Abstract: A thermal processing apparatus includes a cooling water passage in a circumferential wall of a processing vessel such that the cooling water passage extends from a water inlet port to a turn-around point along the circumferential wall in a first direction and further from the turn-around point to a water exit port in a second, opposite direction.

Abstract: A single-substrate-heat-processing apparatus includes an airtight process chamber, the interior of which is partitioned into a process space and a lower space by a mount plate and a shield frame. Heating lamps are disposed at a position outside the process chamber and below the mount plate. The mount plate is supported by a shield frame via an isolator, which has a thermal conductivity lower than that of the mount plate. The isolator is formed of a lower member and an upper member. The upper member has outer and inner cover portions, which cover the inner edge of the shield frame and the outer edge of the mount plate, respectively, in a non-contacting state.