Patents by Inventor Wenyue Zhang
Wenyue Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220272969Abstract: A portion of personal protective equipment treated with a topically applied finish containing a reactive oxygen species-generating dye (ROS) activated by electromagnetic radiation in the visible light region coated on the substrate with the ROS dye incorporated between 0.01-5.00% on weight of substrate to provide antimicrobial or self-cleaning benefits to the textile substrate.Type: ApplicationFiled: February 24, 2022Publication date: September 1, 2022Applicant: Berkshire CorporationInventors: TODD SHOWALTER, SUSAN FAILE, NATHAN HEATON, WENYU ZHANG
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Publication number: 20220260475Abstract: Disclosed is a seepage and internal erosion test apparatus for geotechnical centrifuges. The apparatus includes a mounting base, a four-motorized-jack synchronized lifting table fixed onto the mounting base, a downstream water sink, a plurality of permeameters, a centrifugal pump, and an upstream water sink fixedly mounted on the four-motorized-jack synchronized lifting table; the downstream water sink, the plurality of permeameters, the centrifugal pump, and the upstream water sink are connected by means of pipes; electric ball valves are separately disposed on each branch on which the permeameter is mounted; a temperature control module and flow meters are disposed of in the pipe for connecting the upstream outlet to the permeameter water inlet.Type: ApplicationFiled: May 7, 2022Publication date: August 18, 2022Inventors: Bo HUANG, Chang GUO, Wenyue ZHANG, Linfeng CAO, Yao TANG, Yu ZHAO, Daosheng LING
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Patent number: 11356362Abstract: Example methods and systems for a network management entity to perform adaptive packet flow monitoring. One example method may comprise receiving a request to monitor a packet flow between a first virtualized computing instance supported by a first host and a second virtualized computing instance supported by a second host. The method may also comprise activating a first set of checkpoints by instructing the first host and/or the second host to monitor the packet flow using the first set of checkpoints. The method may further comprise: in response to detecting a predetermined event based on first performance metric information associated with the packet flow, activating a second set of checkpoints by instructing the first host and/or the second host to monitor the packet flow using the second set of checkpoints.Type: GrantFiled: March 7, 2019Date of Patent: June 7, 2022Assignee: VMWARE, INC.Inventors: Ming Shu, Wenyu Zhang, Qiong Wang, Donghai Han
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Publication number: 20210356369Abstract: The present invention discloses a high throughput statistical characterization method of metal micromechanical properties, which comprises: grinding and polishing a metal sample until specular reflection finish satisfies a test requirement; marking position coordinates of a to-be-measured area on the metal sample by a microhardness tester to ensure the comparison of the same to-be-measured area; conducting an isostatic pressing strain test on the to-be-measured area by an isostatic pressing technology; and comparing high throughput characterization of components, microstructures, microdefects and three-dimensional surface morphology of the metal sample before and after isostatic pressing strain to obtain the full-view-field cross-scale high throughput statistical characterization of micromechanical property uniformity of the metal sample.Type: ApplicationFiled: August 1, 2021Publication date: November 18, 2021Inventors: Haizhou WANG, Qun REN, Lei ZHAO, Xuejing SHEN, Hui WANG, Dongling LI, Weihao WAN, Wenyu ZHANG, Xing YU, Lixia YANG
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Patent number: 10996664Abstract: A system evaluates a plurality of faults in an operation of a machine at a set of future instances of time. The system uses a neural network including a first subnetwork sequentially connected with a sequence of second subnetworks for each of the future instance of time such that an output of one subnetwork is an input to a subsequent subnetwork. The first subnetwork accepts the current time-series data and the current setpoints of operation of the machine. Each of the second subnetworks accepts the output of a preceding subnetwork, an internal state of the preceding subnetwork, and a future setpoint for a corresponding future instance of time. Each of the second subnetworks outputs an individual prediction of each fault of a plurality of faults at the corresponding future instance of time.Type: GrantFiled: March 29, 2019Date of Patent: May 4, 2021Assignee: Mitsubishi Electric Research Laboratories, Inc.Inventors: Devesh Jha, Wenyu Zhang, Emil Laftchiev, Daniel Nikovski
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Patent number: 10986841Abstract: Sanitizing and disinfecting compositions with relatively low levels of free available chlorine, with good effectiveness against microbes. The composition may include less than 0.5% by weight hypochlorite or other free available chlorine level, at least one nonionic or zwitterionic surfactant, with a pH from 8 to 12.5. The composition is characterized by an R value of greater than 0 (e.g., greater than 0.5, or equal to 1), where R is defined as the sum of the concentration of any nonionic, zwitterionic, and cationic surfactants divided by the total surfactant concentration (and total surfactant concentration may include any surfactant aids). The compositions may exhibit at least a 3-log reduction in M. bovis or C. diff population within 10 minutes (e.g., 4-6 minutes).Type: GrantFiled: November 6, 2018Date of Patent: April 27, 2021Assignee: The Clorox CompanyInventors: Marisa Macnaughtan, Nipa Modi, Thomas Fahlen, Wenyu Zhang, Ashley Joseph, Timothy Mui
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Patent number: 10957590Abstract: Implementations of the present disclosure generally relate to the fabrication of integrated circuits, and more particularly, to methods for forming a layer. The layer may be a mask used in lithography process to pattern and form a trench. The mask is formed over a substrate having at least two distinct materials by a selective deposition process. The edges of the mask are disposed on an intermediate layer formed on at least one of the two distinct materials. The method includes removing the intermediate layer to form a gap between edges of the mask and the substrate and filling the gap with a different material than the mask or with the same material as the mask. By filling the gap with the same or different material as the mask, electrical paths are improved.Type: GrantFiled: October 30, 2019Date of Patent: March 23, 2021Assignee: Applied Materials, Inc.Inventors: Wenhui Wang, Huixiong Dai, Christopher S. Ngai, Liqi Wu, Wenyu Zhang, Yongmei Chen, Hao Chen, Keith Tatseun Wong, Ke Chang
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Publication number: 20210059258Abstract: Sanitizing and disinfecting compositions with relatively low levels of free available chlorine, with good effectiveness against microbes. The composition may include less than 0.5% by weight hypochlorite or other free available chlorine level, at least one nonionic or zwitterionic surfactant, with a pH from 8 to 12.5. The composition is characterized by an R value of greater than 0 (e.g., greater than 0.5, or equal to 1), where R is defined as the sum of the concentration of any nonionic, zwitterionic, and cationic surfactants divided by the total surfactant concentration (and total surfactant concentration may include any surfactant aids). The compositions may exhibit at least a 3-log reduction in M. bovis or C. diff population within 10 minutes (e.g., 4-6 minutes).Type: ApplicationFiled: November 12, 2020Publication date: March 4, 2021Inventors: Marisa Macnaughtan, Nipa Modi, Thomas Fahlen, Wenyu Zhang, Ashley Joseph, Timothy Mui
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Publication number: 20210059257Abstract: Sanitizing and disinfecting compositions with relatively low levels of free available chlorine, with good effectiveness against microbes. The composition may include less than 0.5% by weight hypochlorite or other free available chlorine level, at least one nonionic or zwitterionic surfactant, with a pH from 8 to 12.5. The composition is characterized by an R value of greater than 0 (e.g., greater than 0.5, or equal to 1), where R is defined as the sum of the concentration of any nonionic, zwitterionic, and cationic surfactants divided by the total surfactant concentration (and total surfactant concentration may include any surfactant aids). The compositions may exhibit at least a 3-log reduction in M. bovis or C. diff population within 10 minutes (e.g., 4-6 minutes).Type: ApplicationFiled: November 12, 2020Publication date: March 4, 2021Inventors: Marisa Macnaughtan, Nipa Modi, Thomas Fahlen, Wenyu Zhang, Ashley Joseph, Timothy Mui
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Patent number: 10938688Abstract: Systems and methods for reducing network cost in a hyper-converged infrastructure are disclosed. The network cost of workload pairs can be assessed. Migration of the workloads can be considered to reduce the network cost and improve the network efficiency of the hyper-converged infrastructure.Type: GrantFiled: July 23, 2018Date of Patent: March 2, 2021Assignee: VMware, Inc.Inventors: Bolt Zhang, Wenyu Zhang, Sahan Gamage, Wang Qiong, Hua Wang, Lei Lu
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Patent number: 10879081Abstract: Methods and apparatus for reducing and eliminating defects in tungsten film are disclosed herein. In the present disclosure, reducing or eliminating oxidation of a first surface of a tungsten film having a predetermined first thickness disposed upon a substrate and within a plurality of trenches is disclosed. The plurality of trenches include a predetermined depth, and a width of less than 20 nanometers. The predetermined first thickness of the tungsten film is substantially uniform throughout the plurality of trenches such that the predetermined first thickness of the tungsten film does not substantially change to a second thickness when the first surface is contacted with air or oxygen.Type: GrantFiled: November 20, 2018Date of Patent: December 29, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Guoqiang Jian, Wei Tang, Chi-Chou Lin, Paul F. Ma, Kai Wu, Vikash Banthia, Mei Chang, Jia Ye, Wenyu Zhang, Jing Zhou
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Patent number: 10871582Abstract: The present disclosure relates to a detection panel, a manufacturing method thereof and a detection device. The detection panel comprises: a base substrate and a photoelectric conversion structure located on the base substrate, and a display structure located on a side of the photoelectric conversion structure facing away from the base substrate and electrically connected to the photoelectric conversion structure; wherein the photoelectric conversion structure is configured to convert an optical signal into an electrical signal, and the display structure is configured to perform image display according to the electrical signal.Type: GrantFiled: April 30, 2019Date of Patent: December 22, 2020Assignees: Beijing BOE Optoelectronics Technology Co., Ltd., BOE Technology Group Co., Ltd.Inventors: Jing Li, Wenyu Zhang, Liangjie Li, Hao Dong, Da Xu
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Publication number: 20200310400Abstract: A system evaluates a plurality of faults in an operation of a machine at a set of future instances of time. The system uses a neural network including a first subnetwork sequentially connected with a sequence of second subnetworks for each of the future instance of time such that an output of one subnetwork is an input to a subsequent subnetwork. The first subnetwork accepts the current time-series data and the current setpoints of operation of the machine. Each of the second subnetworks accepts the output of a preceding subnetwork, an internal state of the preceding subnetwork, and a future setpoint for a corresponding future instance of time. Each of the second subnetworks outputs an individual prediction of each fault of a plurality of faults at the corresponding future instance of time.Type: ApplicationFiled: March 29, 2019Publication date: October 1, 2020Applicant: Mitsubishi Electric Research Laboratories, Inc.Inventors: Devesh Jha, Wenyu Zhang, Emil Laftchiev, Daniel Nikovski
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Patent number: 10755947Abstract: Processing methods comprising etching a metal nitride layer with an etchant. The etchant can be, for example, WCl5, WOCl4 or TaCl5. Methods of improving the selectivity of etch processes are also disclosed.Type: GrantFiled: May 1, 2019Date of Patent: August 25, 2020Assignee: Applied Materials, Inc.Inventors: Wenyu Zhang, Yixiong Yang, Mario D. Sanchez, Guoqiang Jian, Wei V. Tang, Paul F. Ma
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Publication number: 20200236037Abstract: Example methods and systems for a network management entity to perform adaptive packet flow monitoring. One example method may comprise receiving a request to monitor a packet flow between a first virtualized computing instance supported by a first host and a second virtualized computing instance supported by a second host. The method may also comprise activating a first set of checkpoints by instructing the first host and/or the second host to monitor the packet flow using the first set of checkpoints. The method may further comprise: in response to detecting a predetermined event based on first performance metric information associated with the packet flow, activating a second set of checkpoints by instructing the first host and/or the second host to monitor the packet flow using the second set of checkpoints.Type: ApplicationFiled: March 7, 2019Publication date: July 23, 2020Applicant: VMware, Inc.Inventors: Ming SHU, Wenyu ZHANG, Qiong WANG, Donghai HAN
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Patent number: 10665450Abstract: Methods and apparatus for forming a semiconductor structure, including depositing a doping stack having a first surface atop a high-k dielectric layer, wherein the doping stack includes at least one first metal layer having a first surface, at least one second metal layer comprising a first aluminum dopant and a first surface, wherein the second metal layer is atop the first surface of the first metal layer, and at least one third metal layer atop the first surface of the second metal layer; depositing an anneal layer atop the first surface of the doping stack; annealing the structure to diffuse at least the first aluminum dopant into the high-k dielectric layer; removing the anneal layer; and depositing at least one work function layer atop the first surface of the doping stack.Type: GrantFiled: August 17, 2018Date of Patent: May 26, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Yixiong Yang, Paul F. Ma, Wei V. Tang, Wenyu Zhang, Shih Chung Chen, Chen Han Lin, Chi-Chou Lin, Yi Xu, Yu Lei, Naomi Yoshida, Lin Dong, Siddarth Krishnan
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Publication number: 20200161181Abstract: Implementations of the present disclosure generally relate to the fabrication of integrated circuits, and more particularly, to methods for forming a layer. The layer may be a mask used in lithography process to pattern and form a trench. The mask is formed over a substrate having at least two distinct materials by a selective deposition process. The edges of the mask are disposed on an intermediate layer formed on at least one of the two distinct materials. The method includes removing the intermediate layer to form a gap between edges of the mask and the substrate and filling the gap with a different material than the mask or with the same material as the mask. By filling the gap with the same or different material as the mask, electrical paths are improved.Type: ApplicationFiled: October 30, 2019Publication date: May 21, 2020Inventors: Wenhui WANG, Huixiong DAI, Christopher S. NGAI, Liqi WU, Wenyu ZHANG, Yongmei CHEN, Hao CHEN, Keith Tatseun WONG, Ke CHANG
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Publication number: 20200138034Abstract: Sanitizing and disinfecting compositions with relatively low levels of free available chlorine, with good effectiveness against microbes. The composition may include less than 0.5% by weight hypochlorite or other free available chlorine level, at least one nonionic or zwitterionic surfactant, with a pH from 8 to 12.5. The composition is characterized by an R value of greater than 0 (e.g., greater than 0.5, or equal to 1), where R is defined as the sum of the concentration of any nonionic, zwitterionic, and cationic surfactants divided by the total surfactant concentration (and total surfactant concentration may include any surfactant aids). The compositions may exhibit at least a 3-log reduction in M. bovis or C. diff population within 10 minutes (e.g., 4-6 minutes).Type: ApplicationFiled: November 6, 2018Publication date: May 7, 2020Inventors: Marisa Macnaughtan, Nipa Modi, Thomas Fahlen, Wenyu Zhang, Ashley Joseph, Timothy Mui
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Publication number: 20200081139Abstract: The present disclosure relates to a detection panel, a manufacturing method thereof and a detection device. The detection panel comprises: a base substrate and a photoelectric conversion structure located on the base substrate, and a display structure located on a side of the photoelectric conversion structure facing away from the base substrate and electrically connected to the photoelectric conversion structure; wherein the photoelectric conversion structure is configured to convert an optical signal into an electrical signal, and the display structure is configured to perform image display according to the electrical signal.Type: ApplicationFiled: April 30, 2019Publication date: March 12, 2020Inventors: Jing LI, Wenyu ZHANG, Liangjie LI, Hao DONG, Da XU
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Patent number: 10575037Abstract: A video recommending method, including: obtaining videos, the video including long videos and short videos; obtaining a subset of the long videos, of which video attribute values are greater than corresponding attribute thresholds; obtaining a watching record of a user, and obtaining similarities between the short videos and videos in the watching record, to extract a preset quantity of short videos having highest similarities; and recommending the subset of the long videos, of which video attribute values are greater than corresponding attribute thresholds, to the user, and/or recommending the preset quantity of short videos having highest similarities to the user.Type: GrantFiled: September 14, 2017Date of Patent: February 25, 2020Assignee: TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITEDInventors: Yiran Xie, Wenyu Zhang, Zhao Xu, Yu Xiang