Abstract: The present invention provides a processing apparatus using a scanning electron microscope, which includes the scanning electron microscope having an electron optical system radiating and scanning a focused electron beam on a sample placed on a stage to image the sample, and an image processing/control section which controls the scanning electron microscope and processes the image obtained by imaging with the scanning electron microscope. The electron optical system of the scanning electron microscope has image shift electrodes comprised of electrostatic electrodes, the image shift electrodes moving a position at which to apply the focused electron beam onto the sample with the stage stopped to thereby shift a region in which the sample is to be imaged.

Abstract: A system and method of decomposing a single photoresist mask pattern to three photoresist mask patterns. The system and method assign nodes to polygon features on the single photoresist mask pattern, designate nodes as being adjacent nodes for those nodes that are less than a predetermined distance apart, iteratively remove nodes having 2 or less adjacent nodes until no nodes having 2 or less adjacent nodes remain, identify one or more internal nodes, map photoresist mask pattern designations (colors) to the internal nodes, and replace and map a color to each of the nodes removed by the temporarily removing nodes, such that each node does not have an adjacent node of the same color.

Abstract: A method performed by a computer processing system includes receiving a design pattern for an integrated circuit, applying a function to the design pattern to generate a model contour, generating a plurality of Optical Proximity Correction (OPC) target points along the model contour, adjusting the design pattern to create an adjusted pattern, and performing a simulation on the adjusted pattern to create a simulated contour.

Abstract: A composition and methods of its use, the composition comprising: a halogen source, urea, and an additional halogen stabilizer excluding urea, optionally an alkali in a concentration sufficient to provide said composition with a pH of greater than 10; and optionally excluding a stabilized bromine compound from said composition is disclosed. Additionally, a method for reducing biological activity in a process stream is disclosed. The method comprises: providing a composition to a process stream, wherein said composition contains: a halogen, urea, and an additional halogen stabilizer excluding urea, optionally an alkali in a concentration sufficient to provide said composition with a pH of greater than 10; and optionally excluding a stabilized bromine compound from said composition. The invention is also directed to compositions and methods of their use as effective biocidal agents for water streams.

Abstract: A vibration feeding device includes a mounting seat, a vibration feeding mechanism, and a pressing mechanism. The vibration feeding mechanism includes a driving member, a rotating shaft, a rotation wheel, and at least one adjusting member. The rotating shaft is rotatably connected to the driving member. The rotation wheel is non-rotatably sleeved on the rotating shaft. The at least one adjusting member is fixed between the rotating shaft and the rotation wheel to adjust an eccentricity of the rotation wheel. The vibration feeding mechanism is mounted on the mounting seat. The pressing mechanism is connected to the rotation wheel of the vibration feeding mechanism and is driven by the vibration to adjustably move close to and then away from a workpiece.

Abstract: The present disclosure relates to a method and apparatus for performing a dry plasma procedure, while mitigating internal contamination of a semiconductor substrate. In some embodiments, the apparatus includes a semiconductor processing tool having a dry process stage with one or more dry process elements that perform a dry plasma procedure on a semiconductor substrate received from an input port. A wafer transport system transports the semiconductor substrates from the dry process stage to a wet cleaning stage located downstream of the dry process stage. The wet cleaning stage has one or more wet cleaning elements that perform a wet cleaning procedure to remove contaminants from a surface of the semiconductor substrates before the semiconductor substrate is provided to an output port, thereby improving wafer manufacturing quality.

Abstract: A hydrogen storage material has been developed that comprises a metal hydride material embedded into a carbon microstructure that generally exhibits a greater bulk thermal conductivity than the surrounding bulk metal hydride material.

Abstract: A plant cultivation device includes: a planting container having an accommodation space; a planting pan disposed in the accommodation space of the planting container for dividing the accommodation space into a leaf region and a root region; an atomizing sheet disposed in a bottom plate of the planting container, used for performing spraying to the root region of the planting container; and a control circuit board, electrically connected to the atomizing sheet, used for controlling whether the atomizing sheet performs spraying, a nutrient solution tank, used for accommodating a nutrient solution; and a water absorbing material, wherein an end of the water absorbing material is disposed in the nutrient solution tank for taking the nutrient solution of the nutrient solution tank, and the other end of the water absorbing material is in contact with the atomizing sheet.

Abstract: Low molecular weight semicrystalline propylene-alpha olefin copolymers containing propylene crystallinity are used as a nucleating agent in crystalline polypropylene and polypropylene copolymers. The nucleating copolymers are propylene-alpha olefin copolymers having a percent crystallinity of 5-75%, a melting point of 45° C.-105° C., and an MFR between 300 and 5000 g/10 min. Nucleated polypropylene compositions comprise a nucleating amount of the copolymer blended in a matrix of polypropylene homopolymer, or 0.01 to 9 wt % ?-olefin copolymer, having a melting point greater than 110° C. The nucleating copolymer improves processing time with little or no effect on the crystallinity-associated characteristics of the matrix. The invention also provides methods of crystallizing polypropylene with the nucleating agent and of forming articles with the composition, and also provides articles formed from the composition and/or by the method.

Abstract: Printing layers and films for printing are disclosed. Methods for preparing such films also are disclosed.

Abstract: A method for treating a virus infection in a subject is provided. The method comprising administering to the subject in need an effective amount of a derivative of aniline selected from the group consisting of a compound of formula (I), a pharmaceutically acceptable salt of the compound of formula (I), a pharmaceutically acceptable ester of the compound of formula (I), and combinations thereof: wherein, R1 is C1 to C10 alkyl; R2 is H or C1 to C4 alkyl; and R3, R4, R5, R6 and R7 are independently H, —OH, halogen, C1 to C10 alkyl, C1 to C10 alkoxyl, or (C1 to C10 alkylene)-O—O—(C1 to C10 alkyl).

Abstract: The present disclosure relates to a method and apparatus for performing a dry plasma procedure, while mitigating internal contamination of a semiconductor substrate. In some embodiments, the apparatus includes a semiconductor processing tool having a dry process stage with one or more dry process elements that perform a dry plasma procedure on a semiconductor substrate received from an input port. A wafer transport system transports the semiconductor substrates from the dry process stage to a wet cleaning stage located downstream of the dry process stage. The wet cleaning stage has one or more wet cleaning elements that perform a wet cleaning procedure to remove contaminants from a surface of the semiconductor substrates before the semiconductor substrate is provided to an output port. The wet cleaning procedure prior removes internal contaminants of the dry process procedure from the semiconductor substrate and thereby improves wafer manufacturing quality.

Abstract: Methods and systems for design of integrated circuits including performing OPC are discussed. In one embodiment, design data having a geometric feature is provided. A base feature is formed from the geometric feature, which has a substantially linear edge. A pseudo dissection point is determined on the base feature. Add or trim a polygon from the base feature to form a modified feature. An OPC process is performed on the modified feature to generate an output design. The output design is used to fabricate a semiconductor device on a semiconductor substrate.

Abstract: A method for assisting an anti-cancer drug comprising administrating an effective amount of Antrodia camphorata fermentation solution to improve life quality of patient suffering from cancers after chemotherapy is provided.

Abstract: A method performed by a computer processing system includes receiving a design pattern for an integrated circuit, applying a function to the design pattern to generate a model contour, generating a plurality of Optical Proximity Correction (OPC) target points along the model contour, adjusting the design pattern to create an adjusted pattern, and performing a simulation on the adjusted pattern to create a simulated contour.

Abstract: A quartz glass liquid level sensor includes a support frame, a light masking plate, a quartz glass tube, and a sensor module. The light masking plate is movably mounted on the support frame. The quartz glass tube is movably mounted to the support frame. One end of the quartz glass tube is securely fixed to the light masking plate. The sensor module is mounted on the support frame, for sensing a position of the light masking plate relative to the support frame.

Abstract: The present disclosure relates to a method and apparatus for forming a multiple patterning lithograph (MPL) compliant integrated circuit layout by operating a construction validation check on unassembled IC cells to enforce design restrictions that prevent MPL conflicts after assembly. In some embodiments, the method is performed by generating a plurality of unassembled integrated circuit (IC) cells having a multiple patterning design layer. A construction validation check is performed on the unassembled IC cells to identify violating IC cells having shapes disposed in patterns comprising potential multiple patterning coloring conflicts. Design shapes within a violating IC cell are adjusted to achieve a plurality of violation free IC cells. The plurality of violation free IC cells are then assembled to form an MPL compliant IC layout. Since the MPL compliant IC layout is free of coloring conflicts, a decomposition algorithm can be operated without performing a post assembly color conflict check.

Abstract: The gate of a drive transistor having a drain and source is discharged by a circuit including a sensing circuit configured to sense a drain-to-source voltage of the drive transistor. A first current sink path is coupled to the gate of the drive transistor. The first current sink path applies a high discharge current to the gate of the drive transistor when the sensing current senses a lower drain-to-source voltage of the drive transistor. A second current sink path is also coupled to the gate of the drive transistor. The second current sink path is configured to apply a low discharge current to the gate of the drive transistor when the sensing current senses a higher drain-to-source voltage of the drive transistor.

Abstract: Liquid interferon compositions having a pH between 4.0 and 7.2 are described. The compositions comprise interferon-beta and a stabilizing agent at between about 0.3% and 5% by weight which is an amino acid selected from the group consisting of acidic amino acids, arginine and glycine. If needed, salt is added to provide sufficient ionic strength. The liquid composition has not been previously lyophilized or previously cavitated. The liquid is preferably contained within a vessel having at least one surface in contract with the liquid that is coated with a material inert to adsorption of interferon-beta. A kit for parenteral administration of a liquid interferon formulation and a method for stabilizing liquid interferon compositions are also described.

Abstract: A plant cultivation device includes: a planting container having an accommodation space; a planting pan disposed in the accommodation space of the planting container for dividing the accommodation space into a leaf region and a root region; an atomizing sheet disposed in a bottom plate of the planting container, used for performing spraying to the root region of the planting container; and a control circuit board, electrically connected to the atomizing sheet, used for controlling whether the atomizing sheet performs spraying, a nutrient solution tank, used for accommodating a nutrient solution; and a water absorbing material, wherein an end of the water absorbing material is disposed in the nutrient solution tank for taking the nutrient solution of the nutrient solution tank, and the other end of the water absorbing material is in contact with the atomizing sheet.