Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from amorphous tantalum nitride formed by non-reactive sputtering.

Abstract: A head mounted display, including at least one display, an image capture device, a light beam generator, and an optical compensation element, is provided. The display has an open area and generates at least one image light beam. The image capture device is disposed by overlapping with the display corresponding to the open area. The image capture device is configured to capture a target area image through the open area. The light beam generator is configured to project at least one light beam to a target area. The target area reflects the light beam to generate at least one reflection light beam. The optical compensation element is configured to convert a transmission direction of the image light beam and enable the reflection light beam to be directly transmitted to the image capture device.

Abstract: Extreme ultraviolet (EUV) mask blanks and methods for their manufacture, and production systems therefor are disclosed. The method for forming an EUV mask blank comprises smoothing out surface defects on a surface of a substrate.

Abstract: A head mounted display includes a tube, a first light beam generator, a second light beam generator, an image capturer and a controller. The first light beam generator is disposed outside the tube and projects a plurality of first light beams to a first range of a target area. The second light beam generator is disposed inside the tube and projects a second light beam to a second range of the target area. The image capturer captures an image on the target area to generate image information. The controller receives the image information and performs an eye-tracking operation according to the image information. The second range is a center range of the target area, and the first range is a surrounding range of the target area.

Abstract: A pool cleaner including a housing, a driving assembly, a brush assembly, and a removable debris container. The removable debris container is coupled to the housing through a locking member in the brush assembly.

Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; an absorber layer on the capping layer, the absorber layer comprising an antimony-containing material; and a hard mask layer on the absorber layer, the hard mask layer comprising a hard mask material selected from the group consisting of CrO, CrON, TaNi, TaRu and TaCu.

Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from tantalum and ruthenium.

Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; an absorber layer on the capping layer, the absorber layer comprising a tantalum-containing material; and a hard mask layer on the absorber layer, the hard mask layer comprising a hard mask material selected from the group consisting of CrO, CrON, TaNi, TaRu and TaCu.

Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture, and production systems therefor are disclosed. A method for forming an EUV mask blank comprises placing a substrate in a multi-cathode physical vapor deposition chamber, depositing a multilayer stack, removing the substrate from the chamber and passivating the PVD chamber.

Abstract: Methods for the manufacture of extreme ultraviolet (EUV) mask blanks and production systems therefor are disclosed. A method for forming an EUV mask blank comprises forming a bilayer on a portion of a multi-cathode PVD chamber interior and then forming a multilayer stack of Si/Mo on a substrate in the multi-cathode PVD chamber.

Abstract: The disclosure provides a method for transmission of eye tracking information, a head mounted display and a computer device. The method includes: receiving visual content; receiving object information associated with each content object; displaying the visual content, and performing an eye tracking operation on a wearer of the head mounted display; determining, according to the object information of each content object, whether a gaze location corresponds to one of the content objects; and in response to determining that the gaze location corresponds to a first content object of the content objects, transmitting a first indicator associated with the first content object.

Abstract: A head mounted display comprises a light sensor, a first light source, a second light source, a transflective mirror, a lens, a display and a filter. The first light source is used for generating a first light beam. The second light source is used for generating a second light beam. The transflective mirror is provided on the light paths of the first light beam and the second light beam. The first light source is provided at the periphery of the lens or the light sensor. The first light beam is reflected by a first object, and enters the light sensor via the lens and the transflective mirror in sequence. The second light source is provided at the periphery of the filter. After leaving the second light source, the second light beam is reflected by a second object outside the head mounted display first, and then enters the light sensor via the filter and the transflective mirror in sequence. A using method of the head mounted display is also provided.

Abstract: Disclosed is a manufacturing method for a high silicon grain oriented electrical steel sheet, the silicon content of the high silicon grain oriented electrical steel is greater than 4 wt %, comprising the steps of: (1) performing decarburization annealing of a cold-rolled steel plate; (2) allowing high silicon alloy particles in a completely solid state to collide at a high speed with the surface of the decarburization annealed steel plate to be sprayed, thus forming a high silicon alloy coating on the surface of the steel plate to be sprayed; (3) coating a release agent and drying; and (4) annealing. The manufacturing method for the high silicon grain oriented electrical steel sheet of the present invention is inexpensive, and, the high silicon grain oriented electrical steel sheet produced is of stable quality and is provided with great magnetic performance.

Abstract: An extreme ultraviolet reflective element comprising a multilayer stack of absorber layers on a multilayer stack of reflective layers. The element comprises spacing layer and phase tuning layer. Methods of manufacturing extreme ultraviolet reflective elements and lithography systems including extreme ultraviolet reflective elements are also described.

Abstract: Methods of cleaning a PVD chamber component, for example, process kit components are disclosed. The method comprises at least one of directing a jet of pressurized fluid at a surface of the PVD chamber component, directing pressurized carbon dioxide at the surface of the PVD chamber component, placing the PVD chamber component in a liquid and producing ultrasonic waves in the liquid to further remove contaminants from the surface of the PVD chamber component, using a plasma to clean the surface of the PVD chamber component, subjecting the PVD chamber component to a thermal cycle by heating up to a peak temperature of at least 50° C.

Abstract: Various embodiments may provide a memory cell. The memory cell may include an active electrode including an active electrode material. The memory cell may also include a first noble electrode contact with the active electrode, the first noble electrode being a patterned electrode including a noble electrode material. The memory cell may further include a resistive switching layer in contact with the active electrode and the first noble electrode. The memory cell may additionally include a second noble electrode including a noble electrode material, the second noble electrode in contact with the resistive switching layer.

Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer embedded in the multilayer stack of reflective layers.

Abstract: A multilayer stack in the form of a Bragg reflector comprising a graded interfacial layer and a method of manufacturing are disclosed. The graded interfacial layer eliminates the formation of low-reflectivity interfaces in a multilayer stack and reduces roughness of interfaces in a multilayer stack.

Abstract: A physical vapor deposition chamber comprising a tilting substrate support is described. Methods of processing a substrate are also provided comprising tilting at least one of the substrate and the target to improve the uniformity of the layer on the substrate from the center of the substrate to the edge of the substrate. Process controllers are also described which comprise one or more process configurations causing the physical deposition chamber to perform the operations of rotating a substrate support within the physical deposition chamber and tilting the substrate support at a plurality of angles with respect to a horizontal axis.

Abstract: A physical vapor deposition chamber comprising a rotating substrate support having a rotational axis, a first cathode having a radial center positioned off-center from a rotational axis of the substrate support is disclosed. A process controller comprising one or more process configurations selected from one or more of a first configuration to determine a rotation speed (v) for a substrate support to complete a whole number of rotations (n) around the rotational axis of the substrate support in a process window time (t) to form a layer of a first material on a substrate, or a second configuration to rotate the substrate support at the rotation speed (v).