Abstract: A thin, planar semiconductor device having electrodes on both surfaces is disclosed. This semiconductor device is provided with an IC chip and a wiring layer having one side that is electrically connected to surface electrodes of the IC chip. On this surface of the wiring layer, conductive posts are provided on wiring of the wiring layer, and an insulating resin covers all portions not occupied by the IC chip and conductive posts. The end surfaces of the conductive posts are exposed from the insulating resin and are used as first planar electrodes. In addition, a resist layer is formed on the opposite surface of the wiring layer. Exposed portions are formed in the resist layer to expose desired wiring portions of the wiring layer. These exposed portions are used as second planar electrodes. Stacking semiconductor devices of this construction enables an improvement in the integration of semiconductor integrated circuits.

Abstract: The semiconductor device 100 comprises a first semiconductor element 113 provided on a face on one side of a flat plate shaped interconnect component 101, an insulating resin 119 covering a face of a side where the first semiconductor element 113 of the interconnect component 101 is provided and a side face of the first semiconductor element 113, and a second semiconductor element 111 provided on a face on the other side of the interconnect component 101. The interconnect component 101 has a constitution where an interconnect layer 103, a silicon layer 105 and an insulating film 107 are sequentially formed. The interconnect layer 103 has a constitution where the interconnect layer 103 has a flat plate shaped insulating component and a conductive component extending through the insulating component. The first semiconductor element 113 is electrically connected with the second semiconductor element 111 through the conductive component.

Abstract: Disclosed are a bonding method for a semiconductor chip, which employs an ultrasonic bonding scheme that prevents wear-out of the top surface of a mount tool and ensures both high reliability and high productivity, and a bonding apparatus which is used to carry out the method. The bonding apparatus and method are provided with means for suppressing generation of a sliding friction. The apparatus and method execute a bonding process by controlling vibration-axial directional holding force and inertial force based on information given from control management means to thereby maintain a relationship of (vibration-axial directional holding force)>(die shear strength)+(inertial force) while applying an ultrasonic vibration to a region which is subjected to bonding.

Abstract: The semiconductor device 1 has a semiconductor chip 10 (first semiconductor chip) and a semiconductor chip 20 (second semiconductor chip). The semiconductor chip 20 is formed on the semiconductor chip 10. The semiconductor chip 20 is constituted by comprising a semiconductor substrate 22. The semiconductor substrate 22, which is an SOI substrate, is constituted by comprising an insulating layer 34, and a silicon layer 36, which is provided on the insulating layer 34, including a circuit forming region A1. The insulating layer 34 functions as a protective film (a first protective film) covering a lower face (a face opposite to the semiconductor chip 10) of the circuit forming region A1. A protective film 38 (a second protective film) is provided on the semiconductor substrate 22. The protective film 38 covers a side face of the circuit forming region A1.

Abstract: The semiconductor chip 1 has a semiconductor substrate 10. In the present embodiment, the semiconductor substrate 10, which is an SOI substrate, is constituted by comprising a support substrate 12, an insulating layer 14 formed on the support substrate 12 with a layered structure, and a silicon layer 16 formed on the insulating layer 14 with the layered structure. The semiconductor substrate 10 has a circuit forming region A1 provided in the silicon layer 16. An insulating region 18 is provided on the semiconductor substrate 10. The insulating region 18 is provided so as to surround the entire side face of the circuit forming region A1.

Abstract: The SOI substrate 1 has a supporting substrate 10, an insulating layer 20 formed on the supporting substrate 10 and a silicon layer 30 formed on the insulating layer 20. A through electrode 40 is provided in a device formation region A1 of the SOI substrate 1. The through electrode 40 reaches the insulating layer 20 from the silicon layer 30. Specifically, the through electrode 40 extends to an inner part of the insulating layer 20 originating from a surface of the silicon layer 30 while penetrating the silicon layer 30. Here, an end face 40a of the through electrode 40 at the insulating layer 20 side stops inside the insulating layer 20.

Abstract: Disclosed are a bonding method for a semiconductor chip, which employs an ultrasonic bonding scheme that prevents wear-out of the top surface of a mount tool and ensures both high reliability and high productivity, and a bonding apparatus which is used to carry out the method. The bonding apparatus and method are provided with means for suppressing generation of a sliding friction. The apparatus and method execute a bonding process by controlling vibration-axial directional holding force and inertial force based on information given from control management means to thereby maintain a relationship of (vibration-axial directional holding force)>(die shear strength)+(inertial force) while applying an ultrasonic vibration to a region which is subjected to bonding.

Abstract: There is provided a semiconductor device in which a plurality of semiconductor chips is stacked in layers and sealed in a package, including: a lower-layer semiconductor chip which is mounted on a package board; an upper-layer semiconductor chip which is stacked via a plurality of spacers on the lower-layer semiconductor chip; at least one first conductor interconnecting electrically at least one first electrode on the lower-layer semiconductor chip and at least one first internal terminal on the package board; at least one second conductor electrically interconnecting at least one second electrode on the upper-layer semiconductor chip and at least one second internal terminal on the package board; and the package for sealing therein the lower-layer semiconductor chip, the upper-layer semiconductor chip, and the at least one first conductor and the at least one second conductor which are all on the package board.

Abstract: A flip-chip type semiconductor device includes a semiconductor substrate. A plurality of electrode terminals are provided and arranged on a top surface of the semiconductor substrate, a sealing resin layer is formed on the top surface of the semiconductor substrate such that the electrode terminals are completely covered with the sealing resin layer.

Abstract: A semiconductor device according to the invention is provided with an electrode used for connecting a semiconductor chip and a wiring board or plural semiconductor chips, an additive layer formed by doping an additive including at least one type of atom different from an atom forming the electrode in the vicinity of the surface of the electrode and an insulator formed on the surface of the electrode.

Abstract: When viewed in a first direction, a cross section of a pressing surface of the bonding tool for pressing the inner leads is flat and extends uniformly over a range longer than the interval between every two electrode pads. When viewed in a second direction orthogonal to the first direction, and when the inner leads are pressed to the electrode pads by virtue of a predetermined pressing force, the length of a pressing area having a pressing force acting between the inner leads and the electrode pads is shorter than the length of each electrode pad.

Abstract: Disclosed are a bonding method for a semiconductor chip, which employs an ultrasonic bonding scheme that prevents wear-out of the top surface of a mount tool and ensures both high reliability and high productivity, and a bonding apparatus which is used to carry out the method. The bonding apparatus and method are provided with means for suppressing generation of a sliding friction.

Abstract: A bump is formed at a predetermined position on a surface of a semiconductor wafer and a sealing resin is formed so as to cover the surface and to make a surface of the bump exposed. Then, a reinforcing plate is bonded to the sealing resin and the exposed surface of the bump through an adhesive, and a rear portion of the semiconductor wafer is ground using a grind stone or removed by wet etching. Then, the rear surface of the thinned semiconductor wafer is covered with another sealing resin.

Abstract: An electric terminal of an electronic device includes an external electrode, a flexible lead member for connecting the external electrode to a pad of the electronic device, and a support member for surrounding the lead member and mechanically supporting the external electrode when the lead member is deformed by a heat stress applied to the external electrode. By separating the electric connection function from the supporting function in the electric terminal, a reliable connection can be achieved after a heat cycle test of the electronic device.

Abstract: In a multi-chip package having vertically stacked semiconductor integrated circuits (chips), a heat transmitting conductive plate (5) can be interposed between a lower layer semiconductor chip (3) and an upper layer semiconductor chip (4) and connected to a ground wiring of a substrate (2) through a bonding wire (9). A heating transmitting conductive plate (5) at the ground potential can block propagation of noise between the lower layer semiconductor chip (3) and upper layer semiconductor chip (4). Thus, the addition of noise to signals of an analog circuit in the upper layer semiconductor chip (4) can be avoided, reducing noise induced malfunctions. Furthermore, heat generated by the lower layer semiconductor chip (3) and upper layer semiconductor chip (4) can be transmitted through contact points with the heat transmitting conductive plate (5) for dissipation therefrom. This can improve heat dissipating capabilities of the semiconductor device (1) contributing to more stable operation.

Abstract: There is provided a semiconductor device in which a plurality of semiconductor chips is stacked in layers and sealed in a package, including: a lower-layer semiconductor chip which is mounted on a package board; an upper-layer semiconductor chip which is stacked via a plurality of spacers on the lower-layer semiconductor chip; at least one first conductor interconnecting electrically at least one first electrode on the lower-layer semiconductor chip and at least one first internal terminal on the package board; at least one second conductor electrically interconnecting at least one second electrode on the upper-layer semiconductor chip and at least one second internal terminal on the package board; and the package for sealing therein the lower-layer semiconductor chip, the upper-layer semiconductor chip, and the at least one first conductor and the at least one second conductor which are all on the package board.

Abstract: A bump is formed at a predetermined position on a surface of a semiconductor wafer and a sealing resin is formed so as to cover the surface and to make a surface of the bump exposed. Then, a reinforcing plate is bonded to the sealing resin and the exposed surface of the bump through an adhesive, and a rear portion of the semiconductor wafer is ground using a grind stone or removed by wet etching. Then, the rear surface of the thinned semiconductor wafer is covered with another sealing resin.

Abstract: When viewed in a first direction, a cross section of a pressing surface of the bonding tool for pressing the inner leads is flat and extends uniformly over a range longer than the interval between every two electrode pads. When viewed in a second direction orthogonal to the first direction, and when the inner leads are pressed to the electrode pads by virtue of a predetermined pressing force, the length of a pressing area having a pressing force acting between the inner leads and the electrode pads is shorter than the length of each electrode pad.

Abstract: A semiconductor device according to the invention is provided with an electrode used for connecting a semiconductor chip and a wiring board or plural semiconductor chips, an additive layer formed by doping an additive including at least one type of atom different from an atom forming the electrode in the vicinity of the surface of the electrode and an insulator formed on the surface of the electrode.

Abstract: A thin, planar semiconductor device having electrodes on both surfaces is disclosed. This semiconductor device is provided with an IC chip and a wiring layer having one side that is electrically connected to surface electrodes of the IC chip. On this surface of the wiring layer, conductive posts are provided on wiring of the wiring layer, and an insulating resin covers all portions not occupied by the IC chip and conductive posts. The end surfaces of the conductive posts are exposed from the insulating resin and are used as first planar electrodes. In addition, a resist layer is formed on the opposite surface of the wiring layer. Exposed portions are formed in the resist layer to expose desired wiring portions of the wiring layer. These exposed portions are used as second planar electrodes. Stacking semiconductor devices of this construction enables an improvement in the integration of semiconductor integrated circuits.