Abstract: A method for measuring a surface profile of an object, the method includes, acquiring information about a first direction where a step of a surface of the object extends relative to a scanning direction, setting phase distribution applied to the irradiation beam according to the information, and scanning the object in the scanning direction with the irradiation beam.

Abstract: A method for measuring a surface profile of an object, the method includes, acquiring information about a first direction where a step of a surface of the object extends relative to a scanning direction, setting phase distribution applied to the irradiation beam according to the information, and scanning the object in the scanning direction with the irradiation beam.

Abstract: An apparatus which can measure an aerial image is provided. The apparatus includes an aperture configured to transmit light of the aerial image, a detector configured to detect the transmitted light at a plurality of first relative positions to the aperture, a controller configured to control a second relative position of the aperture to the aerial image, and a processor configured to generate information about the aerial image based on data obtained from the detector at each first relative position by controlling the second relative position of the aperture and position data about the first relative positions.

Abstract: The present invention provides a hologram which forms a light intensity distribution on a predetermined plane by using incident light. The hologram includes a plurality of cells configured to control both a phase of a first polarized light component in a first polarization direction of the incident light and a phase of a second polarized light component in a second polarization direction perpendicular to the first polarization direction, to form a phase difference distribution between phase distributions for the first and second polarized light components. The plurality of cells are designed so that a number of phase difference levels of the phase difference distribution is less than a number of phase levels of the phase distribution of the first polarized light component.

Abstract: At least one exemplary embodiment is directed to a detection aperture that varies the effective aperture index of refraction or provides scattering structures to improve the detected resolution and/or intensity of a sampled image. In at least one exemplary embodiment a medium is inserted into the aperture, to match transmittance of polarization through the aperture, and to control the relative transmittance of polarizations through the aperture. In yet another exemplary embodiment structures are provided to scatter or redirect diffracted aperture light to improve detection resolution and/or intensity.

Abstract: The present invention provides a hologram which forms a light intensity distribution on a predetermined plane by using an incident light. The hologram includes a plurality of cells configured to control both a phase of a first polarized light component of the incident light and a phase of a second polarized light component. The plurality of cells are designed to form a portion in an overlap region in which a first light intensity distribution region formed on the predetermined plane by the first polarized light component and a second light intensity distribution region formed on the predetermined plane by the second polarized light component are superposed on each other. The phase of the first polarized light component is diffused in the portion formed in the overlap region.

Abstract: Measuring an aerial image with an aerial image measuring device having a light detector and a light blocking layer for separating polarization components of light incident thereon. The light blocking layer has first and second apertures structured differently from each other, wherein the different structures transmit at least one of the polarization components differently. The detector provides separate samples for light transmitted through the first and second apertures. Separate image profiles for each polarization component of the aerial image are generated using the samples provided by the detector. Image recovery for each of the generated image profiles is performed to generate estimated image profiles for each polarization component of the aerial image that exclude the effects of transmission through the first and second apertures of the aerial image measuring device.

Abstract: An image measuring device that measures an aerial image, with relatively small or no dependence on the incident angle and polarization state of the beams projected onto the measuring device. The aerial image measuring device includes a substrate in which there are photo-luminescent nanoparticles that isotropically emit a photo-luminescent wavelength in response to an illuminated wavelength of the aerial image, a filter that blocks the illuminated wavelength and is transparent to the photo-luminescent wavelength, and a light detector that is sensitive to light of the photo-luminescent wavelength. The substrate is transparent to light of both the illuminated and the photo-luminescent wavelength, and the aerial image passes through the substrate and illuminates the nanoparticles. The photoluminescent light emitted by the nanoparticles passes through the filter and enters the light detector, which measures the aerial image.

Abstract: At least one exemplary embodiment is directed to detection aperture array which includes a shield layer; and a plurality of apertures, where the plurality of apertures are formed in the shield layer and filled with a first medium having an effective index of refraction, wherein the plurality of apertures includes at least two apertures separated by a pitch, wherein the plurality of apertures has a measurement value wherein the measurement value includes at least one of the effective refractive index and a pitch value, wherein the measurement value is changed so that TM and TE modes in incident image light passes through the plurality of apertures with about the same transmittance level, wherein when the measurement value is the pitch value then the TM and TE transmittance level are about the same when an angle of incidence of an image light varies.

Abstract: At least one exemplary embodiment is directed to detection aperture array which includes a shield layer; and a plurality of apertures, where the plurality of apertures are formed in the shield layer and filled with a first medium having an effective index of refraction, wherein the plurality of apertures includes at least two apertures separated by a pitch, wherein the plurality of apertures has a measurement value wherein the measurement value includes at least one of the effective refractive index and a pitch value, wherein the measurement value is changed so that TM and TE modes in incident image light passes through the plurality of apertures with about the same transmittance level, wherein when the measurement value is the pitch value then the TM and TE transmittance level are about the same when an angle of incidence of an image light varies.

Abstract: An optical element and a manufacturing method therefor, an exposure apparatus, and a device manufacturing method that can reduce the effect of intrinsic birefringence under high NA conditions. According to an optical element as one aspect of the present invention, an angle between a [0 0 1] axis of an isometric crystal and an optical axis is less than 10°, and preferably 0°.

Abstract: At least one exemplary embodiment is directed to a detection aperture that varies the effective aperture index of refraction or provides scattering structures to improve the detected resolution and/or intensity of a sampled image. In at least one exemplary embodiment a medium is inserted into the aperture, to match transmittance of polarization through the aperture, and to control the relative transmittance of polarizations through the aperture. In yet another exemplary embodiment structures are provided to scatter or redirect diffracted aperture light to improve detection resolution and/or intensity.

Abstract: An optical element and a manufacturing method therefor, an exposure apparatus, and a device manufacturing method that can reduce the effect of intrinsic birefringence under high NA conditions. According to an optical element as one aspect of the present invention, an angle between a [0 0 1] axis of an isometric crystal and an optical axis is less than 10°, and preferably 0°.

Abstract: A projection optical system includes a plurality of lenses that cause birefringence and at least one optical element for substantially eliminating the birefringence caused by the plurality of lenses. The at least one optical element is detachably mounted on the projection optical system.

Abstract: A projection optical system for projecting a pattern of a first object onto a second object, wherein the projection optical system is provided with a birefringence correcting system for correcting birefringence of an optical element of the projection optical system.

Abstract: An optical element and a manufacturing method therefor, an exposure apparatus, and a device manufacturing method that can reduce the effect of intrinsic birefringence under high NA conditions. According to an optical element as one aspect of the present invention, an angle between a [0 0 1] axis of an isometric crystal and an optical axis is less than 10°, and preferably 0°.

Abstract: A SiO2 thin film is formed on a SiO2 substrate provided with a binary-type diffractive element by a radiofrequency sputtering process so as to cover the fine irregularities formed on the substrate caused by misalignment of masks in the production process. This film planarizes the surface having the fine irregularities and thus prevents a decrease in diffraction efficiency.

Abstract: A projection optical system for projecting a pattern of a first object onto a second object is disclosed, wherein the projection optical system is provided with a birefringence correcting system for correcting birefringence of an optical element of the projection optical system.

Abstract: An optical element and a manufacturing method therefor, an exposure apparatus, and a device manufacturing method that can reduce the effect of intrinsic birefringence under high NA conditions. According to an optical element as one aspect of the present invention, an angle between a [0 0 1] axis of an isometric crystal and an optical axis is less than 10°, and preferably 0°.

Abstract: In a system for transmitting a video signal obtained by a camera to a discrete device either via a recording/reproducing system or via a transmission line, an image processing system includes a circuit which is arranged within the camera to generate a photo-taking state signal indicating information on aberrations in particular; and a correction circuit which is arranged within a device for reproducing or receiving the video signal to correct the aberrations of the video signal in accordance with the photo-taking state signal.