Abstract: The memory capacity of a DRAM is enhanced. A semiconductor memory device includes a driver circuit including part of a single crystal semiconductor substrate, a multilayer wiring layer provided over the driver circuit, and a memory cell array layer provided over the multilayer wiring layer. That is, the memory cell array overlaps with the driver circuit. Accordingly, the integration degree of the semiconductor memory device can be increased as compared to the case where a driver circuit and a memory cell array are provided in the same plane of a substrate containing a singe crystal semiconductor material.

Abstract: An error of stored data is detected with high accuracy. Data (e.g., a remainder in a CRC) used for detecting an error is stored in a memory in which an error is unlikely to occur. Specifically, the following semiconductor device is used: a memory element including a plurality of transistors, a capacitor, and a data storage portion is provided in a matrix; the data storage portion includes one of a source and a drain of one of the plurality of transistors, a gate of another one of the plurality of transistors, and one electrode of the capacitor; a semiconductor layer including a channel of the transistor, the one of the source and the drain of which is connected to the data storage portion, has a band gap of 2.8 eV or more, or 3.2 eV or more; and the data storage portion stores data for detecting an error.

Abstract: A novel programmable logic device is provided. Programmable switches each include a first transistor and a second transistor. The first transistor in a first programmable switch controls conduction between a first wiring and a gate of the second transistor in the first programmable switch. The second transistor in the first programmable switch controls conduction between the first wiring and a second wiring. The first transistor in the second programmable switch controls conduction between another first wiring and a gate of the second transistor in the second programmable switch.

Abstract: A structure with which the zero current of a field effect transistor using a conductor-semiconductor junction can be reduced is provided. A floating electrode (102) including a conductor or a semiconductor and being enclosed by an insulator (104) is formed between a semiconductor layer (101) and a gate (105) so as to cross the semiconductor layer (101) and the floating electrode (102) is charged, whereby carriers are prevented from flowing from a source electrode (103a) or a drain electrode (103b). Accordingly, a sufficiently low carrier concentration can be kept in the semiconductor layer (101) and thus the zero current can be reduced.

Abstract: A plurality of writing transistors are connected in series, and a gate of a pass transistor, an input terminal of an inverter, or the like is directly or indirectly connected to each connection portion of the writing transistors. For example, a signal processing device includes first to third pass transistors, one semiconductor layer, and first to third wirings that overlap with the semiconductor layer and do not overlap with each other. Potentials of the first to third wirings can each change conductivities of at least portions of the semiconductor layer that overlap with the respective wirings. Gates of the first to third pass transistors are electrically connected to the semiconductor layer and are brought into a floating state depending on the conductivities of the portions of the semiconductor layer. Conduction between sources and drains of the pass transistors is controlled by potentials of the gates in the floating state.

Abstract: It is an object to provide a semiconductor device in which power consumption can be reduced. It is another object to provide a highly reliable semiconductor device using a programming cell, such as a programmable logic device (PLD). In accordance with a change in a configuration of connections between basic blocks, power supply voltage furnishing to the basic blocks is changed. That is, when the structure of connections between the basic blocks is such that a basic block does not contribute to a circuit, the supply of the power supply voltage to this basic block is stopped. Further, the supply of the power supply voltage to the basic blocks is controlled using a programming cell formed using a field effect transistor whose channel formation region is formed using an oxide semiconductor, the field effect transistor having extremely low off-state current or extremely low leakage current.

Abstract: A semiconductor device using a programming unit with is provided. A highly reliable semiconductor device using the programming unit is provided. A highly integrated semiconductor device using the programming unit is provided. In a semiconductor circuit having a function of changing a structure of connections between logic cells such as PLDs, connection and disconnection between the logic cells or power supply to the logic cells is controlled by a programming unit using an insulated gate field-effect transistor with a small amount of off-state current or leakage current. A transfer gate circuit may be provided in the programming unit. To lower driving voltage, a capacitor may be provided in the programming unit and the potential of the capacitor may be changed during configuration and during operation.

Abstract: A lookup table with low power consumption is provided. The lookup table includes a memory element including a transistor and a capacitor. A drain of the transistor is connected to one electrode of a capacitor and the input of an inverter, and a source is connected to a first wiring. The other electrode of the capacitor is connected to a second wiring. In such a memory element, the potential of the second wiring is complementary to the potential of the first wiring when writing data; accordingly, the potential of the drain of the transistor, i.e., the potential of the input of the inverter can be higher than the high potential of the inverter. Thus, shoot-through current of the inverter at this time can be significantly reduced. As a result, power consumption in a standby state can be significantly reduced.

Abstract: It is an object to provide a semiconductor device in which power consumption can be reduced. It is another object to provide a highly reliable semiconductor device using a programming cell, such as a programmable logic device (PLD). In accordance with a change in a configuration of connections between basic blocks, power supply voltage furnishing to the basic blocks is changed. That is, when the structure of connections between the basic blocks is such that a basic block does not contribute to a circuit, the supply of the power supply voltage to this basic block is stopped. Further, the supply of the power supply voltage to the basic blocks is controlled using a programming cell formed using a field effect transistor whose channel formation region is formed using an oxide semiconductor, the field effect transistor having extremely low off-state current or extremely low leakage current.

Abstract: A semiconductor device using a programming unit with is provided. A highly reliable semiconductor device using the programming unit is provided. A highly integrated semiconductor device using the programming unit is provided. In a semiconductor circuit having a function of changing a structure of connections between logic cells such as PLDs, connection and disconnection between the logic cells or power supply to the logic cells is controlled by a programming unit using an insulated gate field-effect transistor with a small amount of off-state current or leakage current. A transfer gate circuit may be provided in the programming unit. To lower driving voltage, a capacitor may be provided in the programming unit and the potential of the capacitor may be changed during configuration and during operation.

Abstract: Provided is a field-effect transistor (FET) having small off-state current, which is used in a miniaturized semiconductor integrated circuit. The field-effect transistor includes a thin oxide semiconductor which is formed substantially perpendicular to an insulating surface, a gate insulating film formed to cover the oxide semiconductor, and a gate electrode which is formed to cover the gate insulating film. The gate electrode partly overlaps a source electrode and a drain electrode. The source electrode and the drain electrode are in contact with at least a top surface of the oxide semiconductor. In this structure, three surfaces of the thin oxide semiconductor are covered with the gate electrode, so that electrons injected from the source electrode or the drain electrode can be effectively removed, and most of the space between the source electrode and the drain electrode can be a depletion region; thus, off-state current can be reduced.

Abstract: An object is to increase the retention characteristics of a memory device formed using a wide bandgap semiconductor. A bit line controlling transistor is inserted in a bit line in series. The minimum potential of a gate of the transistor is set to a sufficiently negative value. The gate of the transistor is connected to a bit line controlling circuit connected to a battery. The minimum potential of the bit line is set higher than that of a word line. When power from an external power supply is interrupted, the bit line is cut off by the transistor, ensuring prevention of outflow of charge in the bit line. The potential of a source or a drain (bit line) of a cell transistor is sufficiently higher than that of a gate of the cell transistor, resulting in an absolute off-state; thus, data can be retained. Other embodiments are disclosed.

Abstract: Highly-pure graphite oxide, graphene oxide, or graphene is mass-produced. Graphite is oxidized by an oxidizer, so that a graphite oxide solution is obtained, and electrodialysis is performed on the graphite oxide solution to remove aqueous ions, whereby the purity of graphite oxide is increased. Graphene oxide manufactured using the graphite oxide is mixed with powder, and the mixture is reduced, whereby graphene exhibiting conductive properties is yielded and the powder can be bonded. Such graphene can be used instead of a conduction auxiliary agent or a binder of a variety of batteries.

Abstract: A method for driving a semiconductor device capable of reducing an area of a multiplexer and reducing its power consumption is provided. In a method for operating a semiconductor device including a memory and a multiplexer, a first transistor is connected to a first capacitor, and a second transistor is connected to a second capacitor. In the multiplexer, in a third transistor, a source is connected to a first input terminal and a drain is connected to an output terminal and, in a fourth transistor, a source is connected to a second input terminal and a drain is connected to the output terminal. Further, a step of holding a first potential in a node to which the first transistor, the first capacitor, and a gate of the third transistor are connected and holding a second potential higher than the first potential in the node is included.

Abstract: A lookup table with low power consumption is provided. The lookup table includes a memory element including a transistor and a capacitor. A drain of the transistor is connected to one electrode of a capacitor and the input of an inverter, and a source is connected to a first wiring. The other electrode of the capacitor is connected to a second wiring. In such a memory element, the potential of the second wiring is complementary to the potential of the first wiring when writing data; accordingly, the potential of the drain of the transistor, i.e., the potential of the input of the inverter can be higher than the high potential of the inverter. Thus, shoot-through current of the inverter at this time can be significantly reduced. As a result, power consumption in a standby state can be significantly reduced.

Abstract: An electronic device includes a flexible display substrate including a transmission-type display region and a non-transmission-type display region, and the flexible display substrate is fixed on one or more of housings. Portion of the housing is transparent, and the transmission-type display region overlaps with this transparent portion. In addition, the non-transmission-type display region overlaps with opaque components such as an arithmetic processing unit, a battery, or the like stored in the housing. Display contents and display modes are used properly for the transmission-type display region and the non-transmission-type display region, thereby making it possible to display various images. Other embodiments are also claimed.

Abstract: An insulating film is provided over one surface of a first semiconductor layer including a first oxide semiconductor including indium as a main component, and a second semiconductor layer including an i-type second oxide semiconductor is provided in contact with the other surface. The energy difference between a vacuum level and a Fermi level in the second oxide semiconductor is larger than that in the first oxide semiconductor. In the first semiconductor layer, a region in the vicinity of the junction surface with the second oxide semiconductor which satisfies the above condition is a region having an extremely low carrier concentration (a quasi-i-type region). By using the region as a channel, the off-state current can be reduced. Further, a drain current of the FET flows through the first oxide semiconductor having a high mobility; accordingly, a large amount of current can be extracted.

Abstract: Provided is a field-effect transistor (FET) having small off-state current, which is used in a miniaturized semiconductor integrated circuit. The field-effect transistor includes a thin oxide semiconductor which is formed substantially perpendicular to an insulating surface, a gate insulating film formed to cover the oxide semiconductor, and a gate electrode which is formed to cover the gate insulating film. The gate electrode partly overlaps a source electrode and a drain electrode. The source electrode and the drain electrode are in contact with at least a top surface of the oxide semiconductor. In this structure, three surfaces of the thin oxide semiconductor are covered with the gate electrode, so that electrons injected from the source electrode or the drain electrode can be effectively removed, and most of the space between the source electrode and the drain electrode can be a depletion region; thus, off-state current can be reduced.

Abstract: A programming element including a first transistor, a second transistor, and a capacitor between a logic circuit using a semiconductor element and a power supply is provided. In the programming element, a node where a drain electrode of the first transistor, a gate electrode of the second transistor, and one of electrodes of the capacitor are electrically connected to each other is formed. A potential can be supplied to each of a source electrode of the first transistor and the other of the electrodes of the capacitor. The power supply and the logic circuit are electrically connected to each other through a source electrode and a drain electrode of the second transistor. A connection state between the power supply and the logic circuit is controlled in accordance with the state of the second transistor.

Abstract: A structure with which the zero current of a field effect transistor using a conductor-semiconductor junction can be reduced is provided. A floating electrode (102) including a conductor or a semiconductor and being enclosed by an insulator (104) is formed between a semiconductor layer (101) and a gate (105) so as to cross the semiconductor layer (101) and the floating electrode (102) is charged, whereby carriers are prevented from flowing from a source electrode (103a) or a drain electrode (103b). Accordingly, a sufficiently low carrier concentration can be kept in the semiconductor layer (101) and thus the zero current can be reduced.