Abstract: A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid.

Abstract: A measuring system (100) for the optical measurement of an optical imaging system (150), which is provided to image a pattern arranged in an object surface (155) of the imaging system in an image surface (156) of the imaging system, comprises an object-side structure carrier (110) having an object-side measuring structure (111), to be arranged on the object side of the imaging system; an image-side structure carrier (120) having an image-side measuring structure (121), to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector (130) for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid (171).

Abstract: A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid.

Abstract: A measuring system (100) for the optical measurement of an optical imaging system (150), which is provided to image a pattern arranged in an object surface (155) of the imaging system in an image surface (156) of the imaging system, comprises an object-side structure carrier (110) having an object-side measuring structure (111), to be arranged on the object side of the imaging system; an image-side structure carrier (120) having an image-side measuring structure (121), to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector (130) for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid (171).

Abstract: A measuring apparatus for optical, for example interferometric, measurement of an optical imaging system, imaging of a useful pattern in an imaging operation, including a device for production of radiation information, for example interference information, which is indicative of imaging errors, having a mask structure arrangement which contains a measurement pattern, and a device for detection and evaluation of the interference information which is indicative of imaging errors; also a method for operation of the optical imaging system including imaging error correction.

Abstract: Methods and apparatus for measuring wavefronts and for determining scattered light, and related devices and manufacturing methods. 2.1. The invention relates to a method and apparatus for spatially resolved wavefront measurement on a test specimen, a method and apparatus for spatially resolved scattered light determination, a diffraction structure support and a coherent structure support therefor, and also to an objective or other radiation exposure device manufactured using such a method, and an associated manufacturing method. 2.2.

Abstract: Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and/or a grating structure (7a) to be arranged on the image side. The object-side mask structure includes one or more one-dimensional mask structure patterns, and the image-side grating structure includes one or more two-dimensional grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns.

Abstract: A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an absolute value at each of a plurality of field points in an image plane of the projection objective. At least one of the optical elements is adjusted such that for each of the parameters in the set, the field maximum of its absolute value is minimized.

Abstract: A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid.

Abstract: A method for determining at least one of distortion and de-focus for an optical imaging system. The method includes determining wavefront aberrations in a pupil plane of the optical imaging system by a wavefront measurement method, determining focus offset measured values in an xy-direction and/or z-direction for one or more different illumination settings by a test pattern measurement method with imaging and comparative evaluation of test patterns for the optical imaging system, and determining values for one or more aberration parameters that relate to the distortion and/or image surface from a prescribed relationship between the determined wavefront aberrations and the determined focus offset measured values.

Abstract: Method and devices for measurement of scattered radiation at an optical system are disclosed. The methods can include: emitting radiation with a radiation source; passing the radiation from the radiation source through a first mask having locally varied transmission; passing the radiation from the first mask through the optical system; passing the radiation from the optical system through a second mask having locally varied transmission; measuring the intensity of the radiation having passed through the second mask with a locally resolving detector; and processing the local intensity distribution, determined by the detector, into a pupil resolved measurement result of scattered radiation.

Abstract: A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an absolute value at each of a plurality of field points in an image plane of the projection objective. At least one of the optical elements is adjusted such that for each of the parameters in the set, the field maximum of its absolute value is minimized.

Abstract: A device and a method for wavefront measurement of an optical imaging system, and a microlithography projection exposure machine that is equipped with such a device. The device has a wavefront generating unit that includes an optical element (1) with an object-side periodic structure (2), and a light source unit (20,21) for illuminating the object-side periodic structure with the aid of a measuring radiation. The device also has a detector unit that is arranged on the image side of the imaging system to be measured and that includes an optical element (3) with an image-side periodic structure, and a detector element (52, 52a, 52b) for detecting an overlay pattern of the imaged object-side periodic structure and image-side periodic structure.

Abstract: A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (?1) and a second wavelength (?2), wherein a first ratio is defined as an intensity of light ?2 to an intensity of light ?1 in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least ?1 to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of ?2 to an intensity of light of ?1 in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.

Abstract: In a method for manufacturing an optical imaging system, wavefront aberrations caused by an optical imaging system are determined before and after transporting the optical imaging system. At least some of the aberration parameters which are determined in the preceding determination are used as a given precondition for determining aberration parameters in the subsequent determination. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method are avoided.

Abstract: A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (?1) and a second wavelength (?2), wherein a first ratio is defined as an intensity of light ?2 to an intensity of light ?1 in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least ?1 to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of ?2 to an intensity of light of ?1 in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.

Abstract: In a method for manufacturing an optical imaging system, wavefront aberrations caused by an optical imaging system are determined before and after transporting the optical imaging system. At least some of the aberration parameters which are determined in the preceding determination are used as a given precondition for determining aberration parameters in the subsequent determination. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method are avoided.

Abstract: A measuring apparatus for optical, for example interferometric, measurement of an optical imaging system, imaging of a useful pattern in an imaging operation, including a device for production of radiation information, for example interference information, which is indicative of imaging errors, having a mask structure arrangement which contains a measurement pattern, and a device for detection and evaluation of the interference information which is indicative of imaging errors; also a method for operation of the optical imaging system including imaging error correction.

Abstract: In a method for determining wavefront aberrations for the characterization of imaging characteristics in an optical imaging system, the measurement results from two different measurement methods, which are carried out at successive times, are combined. In this case, at least some of the aberration parameters which are determined in the previous first measurement method are used as a given precondition for determining aberration parameters with the aid of the second measurement method, and are assessed accordingly. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method can be avoided.

Abstract: A method for determining at least one of distortion and de-focus for an optical imaging system. The method includes determining wavefront aberrations in a pupil plane of the optical imaging system by a wavefront measurement method, determining focus offset measured values in an xy-direction and/or z-direction for one or more different illumination settings by a test pattern measurement method with imaging and comparative evaluation of test patterns for the optical imaging system, and determining values for one or more aberration parameters that relate to the distortion and/or image surface from a prescribed relationship between the determined wavefront aberrations and the determined focus offset measured values.