Patents by Inventor Xiaoming Wu

Xiaoming Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100035609
    Abstract: A method for implementing load migration in a pool area is disclosed. The method includes that: the destination CN node receives an identifier of a subscriber ready for migration; and the destination CN node migrates the subscriber ready for migration to the destination CN node, and allocates a local office identifier to the migrated subscriber. In addition, a system for implementing load migration in a pool area and a CN node are disclosed.
    Type: Application
    Filed: October 16, 2009
    Publication date: February 11, 2010
    Applicant: HUAWEI TECHNOLOGIES CO., LTD.
    Inventors: Tao Hui, Xiaoming Wu, Xiaochun Cui, Sihai Ye, Jun Fang
  • Publication number: 20090215976
    Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.
    Type: Application
    Filed: April 27, 2009
    Publication date: August 27, 2009
    Inventors: Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Robert Shick, Xiaoming Wu, Hiroaki Makabe, Yasunori Takahashi, Daoji Gan, Etsu Takeuchi, Seok Ho Kang
  • Publication number: 20090185003
    Abstract: A nozzle plate for a micro-fluid ejection head, a method of making a hydrophobic nozzle plate, and a method for improving the resiliency of a nozzle plate. The nozzle has a photoimageable hydrophobic polycyclic polyolefin layer derived from an epoxy functionalized polynorbornene.
    Type: Application
    Filed: January 23, 2008
    Publication date: July 23, 2009
    Inventors: Craig Michael Bertelsen, Christopher Allen Craft, Bryan Thomas Fannin, David Christopher Graham, Kelly Ann Killeen, Bart Allan Mansdorf, Sean Terrance Weaver, Xiaoming Wu
  • Patent number: 7524594
    Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.
    Type: Grant
    Filed: July 1, 2005
    Date of Patent: April 28, 2009
    Assignee: Promerus LLC
    Inventors: Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Robert Shick, Xiaoming Wu, Hiroaki Makabe, Yasunori Takahashi, Etsu Takeuchi, Daoji Gan, Seok Ho Kang
  • Publication number: 20080242750
    Abstract: A polymer comprising polycyclic repeating units having recurring ion conducting groups and optional crosslinkable groups is disclosed. The present invention provides the capability of tailoring polymers to impart unique properties to membranes fabricated from the polymers. Membranes comprising the polymers and methods for preparing the membranes and their use in ion conducting membranes, particularly in fuel cells, are also provided.
    Type: Application
    Filed: November 9, 2007
    Publication date: October 2, 2008
    Inventors: R. Ravikiran, Xiaoming Wu, Larry F. Rhodes, Robert A. Shick, Hiroko Nakano, Hirotaka Nonaka, Huabin Wang, Robert John Duff, Saikumar Jayaraman, John-Henry Lipian
  • Publication number: 20080194740
    Abstract: A polymer includes a first type of repeat unit represented by Formula I: where X is selected from —CH2—, —CH2—CH2—, or —O—; m is an integer from 0 to about 5; and where for the first type of repeat unit one of R1, R2, R3, and R4 is one of a maleimide containing group and for the second type of repeat unit one of R1, R2, R3, and R4 is a hindered aromatic group, a C8 or greater alkyl group, a C4 or greater halohydrocarbyl or perhalocarbyl group, a C7 or greater aralkyl group, or a heteroatom hydrocarbyl or halohydrocarbyl group.
    Type: Application
    Filed: December 3, 2007
    Publication date: August 14, 2008
    Inventors: Edmund Elce, Andrew Bell, Brian Knapp, Hendra Ng, Larry F. Rhodes, Robert Shick, Wei Zhang, William DiMenna, Saikumar Jayaraman, Jianyong Jin, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Xiaoming Wu, Etsu Takeuchi
  • Patent number: 7356596
    Abstract: Automated techniques are described that provide continuous, uninterrupted operation of the secure packet tunnels in spite of access link flooding attacks. A system is described that includes a source device and a destination device coupled to a network. The source and destination devices may comprise, for example, edge routers that couple local area networks to the network via access links. The source device and the destination device establish a packet tunnel that has a source network address and a destination network address. Upon detecting a network attack, the destination device selects a new network address for at least one of the source network address and the destination network address and establishes a new packet tunnel with the source device. The source network address and the destination network address may comprise port numbers, Internet Protocol (IP) addresses, or other information describing the source and destination devices.
    Type: Grant
    Filed: January 25, 2002
    Date of Patent: April 8, 2008
    Assignee: Architecture Technology Corp.
    Inventors: Ranga S. Ramanujan, Maher N. Kaddoura, Xiaoming Wu, Kevin S. Millikin
  • Patent number: 7341818
    Abstract: The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.
    Type: Grant
    Filed: January 10, 2005
    Date of Patent: March 11, 2008
    Assignee: Promerus LLC
    Inventors: Xiaoming Wu, Larry F. Rhodes, Lawrence Seger
  • Patent number: 7312292
    Abstract: A polymer comprising polycyclic repeating units having recurring ion conducting groups and optional crosslinkable groups is disclosed. The present invention provides the capability of tailoring polymers to impart unique properties to membranes fabricated from the polymers. Membranes comprising the polymers and methods for preparing the membranes and their use in ion conducting membranes, particularly in fuel cells, are also provided.
    Type: Grant
    Filed: June 4, 2004
    Date of Patent: December 25, 2007
    Assignee: Promerus LLC
    Inventors: Ravi Ravikiran, Xiaoming Wu, Larry F. Rhodes, Robert A. Shick, Hiroko Nakano, Hirotaka Nonaka, Huabin Wang, Saikumar Jayaraman, Robert John Duff, John-Henry Lipian
  • Publication number: 20070066775
    Abstract: A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to form a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.
    Type: Application
    Filed: September 7, 2006
    Publication date: March 22, 2007
    Applicant: Promerus LLC
    Inventors: Larry Rhodes, Dennis Barnes, Andrew Bell, Brian Bennett, Chun Chang, John-Henry Lipian, Xiaoming Wu
  • Patent number: 7101654
    Abstract: The disclosed invention relates to novel norbornene-type monomers containing pendent lactone or sultone groups. The invention also relates to norbornene-type polymers and copolymers comprising one or more repeating units represented by the formula: and containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.
    Type: Grant
    Filed: January 14, 2004
    Date of Patent: September 5, 2006
    Assignee: Promerus LLC
    Inventors: Xiaoming Wu, Larry F. Rhodes, Lawrence Seger
  • Publication number: 20060008734
    Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.
    Type: Application
    Filed: July 1, 2005
    Publication date: January 12, 2006
    Inventors: Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Puthenkovilakom, Ramakrishna Ravikiran, Robert Shick, Xiaoming Wu, Hiroaki Makabe, Yasunori Takahashi, Etsu Takeuchi, Daoji Gan, Seok Kang
  • Publication number: 20050153233
    Abstract: The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.
    Type: Application
    Filed: January 14, 2004
    Publication date: July 14, 2005
    Inventors: Xiaoming Wu, Larry Rhodes, Lawrence Seger
  • Publication number: 20050153240
    Abstract: The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.
    Type: Application
    Filed: January 10, 2005
    Publication date: July 14, 2005
    Inventors: Xiaoming Wu, Larry Rhodes, Lawrence Seger
  • Publication number: 20050019638
    Abstract: A polymer comprising polycyclic repeating units having recurring ion conducting groups and optional crosslinkable groups is disclosed. The present invention provides the capability of tailoring polymers to impart unique properties to membranes fabricated from the polymers. Membranes comprising the polymers and methods for preparing the membranes and their use in ion conducting membranes, particularly in fuel cells, are also provided.
    Type: Application
    Filed: June 4, 2004
    Publication date: January 27, 2005
    Inventors: R. Ravikiran, Xiaoming Wu, Larry Rhodes, Robert Shick, Hiroko Nakano, Hirotaka Nonaka, Huabin Wang, Saikumar Jayaraman, Robert Duff, John-Henry Lipian
  • Publication number: 20040229157
    Abstract: A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to form a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.
    Type: Application
    Filed: February 19, 2004
    Publication date: November 18, 2004
    Applicant: Promerus LLC
    Inventors: Larry F. Rhodes, Dennis A. Barnes, Andrew Bell, Brian K. Bennet, Chun Chang, John-Henry Lipian, Xiaoming Wu
  • Publication number: 20030110288
    Abstract: Automated techniques are described that provide continuous, uninterrupted operation of the secure packet tunnels in spite of access link flooding attacks. A system is described that includes a source device and a destination device coupled to a network. The source and destination devices may comprise, for example, edge routers that couple local area networks to the network via access links. The source device and the destination device establish a packet tunnel that has a source network address and a destination network address. Upon detecting a network attack, the destination device selects a new network address for at least one of the source network address and the destination network address and establishes a new packet tunnel with the source device. The source network address and the destination network address may comprise port numbers, Internet Protocol (IP) addresses, or other information describing the source and destination devices.
    Type: Application
    Filed: January 25, 2002
    Publication date: June 12, 2003
    Inventors: Ranga S. Ramanujan, Maher N. Kaddoura, Xiaoming Wu, Kevin S. Millikin