Abstract: A semiconductor device includes a substrate, a seal ring, sensing devices, conductive towers, and an insulation layer. The substrate has a circuit region and a peripheral region around the circuit region. The seal ring is formed over the substrate and disposed in the peripheral region. The sensing devices are formed over the substrate and disposed between the seal ring and the circuit region. The conductive towers are formed over the substrate and disposed between the seal ring and the sensing devices. The conductive towers are configured to provide discharge paths for the sensing devices. The insulation layer is formed over the substrate. The seal ring, the sensing devices and the conductive towers are formed within the insulation layer.

Abstract: A method for inspecting a bonded structure includes: bonding a first semiconductor structure to a second semiconductor structure through a plurality of first conductive connectors between a first surface of the first semiconductor structure and the second semiconductor structure, wherein the first conductive connectors are electrically connected to each other by a plurality of first conductive lines within the second semiconductor structure; applying a voltage to the first conductive connectors through at least one of a plurality of second conductive connectors to obtain an electrical parameter, wherein the second conductive connectors are disposed at a second surface of the first semiconductor structure and electrically connected to the first conductive connectors; and evaluating a bonding status associated with the first conductive connectors according to the electrical parameter. The first conductive connectors are arranged adjacent to a corner or a periphery of the first semiconductor structure.

Abstract: A micro electro mechanical system (MEMS) includes a circuit substrate, a first MEMS structure disposed over the circuit substrate, and a second MEMS structure disposed over the first MEMS structure.

Abstract: A semiconductor device includes a bottom die and a top die. The includes a first test pad set, a second test pad set, a first bottom BPM set electrically connected with the first test pad set, and a second bottom BPM set electrically connected with the second test pad set. The top die includes a first top BPM set bonding to the first bottom BPM set, and a second top BPM set bonding to the second bottom BPM set. The first test pad set has a test pad area, the first bottom BPM set has a first bottom BPM area, and the second bottom BPM set has a second bottom BPM area. The test pad area is greater than the first bottom BPM area and the second bottom BPM area, and the first bottom BPM area is equal to or less than the second bottom BPM area.

Abstract: Some embodiments relate to an integrated device, including: a first interconnect structure on a first substrate; a first central bond pad coupled to the first interconnect structure; a first peripheral bond pad on a first side of the first central bond pad separated by a first distance; a second peripheral bond pad on a second side of the first central bond pad and separated by a second distance substantially equal to the first distance; a second interconnect structure on a second substrate; a first overlying bond pad coupled to the second interconnect structure and bonded to the first central bond pad; and a plurality of exposed bond pads respectively coupled to the first central bond pad, the first peripheral bond pad, the second peripheral bond pad, and the first overlying bond pad, wherein the plurality of exposed bond pads extend past outer sidewalls of the second substrate.

Abstract: An integrated circuit package includes a substrate, a semiconductor interposer on the substrate, and a first integrated circuit chip on the interposer. The interposer includes a galvanic effect test structure including a test contact pad and a detection contact pad. The interposer includes a plurality of primary contact pads electrically coupled to the first integrated circuit chip. The galvanic effect structure can be utilized to test the interposer for galvanic corrosion prior to assembling the interposer into the integrated circuit package.

Abstract: A semiconductor structure includes a recess extending into a substrate and an inductor device including a first isolation layer, a first magnetic layer over the first isolation layer, a second isolation layer over the first magnetic layer, and a conductive element surrounded by the second isolation layer, wherein at least a portion of the inductor device is disposed within the recess. A method of manufacturing a semiconductor structure includes disposing a first isolation layer on a surface of a substrate and extending into a recess formed on the surface; disposing a first magnetic layer over the first isolation layer; disposing a second isolation layer over the first magnetic layer to form a trench; disposing a conductive element in the trench; disposing a third isolation layer over the first magnetic layer, the conductive element and the second isolation layer; and disposing a second magnetic layer over the third isolation layer.

Abstract: A semiconductor includes a first substrate having a device region and a ring region surrounding the device region, a first interconnect structure over the first substrate, the first interconnect structure including a first via tower and a second via tower, a first bonding layer over the first interconnect structure and including a first metal bonding feature, a second bonding layer over the first bonding layer and including a second metal bonding feature in contact with the first metal bonding feature, and a second interconnect structure over the second bonding layer and including a third via tower extending through the second interconnect structure and disposed directly over the ring region. The first via tower is electrically coupled to the second via tower by a first metal line. The first via tower is electrically coupled to the third via tower by the first metal bonding feature and the second metal bonding feature.

Abstract: A semiconductor structure includes a recess extending into a substrate and an inductor device including a first isolation layer, a first magnetic layer over the first isolation layer, a second isolation layer over the first magnetic layer, and a conductive element surrounded by the second isolation layer, wherein at least a portion of the inductor device is disposed within the recess. A method of manufacturing a semiconductor structure includes disposing a first isolation layer on a surface of a substrate and extending into a recess formed on the surface; disposing a first magnetic layer over the first isolation layer; disposing a second isolation layer over the first magnetic layer to form a trench; disposing a conductive element in the trench; disposing a third isolation layer over the first magnetic layer, the conductive element and the second isolation layer; and disposing a second magnetic layer over the third isolation layer.

Abstract: A semiconductor structure includes: a first semiconductor die or wafer including a first bonding crack detection structure portion including discrete bonding crack detection structure portions that are electrically isolated, and a second semiconductor die or wafer bonded to the first semiconductor die, the second semiconductor die or wafer including a second bonding crack detection structure portion including discrete bonding crack detection structure portions that are electrically isolated, wherein the first bonding crack detection structure portion and the second bonding crack detection structure portion are bonded together to form a bonding crack detection structure.

Abstract: A method for fabricating a semiconductor device is provided. The method includes forming a transistor over a semiconductor substrate; forming an interconnect structure including a test structure; forming conductive pads respectively electrically connected with nodes of the test structure, and performing a probe test on the conductive pads. A tower of the test structure connected between the two nodes includes at least one test metal via of a first via layer, at least one test metal via of a second via layer, and at least one test metal via of a third via layer. A size of the test metal via of the second via layer is less than a size of the test metal via of the third via layer, and a number of the test metal via of the second via layer is less than a number of the test metal via of the first via layer.

Abstract: A method of testing a semiconductor package includes: attaching a charge measurement unit to a carrier substrate; forming a first metallization layer over the charge measurement unit, wherein the forming of the first metallization layer induces first charges to accumulate on the charge measurement unit; performing a first test against the charge measurement unit to determine whether breakdown occurs in the charge measurement unit; and in response to determining that no breakdown occurs in the charge measurement unit, forming a second metallization layer over the first metallization layer.

Abstract: A semiconductor includes a first substrate having a device region and a ring region surrounding the device region, a first interconnect structure over the first substrate, the first interconnect structure including a first via tower and a second via tower, a first bonding layer over the first interconnect structure and including a first metal bonding feature, a second bonding layer over the first bonding layer and including a second metal bonding feature in contact with the first metal bonding feature, and a second interconnect structure over the second bonding layer and including a third via tower extending through the second interconnect structure and disposed directly over the ring region. The first via tower is electrically coupled to the second via tower by a first metal line. The first via tower is electrically coupled to the third via tower by the first metal bonding feature and the second metal bonding feature.

Abstract: A method includes forming a solder layer on a surface of one or more chips. A lid is positioned over the solder layer on each of the one or more chips. Heat and pressure are applied to melt the solder layer and attach each lid to a corresponding solder layer. The solder layer has a thermal conductivity of ?50 W/mK.

Abstract: A method of testing a semiconductor package includes: forming a charge measurement unit over a carrier substrate; forming a first dielectric layer over the charge measurement unit; forming a first metallization layer over the dielectric layer, wherein the forming of the first metallization layer induces first charges to accumulate on the charge measurement unit; performing a first test against the charge measurement unit to determine whether breakdown occurs in the charge measurement unit; and in response to determining that no breakdown occurs in the charge measurement unit, forming a second dielectric layer over the first metallization layer.

Abstract: An integrated circuit (IC) package includes a first integrated circuit (IC) device. An interconnection structure is disposed over the first IC device in a cross-sectional side view. The interconnection structure includes a plurality of interconnection components. A cavity is disposed in the interconnection structure in the cross-sectional side view. A second IC device is disposed at least partially within the cavity in the cross-sectional side view. The second IC device is electrically coupled to the first IC device through at least a subset of the interconnection components of the interconnection structure. A non-metallic material partially fills the cavity. The second IC device is at least partially surrounded by the non-metallic material in the cross-sectional side view and in a top view.

Abstract: A semiconductor structure includes an interconnect structure, a passivation structure, a first capacitor, and a contact feature. The interconnect structure is disposed over a semiconductor substrate. The passivation structure is disposed over the interconnect structure. The first capacitor is disposed within the passivation structure. The contact feature is disposed over the passivation structure, wherein the first capacitor is proximal to a corner of the contact feature. A method of manufacturing the semiconductor structure is also provided.

Abstract: A semiconductor structure includes a first die; a molding surrounding the first die; a redistribution layer (RDL) disposed under the first die and the molding, and including a plurality of first conductive pads and a dielectric layer surrounding the plurality of first conductive pads; a second die disposed under the RDL, and including a plurality of first die pads over the second die; and a plurality of first conductive bumps disposed between the RDL and the second die, wherein each of the plurality of first conductive bumps is electrically coupled with corresponding one of the plurality of first die pads and corresponding one of the plurality of first conductive pads, the plurality of first die pads are respectively arranged at corners of the second die, and the plurality of first conductive bumps are electrically connected in series.

Abstract: A method includes forming a solder layer on a surface of one or more chips. A lid is positioned over the solder layer on each of the one or more chips. Heat and pressure are applied to melt the solder layer and attach each lid to a corresponding solder layer. The solder layer has a thermal conductivity of ?50 W/mK.

Abstract: A semiconductor package structure includes a semiconductor die encapsulated in a molding compound, a redistribution structure over the semiconductor die and the molding compound, a surface device over and electrically connected to the redistribution structure, a first connector over and electrically connected to the redistribution structure, a second connector between the surface device and the redistribution structure, a trench in the redistribution structure and laterally surrounding the surface device in a top view of the semiconductor package structure, and an underfill. The second connector electrically connects the surface device to the redistribution structure. The underfill surrounds the second connector. The underfill include a first portion and a second portion. The first portion of the underfill is located between the surface device and the redistribution structure and laterally surrounding the second connector, and the second portion of the underfill is disposed in the trench.