Patents by Inventor Wen Xiao

Wen Xiao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11365475
    Abstract: Methods of cleaning a PVD chamber component, for example, process kit components are disclosed. The method comprises at least one of directing a jet of pressurized fluid at a surface of the PVD chamber component, directing pressurized carbon dioxide at the surface of the PVD chamber component, placing the PVD chamber component in a liquid and producing ultrasonic waves in the liquid to further remove contaminants from the surface of the PVD chamber component, using a plasma to clean the surface of the PVD chamber component, subjecting the PVD chamber component to a thermal cycle by heating up to a peak temperature of at least 50° C.
    Type: Grant
    Filed: July 30, 2020
    Date of Patent: June 21, 2022
    Assignee: Applied Materials Inc.
    Inventors: Vibhu Jindal, Shiyu Liu, Sanjay Bhat, Shuwei Liu, Wen Xiao
  • Patent number: 11366059
    Abstract: Apparatus, methods and are disclosed for measuring refractive index of a material film. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of wavelengths and thickness values for the material film to determine the refractive index of the material film.
    Type: Grant
    Filed: June 5, 2020
    Date of Patent: June 21, 2022
    Assignee: Applied Materials Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Huajun Liu, Herng Yau Yoong
  • Patent number: 11366379
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer embedded in the multilayer stack of reflective layers.
    Type: Grant
    Filed: May 19, 2020
    Date of Patent: June 21, 2022
    Assignee: Applied Materials Inc.
    Inventors: Wen Xiao, Vibhu Jindal
  • Publication number: 20220187697
    Abstract: Apparatus and methods to improve centroid wavelength uniformity of EUV mask blanks are disclosed. The apparatus and methods may utilize one or more of heating the backside and/or the front side of the EUV mask blank. Selected regions and sub regions of the EUV mask blank are selectively heated, resulting in improved centroid wavelength uniformity of EUV mask blanks.
    Type: Application
    Filed: December 15, 2020
    Publication date: June 16, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Herng Yau Yoong, Wen Xiao, Ribhu Gautam, Sanjay Bhat, Vibhu Jindal
  • Publication number: 20220187698
    Abstract: Apparatus and methods for improving flatness of extreme ultraviolet (EUV) mask blanks are disclosed. The apparatus and methods may utilize one or more of heating the backside and/or the front side of the EUV mask blank and a cooling system. Interfacial layers of the EUV mask blank are selectively heated, resulting in improved flatness of the EUV mask blanks.
    Type: Application
    Filed: December 14, 2020
    Publication date: June 16, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Vibhu Jindal, Sanjay Bhat, Wen Xiao, Vinodh Ramachandran
  • Publication number: 20220189749
    Abstract: An ex situ physical vapor deposition (PVD) process kit conditioning apparatus configured to condition process kit components of a PVD substrate processing chamber, the ex situ PVD process kit conditioning apparatus comprising a chamber assembly, a central cathode assembly configured to mount one or more targets. The apparatus is configured to receive one or more components of a process kit of a PVD substrate processing chamber and the central cathode assembly is positioned and configured so that the apparatus deposits the defect reduction coating substantially uniformly on an inner surface of a process kit component of the PVD substrate processing chamber.
    Type: Application
    Filed: December 14, 2020
    Publication date: June 16, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Ribhu Gautam, Vibhu Jindal, Kamatchi Gobinath Manoharan, Sanjay Bhat, Praveen Kumar Choragudi, Wen Xiao, Vinodh Ramachandran
  • Patent number: 11352680
    Abstract: An apparatus and a method for rapidly heating cold-rolled strip steel (10). The apparatus for rapidly heating cold-rolled strip steel (10) comprises a heating zone, a soaking zone, and a cooling zone, and the heating zone is sequentially divided into a first heating section (1), a second heating section (2), a third heating section (3), and a fourth heating section (4) along a moving direction of the strip steel (10) to be heated, the first heating section (1) and the fourth heating section (4) being radiant heating sections, and the second heating section (2) and the third heating section (3) being inductive heating sections. The method for rapidly heating cold-rolled strip steel (10) uses the apparatus for rapidly heating cold-rolled strip steel (10) to heat the strip steel (10).
    Type: Grant
    Filed: May 16, 2018
    Date of Patent: June 7, 2022
    Assignee: BAOSHAN IRON & STEEL CO., LTD.
    Inventors: Huabing Zhang, Guobao Li, Baojun Liu, Dan Han, Xinqiang Zhang, Guanghua Cui, Jianbing Chen, Wen Xiao, Zipeng Zhao
  • Publication number: 20220170866
    Abstract: Apparatus and methods for measuring surface topography are described. The analysis apparatus and methods detect light reflected from the reflective backside of a cantilever assembly including a tip, calculate a background level (BGL) value obtained from an optical scan of a reference sample using a power spectral density (PSD) value obtained from a topographical scan of a reference sample to generate a correlational coefficient between the BGL and the PSD values. The correlational coefficient between the BGL and PSD values is used to measure the BGL value of additional EUV mask blanks by a topographical scan of the EUV mask blanks using the same tip mounted to the cantilever.
    Type: Application
    Filed: November 30, 2020
    Publication date: June 2, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Weimin Li, Wen Xiao, Vibhu Jindal, Sanjay Bhat
  • Publication number: 20220148293
    Abstract: An image feature visualization method and apparatus, and an electronic device during model training, inputs the real training data with positive samples into a mapping generator to obtain fictitious training data with negative samples. The mapping generator includes a mapping module configured to learn a key feature map that distinguishes the real training data with positive samples/negative samples, and the fictitious training data with negative samples is generated based on the real training data with positive samples and the key feature map. The training data with negative samples is input into a discriminator to obtain a discrimination result. An optimizer optimizes the mapping generator and the discriminator until training is completed. During model application, a target image that is to be processed is input into the mapping generator, and the mapper in the mapping generator extracts features of the target image.
    Type: Application
    Filed: March 11, 2020
    Publication date: May 12, 2022
    Inventors: Shuqiang WANG, Wen YU, Chenchen XIAO, Shengye HU, Yanyan SHEN
  • Patent number: 11327394
    Abstract: A multilayer stack in the form of a Bragg reflector comprising a graded interfacial layer and a method of manufacturing are disclosed. The graded interfacial layer eliminates the formation of low-reflectivity interfaces in a multilayer stack and reduces roughness of interfaces in a multilayer stack.
    Type: Grant
    Filed: April 16, 2020
    Date of Patent: May 10, 2022
    Assignee: Applied Materials Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Weimin Li, Shuwei Liu
  • Publication number: 20220107558
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets. A process for improving reflectivity from a multilayer stack is also disclosed.
    Type: Application
    Filed: December 16, 2021
    Publication date: April 7, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Vibhu Jindal, Wen Xiao, Sanjay Bhat
  • Patent number: 11237473
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets. A process for improving reflectivity from a multilayer stack is also disclosed.
    Type: Grant
    Filed: February 26, 2020
    Date of Patent: February 1, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Vibhu Jindal, Wen Xiao, Sanjay Bhat
  • Publication number: 20210382398
    Abstract: Apparatus, methods and are disclosed for measuring refractive index of an absorber material used in EUV phase shift masks. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of EUV wavelengths and thickness values for the absorber material to determine the refractive index of the absorber material.
    Type: Application
    Filed: June 5, 2020
    Publication date: December 9, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Huajun Liu, Herng Yau Yoong
  • Publication number: 20210381967
    Abstract: Apparatus, methods and are disclosed for measuring refractive index of a material film. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of wavelengths and thickness values for the material film to determine the refractive index of the material film.
    Type: Application
    Filed: June 5, 2020
    Publication date: December 9, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Huajun Liu, Herng Yau Yoong
  • Patent number: 11194244
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from amorphous tantalum nitride formed by non-reactive sputtering.
    Type: Grant
    Filed: December 19, 2019
    Date of Patent: December 7, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Shuwei Liu, Chang Ke, Wen Xiao, Vibhu Jindal
  • Publication number: 20210341999
    Abstract: A head mounted display, including at least one display, an image capture device, a light beam generator, and an optical compensation element, is provided. The display has an open area and generates at least one image light beam. The image capture device is disposed by overlapping with the display corresponding to the open area. The image capture device is configured to capture a target area image through the open area. The light beam generator is configured to project at least one light beam to a target area. The target area reflects the light beam to generate at least one reflection light beam. The optical compensation element is configured to convert a transmission direction of the image light beam and enable the reflection light beam to be directly transmitted to the image capture device.
    Type: Application
    Filed: November 24, 2020
    Publication date: November 4, 2021
    Applicant: HTC Corporation
    Inventors: Bo-Wen Xiao, Fu-Cheng Fan
  • Publication number: 20210333703
    Abstract: Extreme ultraviolet (EUV) mask blanks and methods for their manufacture, and production systems therefor are disclosed. The method for forming an EUV mask blank comprises smoothing out surface defects on a surface of a substrate.
    Type: Application
    Filed: April 20, 2021
    Publication date: October 28, 2021
    Applicant: Applied Materials, Inc
    Inventors: Wen Xiao, Vibhu Jindal, Weimin Li, Sanjay Bhat, Azeddine Zerrade
  • Publication number: 20210302726
    Abstract: A head mounted display includes a tube, a first light beam generator, a second light beam generator, an image capturer and a controller. The first light beam generator is disposed outside the tube and projects a plurality of first light beams to a first range of a target area. The second light beam generator is disposed inside the tube and projects a second light beam to a second range of the target area. The image capturer captures an image on the target area to generate image information. The controller receives the image information and performs an eye-tracking operation according to the image information. The second range is a center range of the target area, and the first range is a surrounding range of the target area.
    Type: Application
    Filed: March 31, 2020
    Publication date: September 30, 2021
    Applicant: HTC Corporation
    Inventors: Bao-Jen Shih, Bo-Wen Xiao, Fu-Cheng Fan
  • Publication number: 20210246677
    Abstract: A pool cleaner including a housing, a driving assembly, a brush assembly, and a removable debris container. The removable debris container is coupled to the housing through a locking member in the brush assembly.
    Type: Application
    Filed: June 11, 2019
    Publication date: August 12, 2021
    Inventors: Zhi Xiong Huang, Wen Xiao Zhang, Yaw Yuan Hsu
  • Patent number: D939795
    Type: Grant
    Filed: April 28, 2020
    Date of Patent: December 28, 2021
    Assignee: Intex Marketing Ltd.
    Inventors: Zhi Xiong Huang, Wen Xiao Zhang, James Sener, Andrew Reed