Abstract: Detection device detects relative position between overlapping first and second marks. The device includes illumination system configured to illuminate the first and second marks with unpolarized illumination light, detection system having image sensor and configured to form image on imaging surface of the image sensor from diffracted lights from the first and second marks. The first and second marks are configured to form, on the imaging surface, optical information representing the relative position in first or second direction. Light blocking body arranged on pupil surface of the detection system includes first light blocking portion crossing the optical axis of the detection system in direction conjugate to the first direction and second light blocking portion crossing the optical axis of the detection system in fourth direction conjugate to the second direction.

Abstract: Detection device detects relative position between first and second marks overlapping each other. The device includes illumination system configured to illuminate the first and second marks with illumination light, and detection system configured to form image on imaging surface of image sensor from diffracted lights from the first and the second marks configured to form, on the imaging surface, optical information representing the relative position in first or second direction. The illumination light passes through only optical axis of the illumination system on pupil surface of the illumination system. Light blocking body provided on pupil surface of the detection system includes first light blocking portion crossing optical axis of the detection system in direction conjugate to the first direction, and second light blocking portion crossing the optical axis of the detection system in direction conjugate to the second direction.

Abstract: A detection apparatus that detects a position deviation between an original and a substrate is provided. The apparatus includes an illumination optical system configured to illuminate a first diffraction grating arranged on the original and a second diffraction grating arranged on the substrate, and a detection optical system configured to detect interference light formed by diffracted light diffracted by the first diffraction grating and diffracted light diffracted by the second diffraction grating. The illumination optical system performs dipole illumination by light including two poles in a pupil plane of the illumination optical system, and polarization directions of light beams emitted from the two poles, respectively, and incident on the substrate are orthogonal to each other.

Abstract: A detector that detects relative positions of a first object and a second object in directions different from each other on a predetermined plane, includes an illumination optical system configured to illuminate a first mark provided on the first object and a second mark provided on the second object, and a detection optical system configured to detect interference light of diffracted lights from the first mark and the second mark illuminated by the illumination optical system. A light intensity distribution is formed, on a pupil plane of the illumination optical system, to illuminate the first mark and the second mark from a direction tilted with respect to a normal of the predetermined plane. A pupil plane of the detection optical system allows the interference light to pass through and block at least a part light other than the interference light.

Abstract: A detection device includes an illumination optical system and a detection optical system. The illumination optical system is configured to illuminate a first diffraction grating having a first period in a first direction and a second diffraction grating having a second period different from the first period. The detection optical system is configured to detect light diffracted by the first and second diffraction gratings. The illumination optical system includes an optical member configured to form, on a pupil plane, a first pole and a second pole opposite to the first pole. The illumination optical system causes lights from the first and second poles to obliquely enter the first and second diffraction gratings from the first direction to illuminate the first and second diffraction gratings. The detection optical system detects diffracted light diffracted by one of the first and second diffraction gratings and by an other diffraction grating.

Abstract: A detection device includes an illumination optical system and a detection optical system. The illumination optical system is configured to illuminate a first diffraction grating having a first period in a first direction and a second diffraction grating having a second period different from the first period. The detection optical system is configured to detect light diffracted by the first and second diffraction gratings. The illumination optical system includes an optical member configured to form, on a pupil plane, a first pole and a second pole opposite to the first pole. The illumination optical system causes lights from the first and second poles to obliquely enter the first and second diffraction gratings from the first direction to illuminate the first and second diffraction gratings. The detection optical system detects diffracted light diffracted by one of the first and second diffraction gratings and by an other diffraction grating.

Abstract: An optical system for a holographic microscope includes: a light source configured to emit a light beam; a grating configured to split the light beam into a reference beam and an object beam; a lens unit configured to irradiate a sample by the reference and object beams split by the grating; a spatial filter including a first region for the reference beam and a second region for the object beam; and a detector configured to detect an interference pattern caused by the reference and object beams.

Abstract: A wavefront aberration measuring method forms a plurality of spot images by causing light, which is transmitted through a test optical system, to be incident on a lenslet array, and measures positions of the spot images. Based on the measured positions of the spot images, a wavefront aberration of the test optical system is calculated. When the positions of the spot images are measured, at least one lenslet forming the lenslet array is shielded from light, and the spot images are measured.

Abstract: A wavefront aberration measuring method forms a plurality of spot images by causing light, which is transmitted through a test optical system, to be incident on a lenslet array, and measures positions of the spot images. Optical paths from the positions of the measured spot images toward a light source are calculated, parameters of the test optical system when light rays from the positions of the spot images converge at the light source are specified, and a wavefront aberration of the test optical system corresponding to the parameters of the test optical system is calculated.

Abstract: The present invention provides a hologram which forms a light intensity distribution on a predetermined plane by using incident light. The hologram includes a plurality of cells configured to control both a phase of a first polarized light component in a first polarization direction of the incident light and a phase of a second polarized light component in a second polarization direction perpendicular to the first polarization direction, to form a phase difference distribution between phase distributions for the first and second polarized light components. The plurality of cells are designed so that a number of phase difference levels of the phase difference distribution is less than a number of phase levels of the phase distribution of the first polarized light component.

Abstract: An apparatus for measuring a wavefront of light traveling through test optics includes: a light source; a lenslet array where light from the light source travels through; a detector array configured to acquire a light intensity distribution through the lenslet array; and a processing unit, wherein the processing unit executes data processing with the acquired light intensity distribution, the data processing comprising an estimation process using a beamlet-based propagation model or a ray-based propagation model as a forward propagation model.

Abstract: The objective optical system includes a first optical system configured to collimate a divergent light flux from an object, a second optical system configured to converge the light flux from the first optical system, a beam splitter disposed between the first optical system and the second optical system, a reflector disposed on a side where the light flux from the second optical system is condensed and configured to reflect the light flux, and a third optical system configured to converge the light flux reflected by the reflector and then passing through the second optical system and the beam splitter. When a direction in which the light flux travels in the objective optical system is defined as an optical axis direction, positions of respective portions of the reflector in the optician axis direction are each changeable.

Abstract: An interferometric method for detecting information about a sample includes emitting a laser beam; splitting the laser beam into a reference beam and an object beam; transmitting the object beam through the sample in an incident angle; combining the reference beam with the object beam passed through the sample to form an interference pattern; detecting the interference pattern, and non-linearly scanning the object beam in order to detect a plurality of interference patterns.

Abstract: A wavefront aberration measuring method forms a plurality of spot images by causing light, which is transmitted through a test optical system, to be incident on a lenslet array, and measures positions of the spot images. Optical paths from the positions of the measured spot images toward a light source are calculated, parameters of the test optical system when light rays from the positions of the spot images converge at the light source are specified, and a wavefront aberration of the test optical system corresponding to the parameters of the test optical system is calculated.

Abstract: A wavefront aberration measuring method forms a plurality of spot images by causing light, which is transmitted through a test optical system, to be incident on a lenslet array, and measures positions of the spot images. Based on the measured positions of the spot images, a wavefront aberration of the test optical system is calculated. When the positions of the spot images are measured, at least one lenslet forming the lenslet array is shielded from light, and the spot images are measured.

Abstract: An interferometric method for detecting information about a sample includes emitting a laser beam; splitting the laser beam into a reference beam and an object beam; transmitting the object beam through the sample in an incident angle; combining the reference beam with the object beam passed through the sample to form an interference pattern; detecting the interference pattern, and non-linearly scanning the object beam in order to detect a plurality of interference patterns.

Abstract: The present invention provides a hologram which forms a light intensity distribution on a predetermined plane by using an incident light. The hologram includes a plurality of cells configured to control both a phase of a first polarized light component of the incident light and a phase of a second polarized light component. The plurality of cells are designed to form a portion in an overlap region in which a first light intensity distribution region formed on the predetermined plane by the first polarized light component and a second light intensity distribution region formed on the predetermined plane by the second polarized light component are superposed on each other. The phase of the first polarized light component is diffused in the portion formed in the overlap region.

Abstract: Measuring an aerial image with an aerial image measuring device having a light detector and a light blocking layer for separating polarization components of light incident thereon. The light blocking layer has first and second apertures structured differently from each other, wherein the different structures transmit at least one of the polarization components differently. The detector provides separate samples for light transmitted through the first and second apertures. Separate image profiles for each polarization component of the aerial image are generated using the samples provided by the detector. Image recovery for each of the generated image profiles is performed to generate estimated image profiles for each polarization component of the aerial image that exclude the effects of transmission through the first and second apertures of the aerial image measuring device.

Abstract: An optical system for a holographic microscope includes: a light source configured to emit a light beam; a grating configured to split the light beam into a reference beam and an object beam; a lens unit configured to irradiate a sample by the reference and object beams split by the grating; a spatial filter including a first region for the reference beam and a second region for the object beam; and a detector configured to detect an interference pattern caused by the reference and object beams.

Abstract: An apparatus for measuring a wavefront of light traveling through test optics includes: a light source; a lenslet array where light from the light source travels through; a detector array configured to acquire a light intensity distribution through the lenslet array; and a processing unit, wherein the processing unit executes data processing with the acquired light intensity distribution, the data processing comprising an estimation process using a beamlet-based propagation model or a ray-based propagation model as a forward propagation model.