Abstract: An electronic device is provided. The electronic device comprises: a storage for storing interaction setting information and behavior setting information; an interaction interface; and a processor electrically connected to the storage and the interaction interface. When the processor receives a behavior-driving command from the interaction interface, the processor is configured to select the behavior setting information and the interaction setting information according to the behavior-driving command. The processor is configured to perform a behavior according to the behavior setting information. The processor is further configured to perform an interaction operation based on the behavior according to the behavior setting information and the interaction setting information when the behavior is had. A control method and a non-transitory computer readable storage medium are also provided.

Abstract: A portable surface finishing device based on coherent light source includes a cover, a laser source, an optical calibrating module and a laser scanning module. The cover includes a beam output opening. The laser source is disposed in the cover, and is for providing a laser beam. The optical calibrating module is disposed in the cover, and the laser beam passes through the optical calibrating module. The laser scanning module is disposed in the cover, and the laser beam from the optical calibrating module passes through the laser scanning module so as to linearly output on a target surface. The laser scanning module includes a multifaceted reflective structure, a rotation driving mechanism and an F-theta lens.

Abstract: A method for manufacturing a semiconductor device is provided. In the method for manufacturing a semiconductor device, at first, a semiconductor substrate of a wafer is etched to form at least one fin. Then, an insulation structure is formed around the fin. Thereafter, the fin is recessed. Then, an epitaxial channel structure is epitaxially grown over the recessed fin. Thereafter, a portion of the epitaxial channel structure over a top surface of the insulation structure is removed. Then, a non-contact-type cleaning operation is performed to clean a top surface of the wafer after removing said portion of the epitaxial channel structure. Thereafter, the top surface of the wafer is cleaned using hydrogen fluoride after removing said portion of the epitaxial channel structure. Then, the insulation structure is recessed, such that the epitaxial channel structure protrudes from the recessed insulation structure.

Abstract: A testing system includes apparatus and methods of testing a subject according to a forced-choice scheme. The scheme is based on Thurstonian Item-Response. Theory and is particularly relevant to personality assessment. The invention provides dynamic test generation and scoring for efficient testing of subjects using unique tests.

Abstract: An antibody, or an antigen-binding fragment there, binding human ENO1 (GenBank: AAH506421.1) is provided. Methods for treating an ENO1 protein-related disease or disorder, inhibiting cancer invasion and diagnosis of cancer are also provided.

Abstract: The present disclosure provides, in part, methods for evaluating, identifying, and/or producing (e.g., manufacturing) a CTLA4-Fc fusion protein, e.g., abatacept. In some instances, methods herein allow highly resolved evaluation of abatacept useful for, inter alia, manufacturing abatacept, characterizing abatacept, identifying and/or confirming abatacept, monitoring the structure of abatacept, comparing abatacept preparations made over time or made under different conditions, and/or controlling the structure of abatacept.

Abstract: A memory device comprises a plurality of stacks of word lines, the word lines in the stacks having first vertical sides and second vertical sides opposite the first vertical sides, and a first plurality of strings and a second plurality of strings disposed respectively on the first vertical sides and the second vertical sides of the word lines in a particular stack in the plurality of stacks. The second plurality of strings is offset from the first plurality of strings in a direction along which the word lines in the particular stack extend. A first program operation includes applying a shielding voltage to a first string in the first plurality of strings and a fourth string in the second plurality of strings, and applying a program voltage to a second string in the second plurality of strings and a third string in the first plurality of strings.

Abstract: A memory device comprises a plurality of stacks of word lines, the word lines in the stacks having first vertical sides and second vertical sides opposite the first vertical sides, and a first plurality of strings and a second plurality of strings disposed respectively on the first vertical sides and the second vertical sides of the word lines in a particular stack in the plurality of stacks. The second plurality of strings is offset from the first plurality of strings in a direction along which the word lines in the particular stack extend. A first program operation includes applying a shielding voltage to a first string in the first plurality of strings and a fourth string in the second plurality of strings, and applying a program voltage to a second string in the second plurality of strings and a third string in the first plurality of strings.

Abstract: A pull cord safety device includes a pull cord and a safety unit allowing extension of the pull cord. The safety unit includes a plurality of barrier units. Each barrier unit includes two front barrier ropes and two rear barrier ropes. Each front barrier rope has a front portion extending across and disposed forwardly of the pull cord, and a first intersection portion connected to the front portion. Each rear barrier rope has a rear portion extending across and disposed rearward of the pull cord, and a second intersection portion connected to the rear portion and intersecting and disposed forwardly of the first intersection portion.

Abstract: A computing device obtains and authenticates user credentials provided by a user at a client device. The computing device obtains a photo album of digital images and accesses profile data associated with the user credentials. A grouping of target images is extracted by the computing device from the plurality of digital images based on the profile data, each of the target images depicting a facial region of the user. The computing device retrieves at least one product recommendation for each target image based on the user profile and edits each of the target images based on the retrieved at least one product recommendation. The computing device causes a user interface to be displayed at the client device, the user interface displaying one or more of the edited target images, the user interface further displaying the retrieved at least product recommendation associated with the one or more edited target images.

Abstract: Articles are described including a first microfiltration membrane layer having a first major surface and a second major surface disposed opposite the first major surface, and a first silica layer directly attached to the first major surface of the first microfiltration membrane layer. The first silica layer includes a polymeric binder and acid-sintered interconnected silica nanoparticles arranged to form a continuous three-dimensional porous network. A method of making an article is also described, including providing a first microfiltration membrane layer having a first major surface and a second major surface disposed opposite the first major surface, and forming a first silica layer on the first major surface.

Abstract: A method for manufacturing a semiconductor device is provided. In the method for manufacturing a semiconductor device, at first, a semiconductor substrate of a wafer is etched to form at least one fin. Then, an insulation structure is formed around the fin. Thereafter, the fin is recessed. Then, an epitaxial channel structure is epitaxially grown over the recessed fin. Thereafter, a portion of the epitaxial channel structure over a top surface of the insulation structure is removed. Then, a non-contact-type cleaning operation is performed to clean a top surface of the wafer after removing said portion of the epitaxial channel structure. Thereafter, the top surface of the wafer is cleaned using hydrogen fluoride after removing said portion of the epitaxial channel structure. Then, the insulation structure is recessed, such that the epitaxial channel structure protrudes from the recessed insulation structure.

Abstract: A plasma liquid generating device includes a tube, a plasma generating module, a flow limiting unit, and a position limiting member. The tube has at least an air inlet and a flow channel outlet. The plasma generating module is disposed adjacent to the air inlet and configured to generate plasma. The flow limiting unit is detachably disposed in the tube, and a distance between the flow limiting unit and the flow channel outlet is greater than a distance between the air inlet and the flow channel outlet. The position limiting member is detachably disposed at the flow channel outlet to limit the position of the flow limiting unit.

Abstract: The present invention provides a method for accessing a flash memory module, wherein the method comprises: building a physical address to logical address (P2L) table; building a logical address group table, wherein the logical address group table records statuses of a plurality of logical address groups; receiving a read command asking for a data within the flash memory module, wherein the read command comprises a specific logical address; referring to a status of a specific logical address group corresponding the specific logical address to determine if searching the P2L mapping table or not, to obtain a specific physical address corresponding to the specific logical address, wherein the specific physical address is utilized to read the data from the flash memory module.

Abstract: A method includes providing a semiconductor substrate having first and second regions that are doped with first and second dopants respectively. The first and second dopants are of opposite types. The method further includes epitaxially growing a first semiconductor layer that is doped with a third dopant. The first and third dopants are of opposite types. The method further includes depositing a dielectric hard mask (HM) layer over the first semiconductor layer; patterning the dielectric HM layer to have an opening over the first region; extending the opening towards the semiconductor substrate; and epitaxially growing a second semiconductor layer in the opening. The second semiconductor layer is doped with a fourth dopant. The first and fourth dopants are of a same type. The method further includes removing the dielectric HM layer; and performing a first CMP process to planarize both the first and second semiconductor layers.

Abstract: In a ball movement state measuring system with a ball, a sensing module, a wireless communication module, a power supply and an induction coil, the speed, rotation speed, rotation axis and trace of the ball at first movement state are calculated based on first accelerated speed and first angular velocity of the ball at first movement state and first movement result is obtained by the processor. The speed, rotation speed, rotation axis and trace of the ball at second movement state are calculated based on speed and rotation axis of the ball at first movement state, second accelerated speed and environment parameter of the ball at second movement state and second movement result is obtained by the processor. The ball is forced by gravity, applied force and air resistance at first movement state, and the ball is forced by gravity, air resistance and centripetal force at second movement state.

Abstract: A chemical mechanical polishing (CMP) chamber is disclosed. The CMP chamber includes a chamber body, a door mounted on the chamber body and a chamber substructure being one selected from a group consisting of a moisture separator separating a moisture generated in the CMP chamber, a supplementary exhaust port, a transparent window mounted on the door, a sampling port mounted on the door, a sealing material including a metal frame, an o-ring for sealing the door and a combination thereof.

Abstract: An apparatus for performing chemical mechanical polish on a wafer includes a polishing head that includes a retaining ring. The polishing head is configured to hold the wafer in the retaining ring. The retaining ring includes a first ring having a first hardness, and a second ring encircled by the first ring, wherein the second ring has a second hardness smaller than the first hardness.

Abstract: In a ball movement state measuring system with a ball, a sensing module, a wireless communication module, a power supply and an induction coil, the speed, rotation speed, rotation axis and trace of the ball at first movement state are calculated based on first accelerated speed and first angular velocity of the ball at first movement state and first movement result is obtained by the processor. The speed, rotation speed, rotation axis and trace of the ball at second movement state are calculated based on speed and rotation axis of the ball at first movement state, second accelerated speed and environment parameter of the ball at second movement state and second movement result is obtained by the processor. The ball is forced by gravity, applied force and air resistance at first movement state, and the ball is forced by gravity, air resistance and centripetal force at second movement state.

Abstract: A display device includes a supporting frame, a display panel, an optical film assembly, and a light-penetrated adhesive member. The supporting frame includes a first supporting portion, and the display panel is disposed on the supporting frame. The display panel includes a pixel region and a non-pixel region, and the non-pixel region is disposed outside of the pixel region. The optical film assembly is partially disposed between the first supporting portion and the display panel. The light-penetrated adhesive member is disposed between the first supporting portion of the supporting frame and the optical film assembly. The light-penetrated adhesive member includes a first portion disposed corresponding to the non-pixel region and a second portion disposed corresponding to the pixel region. The configuration can achieve the narrow border design, provide a sufficient structural strength, or improve the light leakage or shadow issue at the edge of the active area.