Patents by Inventor Yezheng Tao
Yezheng Tao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 12371474Abstract: The present disclosure provides a recombinant adeno-associated vector comprising a codon-optimized sequence encoding CYP4V2 linked to selected gene expression regulatory sequences and its use in treating Bietti Crystalline Dystrophy (BCD).Type: GrantFiled: January 11, 2024Date of Patent: July 29, 2025Assignee: SHANGHAI VITALGEN BIOPHARMA CO., LTD.Inventors: Lu Guo, Yezheng Tao, Shin-Shay Tian, Bin Qu, Wei Li, Xi Zhu, Xiaoping Zhao
-
Patent number: 12369244Abstract: Disclosed is an apparatus and a method in which multiple, e.g., two or more pulses from a single laser source are applied to source material prior to application of a main ionizing pulse in which the multiple pulses are generated by a common laser source. The first pulse is directed towards the source material when the source material is at a first position and the second pulse is directed towards the source material when the source material is at a second position.Type: GrantFiled: March 2, 2020Date of Patent: July 22, 2025Assignee: ASML Netherlands B.V.Inventors: Igor Vladimirovich Fomenkov, Yezheng Tao, Robert Jay Rafac
-
Publication number: 20250197456Abstract: The present invention provides new adeno-associated viral (AAV) capsids, and recombinant AAV (rAAV) virion comprising the said capsid and a vector genome comprising a transgene. The rAAV virion comprising the novel capsid shows improved CNS-targeting infection efficiencies and/or increased expression levels of the transgene. Also provided are a method for treating a disease, including administration of the rAAV virion comprising the said AAV capsid to a subject in need thereof.Type: ApplicationFiled: January 17, 2025Publication date: June 19, 2025Applicant: SHANGHAI VITALGEN BIOPHARMA CO., LTD.Inventors: Kai XU, Yezheng TAO, Wei LI, Shin-Shay TIAN, Xiaoping ZHAO
-
Publication number: 20250185147Abstract: Disclosed is a system for and method of performing target metrology in an extreme ultraviolet light source in which illumination for a target imaging/detection system is selected to have a center wavelength less than 400 nm. In some embodiments the illumination is additionally selected to have a line width of at least 4 nm. In some embodiments illumination is obtained as a second harmonic of a Ti:sapphire laser or as a harmonic of an Nd:YAG laser.Type: ApplicationFiled: February 28, 2023Publication date: June 5, 2025Inventors: Yezheng Tao, Jaden Robert Bankhead, Sylvi Haendel, Eric Huang, Erik Peter Farr
-
Publication number: 20250126698Abstract: An EUV collector for an EUV projection exposure apparatus transfers usable EUV light emerging from a source volume into a collection volume separated from the source volume. The source volume has a first source extension along a connection axis between a center of the source volume and a center of the collection volume. The source volume has a second, cross section source extension along a cross section axis perpendicular to the connection axis. The EUV collector images the source volume into the collection volume. The imaging has a first imaging scale along the connection axis and a second imaging scale along the cross section axis. The first imaging scale differs from the second imaging scale by at least 10%.Type: ApplicationFiled: December 23, 2024Publication date: April 17, 2025Inventors: Silvi HAENDEL, Michael PURVIS, Alexander SCHAFGANS, Yezheng TAO, Daniel BROWN, Evan DAVIS, Haining WANG, Markus KARL
-
Patent number: 12245350Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: GrantFiled: December 6, 2022Date of Patent: March 4, 2025Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
-
Publication number: 20250041456Abstract: Provided is a recombinant adeno-associated viral (rAAV) vector comprising one or two of (a) to (c): (a) a nucleotide sequence encoding aromatic L-amino acid decarboxylase (AADC), (b) a nucleotide sequence encoding glucocerebrosidase (GBA1); and (c) a nucleotide sequence encoding a neurotrophic factor (NTF), such as cerebral dopamine neurotrophic factor (CDNF) or glial cell derived neurotrophic factor (GDNF), for treating neurodegenerative disorders, particularly Parkinson's disease (PD), Multiple system atrophy (MSA), Gaucher's disease (GD), and other proteinopathies. Also provided herein are viral particles comprising the rAAV vector, a pharmaceutical composition comprising the viral particles, and uses thereof.Type: ApplicationFiled: October 18, 2024Publication date: February 6, 2025Applicant: SHANGHAI VITALGEN BIOPHARMA CO., LTD.Inventors: Yezheng TAO, Shin-Shay TIAN, Xiaoping ZHAO
-
Publication number: 20240309068Abstract: The present disclosure provides a recombinant adeno-associated vector comprising a codon-optimized sequence encoding CYP4V2 linked to selected gene expression regulatory sequences and its use in treating Bietti Crystalline Dystrophy (BCD).Type: ApplicationFiled: January 11, 2024Publication date: September 19, 2024Applicant: SHANGHAI VITALGEN BIOPHARMA CO., LTD.Inventors: Lu GUO, Yezheng TAO, Shin-Shay TIAN, Bin QU, Wei LI, Xi ZHU, Xiaoping ZHAO
-
Publication number: 20230139746Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: ApplicationFiled: December 6, 2022Publication date: May 4, 2023Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
-
Patent number: 11553582Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: GrantFiled: April 6, 2020Date of Patent: January 10, 2023Assignee: ASML Netherlands, B.V.Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
-
Publication number: 20220192000Abstract: Disclosed is an apparatus and a method in which multiple, e.g., two or more pulses from a single laser source are applied to source material prior to application of a main ionizing pulse in which the multiple pulses are generated by a common laser source. The first pulse is directed towards the source material when the source material is at a first position and the second pulse is directed towards the source material when the source material is at a second position.Type: ApplicationFiled: March 2, 2020Publication date: June 16, 2022Inventors: Igor Vladimirovich Fomenkov, Yezheng Tao, Robert Jay Rafac
-
Publication number: 20200305263Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: ApplicationFiled: April 6, 2020Publication date: September 24, 2020Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
-
Patent number: 10663866Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.Type: GrantFiled: September 20, 2016Date of Patent: May 26, 2020Assignee: ASML Netherlands B.V.Inventors: Alexander Anthony Schafgans, Igor Vladimirovich Fomenkov, Yezheng Tao, Rostislav Rokitski, Robert Jay Rafac, Daniel John William Brown, Cory Alan Stinson
-
Patent number: 10645789Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: GrantFiled: October 23, 2017Date of Patent: May 5, 2020Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
-
Patent number: 10064261Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.Type: GrantFiled: October 23, 2017Date of Patent: August 28, 2018Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Daniel Brown, Alexander A. Schafgans, Jason M. Arcand, Andrew LaForge
-
Publication number: 20180124906Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.Type: ApplicationFiled: October 23, 2017Publication date: May 3, 2018Inventors: Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Daniel Brown
-
Publication number: 20180081280Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.Type: ApplicationFiled: September 20, 2016Publication date: March 22, 2018Inventors: Alexander Anthony Schafgans, Igor Vladimirovich Fomenkov, Yezheng Tao, Rostislav Rokitski, Robert Jay Rafac, Daniel John William Brown, Cory Alan Stinson
-
Publication number: 20180063935Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: ApplicationFiled: October 23, 2017Publication date: March 1, 2018Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
-
Patent number: 9832855Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.Type: GrantFiled: December 15, 2015Date of Patent: November 28, 2017Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Daniel John William Brown, Alexander Anthony Schafgans, Palash Parijat Das
-
Patent number: 9826616Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.Type: GrantFiled: May 6, 2016Date of Patent: November 21, 2017Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Daniel Brown