Patents by Inventor Yih Chen

Yih Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Low biofouling filtration membranes and their forming method
    Patent number: 8062751
    Abstract: The present invention discloses a method for forming a low biofouling filtration membrane. First, an ozone treatment is performed to a fluorine-based porous membrane to introduce peroxides on surface. Afterwards, a first grafting polymerization is initiated from the peroxides, and functional monomers are polymerized to introduce halide groups on surface. Finally, a second grafting polymerization is initiated from the halide groups, and macro-monomers are polymerized to introduce zwitterionic group on surface, so as to form the low biofouling filtration membrane.
    Type: Grant
    Filed: December 21, 2007
    Date of Patent: November 22, 2011
    Assignee: Chung Yuan Christian University
    Inventors: Yung Chang, Ruoh-Chyu Ruaan, Wen-Yih Chen, Akon Higuchi, Yan-Che Chiang, Juin-Yih Lai
  • Anti-bacterial composition and method for producing the same
    Patent number: 8052997
    Abstract: The invention discloses an anti-bacterial composition and method for producing the same. The anti-bacterial composition of the invention includes an organic siloxane material which comprises an amino group, and a plurality of silver atoms. Particularly, the organic siloxane material has a meshed structure, and the plurality of silver atoms are bonded to the amino group and are well dispersed in the meshed structure.
    Type: Grant
    Filed: April 17, 2009
    Date of Patent: November 8, 2011
    Assignee: Chung-Shan Institute of Science and Technology Armaments Bureau, Ministry of National Defense
    Inventors: Cheng-Chien Yang, Kuo-Hui Wu, Wang-Tsai Gu, Chin-Yih Chen, Fu-Chu Yang
  • Epoxy resin containing side-chain-tethered caged POSS and preparation method thereof as well as epoxy resin material containing POSS-epoxy and preparation method thereof
    Patent number: 8044152
    Abstract: An epoxy resin containing side-chain-tethered caged POSS and a preparation method thereof as well as epoxy resin material containing POSS-epoxy and a preparation method thereof are disclosed. The epoxy resin containing side-chain-tethered caged POSS (POSS epoxy) is formed by tethering of POSS group to the side chain of the diglycidyl ether of bisphenol A (DGEBA) epoxy resin. The preparation method of the POSS epoxy includes a step of reacting epoxy resin with caged POSS to form epoxy resin containing side-chain-tethered caged POSS (POSS-epoxy). The preparation method of epoxy resin material containing POSS-epoxy includes a step of reacting DGEBA epoxy resin with POSS-epoxy to get epoxy resin material containing POSS-epoxy. The POSS-epoxy is distributed evenly in the epoxy resin material with POSS-epoxy.
    Type: Grant
    Filed: October 8, 2008
    Date of Patent: October 25, 2011
    Assignee: Chung Shan Institute of Science and Technology, Armaments Bureau, M.N.D
    Inventors: Cheng-Chien Yang, Chen-Chi M. Ma, Wang-Tsae Gu, Chin-Yih Chen
  • POLYMER/CARBON NANOTUBE COMPOSITE FILM WITH HIGH GAS PERMEABILITY RESISTANCE AND MANUFACTURING METHOD THEREOF
    Publication number: 20110240929
    Abstract: The invention provides a polymer/carbon nanotube composite film with high gas permeability resistance and manufacturing method thereof. The manufacturing method uses the in-situ polymerization method to form a polyaniline polymer composite material with multi-layer carbon nanotubes. Then, the polyaniline polymer composite material is under a heat reflux modification to form a charge transferring compound, so that the multi-layer carbon nanotubes will be distributed in a polyaniline polymer substrate uniformly and dispersively, and the gas permeability resistance of the polymer/carbon nanotube composite film can be largely improved.
    Type: Application
    Filed: April 2, 2010
    Publication date: October 6, 2011
    Inventors: CHENG-CHIEN YANG, Jui-Ming Yeh, Chin-Yih Chen, Kuan-Yeh Huang
  • Antibiofouling Nonionic-Zwitterionic Copolymer
    Publication number: 20110160392
    Abstract: The present invention discloses statistical antibiofouling nonionic-zwitterionic copolymers. The antibiofouling nonionic-zwitterionic copolymers are with the LCST (Lower Critical Solution Temperature) and/or UCST (Upper Critical Solution Temperature), and with increasing content of the nonionic monomers, the LCST and/or UCST of copolymers varies.
    Type: Application
    Filed: December 29, 2009
    Publication date: June 30, 2011
    Applicant: CHUNG-YUAN CHRISTIAN UNIVESITY
    Inventors: Yung Chang, Wen-Yih Chen
  • CAPACITOR SUBSTRATE STRUCTURE
    Publication number: 20100309607
    Abstract: The disclosed is a capacitor substrate structure to reduce the high leakage current and low insulation resistance issue of organic/inorganic hybrid materials with ultra-high dielectric constant. The insulation layer, disposed between two conductive layers, includes multi-layered dielectric layers. At least one of the dielectric layers has high dielectric constant, including high dielectric constant ceramic powder and conductive powder evenly dispersed in organic resin. The other dielectric layers can be organic resin, or further include high dielectric constant ceramic powder dispersed in the organic resin. The substrate has an insulation resistance of about 50 K? and leakage current of below 100 ?Amp under operational voltage.
    Type: Application
    Filed: August 21, 2009
    Publication date: December 9, 2010
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shur-Fen Liu, Meng-Huei Chen, Bih-Yih Chen, Yun-Tien Chen
  • ANTI-BACTERIAL COMPOSITION AND METHOD FOR PRODUCING THE SAME
    Publication number: 20100266688
    Abstract: The invention discloses an anti-bacterial composition and method for producing the same. The anti-bacterial composition of the invention includes an organic siloxane material which comprises an amino group, and a plurality of silver atoms. Particularly, the organic siloxane material has a meshed structure, and the plurality of silver atoms are bonded to the amino group and are well dispersed in the meshed structure.
    Type: Application
    Filed: April 17, 2009
    Publication date: October 21, 2010
    Inventors: Cheng-Chien Yang, Kuo-Hui Wu, Wang-Tsai Gu, Chin-Yih Chen, Fu-Chu Yang
  • Apparatus and Method for Recognizing a Person's Gaze
    Publication number: 20100220290
    Abstract: An apparatus and a method for recognizing a person's gaze are disclosed, where the apparatus includes a main body, an eye-movement detector, a data generator and a transmitter, where the main body has the specific area. The eye-movement detector can detect whether a gaze is fixed on the specific area. The data generator can generate gaze data when the gaze is fixed on the specific area. The transmitter can transmit the gaze data to terminal equipment, so that the terminal equipment can receive information that the gaze is fixed on the specific area based on the gaze data, so that the terminal equipment can provide a prompt based on the gaze data.
    Type: Application
    Filed: September 21, 2009
    Publication date: September 2, 2010
    Applicant: NATIONAL CENTRAL UNIVERSITY
    Inventors: Wen-Yih Chen, Jang-Zern Tsai
  • Use of Epinecidin-1 Peptides and Anti-lipopolysaccharide Factor Peptides for Treating Microbial Infection
    Publication number: 20100184647
    Abstract: Treatments of trichomonas, propionibacterium, or yeast infection using an epinecidin-1 peptide or an anti-lipopolysaccharide factor peptide.
    Type: Application
    Filed: January 11, 2010
    Publication date: July 22, 2010
    Applicant: ACADEMIA SINICA
    Inventors: JYH-YIH CHEN, CHIA-YU PAN
  • Epoxy resin containing side-chain-tethered caged POSS and preparation method thereof as well as epoxy resin material containing POSS-epoxy and preparation method thereof
    Publication number: 20100087616
    Abstract: An epoxy resin containing side-chain-tethered caged POSS and a preparation method thereof as well as epoxy resin material containing POSS-epoxy and a preparation method thereof are disclosed. The epoxy resin containing side-chain-tethered caged POSS (POSS epoxy) is formed by tethering of POSS group to the side chain of the diglycidyl ether of bisphenol A (DGEBA) epoxy resin. The preparation method of the POSS epoxy includes a step of reacting epoxy resin with caged POSS to form epoxy resin containing side-chain-tethered caged POSS (POSS-epoxy). The preparation method of epoxy resin material containing POSS-epoxy includes a step of reacting DGEBA epoxy resin with POSS-epoxy to get epoxy resin material containing POSS-epoxy. The POSS-epoxy is distributed evenly in the epoxy resin material with POSS-epoxy.
    Type: Application
    Filed: October 8, 2008
    Publication date: April 8, 2010
    Inventors: Cheng-Chien YANG, Chen-Chi M. Ma, Wang-Tsae Gu, Chin-Yih Chen
  • NOVEL TREATMENT FOR MASK SURFACE CHEMICAL REDUCTION
    Publication number: 20090258159
    Abstract: A method includes forming an absorption material layer on a mask; applying a plasma treatment to the mask to reduce chemical contaminants after the forming of the absorption material layer; performing a chemical cleaning process of the mask; and performing a gas injection to the mask.
    Type: Application
    Filed: April 10, 2008
    Publication date: October 15, 2009
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yih-Chen Su, Ting-Hao Hsu, Sheng-Chi Chin, Heng-Jen Lee, Hung Chang Hsieh, Yao-Ching Ku
  • Method for switching decoupled plasma nitridation processes of different doses
    Patent number: 7601404
    Abstract: A method for switching decoupled plasma nitridation (DPN) processes of different doses, which is able to decrease the switching time, is provided. According to the method, a dummy wafer is inserted into a chamber, a process gas introduced is ignited into plasma, and then a DPN doping process of the next dose is performed on the dummy wafer. The nitrogen concentration of the chamber is thus adjusted rapidly to switch to the DPN process of the next dose. In addition, after several cycles of the above steps are repeated, a dummy wafer is inserted into the chamber, and a complete DPN process of the next dose is performed on the dummy wafer. This process is performed several times before switching to the next DPN process.
    Type: Grant
    Filed: June 9, 2005
    Date of Patent: October 13, 2009
    Assignee: United Microelectronics Corp.
    Inventors: Ying-Wei Yen, Yun-Ren Wang, Shu-Yen Chan, Chen-Kuo Chiang, Chung-Yih Chen
  • Curable High Dielectric Constant Ink Composition and High Dielectric Film
    Publication number: 20090227719
    Abstract: The invention discloses a curable ink composition which comprises about 1-10 parts by weight of a curable epoxy resin system, about 1-30 parts by weight of ferroelectric ceramic powders, about 0.1-10 parts by weight of a polymeric dispersant, and about 50-96 parts by weight of a solvent. The ink composition is suitable for forming a high dielectric film by inkjet printing for built-in capacitors.
    Type: Application
    Filed: March 7, 2008
    Publication date: September 10, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chin-Hsien Hung, Shur-Fen Liu, Meng-Huei Chen, Bih-Yih Chen, Ming-Tsung Hung, Man-Chun Yu
  • Fabric folding machine structure
    Patent number: 7582048
    Abstract: A fabric folding machine structure is used for receiving and folding a fabric woven by a circular knitting machine. A fabric folding machine is added to the circular knitting machine without changing the length, width, and height of the fabric rolling machine. The fabric folding machine has a carrying base for carrying the fabric, and both ends of the carrying base are fixed to the bottom of two side seats, and a plurality of fabric rolling rods disposed between the two side seats define a carrying space, and the two side seats include a fabric folding unit for driving the fabric on the carrying base, and the fabric folding unit can drive the fabric back and forth in the carrying space to fold the fabric on the carrying base, so as to provide a larger carrying space and a higher fabric storing capacity than a prior art fabric folding machine.
    Type: Grant
    Filed: March 30, 2006
    Date of Patent: September 1, 2009
    Assignee: Pai Lung Machinery Mill Co., Ltd.
    Inventor: Wan-Yih Chen
  • Low BIOFOULING FILTRATION MEMBRANES AND THEIR FORMING METHOD
    Publication number: 20090162662
    Abstract: The present invention discloses a method for forming a low biofouling filtration membrane. First, an ozone treatment is performed to a fluorine-based porous membrane to introduce peroxides on surface. Afterwards, a first grafting polymerization is initiated from the peroxides, and functional monomers are polymerized to introduce halide groups on surface. Finally, a second grafting polymerization is initiated from the halide groups, and macro-monomers are polymerized to introduce zwitterionic group on surface, so as to form the low biofouling filtration membrane.
    Type: Application
    Filed: December 21, 2007
    Publication date: June 25, 2009
    Applicant: CHUNG YUAN CHRISTIAN UNIVERSITY
    Inventors: Yung Chang, Ruoh-Chyu Ruaan, Wen-Yih Chen, Akon Higuchi, Yan-Che Chiang, Juin-Yih Lai
  • Epoxy/modified silicon dioxide corrosion resistant nanocomposite material and preparation method thereof
    Publication number: 20090093611
    Abstract: An epoxy/modified silicon dioxide corrosion resistant nanocomposite material and a preparation method thereof are disclosed. The method includes the steps of: dispersing TS(TEOS-SiO2) or APTES/TEOS-SiO2 (TAS) in solvent so as to form TS solution or TAS solution; adding triphenylolmethane triglycidyl ether and 1,4-butanediol diglycidyl ether into the TS solution or TAS solution to produce glycidyl ether/TS solution or glycidyl ether/TAS solution. Add a curing agent into the glycidyl ether/TS solution or glycidyl ether/TAS solution to generate epoxy/TS solution or epoxy/TAS solution. After curing, obtain epoxy/modified silicon dioxide nanocomposite corrosion resistant material. The material is applied to optoelectronics or other fields for corrosion prevention.
    Type: Application
    Filed: October 5, 2007
    Publication date: April 9, 2009
    Inventors: Cheng-Chien Yang, Jui-Ming Yeh, Wang Tsae Gu, Chin Yih Chen, Kung-Chin Chang
  • Quick detachable basketball machine
    Patent number: 7404562
    Abstract: A quick detachable basketball machine comprising a front cabinet unit and a rear cabinet unit is disclosed. The front cabinet unit has an electronic coin slot box, two lower side panels, two upper side panels detachably connected to the lower side panels at the top, an oblique baffle obliquely detachably coupled between the upper side panels, an outer guide board detachably supported between the lower side panels, and two stop blocks mounted on the outer guide board. The rear cabinet unit has a bottom box, a vertical back rack hinged to the rear side of the top wall of the bottom box and holding a rim hoop ring, two side panels respectively hinged to two opposite lateral sides of the top wall of the bottom box and connectable to the bottom side of the vertical back rack, and a top plate bridging the side panels.
    Type: Grant
    Filed: September 26, 2006
    Date of Patent: July 29, 2008
    Assignee: Saint-Fun International Ltd.
    Inventors: Chan-Yih Chen, Cheng-Chun Chiang
  • Toughness-increased phenolic resin and preparation thereof
    Patent number: 7378484
    Abstract: A phenolic resin that increases its toughness by polydimethylsiloxane and a process of preparing the same is provided. Polydimethylsiloxane is added as a coupling agent in a ?-glycidoxypropyltrimethoxysilane-modified phenolic resin to improve the compatibility between polydimethylsiloxane and the phenolic resin. Then, tetraethoxysilane is added to conduct hydrolysis condensation and obtain tougher and thermally stable phenolic resin.
    Type: Grant
    Filed: March 31, 2005
    Date of Patent: May 27, 2008
    Assignee: Chung Shan Institute of Science and Technology
    Inventors: Jeng-Chang Yang, Chen-Chi Martin Ma, Hon-Bin Chen, Chin-Yih Chen
  • Pigment for use in inkjet recording medium coatings and methods
    Patent number: 7377975
    Abstract: Pigment suitable for use in coating compositions for inkjet recording media. Surfaces of an inorganic particulate are interacted with a water-soluble polyvalent metal salt in an aqueous medium. The treated particle surfaces have a significant cationic surface charge imparted to them. The salt is a salt of a metal of Group II or Group III of the Periodic Table. Inkjet recording media treated with a coating composition containing the above pigment provide high density, fast-drying, and non-feathering ink images with suitable water fastness, while the coating compositions also offer cost advantages and improved rheology at higher pigment levels over coatings based on silica pigments.
    Type: Grant
    Filed: September 20, 2006
    Date of Patent: May 27, 2008
    Assignee: J.M. Huber Corporation
    Inventors: Ching-Yih Chen, Ricky L. Giddens, Richard D. Carter
  • Method for preparing a novolac phenolic resin/silica hybrid organic-inorganic nanocomposite
    Patent number: 7365135
    Abstract: The method of the present invention includes grafting a glycidyl alkylene trialkoxy silane to a novolac phenolic resin in an organic solvent to form a modified novolac phenolic resin; mixing a tetralkoxy silane, an acid and water with the resulting organic solution containing the modified novolac phenolic resin, wherein hydrolysis and condensation reactions are carried out to form a —Si—O—Si— bonding; adding a curing agent for novolac phenolic resin to the resulting reaction mixture; evaporating the organic solvent and acid from the resulting mixture and heating the resulting mixture to form a novolac phenolic resin/silica hybrid organic-inorganic nanocomposite.
    Type: Grant
    Filed: June 14, 2004
    Date of Patent: April 29, 2008
    Assignee: Chung-Shan Institute of Science & Technology
    Inventors: Jeng-Cheng Yang, Chen-Chi Martin Ma, Hon-Bin Chen, Chin-Yih Chen