Patents by Inventor Yezheng Tao
Yezheng Tao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160007434Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.Type: ApplicationFiled: July 7, 2014Publication date: January 7, 2016Inventors: Yezheng Tao, John Tom Stewart, IV, Jordan Jur, Andrew LaForge, Daniel Brown, Jason M. Arcand, Alexander A. Schafgans, Michael A. Purvis
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Patent number: 9232624Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.Type: GrantFiled: August 4, 2015Date of Patent: January 5, 2016Assignee: ASML Netherlands B.V.Inventors: Robert J. Rafac, Yezheng Tao
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Publication number: 20150342016Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.Type: ApplicationFiled: August 4, 2015Publication date: November 26, 2015Inventors: Robert J. Rafac, Yezheng Tao
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Patent number: 9155179Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.Type: GrantFiled: November 21, 2014Date of Patent: October 6, 2015Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Robert J. Rafac, Igor V. Fomenkov, Daniel J. W. Brown, Daniel J. Golich
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Publication number: 20150250045Abstract: A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.Type: ApplicationFiled: February 28, 2014Publication date: September 3, 2015Inventors: Yezheng Tao, Daniel J.W. Brown, Alexander Schafgans, Michael David Caudill, Daniel J. Golich, Richard L. Sandstrom, Yoshiho Amada
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Patent number: 9107279Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.Type: GrantFiled: December 8, 2014Date of Patent: August 11, 2015Assignee: ASML Netherlands B.V.Inventors: Robert J. Rafac, Yezheng Tao
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Publication number: 20150189729Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.Type: ApplicationFiled: December 8, 2014Publication date: July 2, 2015Inventors: Robert J. Rafac, Yezheng Tao
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Publication number: 20150189728Abstract: A first remaining plasma that at least partially coincides with a target region is formed; a target including target material in a first spatial distribution to the target region is provided, the target material including material that emits EUV light when converted to plasma; the first remaining plasma and the initial target interact, the interaction rearranging the target material from the first spatial distribution to a shaped target distribution to form a shaped target in the target region, the shaped target including the target material arranged in the shaped spatial distribution; an amplified light beam is directed toward the target region to convert at least some of the target material in the shaped target to a plasma that emits EUV light; and a second remaining plasma is formed in the target region.Type: ApplicationFiled: December 8, 2014Publication date: July 2, 2015Inventors: Yezheng Tao, John Tom Stewart, IV, Daniel J.W. Brown
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Publication number: 20150076374Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.Type: ApplicationFiled: November 21, 2014Publication date: March 19, 2015Inventors: Yezheng Tao, Robert J. Rafac, Igor V. Fomenkov, Daniel J.W. Brown, Daniel J. Golich
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Patent number: 8927952Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.Type: GrantFiled: January 10, 2014Date of Patent: January 6, 2015Assignee: ASML Netherlands B.V.Inventors: Robert J. Rafac, Yezheng Tao
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Patent number: 8912514Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.Type: GrantFiled: June 20, 2014Date of Patent: December 16, 2014Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Robert J. Rafac, Igor V. Fomenkov, Daniel J. W. Brown, Daniel J. Golich
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Patent number: 8872143Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.Type: GrantFiled: March 14, 2013Date of Patent: October 28, 2014Assignee: ASML Netherlands B.V.Inventors: Robert J. Rafac, Yezheng Tao
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Patent number: 8866110Abstract: Techniques are described that enhance power from an extreme ultraviolet light source with feedback from a target material that has been modified prior to entering a target location into a spatially-extended target distribution or expanded target. The feedback from the spatially-extended target distribution provides a nonresonant optical cavity because the geometry of the path over which feedback occurs, such as the round-trip length and direction, can change in time, or the shape of the spatially-extended target distribution may not provide a smooth enough reflectance. However, it may be possible that the feedback from the spatially-extended target distribution provides a resonant and coherent optical cavity if the geometric and physical constraints noted above are overcome. In any case, the feedback can be generated using spontaneously emitted light that is produced from a non-oscillator gain medium.Type: GrantFiled: March 6, 2014Date of Patent: October 21, 2014Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Robert Jay Rafac, Igor V. Fomenkov, Daniel J. W. Brown
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Publication number: 20140299791Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.Type: ApplicationFiled: June 20, 2014Publication date: October 9, 2014Inventors: Yezheng Tao, Robert J. Rafac, Igor V. Fomenkov, Daniel J.W. Brown, Daniel J. Golich
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Publication number: 20140264092Abstract: Techniques are described that enhance power from an extreme ultraviolet light source with feedback from a target material that has been modified prior to entering a target location into a spatially-extended target distribution or expanded target. The feedback from the spatially-extended target distribution provides a nonresonant optical cavity because the geometry of the path over which feedback occurs, such as the round-trip length and direction, can change in time, or the shape of the spatially-extended target distribution may not provide a smooth enough reflectance. However, it may be possible that the feedback from the spatially-extended target distribution provides a resonant and coherent optical cavity if the geometric and physical constraints noted above are overcome. In any case, the feedback can be generated using spontaneously emitted light that is produced from a non-oscillator gain medium.Type: ApplicationFiled: March 6, 2014Publication date: September 18, 2014Inventors: Yezheng Tao, Robert Jay Rafac, Igor V. Fomenkov, Daniel J.W. Brown
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Publication number: 20140264087Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.Type: ApplicationFiled: March 14, 2013Publication date: September 18, 2014Inventors: Robert J. Rafac, Yezheng Tao
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Publication number: 20140264090Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.Type: ApplicationFiled: January 10, 2014Publication date: September 18, 2014Inventors: Robert J. Rafac, Yezheng Tao
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Patent number: 8791440Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.Type: GrantFiled: March 14, 2013Date of Patent: July 29, 2014Assignee: ASML Netherlands B.V.Inventors: Yezheng Tao, Robert J. Rafac, Igor V. Fomenkov, Daniel J. W. Brown, Daniel J. Golich
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Patent number: 8680495Abstract: Techniques are described that enhance power from an extreme ultraviolet light source with feedback from a target material that has been modified prior to entering a target location into a spatially-extended target distribution or expanded target. The feedback from the spatially-extended target distribution provides a nonresonant optical cavity because the geometry of the path over which feedback occurs, such as the round-trip length and direction, can change in time, or the shape of the spatially-extended target distribution may not provide a smooth enough reflectance. However, it may be possible that the feedback from the spatially-extended target distribution provides a resonant and coherent optical cavity if the geometric and physical constraints noted above are overcome. In any case, the feedback can be generated using spontaneously emitted light that is produced from a non-oscillator gain medium.Type: GrantFiled: March 15, 2013Date of Patent: March 25, 2014Assignee: Cymer, LLCInventors: Yezheng Tao, Robert Jay Rafac, Igor V. Fomenkov, Daniel J. W. Brown
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Patent number: 8653492Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.Type: GrantFiled: March 14, 2013Date of Patent: February 18, 2014Assignee: Cymer, LLCInventors: Robert J. Rafac, Yezheng Tao