Patents by Inventor Wen Wu

Wen Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250000479
    Abstract: A system for analyzing vascular sound has a data acquiring module, a feature extraction module, and a feature analyzing module. The data acquiring module is used to acquire audio data from an individual. The feature extraction module is used to extract an audio feature from the audio data. The feature analyzing module is used to analyze the audio feature and to output an abnormality classification of a vascular sound corresponding to the audio data according to an analyze result of the audio feature.
    Type: Application
    Filed: June 27, 2024
    Publication date: January 2, 2025
    Applicant: Far Eastern Memorial Hospital
    Inventors: I-No Cheng, Pen-Chih Liao, Yen-Wen Wu, Yao-Chia Shih, Shih-Hau Fang
  • Publication number: 20240428402
    Abstract: Provided is a system and method for prediction of obstructive coronary artery diseases, where a pre-processing module is configured to generate a left ventricular myocardium image from 3D images of a subject that is space-invariant, a flattening module is configured to resample the left ventricular myocardium image into flattened image in 3D spherical coordinate and preserve neighborhood relationship between myocardium of the subject, and a deep learning module is configured to predict probabilities of obstructive coronary artery disease in left anterior descending, left circumflex and right coronary artery and probability of patent coronary artery for calculation of compound probability of obstructive coronary artery disease for the subject.
    Type: Application
    Filed: June 26, 2023
    Publication date: December 26, 2024
    Inventors: Yen-Wen WU, Chi-Lun KO, Chung-Ming CHEN
  • Patent number: 12176337
    Abstract: Packaged devices and methods of manufacturing the devices are described herein. The packaged devices may be fabricated using heterogeneous devices and asymmetric dual-side molding on a multi-layered redistribution layer (RDL) structure. The packaged devices may be formed with a heterogeneous three-dimensional (3D) Fan-Out System-in-Package (SiP) structure having small profiles and can be formed using a single carrier substrate.
    Type: Grant
    Filed: July 21, 2022
    Date of Patent: December 24, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yi-Wen Wu, Po-Yao Chuang, Meng-Liang Lin, Techi Wong, Shih-Ting Hung, Po-Hao Tsai, Shin-Puu Jeng
  • Publication number: 20240421773
    Abstract: An electronic device includes a driving amplifier, a power amplifier, a power detector, and a bias circuit. The driving amplifier outputs a radio frequency (RF) signal. The power amplifier is electrically connected to the driving amplifier. The power amplifier includes an input end. The power amplifier receives the RF signal through the input end. The power amplifier amplifies the RF signal. The power detector is electrically coupled to the input end and detects the input power of the RF signal. The power detector outputs a driving voltage according to the input power. The bias circuit is electrically connected to the power amplifier and the power detector. The bias circuit outputs a first driving current to the power amplifier according to the driving voltage. The power amplifier amplifies the power of the RF signal from the input power to a target power according to the first driving current.
    Type: Application
    Filed: May 31, 2024
    Publication date: December 19, 2024
    Inventor: Chih-Wen WU
  • Publication number: 20240421202
    Abstract: One aspect of the present disclosure pertains to a semiconductor structure. The semiconductor structure includes first and second active regions extending lengthwise along a first direction and metal gate structures extending lengthwise along a second direction over channels of the first and second active regions. The semiconductor structure includes an insulating structure cutting through the metal gate structures. The insulating structure is disposed between the first and the second active regions along the second direction. The semiconductor structure includes source/drain (S/D) contacts over the insulating structure and over S/D features of the first and second active regions. The S/D contacts extend lengthwise along the second direction. And the semiconductor structure includes a feedthrough via contacting a bottom surface of the S/D contacts and penetrating through a portion of the insulating structure.
    Type: Application
    Filed: June 15, 2023
    Publication date: December 19, 2024
    Inventors: Chia-Wei Chen, I-Wen Wu, Chen-Ming Lee, Ming-Cheng Syu
  • Publication number: 20240410001
    Abstract: The disclosure relates to methods for determining an endometrial status using a sample, for example, a blood plasma sample, from a subject, comprising: (a) performing an assay on the blood sample from the subject to determine a miRNA expression profile, wherein the miRNA expression profile comprises expression levels of a plurality of miRNA and (b) analyzing the miRNA expression profile to obtain a predictive score using a computer-based machine-learning model.
    Type: Application
    Filed: January 31, 2024
    Publication date: December 12, 2024
    Inventors: An Hsu, Pei-Yi Lin, Yu-Ling Chen, Ko-Wen Wu, Kuan-Chun Chen
  • Publication number: 20240412867
    Abstract: A method for establishing a disease prediction model is provided. The method includes the steps of extracting feature values for multiple microbiota features from microbiota data of each of a plurality of samples, selecting a portion of the extracted microbiota features as selected features, and training a disease prediction model. Each piece of training data used in training the disease prediction model includes (i) disease data for each of the samples and (ii) the feature values of the selected features for the sample. The microbiota features include species-level features, microbiota interaction features, and community-level features.
    Type: Application
    Filed: August 22, 2023
    Publication date: December 12, 2024
    Inventors: Chih-Wei TU, Tsung-Hsien TSAI, Yun-Hsuan CHAN, Ning-I YANG, I-Wen WU, Chi-Hsiao YEH, Yu-Chieh LIAO, Ting-Fen TSAI
  • Publication number: 20240387660
    Abstract: An interconnect fabrication method is disclosed herein that utilizes a disposable etch stop hard mask over a gate structure during source/drain contact formation and replaces the disposable etch stop hard mask with a dielectric feature (in some embodiments, dielectric layers having a lower dielectric constant than a dielectric constant of dielectric layers of the disposable etch stop hard mask) before gate contact formation. An exemplary device includes a contact etch stop layer (CESL) having a first sidewall CESL portion and a second sidewall CESL portion separated by a spacing and a dielectric feature disposed over a gate structure, where the dielectric feature and the gate structure fill the spacing between the first sidewall CESL portion and the second sidewall CESL portion. The dielectric feature includes a bulk dielectric over a dielectric liner. The dielectric liner separates the bulk dielectric from the gate structure and the CESL.
    Type: Application
    Filed: July 26, 2024
    Publication date: November 21, 2024
    Inventors: Shih-Che Lin, Po-Yu Huang, I-Wen Wu, Chen-Ming Lee, Chia-Hsien Yao, Chao-Hsun Wang, Fu-Kai Yang, Mei-Yun Wang
  • Publication number: 20240387626
    Abstract: A semiconductor device structure includes nanostructures formed over a substrate. The structure also includes a gate structure formed over and around the nanostructures. The structure also includes a spacer layer formed over a sidewall of the gate structure over the nanostructures. The structure also includes a source/drain epitaxial structure formed adjacent to the spacer layer. The structure also includes a contact structure formed over the source/drain epitaxial structure with an air spacer formed between the spacer layer and the contact structure.
    Type: Application
    Filed: July 26, 2024
    Publication date: November 21, 2024
    Inventors: Kai-Hsuan Lee, Shih-Che Lin, Po-Yu Huang, Shih-Chieh Wu, I-Wen Wu, Chen-Ming Lee, Fu-Kai Yang, Mei-Yun Wang
  • Publication number: 20240387773
    Abstract: A light emitting diode includes a substrate and a semiconductor light emitting stack layer. The semiconductor light emitting stack layer is disposed on the substrate, and the substrate has four sidewalls, an upper surface, and a lower surface. At least one sidewall is provided with a first laser dotting region and a second laser dotting region. The first laser dotting region includes first laser dots, and the second laser dotting region includes second laser dots. A stress crack is present between the first laser dotting region and the second laser dotting region. A first distance D1 is present between the first laser dotting region and the stress crack, a second distance D2 is present between the second laser dotting region and the stress crack, and 0.7D2<D1<1.3D2.
    Type: Application
    Filed: March 13, 2024
    Publication date: November 21, 2024
    Applicant: Quanzhou sanan semiconductor technology Co., Ltd.
    Inventors: Hanqing KE, Min HUANG, Yu-Tsai TENG, Yaowei CHUANG, Chia-Wen WU, Ruiqing LIANG, Xin HU, Linwei KE
  • Publication number: 20240387521
    Abstract: A semiconductor device includes a substrate including a well region of a first conductive type; a first gate electrode on the substrate; a second gate electrode on the substrate; a first doped region embedded within the well region and is of the first conductive type, a second doped region embedded within the well region and is of the first conductive type, and a third doped region embedded within the well region and is of the first conductive type; and a first interconnection structure electrically connecting the first gate electrode and the second gate electrode. The first doped region and the second doped region are on opposite sides of the first gate electrode.
    Type: Application
    Filed: July 30, 2024
    Publication date: November 21, 2024
    Inventors: Ho-Hsiang CHEN, Chi-Hsien LIN, Ying-Ta LU, Hsien-Yuan LIAO, Hsiu-Wen WU, Chiao-Han LEE, Tzu-Jin YEH
  • Publication number: 20240379536
    Abstract: Provided is a package structure including a die; an electrically connecting structure having a die attach region and a peripheral region surrounding the die attach region, wherein the die is disposed on the electrically connecting structure within the die attach region; an insulating protrusion disposed in the peripheral region and extending in a thickness direction of the die; a conductive structure disposed on the electrically connecting structure and encapsulating the insulating protrusion, wherein the conductive structure is electrically coupled to the electrically connecting structure and the die; and a dielectric structure disposed on the electrically connecting structure and encapsulating the die and the conductive structure.
    Type: Application
    Filed: July 22, 2024
    Publication date: November 14, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yi-Wen Wu, Hung-Jui Kuo, Ming-Che Ho
  • Publication number: 20240379762
    Abstract: A method of semiconductor fabrication includes providing a semiconductor structure having a substrate and first, second, third, and fourth fins above the substrate. The method further includes forming an n-type epitaxial source/drain (S/D) feature on the first and second fins, forming a p-type epitaxial S/D feature on the third and fourth fins, and performing a selective etch process on the semiconductor structure to remove upper portions of the n-type epitaxial S/D feature and the p-type epitaxial S/D feature such that more is removed from the n-type epitaxial S/D feature than the p-type epitaxial S/D feature.
    Type: Application
    Filed: July 22, 2024
    Publication date: November 14, 2024
    Inventors: I-Wen Wu, Chen-Ming Lee, Fu-Kai Yang, Mei-Yun Wang, Chun-An Lin, Wei-Yuan Lu, Guan-Ren Wang, Peng Wang
  • Publication number: 20240379605
    Abstract: A semiconductor device includes a substrate; an interconnect structure over the substrate; a first passivation layer over the interconnect structure; a first conductive pad, a second conductive pad, and a conductive line disposed over the first passivation layer and electrically coupled to conductive features of the interconnect structure; a conformal second passivation layer over and extending along upper surfaces and sidewalls of the first conductive pad, the second conductive pad, and the conductive line; a first conductive bump and a second conductive bump over the first conductive pad and the second conductive pad, respectively, where the first conductive bump and the second conductive bump extend through the conformal second passivation layer and are electrically coupled to the first conductive pad and the second conductive pad, respectively; and a dummy bump over the conductive line, where the dummy bump is separated from the conductive line by the conformal second passivation layer.
    Type: Application
    Filed: July 25, 2024
    Publication date: November 14, 2024
    Inventors: Ting-Li Yang, Po-Hao Tsai, Yi-Wen Wu, Sheng-Pin Yang, Hao-Chun Liu
  • Patent number: 12144138
    Abstract: Systems for unlocking and locking a riser cage to a computing device are described herein. Such systems may include: a riser cage in a computing device; an axis member coupled to a first side of the riser cage and adapted to rotate about an axis; a handle coupled to the axis member and adapted to rotate the axis member about the axis; a cam, coupled to the axis member, and adapted to rotate about the axis when the axis member rotates; and a lever coupled to a second side of the riser cage and adapted to rotate about a pivot point when the cam rotates, wherein the lever engages with a stabilizing feature when the handle is in a first handle position.
    Type: Grant
    Filed: October 21, 2021
    Date of Patent: November 12, 2024
    Assignee: Dell Products, L.P.
    Inventors: Hsiang-Yin Hung, Chien-Hung Chou, Hsu-Chu Wang, Hung-Wen Wu
  • Publication number: 20240371955
    Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a source/drain region formed in a semiconductor substrate, a source/drain contact structure formed over the source/drain region, and a silicide region formed between the source/drain region and the source/drain contact structure. The semiconductor device structure also includes a first insulating spacer surrounding and in direct contact with the source/drain contact structure and a second insulating spacer and a third insulating spacer respectively formed on two opposite sidewalls of the source/drain contact structure and in direct contact with an outer edge of the first insulating spacer. A first sidewall of the second insulating spacer and a second sidewall of the third insulating spacer are respectively aligned to two opposite side edges of the source/drain region.
    Type: Application
    Filed: July 15, 2024
    Publication date: November 7, 2024
    Inventors: Kai-Hsuan LEE, Shih-Che LIN, Po-Yu HUANG, Shih-Chieh WU, I-Wen WU, Chen-Ming LEE, Fu-Kai YANG, Mei-Yun WANG
  • Publication number: 20240372303
    Abstract: A pogo pin module and a control method of pogo pin temperature is provided. The pogo pin module includes a pogo pin assembly with a pogo pin, a sense control device, and a heating device. The sense control device is connected to the pogo pin and senses a pogo pin temperature. The heating device is connected to the sense control device. When the pogo pin temperature is less than a first temperature, the sense control device controls the heating device to heat the pogo pin such that the pogo pin temperature is greater than the first temperature to melt or evaporate a medium attached to the pogo pin. The pogo pin module and the control method of pogo pin temperature solves a problem that the conductivity of the pogo pin is worsened because the medium with the worse conductivity can be attached to the pogo pin.
    Type: Application
    Filed: September 25, 2023
    Publication date: November 7, 2024
    Inventors: Sheng-Wen WU, Chin-Kun TSAI, Conglong MA, Shengbing XING
  • Patent number: RE50213
    Abstract: A synchronous backlight device and an operation method thereof are provided. The synchronous backlight device includes a pulse width modulation (PWM) control circuit and a backlight driving circuit. The PWM control circuit receives the video sync information from a video processing circuit and generates a PWM control signal. Wherein, the video sync information defines a plurality of video frame periods, the PWM control circuit at least divides each of the video frame periods into a first period and a second period, the lengths of the first periods of the video frame periods are equal to one another. The frequency of the PWM control signal in the first periods is different from the frequency of the PWM control signal in the second periods. The backlight driving circuit drives the backlight source of a display panel in accordance with the PWM control signal.
    Type: Grant
    Filed: June 7, 2022
    Date of Patent: November 19, 2024
    Assignee: Novatek Microelectronics Corp.
    Inventors: Chung-Wen Wu, Wen-Chi Lin, Sih-Ting Wang
  • Patent number: D1053797
    Type: Grant
    Filed: September 23, 2020
    Date of Patent: December 10, 2024
    Assignee: SCHNEIDER ELECTRIC IT CORPORATION
    Inventors: Sarah Jane Hannon, Justin Solis, Tannan Whidden Winter, Kevin Dunne, Sung Wen Wu, Cormac Ó Conaire, Hui Chung Chen, Shen-Yuan Chien, Hsin-Hsiao Lin, Ding Feng, Ming-Chieh Chang
  • Patent number: D1054384
    Type: Grant
    Filed: October 27, 2022
    Date of Patent: December 17, 2024
    Assignee: TELEBOX INDUSTRIES CORP.
    Inventors: Fu-Wen Wu, Ching-Yi Hsu, Hung Yu Wu