Abstract: An image feature visualization method and apparatus, and an electronic device during model training, inputs the real training data with positive samples into a mapping generator to obtain fictitious training data with negative samples. The mapping generator includes a mapping module configured to learn a key feature map that distinguishes the real training data with positive samples/negative samples, and the fictitious training data with negative samples is generated based on the real training data with positive samples and the key feature map. The training data with negative samples is input into a discriminator to obtain a discrimination result. An optimizer optimizes the mapping generator and the discriminator until training is completed. During model application, a target image that is to be processed is input into the mapping generator, and the mapper in the mapping generator extracts features of the target image.

Abstract: The present invention discloses a spirooxazine photochromic exterior wall coating, comprising the following components by mass percent: 0.6%-1.5% of spirooxazine photochromic compound, 40%-45% of resin, 0.3%-1% of dispersant, 0.2%-0.3% of antifoamer, 1%-3% of additive, 22%-24% of pigment and 30%-32% of solvent. The additive comprises 0.9 wt %-2 wt % of NaCl or KCl solution. The present invention further provides a preparation method for the spirooxazine photochromic exterior wall coating, comprising measuring, grinding, dispersing, mixing, adjusting pH and filtering. Experiments prove that the spirooxazine photochromic exterior wall coating provided by the present invention has good light fatigue resistance effect and can meet the needs of long-term use of building exterior walls.

Abstract: Provided is a graph data processing method, including: acquiring a degree of association of each node in a network graph; splitting the network graph to obtain a dense subgraph according to the degree of association of each node; determining stable nodes in the network graph and coreness of the stable nodes based on the dense subgraph, the coreness of the stable nodes being greater than a preset threshold; obtaining a sparse subgraph in the network graph according to the preset threshold, and remaining nodes in the network graph other than the stable nodes and connecting edges between the remaining nodes; and determining the coreness of each node in the sparse subgraph based on the sparse subgraph and the stable nodes.

Abstract: A transcriptional regulator specifically responding to D-2-hydroxyglutarate (D-2-HG) and its application in the biological detection of D-2-HG. Wherein the transcriptional regulator is named DhdR and the nucleotide sequence is shown as SEQ ID NO: 1. The D-2-HG biosensors BD2HG-0 and BD2HG-1 are constructed using the transcriptional regulator DhdR and can detect biological samples containing D-2-HG.

Abstract: Extreme ultraviolet (EUV) mask blanks, production systems therefor, and methods of increasing multilayer film reflectance are disclosed. The EUV mask blanks comprise a bilayer film on a substrate. The bilayer film comprises a first film layer including silicon (Si), and a second film layer comprising an element selected from the group consisting of ruthenium (Ru), nickel (Ni), cobalt (Co), tungsten (W), iron (Fe), titanium (Ti) and silicides thereof. Some EUV mask blanks further comprise a multilayer reflective stack comprising alternating layers on the bilayer film and a capping layer on the multilayer reflective stack. Some EUV mask blanks include a smoothing layer selected from the group consisting of molybdenum silicide (MoSi), boron carbide (B4C) and silicon nitride (SiN) on the multilayer reflective stack, a capping layer on the smoothing layer, and an absorber layer on the capping layer.

Abstract: The present disclosure provides a log information obtaining system and method. The log information obtaining system includes a baseboard management controller (BMC), a storage device, a first interface, a controller and a first selector. The storage device stores log information of the electronic device. The controller obtains a first signal of the BMC and determines the working state of the BMC, the controller outputs a first selection signal when the working state of the BMC is abnormal. The first selector selects the first output terminal to output the log information received from the first input terminal to the external device. Even if the BMC cannot work normally, it can still obtain the log information of the electronic device and debug the electronic device.

Abstract: A data center security control module able to connect with motherboards of different platforms such as Intel platform, AMD platform, and Ampere platform includes a baseboard management controller (BMC), a chip selection module, and a control module. The BMC outputs an alarm signal. The chip selection module includes N chip selection units, the chip selection unit outputting alarm signal to an external motherboard which is connected to the data center security control module. The control module obtains information as to motherboard type being Intel platform, or AMD platform, or Ampere platform and outputs a control signal to the chip selection module according to the motherboard type to start the chip selection unit associated with such motherboard type. The application also provides a data center security control module control method.

Abstract: Extreme ultraviolet (EUV) mask blanks and methods for their manufacture, and production systems therefor are disclosed. The method for forming an EUV mask blank comprises smoothing out surface defects on a surface of a substrate.

Abstract: A pool cleaner equipped with a joint and a water inlet hose is disclosed. In a rotatable or use configuration, the water inlet hose is freely rotatable relative to a housing to avoid entanglement. In a locked or non-use configuration, either the joint or the water inlet hose is fixed relative to the housing to facilitate installation and/or removal of the water inlet hose via rotation between the joint and the water inlet hose.

Abstract: Extreme ultraviolet (EUV) mask blanks, methods of forming EUV mask blanks and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer reflective stack on a substrate. The multilayer reflective stack comprises a trilayer film including a first film, a second film, and a third film. Some EUV mask blanks include an interface layer on one or more of the first film, the second film and the third film. EUV mask blanks described herein have low Zeff and high reflectance over large bandwidth of reflection angle, thereby minimizing the M3D effect, especially for high-NA EUV scanners.

Abstract: A pool cleaner equipped with a rotating brush assembly is disclosed. The brush assembly is removably coupled to the pool cleaner using clamps that are readily accessible, supported by the pool cleaner, and operable by hand. The clamps may be manipulated between a ready configuration, a loaded configuration to receive a brush assembly, and a locked configuration to secure the brush assembly.

Abstract: A board mis-insertion prevention circuit includes a first detection circuit, a second detection circuit, and a control module. The first detection circuit detects whether a board is in a first state and outputs a first detection signal when the board is in the first state. The second detection circuit detects whether the board is in a second state when the board is not in the first state, and outputs a second detection signal when the board is in the second state. The control module receives the first detection signal or the second detection signal and can allow or disconnect a power supply to the board according to the first detection signal or the second detection signal.

Abstract: Extreme ultraviolet (EUV) mask blanks, production systems therefor, and methods of reducing roughness are disclosed. The EUV mask blanks comprise a multilayer reflective stack on a substrate comprising a plurality of pairs of alternating layers comprising a first layer and a second layer, the first layer including a first element selected from the group consisting of Si, B, Al, Mg, Zr, Ba, Nb, Ti, Gd, Y, and Ca; and the second layer including a second element selected from the group consisting of Ru, Mo, Ta, Sb, Tc, Nb, Ir, Pt, and Pd. Some EUV mask blanks described herein include interface layer between the first layer and the second layer, the interface layer including an interface element selected from the group consisting of Si, B, C, Al, Mo, and Ru.

Abstract: A composite cleat includes a first component and a second component. The first component is made of a first material and is formed a first connecting portion extended along a longitudinal axis and a ground contact surface disposed at one end thereof. The second component is made of a second material different from the first material and is formed a second connecting portion fixedly connected with the first connecting portion and a threaded stud disposed at one end thereof.

Abstract: A multilayer stack in the form of a Bragg reflector comprising a graded interfacial layer and a method of manufacturing are disclosed. The graded interfacial layer eliminates the formation of low-reflectivity interfaces in a multilayer stack and reduces roughness of interfaces in a multilayer stack.

Abstract: A manufacturing method of a halogen-free flame-retardant thermoplastic braided fiber reinforced polymer composite board, comprising steps of: preparing a recycled material containing a halogen-free flame-retardant thermoplastic braided fiber reinforced polymer composite; adding a polymer base material to the recycled material to form a core layer material and extruding the core layer material with a low shear extruder; hot pressing the core layer material by rollers to obtain a recycled fiber core layer; preparing a reinforcement layer containing a fiber material or a fabric with pores; and stacking and hot pressing the recycled fiber core layer and the reinforcement layer.

Abstract: Methods for the manufacture of extreme ultraviolet (EUV) mask blanks and production systems therefor are disclosed. A method for forming an EUV mask blank comprises forming a bilayer on a portion of a multi-cathode PVD chamber interior and then forming a multilayer stack of Si/Mo on a substrate in the multi-cathode PVD chamber.

Abstract: Various embodiments may provide a memory cell. The memory cell may include an active electrode including an active electrode material. The memory cell may also include a first noble electrode contact with the active electrode, the first noble electrode being a patterned electrode including a noble electrode material. The memory cell may further include a resistive switching layer in contact with the active electrode and the first noble electrode. The memory cell may additionally include a second noble electrode including a noble electrode material, the second noble electrode in contact with the resistive switching layer.

Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets.

Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from tantalum and ruthenium.