Abstract: A process of measuring overlay metrologies of wafers, the wafer having a plurality of patterned layers. The process begins with retrieving historical overlay metrologies from a database, and real overlay metrologies of a first group of the wafers are measured. On the other hand, virtual overlay metrologies of a second group of the wafers are calculated with the retrieved historical overly metrologies. The real overlay metrologies of the first group of the wafers and the virtual overlay metrologies of the second group of the wafers are stored to the database as the historical overlay metrologies.

Abstract: The present disclosure relates to a method of monitoring wafer topography. A position and orientation of a plurality first alignment shapes disposed on a surface of a wafer are measured. Wafer topography as a function of wafer position is modeled by subjecting the wafer to an alignment which simultaneously minimizes misalignment between the wafer and a patterning apparatus and maximizes a focus of radiation on the surface. A non-correctable error is determined as a difference between the modeled wafer topography and a measured wafer topography. A maximum non-correctable error per field is determined for a wafer, and a mean variation in the maximum non-correctable error across each field within each wafer of a lot is determined, both within a layer and across layers. These values are then verified against a set of statistical process control rules to determine if they are within a specification limit of the manufacturing process.

Abstract: A method of processing first and second semiconductor wafers is provided. Each of the first and second semiconductor wafers has a first layer and a second layer over the first layer. A first lithographic process is performed on the first layer over the first semiconductor wafer using a first inter-field correction and a first intra-field correction. An overlay error of the first lithographic process is determined. A second inter-field correction and a second intra-field correction are computed based on the first inter-field correction, the first intra-field correction, and the measured overlay error. A second lithographic process is performed on the second layer over the second semiconductor wafer, based on the second inter-field correction and the second intra-field correction.

Abstract: An edge-dominant alignment method for use in an exposure scanner system is provided. The method includes the steps of: providing a wafer having a plurality of shot areas, wherein each shot area has a plurality of alignment marks; determining a first outer zone of the wafer, wherein the first outer zone includes a first portion of the shot areas along a first outer edge of the wafer; determining a scan path according to the shot areas of the first outer zone; and performing an aligning process to each shot area of the first outer zone according to the scan path and an alignment mark of each shot area of the first outer zone.

Abstract: The invention provides a broadband cholesteric liquid crystal film, a method for fabricating the same, a polarization device employing the same, and high light efficiency liquid crystal display employing the same. The cholesteric liquid crystal film is a single-layer liquid crystal material structure, and has a top surface and a bottom surface. Further, the cholesteric liquid crystal film includes a first region, a second region, and a third region, and the first region is adjacent to the top surface of the cholesteric liquid crystal film, the third region is adjacent to the bottom surface of the cholesteric liquid crystal film, and the second region is located between the first and third regions, and the average helical pitch P1 of the first region and the average helical pitch P3 of the third region are both larger than the average helical pitch P2 of the second region.

Abstract: Among other things, one or more systems and techniques for scanner alignment sampling are provided. A set of scan region pairs are defined along a periphery of a sampling area associated with a semiconductor wafer. Alignment marks are formed within scan regions of the set of scan region pairs, but are not formed within other regions of the sampling area. In this way, scan region pairs are scanned to determine alignment factors for respective scan region pairs. An alignment for the sampling area, such as layers or masks used to form patterns onto such layers, is determined based upon alignment factors determined for the scan region pairs.

Abstract: The invention provides a broadband cholesteric liquid crystal film, a method for fabricating the same, a polarization device employing the same, and high light efficiency liquid crystal display employing the same. The cholesteric liquid crystal film is a single-layer liquid crystal material structure, and has a top surface and a bottom surface. Further, the cholesteric liquid crystal film includes a first region, a second region, and a third region, and the first region is adjacent to the top surface of the cholesteric liquid crystal film, the third region is adjacent to the bottom surface of the cholesteric liquid crystal film, and the second region is located between the first and third regions, and the average helical pitch P1 of the first region and the average helical pitch P3 of the third region are both larger than the average helical pitch P2 of the second region.

Abstract: The present disclosure relates to a method of monitoring wafer topography. A position and orientation of a plurality first alignment shapes disposed on a surface of a wafer are measured. Wafer topography as a function of wafer position is modeled by subjecting the wafer to an alignment which simultaneously minimizes misalignment between the wafer and a patterning apparatus and maximizes a focus of radiation on the surface. A non-correctable error is determined as a difference between the modeled wafer topography and a measured wafer topography. A maximum non-correctable error per field is determined for a wafer, and a mean variation in the maximum non-correctable error across each field within each wafer of a lot is determined, both within a layer and across layers. These values are then verified against a set of statistical process control rules to determine if they are within a specification limit of the manufacturing process.

Abstract: Some embodiments of the present disclosure relate to a method of alignment which includes defining a plurality of fields on the face of a wafer, and organizing the plurality of fields into an orthogonal field structure and two or more continuous field structures. A first number of alignment structure positions are measured within each field of the two or more continuous field structures, and a second number of alignment structure positions are measured within each field of the orthogonal field structure, the second number being greater than the first number. The feature or layer is then aligned to the previously formed feature or layer based upon the measured alignment structure positions of the two or more continuous field structures and the orthogonal field structure.

Abstract: A light efficiency enhancing optical device is disclosed, including a cholesteric liquid crystal film, a quarter wave plate disposed on a light out-going surface of the cholesteric liquid crystal film and an optical compensating film disposed on a light out-going surface of the quarter wave plate, wherein the optical compensating film includes a positive birefringence C-plate, and a composite optical compensating film with combination of the optical compensating film and the quarter wave plate has in-plane phase retardation R0 of 100 nm˜170 nm and out-of-plane phase retardation Rth of 0 nm˜400 nm.

Abstract: A process of measuring overlay metrologies of wafers, the wafer having a plurality of patterned layers. The process begins with retrieving historical overlay metrologies from a database, and real overlay metrologies of a first group of the wafers are measured. On the other hand, virtual overlay metrologies of a second group of the wafers are calculated with the retrieved historical overly metrologies. The real overlay metrologies of the first group of the wafers and the virtual overlay metrologies of the second group of the wafers are stored to the database as the historical overlay metrologies.

Abstract: The invention provides a broadband cholesteric liquid crystal film, a method for fabricating the same, a polarization device employing the same, and high light efficiency liquid crystal display employing the same. The cholesteric liquid crystal film is a single-layer liquid crystal material structure, and has a top surface and a bottom surface. Further, the cholesteric liquid crystal film includes a first region, a second region, and a third region, and the first region is adjacent to the top surface of the cholesteric liquid crystal film, the third region is adjacent to the bottom surface of the cholesteric liquid crystal film, and the second region is located between the first and third regions, and the average helical pitch P1 of the first region and the average helical pitch P3 of the third region are both larger than the average helical pitch P2 of the second region.

Abstract: An optical engine includes a receiving chamber and three light source modules. Each light source module includes a positioning board, a heat dissipating plate, and a light source unit. The heat dissipating plate is sandwiched between the light source unit and the positioning board and adhered to the corresponding light source unit. The light source unit is installed on the receiving chamber. The positioning board is matched with the light source unit and installed on the receiving chamber.

Abstract: A lens module includes a seat, a lens holder and a thermal dissipation structure. The seat includes a base plate and two sidewalls perpendicularly formed on a surface of the base plate. The lens holder is mounted on the seat between the two sidewalls. The thermal dissipation structure is mounted on the seat and thermally conducts with the lens holder for cooling the lens holder.

Abstract: An electronic device includes a heat dissipation system and an operating system. The heat dissipation system includes a housing, a first heat dissipation module received in the housing, heat pipes extending from the first heat dissipation module through the housing. The operating system includes a dust-proof housing, a heat source and a heat dissipation device. The heat source is received in the dust-proof housing and generates heat. The cooling module is adhered to an outer surface of the dust-proof housing to be cooled and attaches the heat pipes to the first heat dissipation module. The outer surface of the dust-proof housing is adjacent to the housing. The heat pipes transfer heat from the operating system into the first heat dissipation module.

Abstract: A high transmittance brightness enhanced optical element for backlight modules and liquid crystal display device is disclosed. The brightness enhanced polarizing optical element comprises a reflective polarizer film, a phase retardation film, and a polarization enhancement film. The reflective polarizer film provides a function of selectively reflecting right-handness circularly polarized light or left-handness circularly polarized light and will transmit the other one of them. The one was selectively reflected will be recombined with the light source or the backlight and re-direct toward the reflective polarizer. The portions of the reflective light will be recombined with the fresh light from the light source as above and the processes repeatedly. As a result, almost all of the light transmit the reflective polarizer and in the same circular polarization. The light is then transmitted the phase retardation film and converted to a polarized light with another optical axis.

Abstract: A projector includes a housing, a projection lens, a receiving member, an optical engine, a light source module, a heat sink, and a fan. The housing includes a bottom wall and four sidewalls, the bottom wall and the four sidewalls together define a receiving space. One of the sidewalls a number of first vents, the other three sidewalls define a number of second vents. The projection lens is located at an intersecting corner of the sidewalls. The receiving member includes a first receiving portion and a second receiving portion. The optical engine is received in the second receiving portion. The light source module is received in the first receiving portion. The heat sink is located at an intersecting corner of the sidewalls. The fan is located at an intersecting corner of the sidewalls.

Abstract: A low color variation optical device is provided. The optical device includes a cholesteric liquid crystal film, a first phase retardation film disposed above the cholesteric liquid crystal film and a second phase retardation film disposed below the cholesteric liquid crystal film, wherein the second phase retardation film includes a plurality of molecules with a tilted and twisted arrangement. The invention also provides a backlight module and a liquid crystal display including a low color variation optical device.

Abstract: A liquid crystal display (LCD) includes two glass substrates, a liquid crystal unit formed by sandwiching a liquid crystal layer between the two glass substrates, a first polarizing film, and a second polarizing film. In another example, the LCD further includes a diffuse reflective film formed on the other side of the second polarizing film. In another example, the second polarizing film is replaced by a reflective film. The liquid crystal layer is composed of an antiferroelectric (including intermediate antiferroelectric) smectic liquid crystal material, and a birefringence of the liquid crystal layer changes along with an electric field applied to the liquid crystal layer.

Abstract: A light-source module includes a casing, and a number of light-source units. The casing defines a number of receiving holes on the walls thereof corresponding to the light-source units. Each light-source unit is received in a corresponding receiving hole. Each light-source unit includes a light source, a converging lens disposed on the optical path of the light emitted from the light source, and a spacer spaced the light source and the converging lens.