguard International Semiconductor Corporation
    Inventors: Chih-Hsuan Lin, Shao-Chang Huang, Wen-Hsin Lin, Yeh-Ning Jou, Hwa-Chyi Chiou, Chun-Chih Chen
  • Publication number: 20240309185
    Abstract: An ethylene-vinyl alcohol copolymer (EVOH) resin particle composition, an EVOH film formed therefrom, and a multilayer structure containing the same. The EVOH resin particle composition includes: a first EVOH resin particle having a peak material volume (Vmp) of 0.00001˜6 ?m3/?m2; and a second EVOH resin particle having a peak material volume (Vmp) of 0.00015˜20 ?m3/?m2. This can improve the workability and mechanical properties of the EVOH composition when it is made into a film.
    Type: Application
    Filed: June 16, 2022
    Publication date: September 19, 2024
    Inventors: Chih Chieh LIANG, Wen Hsin LIN
  • Publication number: 20240287298
    Abstract: An ethylene-vinyl alcohol copolymer (EVOH) resin particle composition, an EVOH film formed therefrom, and a multilayer structure containing the same. The EVOH resin particle composition includes: a first EVOH resin particle having a surface core void volume (Vvc) of 0.002˜14 ?m3/?m2; and a second EVOH resin particle having a surface core void volume (Vvc) of 0.010˜48 ?m3/?m2. This can improve the thermoformability of EVOH compositions.
    Type: Application
    Filed: June 16, 2022
    Publication date: August 29, 2024
    Inventors: Chih Chieh LIANG, Wen Hsin LIN
  • Publication number: 20240279454
    Abstract: An ethylene-vinyl alcohol copolymer (EVOH) resin particle composition, an EVOH film formed therefrom, and a multilayer structure containing the same. The EVOH resin particle composition includes: a first EVOH resin particle having a surface valley void volume (Vvv) of 0.00003˜2 ?m3/?m2; and a second EVOH resin particle having a surface valley void volume (Vvv) of 0.00005˜10 ?m3/?m2. This can improve thickness uniformity, oxygen transmission rate and stretchability of the film made by the EVOH resin particle compositions.
    Type: Application
    Filed: June 16, 2022
    Publication date: August 22, 2024
    Inventors: Chih Chieh LIANG, Wen Hsin LIN
  • Publication number: 20240282766
    Abstract: A semiconductor structure including a substrate, a first well, a first doped region, a second doped region, a third doped region, a second well, a fourth doped region, and a fifth doped region is provided. The substrate has a first conductivity type. The first well is disposed in the substrate and has a second conductivity type. The first doped region is disposed in the first well and has the second conductivity type. The second doped region is disposed in the first well and has the first conductivity type. The third doped region is disposed in the first well and has the first conductivity type. The second well is disposed in the first well. The fourth doped region is disposed in the second well and has the first conductivity type. The fifth doped region is disposed in the second well and has the second conductivity type.
    Type: Application
    Filed: February 17, 2023
    Publication date: August 22, 2024
    Applicant: Vanguard International Semiconductor Corporation
    Inventors: Yeh-Ning JOU, Chih-Hsuan LIN, Wen-Hsin LIN, Hwa-Chyi CHIOU, Kai-Chieh HSU
  • Publication number: 20240213241
    Abstract: An ESD protection device includes a substrate, an epitaxial layer, first to third well regions, and first to sixth doped regions. The first to third well regions are disposed in the epitaxial layer. The third well region is disposed between the first and second well regions. The first and second doped regions are disposed on the first well region and coupled to a pad. The third and fourth doped regions are disposed on the second well region and coupled to a ground terminal. The fifth doped region is disposed on the third well region, and the sixth doped region is disposed in the fifth doped region. The third, fifth, and sixth doped regions have the same conductive type. In response to an electrostatic discharge event occurring on the pad, a discharge path is formed between the pad and the ground terminal.
    Type: Application
    Filed: December 27, 2022
    Publication date: June 27, 2024
    Applicant: Vanguard International Semiconductor Corporation
    Inventors: Yeh-Ning JOU, Jian-Hsing LEE, Chieh-Yao CHUANG, Hsien-Feng LIAO, Ting-Yu CHANG, Chih-Hsuan LIN, Wen-Hsin LIN, Hwa-Chyi CHIOU
  • Publication number: 20240170953
    Abstract: An electrostatic discharge protection circuit is provided. The electrostatic discharge protection circuit includes first, second, and third transistors and a discharge circuit. The first transistor has a first gate, a first drain coupled to the bonding pad, and a first source coupled to a first node. The second transistor has a second gate coupled to a power terminal, a second drain coupled to the first gate, and a second source coupled to a ground. The third transistor has a third gate coupled to the power terminal, a third drain coupled to the first node, and a third source coupled to the ground. The discharge circuit is controlled by a driving voltage at the first node. In response to an electrostatic discharge event occurring on the bonding pad, the discharge circuit provides a discharge path between the bonding pad and the ground according to the driving voltage.
    Type: Application
    Filed: November 17, 2022
    Publication date: May 23, 2024
    Applicant: Vanguard International Semiconductor Corporation
    Inventors: Chih-Hsuan LIN, Shao-Chang HUANG, Wen-Hsin LIN, Yeh-Ning JOU, Hwa-Chyi CHIOU, Chun-Chih CHEN
  • Publication number: 20240058494
    Abstract: The disclosure provides a casing including a substrate, a transparent fluorescent identifying part, and a transparent antibacterial film. The transparent fluorescent identifying part is disposed on the substrate. The transparent antibacterial film covers the substrate and the transparent fluorescent identifying part. A method of manufacturing the casing is also provided.
    Type: Application
    Filed: October 30, 2023
    Publication date: February 22, 2024
    Applicant: Acer Incorporated
    Inventors: Wen-Hsin Lin, Wen-Chieh Tai, Cheng-Nan Ling
  • Patent number: 11850321
    Abstract: The disclosure provides a casing including a substrate, a transparent fluorescent identifying part, and a transparent antibacterial film. The transparent fluorescent identifying part is disposed on the substrate. The transparent antibacterial film covers the substrate and the transparent fluorescent identifying part. A method of manufacturing the casing is also provided.
    Type: Grant
    Filed: February 23, 2021
    Date of Patent: December 26, 2023
    Assignee: Acer Incorporated
    Inventors: Wen-Hsin Lin, Wen-Chieh Tai, Cheng-Nan Ling
  • Patent number: 11778766
    Abstract: A manufacturing method of a casing including the following steps is provided. A magnesium alloy substrate is provided first. Next, a protective film is formed on the magnesium alloy substrate. A grinding treatment, a cutting treatment, or an engraving treatment is then performed to remove portions of the protective film and portions of the magnesium alloy substrate. An electrophoretic coating treatment is performed afterwards to form a light-transmissive coating layer covering the protective film and the magnesium alloy substrate. A casing is also provided.
    Type: Grant
    Filed: November 3, 2020
    Date of Patent: October 3, 2023
    Assignee: Acer Incorporated
    Inventors: Wen-Hsin Lin, Cheng-Nan Ling, Wen-Chieh Tai
  • Patent number: 11746170
    Abstract: The present invention relates to an ethylene-vinyl alcohol copolymer (EVOH) resin composition, an EVOH film formed therefrom, and a multilayer structure containing the same. The core void volume (Vvc) of the surface of the EVOH resin composition is more than 0.010 ?m3/?m2 and less than 50 ?m3/?m2; or its surface pole height (Sxp) is more than 0.010 ?m and less than 9.0 ?m. The invention can reduce the torque output during processing, reduce the adsorption of fine powder on the surface caused by static electricity generated on the surface of the EVOH, and provide good film thickness uniformity.
    Type: Grant
    Filed: March 22, 2022
    Date of Patent: September 5, 2023
    Assignee: CHANG CHUN PETROCHEMICAL CO., LTD.
    Inventors: Chih Chieh Liang, Wen Hsin Lin
  • Publication number: 20230207521
    Abstract: At least some embodiments of the present disclosure relate to a semiconductor device package. The semiconductor device package includes a first substrate with a first surface and a second surface opposite to the first surface, a second substrate adjacent to the first surface of the first substrate, and an encapsulant encapsulating the first substrate and the second substrate. The first substrate defines a space. The second substrate covers the space. The second surface of the first substrate is exposed by the encapsulant. A surface of the encapsulant is coplanar with the second surface of the first substrate or protrudes beyond the second surface of the first substrate.
    Type: Application
    Filed: February 21, 2023
    Publication date: June 29, 2023
    Applicant: Advanced Semiconductor Engineering, Inc.
    Inventors: Yung-Hsing CHANG, Wen-Hsin LIN
  • Patent number: 11685824
    Abstract: The present invention relates to an ethylene-vinyl alcohol copolymer (EVOH) resin composition, an EVOH film formed therefrom, and a multilayer structure containing the same. The surface roughness of the EVOH resin composition is a kurtosis (Sku) ranging from 0.05 to 100. The EVOH of the invention can reduce the torque output during processing, and can obtain the EVOH film with excellent appearance.
    Type: Grant
    Filed: March 22, 2022
    Date of Patent: June 27, 2023
    Assignee: CHANG CHUN PETROCHEMICAL CO., LTD.
    Inventors: Chih Chieh Liang, Wen Hsin Lin
  • Patent number: 11655317
    Abstract: The present invention relates to an ethylene-vinyl alcohol copolymer (EVOH) resin composition, an EVOH film formed therefrom, and a multilayer structure containing the same. The surface roughness of the EVOH resin composition is the root mean square gradient (Sdq) between 0.0005 and 13. The EVOH of the invention can reduce the torque output during processing, and make the appearance of the EVOH film highly uniform.
    Type: Grant
    Filed: March 22, 2022
    Date of Patent: May 23, 2023
    Assignee: CHANG CHUN PETROCHEMICAL CO., LTD.
    Inventors: Chih Chieh Liang, Wen Hsin Lin
  • Patent number: 11643575
    Abstract: The present invention relates to an ethylene-vinyl alcohol copolymer (EVOH) resin composition, an EVOH film formed therefrom, and a multilayer structure containing the same. The surface roughness of the EVOH resin composition is the peak material volume (Vmp) between 0.0008 and 10 ?m3/?m2. The EVOH of the invention can reduce the torque output during processing, and can obtain the EVOH film with excellent appearance.
    Type: Grant
    Filed: March 22, 2022
    Date of Patent: May 9, 2023
    Assignee: CHANG CHUN PETROCHEMICAL CO., LTD.
    Inventors: Chih Chieh Liang, Wen Hsin Lin