Patents by Inventor Willem Marie Julia Marcel Coene
Willem Marie Julia Marcel Coene has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200072761Abstract: A method including selecting a shaped feature from a set of shaped features, each shaped feature of the set of shaped features having a set of points on a perimeter of the shape of the shaped feature, creating a plurality of shape context descriptors for the selected shaped feature, wherein each shape context descriptor provides an indication of a location in a shape context descriptor framework of a first focus point of the set of points in relation to a second point of the set of points, and identifying a shaped feature from the set of shaped features having a same or similar shape as the selected shaped feature based on data from the plurality of shape context descriptors.Type: ApplicationFiled: March 2, 2018Publication date: March 5, 2020Inventors: Adrianus Cornelis Matheus KOOPMAN, Scott Anderson MIDDLEBROOKS, Willem Marie Julia Marcel COENE
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Publication number: 20190391498Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.Type: ApplicationFiled: September 5, 2019Publication date: December 26, 2019Applicant: ASML Netherlands B.V.Inventors: Scott Anderson MIDDLEBROOKS, Markus Gerardus Martinus Maria VAN KRAAIJ, Adrianus Cornelis Matheus KOOPMAN, Stefan HUNSCHE, Willem Marie Julia Marcel COENE
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Patent number: 10437157Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.Type: GrantFiled: November 13, 2015Date of Patent: October 8, 2019Assignee: ASML Netherlands B.V.Inventors: Scott Anderson Middlebrooks, Markus Gerardus Martinus Maria Van Kraaij, Adrianus Cornelis Matheus Koopman, Stefan Hunsche, Willem Marie Julia Marcel Coene
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Patent number: 10379448Abstract: Target structures such as overlay gratings (Ta and Tb) are formed on a substrate (W) by a lithographic process. The first target is illuminated with a spot of first radiation (456a, Sa) and simultaneously the second target is illuminated with a spot of second radiation (456b, Sb). A sensor (418) detects at different locations, portions (460x?, 460x+) of said first radiation that have been diffracted in a first direction by features of the first target and portions (460y?, 460y+) of said second radiation that have been diffracted in a second direction by features of the second target. Asymmetry in X and Y directions can be detected simultaneously, reducing the time required for overlay measurements in X and Y. The two spots of radiation at soft x-ray wavelength can be generated simply by exciting two locations (710a, 710b) in a higher harmonic generation (HHG) radiation source or inverse Compton scattering source.Type: GrantFiled: January 19, 2018Date of Patent: August 13, 2019Assignee: ASML Netherlands B.V.Inventors: Simon Gijsbert Josephus Mathijssen, Sander Bas Roobol, Nan Lin, Willem Marie Julia Marcel Coene, Arie Jeffrey Den Boef
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Publication number: 20190107781Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.Type: ApplicationFiled: October 3, 2018Publication date: April 11, 2019Applicants: Stichting VU, Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Universiteit van Amsterdam, ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Arie Jeffrey Den Boef, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner, Willem Marie Julia Marcel Coene, Patrick Warnaar
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Patent number: 10234384Abstract: Disclosed is a method of obtaining data describing an object structure. The method comprising the steps of: (a) illuminating the object structure with illuminating radiation; (b) modulating the phase of the illuminating radiation after scattering by the object structure, the modulation comprising applying a first phase factor dependent upon at least one controllable parameter and an aberration function having a form of a subadditive function of a vector norm; (c) capturing a plurality of intensity patterns, wherein each intensity pattern corresponds to a unique value of the at least one controllable parameter; and (d) reconstructing the data describing the object structure based on the plurality of intensity patterns. Also disclosed are corresponding inspection and lithographic apparatuses, a method of manufacturing devices and a computer program.Type: GrantFiled: March 3, 2017Date of Patent: March 19, 2019Assignee: ASML Netherlands B.V.Inventors: Willem Marie Julia Marcel Coene, Alexander Prasetya Konijnenberg
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Publication number: 20180224753Abstract: Target structures such as overlay gratings (Ta and Tb) are formed on a substrate (W) by a lithographic process. The first target is illuminated with a spot of first radiation (456a, Sa) and simultaneously the second target is illuminated with a spot of second radiation (456b, Sb). A sensor (418) detects at different locations, portions (460x?, 460x+) of said first radiation that have been diffracted in a first direction by features of the first target and portions (460y?, 460y+) of said second radiation that have been diffracted in a second direction by features of the second target. Asymmetry in X and Y directions can be detected simultaneously, reducing the time required for overlay measurements in X and Y. The two spots of radiation at soft x-ray wavelength can be generated simply by exciting two locations (710a, 710b) in a higher harmonic generation (HHG) radiation source or inverse Compton scattering source.Type: ApplicationFiled: January 19, 2018Publication date: August 9, 2018Applicant: ASML Netherlands B.V.Inventors: Simon Gijsbert Josephus MATHIJSSEN, Sander Bas Roobol, Nan Lin, Willem Marie Julia Marcel Coene, ArIe Jeffrey Den Boef
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Publication number: 20180149987Abstract: An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.Type: ApplicationFiled: March 14, 2016Publication date: May 31, 2018Applicant: ASML Netherlands B.V.Inventors: Simon Gijsbert Josephus MATHIJSSEN, Arie Jeffrey DEN BOEF, Alessandro POLO, Patricius Aloysius Jacobus TINNEMANS, Adrianus Johannes Hendrikus SCHELLEKENS, Elahe YEGANEGI DASTGERDI, Willem Marie Julia Marcel COENE, Erik Willem BOGAART, Simon Reinald HUISMAN
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Patent number: 9946167Abstract: Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The optical system has a first branch leading to a pupil plane imaging sensor and a second branch leading to a substrate plane imaging sensor. A spatial light modulator is arranged in an intermediate pupil plane of the second branch of the optical system. The SLM imparts a programmable pattern of attenuation that may be used to correct for asymmetries between the first and second modes of illumination or imaging. By use of specific target designs and machine-learning processes, the attenuation patterns may also be programmed to act as filter functions, enhancing sensitivity to specific parameters of interest, such as focus.Type: GrantFiled: August 12, 2015Date of Patent: April 17, 2018Assignee: ASML Netherlands B.V.Inventors: Hendrik Jan Hidde Smilde, Arno Jan Bleeker, Willem Marie Julia Marcel Coene, Patrick Warnaar, Michael Kubis
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Patent number: 9915879Abstract: A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets which are for measuring overlay using X-ray scattering and small targets which are for measuring overlay by diffraction of visible radiation. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas.Type: GrantFiled: May 12, 2015Date of Patent: March 13, 2018Assignee: ASML Netherlands B.V.Inventors: Richard Quintanilha, Willem Marie Julia Marcel Coene
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Publication number: 20170345138Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.Type: ApplicationFiled: November 13, 2015Publication date: November 30, 2017Applicant: ASML Netherlands B.V.Inventors: Scott Anderson MIDDLEBROOKS, Markus Gerardus Martinus Maria VAN KRAAIJ, Maxim PISARENCO, Adrianus Cornelis Matheus KOOPMAN, Stefan HUNSCHE, Willem Marie Julia Marcel COENE
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Publication number: 20170336713Abstract: A method and apparatus of detection, registration and quantification of an image. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non-nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.Type: ApplicationFiled: November 13, 2015Publication date: November 23, 2017Applicant: ASML Netherlands B.V.Inventors: Scott Anderson MIDDLEBROOKS, Markus Gerardus Martinus Maria VAN KRAAJI, Adrianus Cornelis Matheus KOOPMAN, Stefan HUNSCHE, Willem Marie Julia Marcel COENE
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Publication number: 20170261428Abstract: Disclosed is a method of obtaining data describing an object structure. The method comprising the steps of: (a) illuminating the object structure with illuminating radiation; (b) modulating the phase of the illuminating radiation after scattering by the object structure, the modulation comprising applying a first phase factor dependent upon at least one controllable parameter and an aberration function having a form of a subadditive function of a vector norm; (c) capturing a plurality of intensity patterns, wherein each intensity pattern corresponds to a unique value of the at least one controllable parameter; and (d) reconstructing the data describing the object structure based on the plurality of intensity patterns. Also disclosed are corresponding inspection and lithographic apparatuses, a method of manufacturing devices and a computer program.Type: ApplicationFiled: March 3, 2017Publication date: September 14, 2017Applicant: ASML Netherlands B.V.Inventors: Willem Marie Julia Marcel COENE, Alexander Prasetya Konijnenberg
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Publication number: 20160033877Abstract: Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The optical system has a first branch leading to a pupil plane imaging sensor and a second branch leading to a substrate plane imaging sensor. A spatial light modulator is arranged in an intermediate pupil plane of the second branch of the optical system. The SLM imparts a programmable pattern of attenuation that may be used to correct for asymmetries between the first and second modes of illumination or imaging. By use of specific target designs and machine-learning processes, the attenuation patterns may also be programmed to act as filter functions, enhancing sensitivity to specific parameters of interest, such as focus.Type: ApplicationFiled: August 12, 2015Publication date: February 4, 2016Applicant: ASML Netherlands B.V.Inventors: Hendrik Jan Hidde SMILDE, Arno Jan Bleeker, Willem Marie Julia Marcel Coene, Patrick Warnaar, Michael Kubis
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Patent number: 9201311Abstract: A method of measuring a phase difference between two regions in an aberration function: Reference structures are produced on a substrate using illumination that minimizes effects of phase aberration. A grating is produced on the substrate using a phase-shift grating reticle to produce, in the exit pupil, a pair of diffracted non-zero orders, while forbidding other diffracted orders and produces interference fringes formed by interference between the pair. The interference contributes to a first grating on the substrate. Overlay error is measured between the grating and the reference structure using diffraction-based or image-based overlay measurements. A phase aberration function for the exit pupil of the lithographic apparatus can then be determined from the measured overlay errors.Type: GrantFiled: June 26, 2012Date of Patent: December 1, 2015Assignee: ASML Netherlands B.V.Inventors: Willem Marie Julia Marcel Coene, Sven Van Haver
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Publication number: 20150331336Abstract: A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets which are for measuring overlay using X-ray scattering and small targets which are for measuring overlay by diffraction of visible radiation. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas.Type: ApplicationFiled: May 12, 2015Publication date: November 19, 2015Applicant: ASML Netherlands B.V.Inventors: Richard QUINTANILHA, Willem Marie Julia Marcel COENE
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Patent number: 9140998Abstract: Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The optical system has a first branch leading to a pupil plane imaging sensor and a second branch leading to a substrate plane imaging sensor. A spatial light modulator is arranged in an intermediate pupil plane of the second branch of the optical system. The SLM imparts a programmable pattern of attenuation that may be used to correct for asymmetries between the first and second modes of illumination or imaging. By use of specific target designs and machine-learning processes, the attenuation patterns may also be programmed to act as filter functions, enhancing sensitivity to specific parameters of interest, such as focus.Type: GrantFiled: November 10, 2011Date of Patent: September 22, 2015Assignee: ASML Netherlands B.V.Inventors: Hendrik Jan Hidde Smilde, Arno Jan Bleeker, Patrick Warnaar, Willem Marie Julia Marcel Coene, Michael Kubis
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Patent number: 9081304Abstract: A target for measuring an overlay error or a critical dimension of a substrate comprises a grating. In one example, lines of the grating are arranged at an angle of about 45° with respect to edges of the target. As a consequence, the diffraction order of the grating reflection has its sub-maxima not aligned along the line on which the other diffraction orders are positioned, and overlap of intensity with other diffraction orders is reduced.Type: GrantFiled: July 9, 2009Date of Patent: July 14, 2015Assignee: ASML Netherlands B.V.Inventors: Hendrik Jan Hidde Smilde, Willem Marie Julia Marcel Coene
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Patent number: 8553218Abstract: Calibration of an angularly resolved scatterometer is performed by measuring a target in two or more different arrangements. The different arrangements cause radiation being measured in an outgoing direction to be different combinations of radiation illuminating the target from ingoing directions. A reference mirror measurement may also be performed. The measurements and modeling of the difference between the first and second arrangements is used to estimate separately properties of the ingoing and outgoing optical systems. The modeling may account for symmetry of the respective periodic target. The modeling typically accounts for polarizing effects of the ingoing optical elements, the outgoing optical elements and the respective periodic target. The polarizing effects may be described in the modeling by Jones calculus or Mueller calculus. The modeling may include a parameterization in terms of basis functions such as Zernike polynomials.Type: GrantFiled: December 20, 2010Date of Patent: October 8, 2013Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Henricus Petrus Maria Pellemans, Gerbrand Van Der Zouw, Willem Marie Julia Marcel Coene
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Patent number: RE44678Abstract: An information system according to the invention comprises a record carrier and a playback apparatus. The record carrier has information marks along a track thereof and exhibits first variations caused by existence and nonexistence of the information marks along the track. The first variations represent an information signal recorded on said record carrier. The record carrier further exhibits second variations caused by variations associated with the information marks. The phase of the second variations is coupled to the phase of the first variations.Type: GrantFiled: June 13, 2008Date of Patent: December 31, 2013Assignee: Koninklijke Philips N.V.Inventors: Job Cornelis Oostveen, Willem Marie Julia Marcel Coene, Jan Harm Boer, Franciscus Lucas Antonius Johannes Kamperman, Aloysius Michael Josephus Maria Spruijt, Paulus Reinier Joannes Van Roosmalen