Abstract: An exposure apparatus includes a substrate stage on which substrates are placed, and first projection modules each including a spatial light modulator, the first projection modules projecting wiring patterns each connecting semiconductor chips arranged on each of the substrates onto the substrates, wherein the first projection modules project the wiring patterns onto different substrates, substantially simultaneously.

Abstract: An optical device includes a plurality of laser light sources, an output module having an optical modulator, and a time divider that is disposed between the plurality of laser light sources and the output module and that is configured to divide laser beams emitted from the plurality of laser light sources in time.

Abstract: An exposure apparatus includes a substrate holder configured to hold a substrate and move, a module including a spatial light modulator having light modulation elements that are two-dimensionally arranged, an illumination unit irradiating the spatial light modulator with illumination lights, and a projection unit guiding the illumination light from the light modulation elements to respective light irradiation areas that are two-dimensionally arranged on the substrate in first and second directions, and a control unit configured to drive the substrate holder in a scanning direction, wherein the light modulation elements are two-dimensionally arranged to be inclined at a predetermined angle ? (0°<?<90°) with respect to the scanning direction and a non-scanning direction orthogonal to the scanning direction, and when a predetermined region of the substrate is exposed, the control unit scans the substrate holder at such a speed that spot positions are arranged in a staggered arrangement.

Abstract: A spatial light modulation unit is used in an exposure apparatus that exposes an exposure pattern onto a photosensitive substrate while moving the photosensitive substrate in a scan direction. The spatial light modulation unit includes: a spatial light modulator having a plurality of elements; a controller that controls the plurality of elements in accordance with the exposure pattern; and a SLM substrate on which the spatial light modulator and the controller are provided. The controller is arranged side by side in the scan direction with respect to the spatial light modulator.

Abstract: An exposure apparatus exposes an object to pattern light generated by a spatial light modulator having a plurality of elements in accordance with drawing data. The exposure apparatus includes a data output unit configured to output the drawing data to the spatial light modulator, an illumination optical system configured to irradiate the spatial light modulator with illumination light, a first movable body configured to hold the object, a projection optical system configured to project an image of the pattern light generated by the spatial light modulator onto the object, a detection unit configured to detect the image of the pattern light that has been projected, and a determination unit configured to determine whether the spatial light modulator is capable of generating pattern light in accordance with the drawing data output from the data output unit, based on a detection result of the detection unit.

Abstract: An exposure apparatus includes an illumination optical system, a spatial light modulator illuminated by light from the illumination optical system, a projection optical system that irradiates an exposure target with light emitted from the spatial light modulator, a stage on which the exposure target is placed to perform a relative movement between the exposure target and the projection optical system relative to each other in a predetermined scanning direction, and a controller that has a storage in which information relating to exposure pattern is stored and controls exposure for the exposure target. The controller controls the exposure for the exposure target so that a first step of performing a first exposure based on the information relating to the exposure pattern and a second step of performing a second exposure based on at least a portion of the information relating to the exposure pattern used in the first step are executed.

Abstract: An exposure apparatus includes: an illumination optical system; a spatial light modulator; a projection optical system that illuminates an exposure target with light emitted from the spatial light modulator; and a stage where the exposure target is placed, wherein by the stage moving the exposure target in a predetermined scan direction, the light illuminates the exposure target by the projection optical system scans on the exposure target, the spatial light modulator includes a plurality of mirrors that rotates around a tilt axis extending in a direction orthogonal to both the scan and an optical axis directions of the projection optical system, the mirrors become an ON state by adjusting a tilt of each mirror relative to the scan direction and thereby emit light to the system, and the exposure apparatus includes an angle adjustment mechanism that adjusts a tilt angle of the spatial light modulator relative to the scan direction.

Abstract: An exposure apparatus includes an exposure module that includes a spatial light modulator and projects and exposes pattern light generated by the spatial light modulator onto a substrate, and a determination unit configured to, when a plurality of substrates scheduled to be arranged on a substrate holder include a first substrate having a defect, determine a plurality of substrates to be arranged on the substrate holder from the plurality of substrates scheduled to be arranged on the substrate holder, based on a predetermined handling method for the first substrate.

Abstract: An illumination optical system configured to illuminate a mask on which a predetermined pattern is formed, includes a plurality of light sources configured to emit pulse lights, an optical system including a division part configured to divide the pulse lights emitted from the plurality of light sources into first pulse light and second pulse light, a delay optical system configured to guide the second pulse light to a second optical path longer than a first optical path through which the first pulse light passes, and a synthesis/division part configured to synthesize the first pulse light and the second pulse light passing through the delay optical system and divide and emit the synthesized pulse light, and an illumination system configured to guide the pulse lights emitted from the optical system to the mask and illuminate the mask.

Abstract: An optical device includes a plurality of laser light sources, an output module having an optical modulator, and a time divider that is disposed between the plurality of laser light sources and the output module and that is configured to divide laser beams emitted from the plurality of laser light sources in time.

Abstract: An exposure apparatus that scans and exposes a substrate via an optical modulator in which a plurality of elements are controlled according to an image pattern, the exposure apparatus includes a first stage that supports a first substrate, a second stage that supports a second substrate different from the first substrate, a measurement part that measures information about the second substrate, and a generation part that generates control data, which controls the plurality of elements during scanning and exposing the second substrate, based on the information during an exposure process of the first substrate, wherein the measurement part measures the information about the second substrate during the exposure process of the first substrate.

Abstract: An exposure apparatus includes a spatial light modulator (SLM), a generation unit that acquires a measurement result from a measurement system measuring positions of semiconductor chips arranged on a first substrate, determines a wiring connecting the semiconductor chips based on the measurement result, generates control data used for control of the SLM in generating the determined wiring pattern, and stores the control data in a storage unit, and an exposure processing unit that controls the SLM using the control data stored in the storage unit and exposes the wiring pattern, wherein at least one of measurement of the positions of the semiconductor chips on the first substrate, acquisition of the measurement result, determination of the wiring pattern, generation of the control data, or storage of the control data is executed while the exposure processing unit is performing exposure processing on a second substrate different from the first substrate.

Abstract: A nozzle for producing material extrusion in a three-dimensional printer includes a shank including an internal flow passage, where the shank is constructed of a first material having a first thermal conductivity. The nozzle also includes a shank barrel mechanically coupled to the shank. The shank barrel is constructed of a second material having a second thermal conductivity. The first thermal conductivity of the first material is different from the second thermal conductivity of the second material to create a first heat break between the shank and the shank barrel, where the first heat break reduces heat transfer between the shank and the shank barrel.

Abstract: A three-dimensional printer and a method of leveling a support surface in a three-dimensional printer. The three-dimensional printer includes a base plate, a support bed, including a support surface, wherein the support bed is mounted to the base plate, a plurality of adjustable mounting assemblies adjustably mounting the base plate to the support bed, wherein each adjustable mount assembly separates the base plate from the support bed by a first distance. The three-dimensional printer may further include a vacuum port fluid communication with a vacuum opening, a vacuum pump in fluid communication with the vacuum port, a vacuum regulator coupled to the tubing between the vacuum pump and vacuum port, and a vacuum pressure switch coupled to the tubing between the vacuum regulator and the vacuum port.

Abstract: A three-dimensional printer for manufacturing additive printed parts includes a housing defining a cavity and first and second fixed rails extending along a first axis. First and second movable rails extend along a second axis and move independent of other another along the first axis. First and second print heads move along the second axis on the first and second movable rails, respectively, and first, second, and third dividers collectively separate the cavity to partially define process and instrument chambers. The first divider is mounted to the housing and the first movable rail and expands and contracts with the movement of the first movable rail. The second divider is mounted to the housing and the second movable rail and expands and contracts with the movement of the second movable rail. The third divider is mounted to the movable rails and expands and contracts with the movement of the movable rails.

Abstract: A three-dimensional printer and a method of leveling a support surface in a three-dimensional printer. The three-dimensional printer includes a base plate, a support bed, including a support surface, wherein the support bed is mounted to the base plate, a plurality of adjustable mounting assemblies adjustably mounting the base plate to the support bed, wherein each adjustable mount assembly separates the base plate from the support bed by a first distance. The three-dimensional printer may further include a vacuum port fluid communication with a vacuum opening, a vacuum pump in fluid communication with the vacuum port, a vacuum regulator coupled to the tubing between the vacuum pump and vacuum port, and a vacuum pressure switch coupled to the tubing between the vacuum regulator and the vacuum port.

Abstract: An optical device includes a plurality of laser light sources, an output module having an optical modulator, and a time divider that is disposed between the plurality of laser light sources and the output module and that is configured to divide laser beams emitted from the plurality of laser light sources in time.

Abstract: A three-dimensional printer and a method of leveling a support surface in a three-dimensional printer. The three-dimensional printer includes a base plate, a support bed, including a support surface, wherein the support bed is mounted to the base plate, a plurality of adjustable mounting assemblies adjustably mounting the base plate to the support bed, wherein each adjustable mount assembly separates the base plate from the support bed by a first distance. The three-dimensional printer may further include a vacuum port fluid communication with a vacuum opening, a vacuum pump in fluid communication with the vacuum port, a vacuum regulator coupled to the tubing between the vacuum pump and vacuum port, and a vacuum pressure switch coupled to the tubing between the vacuum regulator and the vacuum port.

Abstract: A machine for producing additive printed parts includes a first print head supported on a first gantry assembly, the first gantry assembly supported within the machine and adapted to selectively move horizontally back and forth along an x-axis, the first print head adapted to selectively move horizontally back and forth on the first gantry assembly along a y-axis, and a second print head supported on a second gantry assembly, the second gantry assembly supported within the machine and adapted to selectively move horizontally back and forth along the x-axis, the second print head adapted to selectively move horizontally back and forth on the first gantry assembly along the y-axis, wherein, the first and second print heads are independently moveable along both the x-axis and the y-axis.

Abstract: A three-dimensional printer for manufacturing additive printed parts includes a housing defining a cavity and first and second fixed rails extending along a first axis. First and second movable rails extend along a second axis and move independent of other another along the first axis. First and second print heads move along the second axis on the first and second movable rails, respectively, and first, second, and third dividers collectively separate the cavity to partially define process and instrument chambers. The first divider is mounted to the housing and the first movable rail and expands and contracts with the movement of the first movable rail. The second divider is mounted to the housing and the second movable rail and expands and contracts with the movement of the second movable rail. The third divider is mounted to the movable rails and expands and contracts with the movement of the movable rails.