Patents by Inventor Yifeng Wu

Yifeng Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240134068
    Abstract: A radiation measurement device may be provided. The radiation measurement device may comprise a scattering component and a first detector. The scattering component may be located between a radiation source of an imaging device and the first detector, and configured to scatter first radiation rays emitted by the radiation source into scattering rays. The first detector may be configured to collect first measurement data by detecting at least a portion of the scattering rays, the first measurement data reflecting an operation status of the radiation source.
    Type: Application
    Filed: December 27, 2023
    Publication date: April 25, 2024
    Applicant: SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD.
    Inventors: Qiusheng WU, Yifeng JIANG, Yangyang LIN
  • Patent number: 11945032
    Abstract: A forging head for additive manufacturing, comprising a base portion and a forging portion. The forging portion extends from the base portion for forging a cladding layer during formation of the cladding layer by additive manufacturing. The forging head further comprising a through hole which is formed through the base portion and the forging portion, for at least one of an energy bean and an additive material to pass through during formation of the cladding layer.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: April 2, 2024
    Assignee: General Electric Company
    Inventors: Hai Chang, Dalong Zhong, Yingna Wu, Yong Wu, Zirong Zhai, Yifeng Wang
  • Publication number: 20240014312
    Abstract: A semiconductor device comprises a III-N device and a Field Effect Transistor (FET). The III-N device comprises a substrate on a first side of a III-N material structure, a first gate, a first source, and a first drain on a side of the III-N material structure opposite the substrate. The FET comprises a second semiconductor material structure, a second gate, a second source, and a second drain, and the second source being on an opposite side of the second semiconductor material structure from the second drain. The second drain of the FET is directly contacting and electrically connected to the first source of the III-N devices, and a via-hole is formed through a portion of the III-N material structure exposing a portion of the top surface of the substrate and the first gate is electrically connected to the substrate through the via-hole.
    Type: Application
    Filed: September 20, 2023
    Publication date: January 11, 2024
    Inventors: Yifeng Wu, John Kirk Gritters
  • Publication number: 20230420526
    Abstract: A transistor comprising an active region having a channel layer, with source and drain electrodes formed in contact with the active region and a gate formed between the source and drain electrodes and in contact with the active region. A spacer layer is on at least part of the surface of the plurality of active region between the gate and the drain electrode and between the gate and the source electrode. A field plate is on the spacer layer and extends on the spacer and over the active region toward the drain electrode. The field plate also extends on the spacer layer over the active region and toward the source electrode. At least one conductive path electrically connects the field plate to the source electrode or the gate.
    Type: Application
    Filed: September 11, 2023
    Publication date: December 28, 2023
    Inventors: Yifeng Wu, Primit Parikh, Umesh Mishra, Scott Sheppard
  • Patent number: 11810971
    Abstract: A semiconductor device comprises a III-N device and a Field Effect Transistor (FET). The III-N device comprises a substrate on a first side of a III-N material structure, a first gate, a first source, and a first drain on a side of the III-N material structure opposite the substrate. The FET comprises a second semiconductor material structure, a second gate, a second source, and a second drain, and the second source being on an opposite side of the second semiconductor material structure from the second drain. The second drain of the FET is directly contacting and electrically connected to the first source of the III-N devices, and a via-hole is formed through a portion of the III-N material structure exposing a portion of the top surface of the substrate and the first gate is electrically connected to the substrate through the via-hole.
    Type: Grant
    Filed: March 20, 2020
    Date of Patent: November 7, 2023
    Assignee: Transphorm Technology, Inc.
    Inventors: Yifeng Wu, John Kirk Gritters
  • Patent number: 11791385
    Abstract: A transistor comprising an active region having a channel layer, with source and drain electrodes formed in contact with the active region and a gate formed between the source and drain electrodes and in contact with the active region. A spacer layer is on at least part of the surface of the plurality of active region between the gate and the drain electrode and between the gate and the source electrode. A field plate is on the spacer layer and extends on the spacer and over the active region toward the drain electrode. The field plate also extends on the spacer layer over the active region and toward the source electrode. At least one conductive path electrically connects the field plate to the source electrode or the gate.
    Type: Grant
    Filed: March 11, 2005
    Date of Patent: October 17, 2023
    Assignee: Wolfspeed, Inc.
    Inventors: Yifeng Wu, Primit Parikh, Umesh Mishra, Scott Sheppard
  • Publication number: 20230307429
    Abstract: An electronic module for a half-bridge circuit includes a base substrate with an insulating layer between a first metal layer and a second metal layer. A trench formed through the first metal layer electrically isolates first, second, and third portions of the first metal layer from one another. A high-side switch includes an enhancement-mode transistor and a depletion-mode transistor. The depletion-mode transistor includes a III-N material structure on an electrically conductive substrate. A drain electrode of the depletion-mode transistor is connected to the first portion, a source electrode of the enhancement-mode transistor is connected to the second portion, a drain electrode of the enhancement-mode transistor is connected to a source electrode of the depletion-mode transistor, a gate electrode of the depletion-mode transistor is connected to the electrically conductive substrate, and the electrically conductive substrate is connected to the second portion.
    Type: Application
    Filed: May 30, 2023
    Publication date: September 28, 2023
    Inventors: David Michael Rhodes, Yifeng Wu, Sung Hae Yea, Primit Parikh
  • Patent number: 11749656
    Abstract: An electronic module for a half-bridge circuit includes a base substrate with an insulating layer between a first metal layer and a second metal layer. A trench formed through the first metal layer electrically isolates first, second, and third portions of the first metal layer from one another. A high-side switch includes an enhancement-mode transistor and a depletion-mode transistor. The depletion-mode transistor includes a III-N material structure on an electrically conductive substrate. A drain electrode of the depletion-mode transistor is connected to the first portion, a source electrode of the enhancement-mode transistor is connected to the second portion, a drain electrode of the enhancement-mode transistor is connected to a source electrode of the depletion-mode transistor, a gate electrode of the depletion-mode transistor is connected to the electrically conductive substrate, and the electrically conductive substrate is connected to the second portion.
    Type: Grant
    Filed: May 5, 2021
    Date of Patent: September 5, 2023
    Assignee: Transphorm Technology, Inc.
    Inventors: David Michael Rhodes, Yifeng Wu, Sung Hae Yea, Primit Parikh
  • Patent number: 11664429
    Abstract: A field effect transistor comprising a buffer and channel layer formed successively on a substrate. A source electrode, drain electrode, and gate are all formed in electrical contact with the channel layer, with the gate between the source and drain electrodes. A spacer layer is formed on at least a portion of a surface of the channel layer between the gate and drain electrode and a field plate is formed on the spacer layer isolated from the gate and channel layer. The spacer layer is electrically connected by at least one conductive path to the source electrode, wherein the field plate reduces the peak operating electric field in the device.
    Type: Grant
    Filed: September 5, 2017
    Date of Patent: May 30, 2023
    Assignee: Wolfspeed, Inc.
    Inventors: Yifeng Wu, Primit Parikh, Umesh Mishra, Marcia Moore
  • Patent number: 11586637
    Abstract: This disclosure relates to a search result processing method and apparatus, and a storage medium. The method may include acquiring a search result according to a search keyword and obtaining an accurate matching score of the search result relative to the search keyword. The method may further include determining a semantic matching weight vector of the search result, a semantic representation vector of the search keyword, and a semantic representation vector of the search result. The method may further include obtaining a semantic matching score of the search result relative to the search keyword according to the semantic representation vectors and the semantic matching weight vector. The method may further include obtaining a similarity between the search result and the search keyword according to the accurate matching score and the semantic matching score.
    Type: Grant
    Filed: March 12, 2021
    Date of Patent: February 21, 2023
    Assignee: TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
    Inventors: Yifeng Wu, Qiang Yan, Wenhao Zheng, Xiaoyin Chen, Dechuan Zhan
  • Publication number: 20220134770
    Abstract: An example system for thermal energy determination can include a first controller comprising a processor and a non-transitory machine-readable medium (MRM) communicatively coupled to the processor. The non-transitory MRM can include instructions executable by the processor to cause the processor to receive relative humidity information of an environment of a thermal printing device, determine a colormap to a print media of the thermal printing device based on the relative humidity, and determine a particular thermal energy to apply to the print media based on the determined colormap.
    Type: Application
    Filed: June 13, 2019
    Publication date: May 5, 2022
    Applicant: Hewlett-Packard Development Company, L.P.
    Inventors: Miguel Angel Lopez Alvarez, Jay S. Gondek, John J. Cantrell, Yifeng Wu
  • Publication number: 20220129714
    Abstract: Examples of printing device calibration based on a lot code are described. In an example, a lot code of a print media is determined. Calibration parameters for a printing device are determined based on the lot code. The printing device is calibrated to print on the print media based on the calibration parameters.
    Type: Application
    Filed: July 18, 2019
    Publication date: April 28, 2022
    Applicant: Hewlett-Packard Development Company, L.P.
    Inventors: Naoto A. Kawamura, Christine E. Steichen, Yifeng Wu, John J. Cantrell, David M. Wetchler
  • Patent number: 11309884
    Abstract: A circuit includes an electronic component package that comprises a first lead, a second lead, and a third lead; and a III-N transistor encased in the electronic component package, the III-N transistor including a drain, a gate, and a source, where the source is coupled to the first lead, the gate is coupled to the second lead, and the drain is coupled to the third lead. The circuit includes a high voltage node and a resistor, the resistor having a first terminal coupled to the high voltage node and a second terminal coupled to the third lead. The circuit further includes a ferrite bead connected in parallel to the resistor and coupled between the third lead and the high voltage node. When switching, the deleterious effects of a parasitic inductance of the circuit's power loop are mitigated by the ferrite bead and the resistor.
    Type: Grant
    Filed: December 30, 2020
    Date of Patent: April 19, 2022
    Assignee: Transphorm Technology, Inc.
    Inventors: Jason Cuadra, Yifeng Wu, Zhan Wang
  • Publication number: 20210408273
    Abstract: A semiconductor device comprises a III-N device and a Field Effect Transistor (FET). The III-N device comprises a substrate on a first side of a III-N material structure, a first gate, a first source, and a first drain on a side of the III-N material structure opposite the substrate. The FET comprises a second semiconductor material structure, a second gate, a second source, and a second drain, and the second source being on an opposite side of the second semiconductor material structure from the second drain. The second drain of the FET is directly contacting and electrically connected to the first source of the III-N devices, and a via-hole is formed through a portion of the III-N material structure exposing a portion of the top surface of the substrate and the first gate is electrically connected to the substrate through the via-hole.
    Type: Application
    Filed: March 20, 2020
    Publication date: December 30, 2021
    Inventors: Yifeng WU, John Kirk GRITTERS
  • Publication number: 20210391311
    Abstract: An electronic module for a half-bridge circuit includes a base substrate with an insulating layer between a first metal layer and a second metal layer. A trench formed through the first metal layer electrically isolates first, second, and third portions of the first metal layer from one another. A high-side switch includes an enhancement-mode transistor and a depletion-mode transistor. The depletion-mode transistor includes a III-N material structure on an electrically conductive substrate. A drain electrode of the depletion-mode transistor is connected to the first portion, a source electrode of the enhancement-mode transistor is connected to the second portion, a drain electrode of the enhancement-mode transistor is connected to a source electrode of the depletion-mode transistor, a gate electrode of the depletion-mode transistor is connected to the electrically conductive substrate, and the electrically conductive substrate is connected to the second portion.
    Type: Application
    Filed: May 5, 2021
    Publication date: December 16, 2021
    Inventors: David Michael Rhodes, Yifeng Wu, Sung Hae Yea, Primit Parikh
  • Patent number: D948105
    Type: Grant
    Filed: August 27, 2020
    Date of Patent: April 5, 2022
    Inventor: Yifeng Wu
  • Patent number: D970225
    Type: Grant
    Filed: September 14, 2021
    Date of Patent: November 22, 2022
    Inventor: Yifeng Wu
  • Patent number: D975210
    Type: Grant
    Filed: January 9, 2022
    Date of Patent: January 10, 2023
    Assignee: STARPONY (HK) LIMITED
    Inventor: Yifeng Wu
  • Patent number: D994051
    Type: Grant
    Filed: May 20, 2022
    Date of Patent: August 1, 2023
    Assignee: Guangzhou Mohuan Xingkong Electronic Commerce Co., Ltd.
    Inventor: Yifeng Wu
  • Patent number: D1024226
    Type: Grant
    Filed: May 24, 2022
    Date of Patent: April 23, 2024
    Assignee: Guangzhou Mohuan Xingkong Electronic Commerce Co., Ltd.
    Inventor: Yifeng Wu