Patents by Inventor Xiaoming Wu

Xiaoming Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8580477
    Abstract: Embodiments in accordance with the present invention encompass negative-tone, aqueous base developable, self-imageable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.
    Type: Grant
    Filed: September 21, 2009
    Date of Patent: November 12, 2013
    Assignee: Promerus LLC
    Inventors: Brian Knapp, Edmund Elce, Andrew Bell, Cheryl Burns, Sridevi Kaiti, Brian Kocher, Hendra Ng, Yogesh Patel, Masanobu Sakamoto, Xiaoming Wu, Linda Zhang
  • Publication number: 20130284694
    Abstract: Disclosed is an ejection device for an inkjet printer that includes an ejection chip having a substrate and at least one fluid ejecting element. The ejection device further includes a fluidic structure configured over the ejection chip. The fluidic structure includes a nozzle plate composed of an organic material and includes a plurality of nozzles. The fluidic structure further includes a flow feature layer configured in between the ejection chip and the nozzle plate. The flow feature layer is composed of an organic material and includes a plurality of flow features. Furthermore, the fluidic structure includes a liner layer encapsulating the nozzle plate. The liner layer further at least partially encapsulates each flow feature of the plurality of flow features. The liner layer is composed of an inorganic material. Further disclosed is a method for fabricating the ejection device.
    Type: Application
    Filed: June 24, 2013
    Publication date: October 31, 2013
    Inventors: Xiaorong CAI, Jiandong FANG, Xiaoming WU, Elaine Yeap MONEY, Eunki HONG, Yimin GUAN, Burton JOYNER, II, Sean Terrance WEAVER, David GRAHAM, Zach REITMEIER
  • Publication number: 20130183450
    Abstract: A method of forming a patterned photoresist layer having a hydrophobic surface is provided. The method includes forming a photoresist layer on a substrate and image patterning. The photoresist layer may comprise a polymeric material. The imaged photoresist layer may then undergo a two-stage post-exposure bake. A surface treatment may be performed on the photoresist layer in between the two-stage post-exposure bake. The surface treatment may include applying a siloxane solution on a partially post-exposure baked photoresist layer. The post-exposure baked photoresist layer may then be developed to form the patterned photoresist layer. The method may be used to form a hydrophobic photoimageable nozzle plate of a micro-fluid ejection head having improved mechanical properties and stable hydrophobic properties.
    Type: Application
    Filed: January 13, 2012
    Publication date: July 18, 2013
    Inventors: David BERNARD, Paul DRYER, Bart MANSDORF, Xiaoming WU
  • Patent number: 8394575
    Abstract: Environmentally friendly thick film layers for a micro-fluid ejection head and micro-fluid ejection heads are disclosed. The environmentally friendly thick film layer includes a negative photoresist layer derived from a composition comprising a multi-functional epoxy compound, a low molecular weight polymeric difunctional epoxy compound, a monomeric difunctional epoxy compound, a methide-based photoacid generator that does not contain antimony, a chromophore and an aryl ketone solvent. Optionally the photoresist layer contains an adhesion enhancer. The negative photoresist layer is environmentally friendly and provides good resolution, well defined critical dimensions, straight side walls, and a large processing window.
    Type: Grant
    Filed: September 30, 2010
    Date of Patent: March 12, 2013
    Assignee: Lexmark International, Inc.
    Inventors: Xiaoming Wu, David Graham, Sean Weaver, Bart Mansdorf, Rich Wells, Joel Provence
  • Publication number: 20130048601
    Abstract: A method for improving adhesion between polymeric materials is provided. The method includes treating a surface of a first polymeric material with plasma of oxygen gas and hydrogen-containing gas. The first polymeric material may be a fully cured polymeric material. A second polymeric material may then be deposited on the plasma treated surface of the first polymeric material. The second polymeric material may be an uncured polymeric material. This plasma treatment may be used in improving the adhesion between polymeric components of an inkjet printer. It provides good adhesion between the polymeric components of the inkjet printer even after long exposure to ink.
    Type: Application
    Filed: August 31, 2011
    Publication date: February 28, 2013
    Inventors: Paul Dryer, David Bernard, David Rhine, Xiaoming Wu, Jing X. Sun, Gary Williams
  • Publication number: 20120293584
    Abstract: Disclosed is a fluid ejection device for an inkjet printer that includes a substrate having at least one fluid flow channel configured within a bottom portion of the substrate. Each fluid flow channel of the at least one fluid flow channel is configured by etching the bottom portion. The substrate also includes a plurality of fluid flow vias configured within a top portion of the substrate. Each fluid flow via of the plurality of fluid flow vias is configured by etching the top portion. The each fluid flow via is further configured to be in fluid communication with a corresponding fluid flow channel through an isotropically etched cavity configured below the each fluid flow via and fluidically coupled to the corresponding fluid flow channel. The fluid ejection device also includes a flow feature to layer and a nozzle plate. Further disclosed are methods for fabricating fluid ejection devices.
    Type: Application
    Filed: May 20, 2011
    Publication date: November 22, 2012
    Inventors: Jiandong Fang, Xiaoming Wu
  • Publication number: 20120274707
    Abstract: Disclosed is an ejection device for an inkjet printer that includes an ejection chip having a substrate and at least one fluid ejecting element. The ejection device further includes a fluidic structure configured over the ejection chip. The fluidic structure includes a nozzle plate composed of an organic material and includes a plurality of nozzles. The fluidic structure further includes a flow feature layer configured in between the ejection chip and the nozzle plate. The flow feature layer is composed of an organic material and includes a plurality of flow features. Furthermore, the fluidic structure includes a liner layer encapsulating the nozzle plate. The liner layer further at least partially encapsulates each flow feature of the plurality of flow features. The liner layer is composed of an inorganic material. Further disclosed is a method for fabricating the ejection device.
    Type: Application
    Filed: April 29, 2011
    Publication date: November 1, 2012
    Inventors: Xiaorong Cai, Jiandong Fang, Xiaoming Wu, Elaine Yeap Money, Eunki Hong, Yimin Guan, Burton Joyner, II, Sean Terrance Weaver, David Graham, Zach Reitmeier
  • Publication number: 20120236076
    Abstract: Disclosed is a printhead for a printer that includes a plurality of ejection chip units. Each ejection chip unit of the plurality of ejection chip units is configured to eject at least one fluid. The printhead further includes a plurality of supporting units. Each supporting unit of the plurality of supporting units is fluidly coupled with a corresponding ejection chip unit. The each supporting unit includes a plurality of trenches adapted to receive an adhesive to facilitate attachment of the each supporting unit with the corresponding ejection chip unit. Furthermore, the printhead includes a base unit fluidly coupled with the each supporting unit of the plurality of supporting units. The base unit is adapted to provide the at least one fluid to the each ejection chip unit through a corresponding to supporting unit. Further disclosed is a method for assembling the printhead.
    Type: Application
    Filed: March 14, 2011
    Publication date: September 20, 2012
    Inventors: Michael J. Dixon, Jiandong Fang, Richard Earl Corley, JR., Jeanne Marie Saldanha Singh, Frank E. Anderson, Xiaoming Wu
  • Publication number: 20120082933
    Abstract: Environmentally friendly thick film layers for a micro-fluid ejection head and micro-fluid ejection heads are disclosed. The environmentally friendly thick film layer includes a negative photoresist layer derived from a composition comprising a multi-functional epoxy compound, a low molecular weight polymeric difunctional epoxy compound, a monomeric difunctional epoxy compound, a methide-based photoacid generator that does not contain antimony, a chromophore and an aryl ketone solvent. Optionally the photoresist layer contains an adhesion enhancer. The negative photoresist layer is environmentally friendly and provides good resolution, well defined critical dimensions, straight side walls, and a large processing window.
    Type: Application
    Filed: September 30, 2010
    Publication date: April 5, 2012
    Inventors: XIAOMING WU, David Graham, Sean Weaver, Bart Mansdorf, Rich Wells, Joel Provence
  • Publication number: 20110318882
    Abstract: A method of bonding a chip to a wafer at precise alignment suitable for fabricating a heater chip in an ink jet printhead is provided. The method includes spray coating an adhesive composition on a surface of a substrate, aligning and tacking at least one chip to the substrate coated with the adhesive composition, exposing the substrate tacked with at least one chip coated with the adhesive composition to radiation and heat, and performing thermal compression bonding. The method uses a spray coatable adhesive composition comprising a thermally activated adhesive and a photoacid generator.
    Type: Application
    Filed: June 24, 2011
    Publication date: December 29, 2011
    Inventors: Xiaoming Wu, Paul Dryer, David Rhine, Anne Pearson, Jeanne Marie Saldanha Singh, Richard Wells, Joel Provence
  • Publication number: 20110319513
    Abstract: A spray coatable adhesive composition used for bonding silicon dies to a rigid substrate, preferable a silicon substrate is disclosed. The adhesive composition includes an epoxy based resin, a thermal acid generator, a photoacid generator and a solvent. The epoxy based resin includes a mixture of a solid bisphenol A epoxy resin and a liquid or semi-liquid hydrogenated bisphenol A epoxy resin at a weight ratio ranging from about 80:20 to about 65:35. The adhesive composition has a low viscosity which allows it to be spray coated on a rigid substrate and form thin film adhesive which allows silicon dies to be bonded with precise placement on the silicon substrate.
    Type: Application
    Filed: June 24, 2011
    Publication date: December 29, 2011
    Inventors: Xiaoming Wu, Paul Dryer, David Rhine, Anna Pearson, Jeanne Marie Saldanha Singh, Richard Wells, Joel Provence
  • Patent number: 8053515
    Abstract: A polymer includes a first type of repeat unit represented by Formula I: where X is selected from —CH2—, —CH2—CH2—, or —O—; m is an integer from 0 to about 5; and where for the first type of repeat unit one of R1, R2, R3, and R4 is one of a maleimide containing group and for the second type of repeat unit one of R1, R2, R3, and R4 is a hindered aromatic group, a C8 or greater alkyl group, a C4 or greater halohydrocarbyl or perhalocarbyl group, a C7 or greater aralkyl group, or a heteroatom hydrocarbyl or halohydrocarbyl group.
    Type: Grant
    Filed: December 3, 2007
    Date of Patent: November 8, 2011
    Assignee: Promerus LLC
    Inventors: Edmund Elce, Andrew Bell, Brian Knapp, Hendra Ng, Larry F. Rhodes, Robert Shick, Wei Zhang, William DiMenna, Saikumar Jayaraman, Jianyong Jin, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Xiaoming Wu, Etsu Takeuchi
  • Patent number: 7954926
    Abstract: A nozzle plate for a micro-fluid ejection head, a method of making a hydrophobic nozzle plate, and a method for improving the resiliency of a nozzle plate. The nozzle has a photoimageable hydrophobic polycyclic polyolefin layer derived from an epoxy functionalized polynorbornene.
    Type: Grant
    Filed: January 23, 2008
    Date of Patent: June 7, 2011
    Assignee: Lexmark International, Inc.
    Inventors: Craig Michael Bertelsen, Christopher Allen Craft, Bryan Thomas Fannin, David Christopher Graham, Kelly Ann Killeen, Bart Allan Mansdorf, Sean Terrance Weaver, Xiaoming Wu
  • Publication number: 20110070543
    Abstract: Embodiments in accordance with the present invention encompass negative-tone, aqueous base developable, self-imageable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.
    Type: Application
    Filed: September 21, 2009
    Publication date: March 24, 2011
    Applicant: PROMERUS LLC
    Inventors: Brian Knapp, Edmund Elce, Andrew Bell, Cheryl Burns, Sridevi Kaiti, Brian Kocher, Hendra Ng, Yogesh Patel, Masanobu Sakamoto, Xiaoming Wu, Linda Zhang
  • Patent number: 7888415
    Abstract: A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to faun a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.
    Type: Grant
    Filed: February 4, 2010
    Date of Patent: February 15, 2011
    Assignee: Promerus LLC
    Inventors: Larry F. Rhodes, Dennis A. Barnes, Andrew Bell, Brian K. Bennett, Chun Chang, John Henry Lipian, Xiaoming Wu
  • Patent number: 7863394
    Abstract: A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to form a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.
    Type: Grant
    Filed: September 7, 2006
    Date of Patent: January 4, 2011
    Assignee: Promerus LLC
    Inventors: Larry F. Rhodes, Dennis A. Barnes, Andrew Bell, Brian K. Bennett, Chun Chang, John-Henry Lipian, Xiaoming Wu
  • Patent number: 7858721
    Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.
    Type: Grant
    Filed: April 27, 2009
    Date of Patent: December 28, 2010
    Assignee: Promerus LLC
    Inventors: Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Robert Shick, Xiaoming Wu, Hiroaki Makabe, Yasunori Takahashi, Etsu Takeuchi, Daoji Gan, Seok Ho Kang
  • Patent number: 7851575
    Abstract: A polymer comprising polycyclic repeating units having recurring ion conducting groups and optional crosslinkable groups is disclosed. The present invention provides the capability of tailoring polymers to impart unique properties to membranes fabricated from the polymers. Membranes comprising the polymers and methods for preparing the membranes and their use in ion conducting membranes, particularly in fuel cells, are also provided.
    Type: Grant
    Filed: November 9, 2007
    Date of Patent: December 14, 2010
    Assignee: Promerus LLC
    Inventors: Ramakrishna Ravikiran, Xiaoming Wu, Larry F. Rhodes, Robert A. Shick, Hiroko Nakano, Hirotaka Nonaka, Huabin Wang, Robert John Duff, Saikumar Jayaraman, John-Henry Lipian
  • Publication number: 20100177488
    Abstract: A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to faun a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.
    Type: Application
    Filed: February 4, 2010
    Publication date: July 15, 2010
    Applicant: PROMERUS LLC
    Inventors: Larry F. Rhodes, Dennis A. Barnes, Andrew Bell, Brian K. Bennett, Chun Chang, Xiaoming Wu, John-Henry Lipian
  • Patent number: 7674847
    Abstract: A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to form a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.
    Type: Grant
    Filed: February 19, 2004
    Date of Patent: March 9, 2010
    Assignee: Promerus LLC
    Inventors: Larry F. Rhodes, Dennis A. Barnes, Andrew Bell, Brian K. Bennet, Chung Chang, John-Henry Lipian, Xiaoming Wu