Abstract: Disclosed herein are methods of diagnosing, and treating and/or preventing CD55-deficiency, hyperactivation of complement, angiopathic thrombosis and protein-losing enteropathy (CHAPLE). The method of diagnosing includes: providing a sample from a patient; performing an assay detecting at least one of at least one mutation in a DNA sequence of a CD55 gene, at least one mutation in a RNA sequence of a CD55 transcript, at least one mutation in a DNA sequence of a CD55 complementary-DNA (cDNA), CD55 protein, CD55 protein binding, complement deposition or combination thereof, and diagnosing the patient with CHAPLE. The method of treating and/or preventing at least one symptom of CHAPLE includes: administering an effective amount of a composition comprising at least one complement inhibitor to a subject in need thereof, wherein the composition is effective in treating or preventing at least on symptom of CHAPLE. The disclosure further relates to compositions effective at treating and/or preventing CHAPLE.

Abstract: A cabling-based airflow routing system includes a chassis that defines a chassis housing. A first heat producing component is located in the chassis housing. A first cabling connector is located in the chassis housing. A second cabling connector that is located in the chassis housing. A first ribbon cable that extends through the chassis housing between the first cabling connector and the second cabling connector. The first ribbon cable includes a first cabling airflow routing portion that is oriented in the chassis housing in an airflow path and that is configured to redirect a first portion of an airflow provided in the airflow path towards the first heat producing component.

Abstract: Apparatuses, systems, and methods to perform diagnostic evaluation of data center data. In at least one embodiment, one or more processors determine one or more diagnostic results based, at least in part, on a trained application model to receive homomorphically encrypted log data and to execute the model with the homomorphically encrypted log data.

Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. A surface floating potential of a substrate placed atop a stage in a positive column of the DC plasma is adjusted and maintained to a reference potential. A periodic biasing signal referenced to the reference potential is capacitively coupled to the stage to control a surface potential at the substrate according to: an active phase for provision of kinetic energy to free electrons in the DC plasma for activation of targeted bonds at the surface of the substrate; a neutralization phase for repelling of the free electrons from the surface of the substrate; and an initialization phase for restoring an initial condition of the surface floating potential.

Abstract: Disclosed herein are system, method, and computer program product embodiments for utilizing non-RAM memory to implement large digital display emulations. An embodiment operates by generating, by an emulator device, a pixel map of a digital display, wherein the pixel map comprises a plurality of pixels representative of a plurality of light emitting elements arranged on a viewable surface of the large digital display. A distance and orientation of a virtual viewer to the viewable surface of the large digital display is generated and the emulator device emulates the large digital display based on the pixel map and the distance and the orientation of the virtual viewer and renders the digital content based on the emulated large digital display.

Abstract: Apparatuses, systems, and methods for verifying fingerprints associated with components to be installed on printed circuit boards (PCBs). In at least one embodiment, one or more processors determine whether a component fingerprint associated with a component to be installed on the PCB corresponds to an expected fingerprint, the component fingerprint based, at least in part, on a firmware version associated with the component.

Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. The anode and cathode of a DC plasma chamber are respectively connected to an adjustable DC voltage source and a DC current source. The anode potential is adjusted to shift a surface floating potential of a stage in a positive column of the DC plasma to a reference ground potential of the DC voltage/current sources. A conductive plate in a same region of the positive column opposite the stage is used to measure the surface floating potential of the stage. A control loop can be activated throughout various processing steps to maintain the surface floating potential of the stage to the reference ground potential. A signal generator referenced to the ground potential is capacitively coupled to the stage to control a surface potential at the stage for provision of kinetic energy to free electrons in the DC plasma.

Abstract: Apparatuses, systems, and methods for communication interfaces of a programmable part. In at least one embodiment, one or more communication interfaces are secured to a top side of a programmable part to provide programmable access to the programmable part after installation on a printed circuit board (PCB), the one or more communication interfaces to be selectively disabled based, at least in part, on a status of the programmable part.

Abstract: The invention relates to methods and compositions for identifying and selecting maize plants with enhanced resistance to northern leaf blight. Maize plants generated by the methods of the invention are also a feature of the invention.

Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. A surface floating potential of a substrate placed atop a stage in a positive column of the DC plasma is adjusted and maintained to a reference potential. A periodic biasing signal referenced to the reference potential is capacitively coupled to the stage to control a surface potential at the substrate according to: an active phase for provision of kinetic energy to free electrons in the DC plasma for activation of targeted bonds at the surface of the substrate; a neutralization phase for repelling of the free electrons from the surface of the substrate; and an initialization phase for restoring an initial condition of the surface floating potential.

Abstract: Active comfort controlled bedding systems and processes of operating the bedding systems generally include a variable firmness control. The active comfort controlled bedding system can include a control unit in electrical communication with a signal generating layer configured to generate heat and alter a firmness property of at least one viscoelastic foam layer, wherein the amount of heat is based on a decrease of the glass transition temperature as a function of the percentage of humidity in the environment. In other embodiments, the bedding system is provided with at least one foam layer comprising a phase change material stratified in a foam structure of the at least one foam layer; and the at least one foam layer is heated to a temperature greater than a melt temperature of the paraffin wax to soften the at least one foam layer. In other embodiments, ambient humidity conditions can be changed.

Abstract: The present invention relates a formulation and capsule suitable for oral administration. The invention further relates to the use of the formulation and capsule for treating inflammatory bowel diseases, for instance ulcerative colitis (UC) or Crohn's disease.

Abstract: An improved headset is provided to selectively distribute the weight of the headset while securely registering the headset comfortably on a wearer's head. The headset comprises one or more compliant arms and a frame to selectively distribute the weight of the headset and secure the headset to the wearer's head without the need for straps or leavers. The compliant arms provide a normalizing force through elastic body deformation to selectively distribute the weight of the headset.

Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. The anode and cathode of a DC plasma chamber are respectively connected to an adjustable DC voltage source and a DC current source. The anode potential is adjusted to shift a surface floating potential of a stage in a positive column of the DC plasma to a reference ground potential of the DC voltage/current sources. A conductive plate in a same region of the positive column opposite the stage is used to measure the surface floating potential of the stage. A signal generator referenced to the ground potential is capacitively coupled to the stage to control a surface potential at the stage for provision of kinetic energy to free electrons in the DC plasma.

Abstract: A computer-implemented method for generating feedback based on a handwritten text, comprises the steps of initializing a writing instrument to be used in a writing operation comprising a handwritten text and capturing and processing the handwritten text to generate digital text data. The method further comprises the steps of identifying at least one handwritten text attribute associated with the digital text data, comparing the at least one handwritten text attribute with predefined textual feature attributes, and generating a textual feature based on the compared at least one handwritten text attribute and predefined textual feature attributes. In addition, the method comprises the steps of modifying the digital text data using the textual feature and generating feedback to a user based on the modified digital text data.

Abstract: Apparatuses, sytstems, and methods to adjust flow areas. In at least one embodiment, one or more flow control devices adjust a flow area of a server component inlet or the server component outlet based, at least in part, on at least one of sensor data or server component operating conditions.

Abstract: A task definition is received. The task definition indicates at least a location from which one or more software image can be obtained and information usable to determine an amount of resources to allocate to one or more software containers for the one or more software image. A set of virtual machine instances in which to launch the one or more software containers is determined, the one or more software image is obtained from the location included in the task definition and is launched as the one or more of software containers within the set of virtual machine instances.

Abstract: Systems and methods for material processing using wafer scale waves of precisely controlled electrons in a DC plasma is presented. The anode and cathode of a DC plasma chamber are respectively connected to an adjustable DC voltage source and a DC current source. The anode potential is adjusted to shift a surface floating potential of a stage in a positive column of the DC plasma to a reference ground potential of the DC voltage/current sources. A control loop can be activated throughout various processing steps to maintain the surface floating potential of the stage to the reference ground potential. A signal generator referenced to the ground potential is capacitively coupled to the stage to control a surface potential at the stage for provision of kinetic energy to free electrons in the DC plasma.

Abstract: Magnetic positioning systems and methods for use in a robotic surgical system are provided. A multi-axis magnetic field source generates a magnetic field by simultaneously exciting a plurality of axes of the multi-axis magnetic field source with respective source signals that are orthogonal to each other over a period, T. A multi-axis magnetic field sensor detects the generated magnetic field. The detected magnetic field is analysed over an analysis interval which is at least as long as the period, T, to resolve the detected magnetic field into components which are due to the plurality of source signals. The components are used to determine one or both of the position and the orientation of the multi-axis magnetic field sensor relative to the multi-axis magnetic field source.