Abstract: There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ?193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

Abstract: The invention relates to an arrangement of optical elements in a microlithographic projection exposure apparatus, particularly in a projection objective of a microlithographic projection exposure apparatus. The arrangement comprises a rigid first optical element, a rigid second optical element with a first optical surface and a second optical surface on opposite sides and a first liquid. The first optical element has a concave optical surface. The first side of the second optical element is facing the concave optical surface of the first optical element. The first liquid is at least partially filling the space between the first optical element and the second optical element.

Abstract: There is provided an illumination system that includes (a) a light source that emits light having a wavelength ?193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.

Abstract: A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n?1.6 at the operating wavelength.

Abstract: Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.

Abstract: A focusing-device for the radiation from a light source (2) is provided with a collector mirror (1, 1?) which is arranged in a mount (24) and collects the light, in virtual or real terms, from the light source (2) at the second focus (200). The collector mirror (1, 1?) is displaceably connected to the mount (24) via a bearing in such a way that its optical properties remain at least approximately the same even in the event of temperature changes.

Abstract: There is provided a collector. The collector includes a first mirror shell positioned inside a second mirror shell that has a chamfered end.

Abstract: There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.

Abstract: The invention relates to a projection objective (6), in particular for applications in microlithography, serving to project an image of an object (3) arranged in an object plane (4) onto a substrate (18) arranged in an image plane (7). The projection objective (6) has an object-side-oriented part (10) which is arranged adjacent to the object plane (4) and includes a plurality of optical elements, and it also has an image-side-oriented part (11) of the objective which is arranged adjacent to the image plane (7) and includes a free space (16) serving to receive a fluid (13) and further includes at least a part of an optical end-position element (14) serving to delimit the free space (16) towards the object side. The projection objective (6) is operable in different modes of operation in which the free space (16) is filled with fluids (13) that differ in their respective indices of refraction.

Abstract: There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.

Abstract: The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.

Abstract: An illumination system comprises (a) a first optical element upon which a light beam impinges, where the first optical element has first raster elements that partition said light beam into light channels; (b) a second optical element that receives said light channels, where the second optical element has a second raster elements; (c) an object plane that receives said light channels via said second optical element; and (d) an exit pupil that is provided with an illumination via said object plane. The system is characterized by an assignment of a member of said first raster elements and a member of said second raster elements to each of said light channels to provide a continuous beam path from said first optical element to said object plane for each of said plurality of light channels. The assignment is changeable to provide an adjustment of said illumination in said exit pupil.

Abstract: Collectors are disclosed. The collectors can be for illumination systems with a wavelength ?193 nm, including ?126 nm, and the EUV range. The collectors can serve to receive the light rays emitted from a light source and to illuminate an area in a plane. The collectors can include at least a first mirror shell or a first shell segment as well as a second mirror shell or a second shell segment receiving the light and providing a first illumination and a second illumination in a plane which is located in the light path downstream of the collector. An illumination systems are also disclosed. The illumination systems can be equipped with a collector. Projection exposure apparatuses are also disclosed. The projection exposure apparatuses can include an illumination system. Methods for the manufacture of microstructures by photographic exposure are also disclosed.

Abstract: There is provided an illumination system. The illumination system includes a source of light having a wavelength of less than or equal to about 193 nm, a first facet, a second facet, and a reflective element. The light is incident on the first facet via a first path, propagates from the first facet to the second facet via a second path, and propagates from the second facet to the reflective element via a third path. The second path and the third path are in substantially opposite directions from one another and substantially parallel to each other.

Abstract: An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.

Abstract: The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source (18) for producing light in the EUV region. The projection exposure system further comprises a first optical system (19, 20, 21, 22, 23, 24) for illuminating a mask (25) by the light of the light source (18) and a second optical system (26, 27, 28, 29, 30, 31) for imaging the mask (25) on a component (32). At least one polarization-optical element (1) is disposed on the beam path between the light source (18) and the component (32).

Abstract: A focusing-device for the radiation from a light source (2) is provided with a collector mirror (1, 1?) which is arranged in a mount (24) and collects the light, in virtual or real terms, from the light source (2) at the second focus (200). The collector mirror (1, 1?) is displaceably connected to the mount (24) via a bearing in such a way that its optical properties remain at least approximately the same even in the event of temperature changes.

Abstract: An illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength especially ?193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

Abstract: There is provided an illumination system for lithography with wavelengths of ?193 mn. The system comprises a first optical element, which is divided into first raster elements and lies in a first plane. The first plane defines an x-direction and a y-direction, the first raster elements each have an x-direction and a y-direction with an aspect ratio, and at least two of the first raster elements have aspect ratios of different magnitude.

Abstract: The invention relates to an illumination system with a light source emitting radiation with a wavelength ?193 nm, especially radiation in the EUV wavelength range. The invention comprises a first facetted optical element in a first plane with at least a first and second field raster element which receive the light of the light source and divide the same into a first and second bundle of light; a optical component comprising at least a second facetted optical element in a second plane with a first and second pupil raster element, with the first light bundle impinging upon the first pupil raster element and the second light bundle impinging upon the second pupil raster element, with an attenuator being arranged in or close to the second plane or a plane conjugated to the second plane at least in the first light bundle extending from the first field raster element to the first pupil raster element, wherein the optical component images the first and second field raster element into a field plane.