Patents by Inventor Yi-Ming Chen
Yi-Ming Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12266737Abstract: A semiconductor light-emitting device comprises a semiconductor stack having a first surface, wherein the first surface comprises multiple protrusion portions and multiple concave portions; a first electrode on the first surface and electrically connecting with the semiconductor stack; a second electrode on the first surface and electrically connecting with the semiconductor stack; and a transparent conduction layer conformally covering the first surface and between the first electrode and the semiconductor stack, wherein the first electrode comprises a first bonding portion and a first extending portion, and the first extending portion is between the first bonding portion and the transparent conduction layer and conformally covers the transparent conduction layer.Type: GrantFiled: March 31, 2021Date of Patent: April 1, 2025Assignee: EPISTAR CORPORATIONInventors: Yi-Ming Chen, Tsung-Hsien Yang
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Publication number: 20250100161Abstract: A method includes receiving a carrier, the carrier including a carrier body, a first filter, and a housing securing the first filter to the carrier body. The method further includes uninstalling the housing from the carrier, replacing the first filter with a second filter, reinstalling the housing on the carrier body, and inspecting the second filter. Inspecting the second filter includes using an automatic inspection mechanism to detect surface flatness of the second filter.Type: ApplicationFiled: December 9, 2024Publication date: March 27, 2025Inventors: Jen-Ti WANG, Yi-Ming CHEN, Chih-Wei LIN, Cheng-Ho HUNG, Fu-Hsien LI
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Publication number: 20250054796Abstract: A system is provided. The system includes: a semiconductor processing system comprising: a semiconductor processing apparatus configured to perform at least one semiconductor fabrication process; and a load port attached to the semiconductor processing apparatus and configured to load a wafer contained in a wafer container to the semiconductor processing apparatus; and a load port first aid platform in electrical communication with the load port, wherein the load port first aid platform controls the load port when the semiconductor processing apparatus malfunctions.Type: ApplicationFiled: August 7, 2023Publication date: February 13, 2025Inventors: Chia-Hsi Wang, ChunKai Yu, Yi-Ming Chen, Yen-Yu Chen, Yi-Fu Chen
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Publication number: 20250015246Abstract: A semiconductor device is provided, which includes an active region, a first semiconductor layer, a first metal element-containing structure, a first p-type or n-type layer, a second semiconductor layer and an insulating layer. The active region has a first surface and a second surface. The first semiconductor layer is at the first surface. The first metal element-containing structure covers the first semiconductor layer and comprising a first metal element. The first p-type or n-type layer is between the first semiconductor layer and the first metal element-containing structure. The second semiconductor layer is between the first semiconductor layer and the first p-type or n-type layer. The insulating layer covers a portion of the first semiconductor layer and a portion of the second semiconductor. The first p-type or n-type layer includes an oxygen element (O) and a second metal element and has a thickness less than or equal to 20 nm.Type: ApplicationFiled: September 23, 2024Publication date: January 9, 2025Inventors: Yu-Tsu LEE, Yi-Yang CHIU, Chun-Wei CHANG, Min-Hao YANG, Wei-Jen HSUEH, Yi-Ming CHEN, Shih-Chang LEE, Chung-Hao WANG
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Publication number: 20240421253Abstract: An optoelectronic semiconductor device includes a substrate, a first type semiconductor structure located on the substrate, a second type semiconductor structure located on the first type semiconductor structure, an active structure located between the first type semiconductor structure and the second type semiconductor structure, a plurality of contact portions disposed between the first type semiconductor structure and the substrate, and a first conductive oxide layer, a second conductive oxide layer, a first insulating layer and a second insulating layer. The plurality of contact portions is separated from each other, and one of them includes a semiconductor and has a side wall. The first conductive oxide layer contacts the contact portion, and the second conductive oxide layer contacts the first conductive oxide layer. The first insulating layer contacts the side wall. The second insulating layer is disposed between the first insulating layer and the second conductive oxide layer.Type: ApplicationFiled: August 26, 2024Publication date: December 19, 2024Inventors: Chung-Hao WANG, Yu-Chi WANG, Yi-Ming CHEN, Yi-Yang CHIU, Chun-Yu LIN
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Publication number: 20240413268Abstract: A semiconductor device includes a semiconductor stack, a reflective structure, and a conductive structure. The semiconductor stack includes a first semiconductor structure, a second semiconductor structure and an active region located between the first semiconductor structure and the second semiconductor structure. The reflective structure is located at a side of semiconductor stack closed to the first semiconductor structure, and includes a first metal. The conductive structure locates between the reflective structure and the first semiconductor structure, and includes a first region overlapping with the active structure and a second region which does not overlap with the active structure. The first metal in the second region has a concentration smaller than 5 atomic percent.Type: ApplicationFiled: June 7, 2024Publication date: December 12, 2024Inventors: Yi-Yang CHIU, Chun-Yu LIN, Chun Wei CHANG, Yi-Ming CHEN, Chen OU, Hung-Yu CHOU, Liang-Yi WU, Hsiao-Chi YANG
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Patent number: 12162134Abstract: A system includes a plurality of semiconductor processing tools; a carrier purge station; a carrier repair station; and an overhead transport (OHT) loop for transporting one or more substrate carriers among the plurality of semiconductor processing tools, the carrier purge station, and the carrier repair station. The carrier purge station is configured to receive a substrate carrier from one of the plurality of semiconductor processing tools, purge the substrate carrier with an inert gas, and determine if the substrate carrier needs repair. The carrier repair station is configured to receive a substrate carrier to be repaired and replace one or more parts in the substrate carrier.Type: GrantFiled: February 17, 2023Date of Patent: December 10, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Jen-Ti Wang, Chih-Wei Lin, Fu-Hsien Li, Yi-Ming Chen, Cheng-Ho Hung
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Patent number: 12125956Abstract: A semiconductor device is provided, which includes a semiconductor stack and a first contact structure. The semiconductor stack includes an active layer and has a first surface and a second surface. The first contact structure is located on the first surface and includes a first semiconductor layer, a first metal element-containing structure and a first p-type or n-type layer. The first metal element-containing structure includes a first metal element. The first p-type or n-type layer physically contacts the first semiconductor layer and the first metal element-containing structure. The first p-type or n-type layer includes an oxygen element (O) and a second metal element and has a thickness less than or equal to 20 nm, and the first semiconductor layer includes a phosphide compound or an arsenide compound.Type: GrantFiled: March 16, 2021Date of Patent: October 22, 2024Assignee: EPISTAR CORPORATIONInventors: Yu-Tsu Lee, Yi-Yang Chiu, Chun-Wei Chang, Min-Hao Yang, Wei-Jen Hsueh, Yi-Ming Chen, Shih-Chang Lee, Chung-Hao Wang
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Patent number: 12074252Abstract: An optoelectronic semiconductor device includes a substrate, a first type semiconductor structure, a second type semiconductor structure, an active structure and a contact structure. The first type semiconductor structure is located on the substrate and has a first protrusion part with a first thickness and a platform part with a second thickness. The second type semiconductor structure is located on the first type semiconductor structure. The active structure is between the first type semiconductor structure and the second type semiconductor structure. The contact structure is disposed between the first type semiconductor structure and the substrate. The second thickness of the platform part is in a range of 0.01 ?m to 1 ?m.Type: GrantFiled: September 19, 2022Date of Patent: August 27, 2024Assignee: EPISTAR CORPORATIONInventors: Chung-Hao Wang, Yu-Chi Wang, Yi-Ming Chen, Yi-Yang Chiu, Chun-Yu Lin
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Publication number: 20240239765Abstract: The present invention relates to a nicotinohydrazide derivative, a stereoisomer thereof or a pharmaceutically acceptable salt thereof having a structure of formula (I): wherein each of X, Y and Z is one of N and CH, at least one of X, Y and Z is CH, at least one of X, Y and Z is N, and R is one of OH and NH2.Type: ApplicationFiled: December 25, 2020Publication date: July 18, 2024Inventors: Yi-Ming Chen, Cherng-Chyi Tzeng, Yeh-Long Chen, Chih-Hua Tseng, Chia-Hung Yen, Rajni Kant, Ming-Hui Yang
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Patent number: 12002906Abstract: The present disclosure provides a semiconductor device and a semiconductor component. The semiconductor device includes an active structure, a ring-shaped semiconductor contact layer, a first electrode, and an insulating layer. The active structure has a first-conductivity-type semiconductor layer, a second-conductivity-type semiconductor layer, and an active layer located between the first-conductivity-type semiconductor layer and the second-conductivity-type semiconductor layer. The ring-shaped semiconductor contact layer is located on the second-conductivity-type semiconductor layer and having a first inner sidewall and a first outer sidewall. The first electrode has an upper surface and covers the ring-shaped semiconductor contact layer. The insulating layer covers the first electrode and the active structure and has a second inner sidewall and a second outer sidewall. The first inner sidewall is not flush with the second inner sidewall in a vertical direction.Type: GrantFiled: August 19, 2021Date of Patent: June 4, 2024Assignee: EPISTAR CORPORATIONInventors: Hao-Chun Liang, Wei-Shan Yeoh, Yao-Ning Chan, Yi-Ming Chen, Shih-Chang Lee
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Patent number: 11972252Abstract: A docker image is received. The docker image is for a container. The container contains files that allow for virtualization of applications that run within the container. The docker image is parsed to identify layer files in the docker image. Installed software components (e.g., installed files) and/or hardware components in the layer files are identified. Software application index calls are made to generate information that identifies relationships between the installed software components and/or hardware components. The relationships between the installed software components and/or hardware components are then displayed to a user.Type: GrantFiled: August 2, 2021Date of Patent: April 30, 2024Assignee: Micro Focus LLCInventors: Qiuxia Song, Yi-Ming Chen, Zhong-Yi Yang, Yangyang Zhao, Lei Xiao
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Patent number: 11906939Abstract: A lubricating oil volume adjustment system and a lubricating oil volume adjustment method are provided. The system includes a storage device and a processor and is connected to a machine including a motor through a data acquisition device acquiring current information of the motor. The storage device stores a machine learning model trained by a training data set including a plurality of pieces of the current information of the motor during operation and a plurality of temperature values measured during operation of the machine. The processor is configured to acquire the current information of present operation of the motor by using the data acquisition device, predict a temperature value of the machine when the motor operates under the current information by using the machine learning model, and calculate and adjust a lubricating oil volume suitable to be used by the machine during operation according to the predicted temperature value.Type: GrantFiled: March 11, 2021Date of Patent: February 20, 2024Assignee: Industrial Technology Research InstituteInventors: Yi-Ming Chen, Tian-You Hou, Shu-Chung Liao
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Publication number: 20240047604Abstract: A semiconductor light-emitting device comprises a substrate; a first adhesive layer on the substrate; multiple epitaxial units on the first adhesive layer; a second adhesive layer on the multiple epitaxial units; multiple first electrodes between the first adhesive layer and the multiple epitaxial units, and contacting the first adhesive layer and the multiple epitaxial units; and multiple second electrodes between the second adhesive layer and the multiple epitaxial units, and contacting the second adhesive layer and the multiple epitaxial units; wherein the multiple epitaxial units are totally separated.Type: ApplicationFiled: October 17, 2023Publication date: February 8, 2024Inventors: Hsin-Chih Chiu, Chih-Chiang Lu, Chun-Yu Lin, Ching-Huai Ni, Yi-Ming Chen, Tzu-Chieh Hsu, Ching-Pei Lin
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Publication number: 20240019838Abstract: A composite tool cutting monitoring system used for a machine is provided. The cutting monitoring system includes a data capturing module, a database and a cutting control module. The data capturing module is configured to capture a motor current data of the machine and a tool wear data. The motor current data is used as a training data for a tool wear state prediction model to perform deep learning and forecasting. The database is configured to establish a tool wear database for the comparison of a tool wear state. The tool wear state prediction model outputs a tool wear state prediction data to the cutting control module. The cutting control module judges whether the tool wear state is normal according to the tool wear state prediction data.Type: ApplicationFiled: October 27, 2022Publication date: January 18, 2024Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Yi-Ming CHEN, Shu-Chung LIAO
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Publication number: 20230371818Abstract: A hyperspectral characteristic band selection method and an active hyperspectral imaging device using the same. The method using a virtual dimension algorithm to calculate a number of endmembers of a hyperspectral image of a predetermined disease, and using between 1 time and 2 times the number of endmembers as a number of predetermined selected bands, and then selecting characteristic bands with a number matching the number of selected bands from a plurality of spectral bands in the image. The device comprises a base, light sources and a sensing portion, the light sources are respectively disposed on the base, bands emitted by the light sources are configured according to the characteristic bands calculated by the method. The sensing portion is disposed on the base and spaced apart from the light sources for receiving reflected light from an external target object irradiated by the light sources to obtain a hyperspectral image.Type: ApplicationFiled: May 20, 2022Publication date: November 23, 2023Inventors: Hsian-Min CHEN, Yi-Ming CHEN, YI-JING SHEEN, Hsin-Che WANG, TSU-TE HAO
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Patent number: 11791436Abstract: A semiconductor light-emitting device comprises a substrate; a first adhesive layer on the substrate; multiple epitaxial units on the first adhesive layer; a second adhesive layer on the multiple epitaxial units; multiple first electrodes between the first adhesive layer and the multiple epitaxial units, and contacting the first adhesive layer and the multiple epitaxial units; and multiple second electrodes between the second adhesive layer and the multiple epitaxial units, and contacting the second adhesive layer and the multiple epitaxial units; wherein the multiple epitaxial units are totally separated.Type: GrantFiled: January 6, 2022Date of Patent: October 17, 2023Assignee: EPISTAR CORPORATIONInventors: Hsin-Chih Chiu, Chih-Chiang Lu, Chun-Yu Lin, Ching-Huai Ni, Yi-Ming Chen, Tzu-Chieh Hsu, Ching-Pei Lin
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Publication number: 20230191619Abstract: A system includes a plurality of semiconductor processing tools; a carrier purge station; a carrier repair station; and an overhead transport (OHT) loop for transporting one or more substrate carriers among the plurality of semiconductor processing tools, the carrier purge station, and the carrier repair station. The carrier purge station is configured to receive a substrate carrier from one of the plurality of semiconductor processing tools, purge the substrate carrier with an inert gas, and determine if the substrate carrier needs repair. The carrier repair station is configured to receive a substrate carrier to be repaired and replace one or more parts in the substrate carrier.Type: ApplicationFiled: February 17, 2023Publication date: June 22, 2023Inventors: Jen-Ti Wang, Chih-Wei Lin, Fu-Hsien Li, Yi-Ming Chen, Cheng-Ho Hung
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Patent number: 11600749Abstract: Disclosed is a light-emitting device comprising a light-emitting stack having a length, a width, a first semiconductor layer, an active layer on the first semiconductor layer, and a second semiconductor layer on the active layer, wherein the first semiconductor layer, the active layer, and the second semiconductor layer are stacked in a stacking direction. A first electrode is coupled to the first semiconductor layer and extended in a direction parallel to the stacking direction and a second electrode is coupled to the second semiconductor layer and extended in a direction parallel to the stacking direction. A dielectric layer is disposed between the first electrode and the second electrode.Type: GrantFiled: June 8, 2018Date of Patent: March 7, 2023Assignee: EPISTAR CORPORATIONInventors: Shih-I Chen, Wei-Yu Chen, Yi-Ming Chen, Ching-Pei Lin, Tsung-Xian Lee
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Patent number: 11584019Abstract: An apparatus for semiconductor manufacturing includes an input port to receive a carrier, wherein the carrier includes a carrier body, a housing installed onto the carrier body, and a filter installed between the carrier body and the housing. The apparatus further includes a first robotic arm to uninstall the housing from the carrier and to reinstall the housing into the carrier; one or more second robotic arms to remove the filter from the carrier and to install a new filter into the carrier; and an output port to release the carrier to production.Type: GrantFiled: December 7, 2020Date of Patent: February 21, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Jen-Ti Wang, Chih-Wei Lin, Fu-Hsien Li, Yi-Ming Chen, Cheng-Ho Hung