Abstract: In an embodiment, a method includes: forming a first fin and a second fin extending from a semiconductor substrate; depositing a liner layer along a first sidewall of the first fin, a second sidewall of the second fin, and a top surface of the semiconductor substrate, the liner layer formed of silicon oxynitride having a nitrogen concentration in a range of 5% to 30%; depositing a fill material on the liner layer, the fill material formed of silicon; annealing the liner layer and the fill material, the annealing converting the fill material to silicon oxide, the annealing decreasing the nitrogen concentration of the liner layer to a range of 1% to 5%; and recessing the liner layer and the fill material to form an isolation region between the first fin and the second fin.

Abstract: Example methods and systems for routing domain computation are described. In one example, a computer system may assign multiple logical entities with respective routing domain identifiers (IDs) by processing network topology information using multiple compute nodes. In response to detecting a network topology change associated with a particular logical entity, the computer system may determine first state change information identifying a first update to first state information maintained by a first compute node; and second state change information identifying a second update to second state information maintained by a second compute node. Further, the particular logical entity with an updated routing domain ID based on the first state change information and the second state change information. The updated routing domain ID may be used in a communication between a management entity and host(s) supporting the particular logical entity.

Abstract: A sprayer includes: a container; a passage including a transparent window, a first opening, a second opening and a resonator, wherein when liquid in the container is passed through the resonator via the first opening, the liquid is emitted as a gas via the second opening; and a removable detection unit disposed outside of the passage. The removable detection unit includes: a light source for illuminating the gas in the passage; an optical sensor disposed to detect a parameter of light reflected by the gas; and a processor coupled to the optical sensor for stopping the resonator from generating the gas when the parameter is below a threshold. The passage further includes a cavity disposed on a bottom surface of the passage in front of the optical sensor, wherein when the gas in the passage contacts the bottom surface, resultant water vapour will enter the cavity.

Abstract: A dynamic power positioning method and a dynamic power positioning system thereof are disclosed. The method comprises the steps of: controlling a device to be measured to transmit a plurality of positioning signals with a plurality of transmission powers; making a plurality of known location devices to receive the plurality of positioning signals, and recording the intensities and the corresponding reception times of the plurality of positioning signals, and the coordinates of the plurality of known location devices to the database; finding out the known location device corresponding to a positioning signal having a higher signal intensity among the received plurality of positioning signals; obtaining a signal intensity-distance function and a signal intensity-distance standard deviation function from the database; and finding out the device location of the device to be measured according to the signal intensity-distance function and signal intensity-distance standard deviation function.

Abstract: Disclosed is an IC voltage determining method including: executing a static timing analysis according to a circuit design to obtain data of a critical path and then generating a netlist; executing a circuit parameter simulation and Monte Carlo simulation with the netlist according to a regular voltage and prescribed parameters to obtain a circuit parameter reference value and a variance of circuit parameter values; executing an adaptive voltage scaling analysis according to a voltage range to obtain a voltage-versus-parameter relation indicative of the number of times that each of circuit parameter deviations that are respectively associated with predetermined voltages within the predetermined voltage range is of the variance; and testing an IC according to the regular voltage to obtain a circuit parameter test value and determining the IC voltage according to the voltage-versus-parameter relation and a difference between the circuit parameter test value and the circuit parameter reference value.

Abstract: A method includes forming a silicon layer on a wafer, forming an oxide layer in contact with the silicon layer, and, after the oxide layer is formed, annealing the wafer in an environment comprising ammonia (NH3) to form a dielectric barrier layer between, and in contact with, the silicon layer and the oxide layer. The dielectric barrier layer comprises silicon and nitrogen.

Abstract: Semiconductor devices and methods of manufacturing are presented in which inner spacers for nanostructures are manufactured. In embodiments a dielectric material is deposited for the inner spacer and then treated. The treatment may add material and cause an expansion in volume in order to close any seams that can interfere with subsequent processes.

Abstract: A treatment, structure and system are provided that modify the deposition process of a material that can occur over two differing materials. In an embodiment the deposition rates may be adjusted by the treatment to change the deposition rate of one of the materials to be more in line with the deposition rate of a second one of the materials. Also, the deposition rates may be modified to be different from each other, to allow for a more selective deposition over the first one of the materials than over the second one of the materials.

Abstract: A power rail design method is disclosed that includes the steps outlined below. A plurality of power rails and a plurality of power domains corresponding thereto in an integrated circuit design file are identified. A design rule check for a plurality of circuit units in the integrated circuit design file is performed to retrieve a plurality of non-violating circuit regions that correspond to the power rails in each of the power domains. The power rails corresponding to at least part of the plurality of non-violating circuit regions in the integrated circuit design file are widened to occupy at least part of the non-violating circuit regions for the plurality of power rails.

Abstract: The present disclosure provides embodiments of semiconductor structures and method of forming the same. An example semiconductor structure includes a first source/drain feature and a second source/drain feature and a hybrid fin disposed between the first source/drain feature and the second source/drain feature and extending lengthwise along a first direction. The hybrid fin includes an inner feature and an outer layer disposed around the inner feature. The outer layer includes silicon oxycarbonitride and the inner feature includes silicon carbonitride.

Abstract: A method includes forming a dummy gate stack over a semiconductor region of a wafer, and depositing a gate spacer layer using Atomic Layer Deposition (ALD) on a sidewall of the dummy gate stack. The depositing the gate spacer layer includes performing an ALD cycle to form a dielectric atomic layer. The ALD cycle includes introducing silylated methyl to the wafer, purging the silylated methyl, introducing ammonia to the wafer, and purging the ammonia.

Abstract: In an embodiment, a method includes: forming a first fin and a second fin extending from a semiconductor substrate; depositing a liner layer along a first sidewall of the first fin, a second sidewall of the second fin, and a top surface of the semiconductor substrate, the liner layer formed of silicon oxynitride having a nitrogen concentration in a range of 5% to 30%; depositing a fill material on the liner layer, the fill material formed of silicon; annealing the liner layer and the fill material, the annealing converting the fill material to silicon oxide, the annealing decreasing the nitrogen concentration of the liner layer to a range of 1% to 5%; and recessing the liner layer and the fill material to form an isolation region between the first fin and the second fin.

Abstract: Semiconductor device structures having low-k features and methods of forming low-k features are described herein. Some examples relate to a surface modification layer, which may protect a low-k feature during subsequent processing. Some examples relate to gate spacers that include a low-k feature. Some examples relate to a low-k contact etch stop layer. Example methods are described for forming such features.

Abstract: An integrated circuit structure includes a bulk semiconductor region, a first semiconductor strip over and connected to the bulk semiconductor region, and a dielectric layer including silicon oxide therein. Carbon atoms are doped in the silicon oxide. The dielectric layer includes a horizontal portion over and contacting a top surface of the bulk semiconductor region, and a vertical portion connected to an end of the horizontal portion. The vertical portion contacts a sidewall of a lower portion of the first semiconductor strip. A top portion of the first semiconductor strip protrudes higher than a top surface of the vertical portion to form a semiconductor fin. The horizontal portion and the vertical portion have a same thickness. A gate stack extends on a sidewall and a top surface of the semiconductor fin.

Abstract: A method includes forming a silicon layer on a wafer, forming an oxide layer in contact with the silicon layer, and, after the oxide layer is formed, annealing the wafer in an environment comprising ammonia (NH3) to form a dielectric barrier layer between, and in contact with, the silicon layer and the oxide layer. The dielectric barrier layer comprises silicon and nitrogen.

Abstract: A treatment, structure and system are provided that modify the deposition process of a material that can occur over two differing materials. In an embodiment the deposition rates may be adjusted by the treatment to change the deposition rate of one of the materials to be more in line with the deposition rate of a second one of the materials. Also, the deposition rates may be modified to be different from each other, to allow for a more selective deposition over the first one of the materials than over the second one of the materials.

Abstract: Semiconductor device structures having dielectric features and methods of forming dielectric features are described herein. In some examples, the dielectric features are formed by an ALD process followed by a varying temperature anneal process. The dielectric features can have high density, low carbon concentration, and lower k-value. The dielectric features formed according to the present disclosure has improved resistance against etching chemistry, plasma damage, and physical bombardment in subsequent processes while maintaining a lower k-value for target capacitance efficiency.

Abstract: Semiconductor device structures comprising a spacer feature having multiple spacer layers are provided. In one example, a semiconductor device includes an active area on a substrate, the active area comprising a source/drain region, a gate structure over the active area, the source/drain region being proximate the gate structure, a spacer feature having a first portion along a sidewall of the gate structure and having a second portion along the source/drain region, wherein the first portion of the spacer feature comprises a bulk spacer layer along the sidewall of the gate structure, wherein the second portion of the spacer feature comprises the bulk spacer layer and a treated seal spacer layer, the treated seal spacer layer being disposed along the source/drain region and between the bulk spacer layer and the source/drain region, and a contact etching stop layer on the spacer feature.

Abstract: A method includes forming a dummy gate stack over a semiconductor region of a wafer, and depositing a gate spacer layer using Atomic Layer Deposition (ALD) on a sidewall of the dummy gate stack. The depositing the gate spacer layer includes performing an ALD cycle to form a dielectric atomic layer. The ALD cycle includes introducing silylated methyl to the wafer, purging the silylated methyl, introducing ammonia to the wafer, and purging the ammonia.