Patents by Inventor Wen Xiao

Wen Xiao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210124252
    Abstract: Methods for the manufacture of extreme ultraviolet (EUV) mask blanks and production systems therefor are disclosed. A method for forming an EUV mask blank comprises forming a bilayer on a portion of a multi-cathode PVD chamber interior and then forming a multilayer stack of Si/Mo on a substrate in the multi-cathode PVD chamber.
    Type: Application
    Filed: October 22, 2020
    Publication date: April 29, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Sanjay Bhat, Shiyu Liu, Binni Varghese, Vibhu Jindal, Azeddine Zerrade
  • Publication number: 20210124253
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture, and production systems therefor are disclosed. A method for forming an EUV mask blank comprises placing a substrate in a multi-cathode physical vapor deposition chamber, depositing a multilayer stack, removing the substrate from the chamber and passivating the PVD chamber.
    Type: Application
    Filed: October 22, 2020
    Publication date: April 29, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Herng Yau Yoong, Wen Xiao, Vibhu Jindal, Shuwei Liu, Sanjay Bhat, Azeddine Zerrade
  • Publication number: 20210118896
    Abstract: Methods and structures of a three-dimensional memory device are disclosed. In an example, the memory device includes a substrate having one or more first recesses in a first region and one or more second recesses in a second region. A liner layer is disposed over the sidewalls and bottom of the one or more first recesses in the first region and an epitaxially-grown material is formed in the one or more second recesses in the second region. One or more NAND strings are formed over the epitaxially-grown material disposed in the one or more second recesses, and one or more vertical structures are formed over the one or more first recesses in the first region.
    Type: Application
    Filed: December 8, 2020
    Publication date: April 22, 2021
    Applicant: Yangtze Memory Technologies Co., Ltd.
    Inventors: Yue Qiang PU, Jin Wen Dong, Jun Chen, Zhenyu Lu, Qian Tao, Yushi Hu, Zhao Hui Tang, Li Hong Xiao, Yu Ting Zhou, Sizhe Li, Zhaosong Li
  • Patent number: 10969865
    Abstract: The disclosure provides a method for transmission of eye tracking information, a head mounted display and a computer device. The method includes: receiving visual content; receiving object information associated with each content object; displaying the visual content, and performing an eye tracking operation on a wearer of the head mounted display; determining, according to the object information of each content object, whether a gaze location corresponds to one of the content objects; and in response to determining that the gaze location corresponds to a first content object of the content objects, transmitting a first indicator associated with the first content object.
    Type: Grant
    Filed: November 14, 2019
    Date of Patent: April 6, 2021
    Assignee: HTC Corporation
    Inventors: Bo-Wen Xiao, Fu-Cheng Fan
  • Patent number: 10935793
    Abstract: A head mounted display comprises a light sensor, a first light source, a second light source, a transflective mirror, a lens, a display and a filter. The first light source is used for generating a first light beam. The second light source is used for generating a second light beam. The transflective mirror is provided on the light paths of the first light beam and the second light beam. The first light source is provided at the periphery of the lens or the light sensor. The first light beam is reflected by a first object, and enters the light sensor via the lens and the transflective mirror in sequence. The second light source is provided at the periphery of the filter. After leaving the second light source, the second light beam is reflected by a second object outside the head mounted display first, and then enters the light sensor via the filter and the transflective mirror in sequence. A using method of the head mounted display is also provided.
    Type: Grant
    Filed: July 29, 2019
    Date of Patent: March 2, 2021
    Assignee: HTC Corporation
    Inventors: Bo-Wen Xiao, Fu-Cheng Fan
  • Publication number: 20210047706
    Abstract: Disclosed is a manufacturing method for a high silicon grain oriented electrical steel sheet, the silicon content of the high silicon grain oriented electrical steel is greater than 4 wt %, comprising the steps of: (1) performing decarburization annealing of a cold-rolled steel plate; (2) allowing high silicon alloy particles in a completely solid state to collide at a high speed with the surface of the decarburization annealed steel plate to be sprayed, thus forming a high silicon alloy coating on the surface of the steel plate to be sprayed; (3) coating a release agent and drying; and (4) annealing. The manufacturing method for the high silicon grain oriented electrical steel sheet of the present invention is inexpensive, and, the high silicon grain oriented electrical steel sheet produced is of stable quality and is provided with great magnetic performance.
    Type: Application
    Filed: March 25, 2019
    Publication date: February 18, 2021
    Applicant: BAOSHAN IRON & STEEL CO., LTD.
    Inventors: Huabing ZHANG, Shuangjie CHU, Guobao LI, Wen XIAO, Baojun LIU, Yongjie YANG, Kanyi SHEN, Dan HAN, Zhining HU
  • Publication number: 20210041781
    Abstract: An extreme ultraviolet reflective element comprising a multilayer stack of absorber layers on a multilayer stack of reflective layers. The element comprises spacing layer and phase tuning layer. Methods of manufacturing extreme ultraviolet reflective elements and lithography systems including extreme ultraviolet reflective elements are also described.
    Type: Application
    Filed: July 31, 2020
    Publication date: February 11, 2021
    Inventors: Wen Xiao, Vibhu Jindal
  • Publication number: 20210032742
    Abstract: Methods of cleaning a PVD chamber component, for example, process kit components are disclosed. The method comprises at least one of directing a jet of pressurized fluid at a surface of the PVD chamber component, directing pressurized carbon dioxide at the surface of the PVD chamber component, placing the PVD chamber component in a liquid and producing ultrasonic waves in the liquid to further remove contaminants from the surface of the PVD chamber component, using a plasma to clean the surface of the PVD chamber component, subjecting the PVD chamber component to a thermal cycle by heating up to a peak temperature of at least 50° C.
    Type: Application
    Filed: July 30, 2020
    Publication date: February 4, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Vibhu Jindal, Shiyu Liu, Sanjay Bhat, Shuwei Liu, Wen Xiao
  • Publication number: 20210013407
    Abstract: Various embodiments may provide a memory cell. The memory cell may include an active electrode including an active electrode material. The memory cell may also include a first noble electrode contact with the active electrode, the first noble electrode being a patterned electrode including a noble electrode material. The memory cell may further include a resistive switching layer in contact with the active electrode and the first noble electrode. The memory cell may additionally include a second noble electrode including a noble electrode material, the second noble electrode in contact with the resistive switching layer.
    Type: Application
    Filed: March 8, 2019
    Publication date: January 14, 2021
    Inventors: Wen Xiao, Wendong Song, Jun Ding, Ernult Franck Gerard
  • Publication number: 20200371431
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer embedded in the multilayer stack of reflective layers.
    Type: Application
    Filed: May 19, 2020
    Publication date: November 26, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal
  • Publication number: 20200332412
    Abstract: A physical vapor deposition chamber comprising a rotating substrate support having a rotational axis, a first cathode having a radial center positioned off-center from a rotational axis of the substrate support is disclosed. A process controller comprising one or more process configurations selected from one or more of a first configuration to determine a rotation speed (v) for a substrate support to complete a whole number of rotations (n) around the rotational axis of the substrate support in a process window time (t) to form a layer of a first material on a substrate, or a second configuration to rotate the substrate support at the rotation speed (v).
    Type: Application
    Filed: April 16, 2020
    Publication date: October 22, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Sanjay Bhat
  • Publication number: 20200335331
    Abstract: A physical vapor deposition chamber comprising a tilting substrate support is described. Methods of processing a substrate are also provided comprising tilting at least one of the substrate and the target to improve the uniformity of the layer on the substrate from the center of the substrate to the edge of the substrate. Process controllers are also described which comprise one or more process configurations causing the physical deposition chamber to perform the operations of rotating a substrate support within the physical deposition chamber and tilting the substrate support at a plurality of angles with respect to a horizontal axis.
    Type: Application
    Filed: April 16, 2020
    Publication date: October 22, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Sanjay Bhat
  • Publication number: 20200333700
    Abstract: A multilayer stack in the form of a Bragg reflector comprising a graded interfacial layer and a method of manufacturing are disclosed. The graded interfacial layer eliminates the formation of low-reflectivity interfaces in a multilayer stack and reduces roughness of interfaces in a multilayer stack.
    Type: Application
    Filed: April 16, 2020
    Publication date: October 22, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Weimin Li, Shuwei Liu
  • Publication number: 20200299986
    Abstract: A pool cleaner is disclosed having enhanced travel features, such as enhanced traction, enhanced propulsion, enhanced steering, enhanced directional control, and/or enhanced power assistance when traveling across a pool.
    Type: Application
    Filed: September 19, 2018
    Publication date: September 24, 2020
    Inventors: Zhi Xiong Huang, Wen Xiao Zhang, Yaw Yuan Hsu
  • Publication number: 20200291501
    Abstract: An apparatus and a method for rapidly heating cold-rolled strip steel (10). The apparatus for rapidly heating cold-rolled strip steel (10) comprises a heating zone, a soaking zone, and a cooling zone, and the heating zone is sequentially divided into a first heating section (1), a second heating section (2), a third heating section (3), and a fourth heating section (4) along a moving direction of the strip steel (10) to be heated, the first heating section (1) and the fourth heating section (4) being radiant heating sections, and the second heating section (2) and the third heating section (3) being inductive heating sections. The method for rapidly heating cold-rolled strip steel (10) uses the apparatus for rapidly heating cold-rolled strip steel (10) to heat the strip steel (10).
    Type: Application
    Filed: May 16, 2018
    Publication date: September 17, 2020
    Applicant: BAOSHAN IRON & STEEL CO., LTD.
    Inventors: Huabing ZHANG, Guobao LI, Baojun LIU, Dan HAN, Xinqiang ZHANG, Guanghua CUI, Jianbing CHEN, Wen XIAO, Zipeng ZHAO
  • Patent number: 10771773
    Abstract: A head-mounted display device including a display system and a light modulator is provided. The display system is configured to selectively display a first content to be visually recognized as being superimposed on a scenery of a surrounding environment, or not display the first content. The light modulator, positioned between the display system and the surrounding environment, includes an array of pixels, wherein a portion of the pixels is configured to modulate light to present a display of a second content, while the rest of the pixels are configured to be substantially transparent to light.
    Type: Grant
    Filed: May 11, 2017
    Date of Patent: September 8, 2020
    Assignee: HTC Corporation
    Inventors: Bo-Wen Xiao, Fu-Cheng Fan, Chun-Ta Lin, Wei-Jen Chang
  • Publication number: 20200278603
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and EUV lithography systems are disclosed. The EUV mask blanks comprise an absorber including a tuning layer and a stack of absorber layers of a first material A and a second material B.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal
  • Publication number: 20200277697
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Sanjay Bhat, Vibhu Jindal, Wen Xiao
  • Publication number: 20200277698
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets. A process for improving reflectivity from a multilayer stack is also disclosed.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Vibhu Jindal, Wen Xiao, Sanjay Bhat
  • Publication number: 20200277696
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Sanjay Bhat