Abstract: Implementations of the disclosure provide video processing systems and methods. The video processing method may include receiving, by one or more processors, a video frame of a video for in-loop filtering. For a target pixel of the video frame, the video processing method may further include selecting, by the one or more processors, a bilateral filtering window to perform the in-loop filtering on the target pixel from a group of candidate filtering windows. The group of candidate filtering windows include a plurality of side filtering windows and a full filtering window. The video processing method may also include filtering, by the one or more processors, the target pixel of the video frame using the selected bilateral filtering window.

Abstract: Methods and devices are provided for decoding a video block in GPM. The method includes: partitioning the video block into first and second geometric partitions; receiving a first GPM with a motion vector refinement (GPM-MVR) enable flag for the first geometric partition and receiving a second GPM-MVR enable flag for the second geometric partition; receiving a joint template matching (TM) enable flag for the first and second geometric partition that jointly indicates whether a uni-directional motion of the first partition is refined by TM and whether a uni-directional motion of the second partition is refined by the TM; receiving a first merge GPM index for the first geometric partition and a second merge GPM index for the second geometric partition; constructing a uni-directional MV candidate list of the GPM; and generating a uni-directional MV for the first geometric partition and a uni-directional MV for the second geometric partition.

Abstract: Provided is a method for video decoding including: receiving a control variable enabling adaptive switch between motion vector refinement (MVR) offset sets; receiving an indication variable enabling adaptive switch between codeword tables that binarize offset magnitudes in the MVR offset sets under the coding level; partitioning the video block into a first and a second geometric partition; selecting an MVR offset set based on the control variable; receiving syntax elements to determine a first and second MVR offsets applied to the first and second geometric partitions from the selected MVR offset set; obtaining a first and second MVs from a candidate list for the first and the second geometric partition; calculating a first and second refined MVs based on the first and second MVs and the first and second MVR offsets; and obtaining prediction samples based on the first and second refined MVs.

Abstract: An electrical connection structure is provided. The electrical connection structure includes a through hole, a first pad, a second pad and a conductive bridge. The through hole has a first end and a second end. The first pad at least partially surrounds the first end of the through hole and is electrically connected to a first circuit. The second pad is located at the second end of the through hole and is electrically connected to a second circuit. The conductive bridge is connected to the first pad and second pad through the through hole, thereby making the first and second circuits electrically connected to each other.

Abstract: An electronic apparatus performs a method of decoding video data. The method includes: receiving, from the video data, an Adaptation Parameter Set (APS) identifier associated with a number of previously used Cross-Component Sample Adaptive Offset (CCSAO) filter offset sets stored in APS; receiving, from the video data, a syntax in Picture Header (PH) or Slice Header (SH) that indicates the APS identifier used for a current picture or slice; decoding, for the current coding tree unit (CTU), a filter set index that indicates a particular previously used CCSAO filter offset set of the number of offset sets in the APS associated with the APS identifier; and applying the particular previously used CCSAO filter offset set to the current CTU of the video data.

Abstract: Implementations of the disclosure provide systems and methods for motion refinement in a video. The method may include determining an initial motion vector for a video block of a video frame from the video. The method may include determining a matching target based on a weighted combination of a first reference block from a first reference frame in the video and a second reference block from a second reference frame in the video. The method may include performing a bilateral matching based motion refinement process at a block level to iteratively update the initial motion vector based on the matching target until a refined motion vector is obtained. The method may include refining a motion vector for each sub-block in the video block using the refined motion vector of the video block. Refining the motion vector at a sub-block level applies an affine motion model of the video block.

Abstract: A method for decoding a video block in GPM includes: partitioning the video block into two geometric partitions; constructing a uni-directional motion victor (MV) candidate list by adding regular merge candidates; in response to determining that the candidate list is not full, constructing a first updated candidate list by adding additional uni-directional MVs derived from bi-prediction MVs of a regular merge candidate list to the candidate list; in response to determining that the first updated candidate list is not full, constructing a second updated candidate list by adding pairwise average candidates to the first updated candidate list; in response to determining that the second updated candidate list is not full, periodically adding zero uni-directional MVs to the second updated candidate list until a maximum length is reached; and respectively generating a uni-directional MV for each geometric partition.

Abstract: Cable assemblies for providing electrical communication between hinged sections of an electronic device are described. The cable assemblies can include a cover that covers one or more cables that run through a hinge region of the electronic device. The cable and cover can be drawn over a mandrel of the hinge region. The cover and the portions of the mandrel can be visible to a user at the hinge region of the electronic device. The cover can be sufficiently rigid to guide a path of the cable and protect the cable from bending beyond a prescribed angle during rotation of the electronic device at the hinge region. The cover can also be sufficiently rigid to prevent ceasing or folding of the cover and the cable during rotation of the electronic device at the hinge region.

Abstract: A modulating device is provided. The modulating device includes multiple modulating elements, multiple pixel circuits, and a compensation circuit. The pixel circuits are electrically connected to the modulating elements correspondingly. The compensation circuit includes a driving unit, a voltage source, and a current source. The driving unit provides a driving signal to the pixel circuits. The voltage source is electrically connected to the driving unit. The voltage source provides a constant voltage to the pixel circuits. The current source is electrically connected to the driving unit. The current source provides a constant current to the pixel circuits.

Abstract: An automatic adjustment method and an automatic adjustment device of a beam of a semiconductor apparatus, and a training method of a parameter adjustment model are provided. The automatic adjustment method of the beam of the semiconductor apparatus includes the following steps. The semiconductor apparatus generates the beam. A wave curve of the beam is obtained. The wave curve is segmented into several sections. The slope of each of the sections is obtained. Several environmental factors of the semiconductor apparatus are obtained. According to the slopes and the environmental factors, at least one parameter adjustment command of the semiconductor apparatus is analyzed through the parameter adjustment model.

Abstract: A modulation device including a plurality of electronic elements, at least one first signal line and a first driving circuit is provided. The at least one first signal line is respectively electrically connected to at least one of the electronic elements. The first driving circuit is electrically connected to the at least one first signal line. The first driving circuit provides a first signal to at least one of the at least one first signal line. The first signal includes a first pulse. The first pulse includes a first section and a second section closely adjacent to the first section.

Abstract: Methods and devices are provided for decoding a video block in GPM. The method includes: partitioning the video block into a first geometric partition and a second geometric partition; receiving a first template matching (TM) enable flag for the first geometric partition a second TM enable flag for the second geometric partition, the first TM enable flag indicating whether a uni-directional motion of the first geometric partition is refined by TM, and the second TM enable flag indicating whether a uni-directional motion of the second partition is refined by the TM; receiving a first merge GPM index for the first geometric partition and a second merge GPM index for the second geometric partition; constructing a uni-directional motion victor (MV) candidate list of the GPM; and generating a first uni-directional MV for the first geometric partition and a second uni-directional MV for the second geometric partition.

Abstract: Methods and devices for video decoding are provided. The method may include obtaining a plurality of coding blocks within a video frame, where the plurality of coding blocks may include at least one chroma coding block and a plurality of luma coding blocks. Further, the method may include determining whether to apply OBMC to the at least one chroma coding block and the plurality of luma coding blocks to generate prediction samples for the video frame in response to determining that a local chroma tree partition is applied to the plurality of coding blocks.

Abstract: Methods and devices for video decoding are provided. The method includes: receiving a control variable associated with the video block at a coding level, where the control variable enables adaptive switch between a plurality of motion vector refinement (MVR) offset sets, and the video block comprises first and second geometric partitions; receiving one or more syntax elements to determine a first MVR offset for the first geometric partition and a second MVR offset for the second geometric partition from a selected MVR offset set; obtaining a first motion vector (MV) and a second MV from a candidate list for the first and second geometric partitions; calculating a first refined MV and a second refined MV based on the first and second MVs and the first and second MVR offsets; and obtaining prediction samples for the video block based on the first and second refined MVs.

Abstract: Metal-comprising resist layers (for example, metal oxide resist layers), methods for forming the metal-comprising resist layers, and lithography methods that implement the metal-comprising resist layers are disclosed herein that can improve lithography resolution. An exemplary method includes forming a metal oxide resist layer over a workpiece by performing deposition processes to form metal oxide resist sublayers of the metal oxide resist layer over the workpiece and performing a densification process on at least one of the metal oxide resist sublayers. Each deposition process forms a respective one of the metal oxide resist sublayers. The densification process increases a density of the at least one of the metal oxide resist sublayers. Parameters of the deposition processes and/or parameters of the densification process can be tuned to achieve different density profiles, different density characteristics, and/or different absorption characteristics to optimize patterning of the metal oxide resist layer.

Abstract: A method of manufacturing a semiconductor device includes forming a photoresist layer over a substrate, including combining a first precursor and a second precursor in a vapor state to form a photoresist material, and depositing the photoresist material over the substrate. A protective layer is formed over the photoresist layer. The photoresist layer is selectively exposed to actinic radiation through the protective layer to form a latent pattern in the photoresist layer. The protective layer is removed, and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a pattern.

Abstract: A method of manufacturing a semiconductor device includes forming a photoresist layer over a substrate, including combining a first precursor and a second precursor in a vapor state to form a photoresist material, and depositing the photoresist material over the substrate. A protective layer is formed over the photoresist layer. The photoresist layer is selectively exposed to actinic radiation through the protective layer to form a latent pattern in the photoresist layer. The protective layer is removed, and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a pattern.

Abstract: An organometallic precursor for extreme ultraviolet (EUV) lithography is provided. An organometallic precursor includes an aromatic di-dentate ligand, a transition metal coordinated to the aromatic di-dentate ligand, and an extreme ultraviolet (EUV) cleavable ligand coordinated to the transition metal. The aromatic di-dentate ligand includes a plurality of pyrazine molecules.

Abstract: A method of manufacturing semiconductor device includes forming a multilayer photoresist structure including a metal-containing photoresist over a substrate. The multilayer photoresist structure includes two or more metal-containing photoresist layers having different physical parameters. The metal-containing photoresist is a reaction product of a first precursor and a second precursor, and each layer of the multilayer photoresist structure is formed using different photoresist layer formation parameters. The different photoresist layer formation parameters are one or more selected from the group consisting of the first precursor, an amount of the first precursor, the second precursor, an amount of the second precursor, a length of time each photoresist layer formation operation, and heating conditions of the photoresist layers.

Abstract: A method of forming a pattern in a photoresist layer includes forming a photoresist layer over a substrate, and reducing moisture or oxygen absorption characteristics of the photoresist layer. The photoresist layer is selectively exposed to actinic radiation to form a latent pattern, and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a pattern.