Abstract: A method for controlling CD of etch process defines difference between designed dimension and etched dimension as dimensional displacement and defines target value of the dimensional displacement. A plurality of samples are prepared in each group having different exposure ratios. The plurality of samples of each group are etched until etch end point is detected and then over-etched for uniform time interval after detecting the etch end point. Using etch end point and over-etch time, correlation function of the over-etch time to the etch end point time is determined and the over-etch time to the etch end point is determined using the correlation function.

Abstract: An exposure method and apparatus for use in exposing a photoresist on a semiconductor wafer do not employ an aperture for shaping the exposure light. The exposure apparatus includes a light source unit, a reflecting mirror unit having a micro mirror array (MMA) and a control unit that controls the MMA, and a pattern transfer unit that transfers the pattern of a photomask onto the photoresist. The angles of inclination of the respective mirrors of the MMA are adjusted to reflect incident light in a manner that shapes the incident light. Accordingly, it is possible to form a pattern having the highest degree of resolution and optimum depth of focus (DOF) in the shortest amount of processing time.

Abstract: A method and apparatus for obtaining high-resolution images of rotating targets by using an image reconstruction algorithm without interpolation, are provided. The method comprises the steps of: a) acquiring initial information; b) calculating parameters; c) computing a start frequency ƒsk and a step frequency &dgr;ƒk; d) measuring data for the target to store them; e) determining whether or not the step d) is completed; f) if the determination result is negative, repeating the steps a) to e); and, if otherwise, obtaining the image; and g) displaying the image.

Abstract: A mask blank and a method of fabricating a phase shift mask from the same. The mask blank includes a transparent substrate, a light shield layer formed on the entire upper surface of the transparent substrate, and a multifunctional protective layer formed on the entire surface of the light shield layer. To make the phase shift mask from the blank, the protective layer is patterned, and the exposed portions of the light shield layer are etched using the protective layer pattern as an etch mask to in turn expose first and second regions of the substrate. The phase shift region is formed by etching a groove in the second region of the substrate while the protective layer pattern protects the light shield layer from the etchant. Therefore, undesirable residue is prevented from forming as a result of a reaction between the etchant and the light shield layer and hence, from accumulating at the bottom of a groove constituting the phase shift region.

Abstract: The present invention relates to a file construction for mobile communication device including an execution segment in form of machine language codes and a file execution method using the same, whereby a file in accordance with the present invention comprises a header, a file execution segment formed in machine language codes, and a resource segment to be selected by languages; wherein the header includes data for performing one or more of the functions of: 1) verifying reliability/validity of the file, 2) restricting use of the file (by period of the use, by times of the use), and 3) automatic updating of the file. The file construction and the file execution method as per the present invention enable to enhance execution speed of a program for mobile communication device and to reduce storage space for such program; while functions such as verification of validity of the file, limiting use of the file, updating of the file can be performed using various data contained in the file header.

Abstract: A mask blank includes a transparent substrate, a light shield layer formed on the upper surface of the transparent substrate, and a multi-functional protective layer formed on the light shield layer. To make a phase shift mask from the blank, the protective layer is patterned, and the light shield layer is etched using the protective layer pattern as an etch mask. The phase shift region is formed by etching a groove in the second region of the substrate while the protective layer pattern protects the light shield layer. Therefore, undesirable residue is prevented from forming at the bottom of the groove constituting the phase shift region. The method also entails patterning a photosensitive layer on the protective layer, and patterning the protective layer by using the patterned photosensitve layer as a mask. In this case, the structure is cleaned so that no residue remains on the exposed portions of the light shield layer.

Abstract: A method of fabricating a phase shift mask is provided in which light shield film patterns for setting a phase shift region and a phase non-shift region are simultaneously formed on a substrate. A groove is formed in the substrate set as the phase shift region. The light shield film pattern, which contacts the groove and is formed on a region of the substrate set as the phase non-shift region, is removed. A phase shift layer can be formed between the substrate and the light shield film pattern. In this case, regions set by the light shield film pattern become opposite to when the phase shift layer is not formed. That is, a phase shift region is changed into a phase non-shift region, and the phase non-shift region is changed into the phase shift region.

Abstract: A method of fabricating a phase shift mask is provided in which light shield film patterns for setting a phase shift region and a phase non-shift region are simultaneously formed on a substrate. A groove is formed in the substrate set as the phase shift region. The light shield film pattern, which contacts the groove and is formed on a region of the substrate set as the phase non-shift region, is removed. A phase shift layer is formed between the substrate and the light shield film pattern. In this case, regions set by the light shield film pattern become opposite to when the phase shift layer is not formed. That is, a phase shift region is changed into a phase non-shift region, and the phase non-shift region is changed into the phase shift region.

Abstract: An acousto-optic modulator including an ultrasonic medium for controlling light from an optical source through diffraction, two transducers each having one electrode formed on one side thereof, the electrodes being for generating an acousto-elastic wave, and a conductive adhesive layer interposed between the ultrasonic medium and each of the sides of the transducers opposite to the sides on which the electrodes are installed, in order to adhere each of the transducers to the ultrasonic medium.

Abstract: A photo mask of a semiconductor device includes a transmission preventing layer formed of a molybdenum alloy, which is a solid solution of a metal atom such as chrome in molybdenum, on a light transmitting substrate. Also, the molybdenum alloy may be a molybdenum vanadium alloy, a molybdenum niobium alloy, a molybdenum tantalum alloy, or a molybdenum tungsten alloy, which is a solid solution of vanadium, niobium, tantalum, or tungsten in molybdenum, respectively. The photo mask provides high resolution during a photolithography process by obtaining a thinner transmission preventing layer.

Abstract: A light combining apparatus using two flat plates combines three separate light beams having blue, green and red wavelengths to a single combined light beam for a light source by an easier and simple small-sized device and makes the combined light beam smoothly enter the place for implementing the final information. The apparatus includes a reflection mirror for reflecting light beams with all of the wavelengths, at least one filter for transmitting only at least one light beam with a specific wavelength and reflecting light beams with the other wavelengths, and a medium located between the reflection mirror and the filter, through which the incident light beams and the reflected light beams pass, wherein the three light beams are combined into a single light beam within the medium which single light beam then exits the apparatus. A method of combining separate light beams having different wavelengths is also disclosed.

Abstract: A 3-channel modulation system for a high power laser and a modulation method for a high power laser are disclosed herein. In a preferred implementation, the modulation system includes a laser light source, a light modulator modulating the light generated from the laser light source and including a pair of electrodes having a predetermined area disposed on one side of the light modulator, an image signal generating sub-system, a drive circuit sub-system for operating the electrodes so that the image signal being generated from the image signal generating sub-system is provided through the electrodes to the light modulator, a first cylindrical lens positioned between the laser light source and the light modulator so that the area and form of the light generated from the laser light source are modified and the modified light enters the light modulator, and a second cylindrical lens positioned at an output side of the light modulator to modify the area and form of the light modulated by the light modulator.

Abstract: An acousto-optic modulator comprised of an acousto-optic element coated with an anti-reflection layer, and a method of manufacturing the same, are provided. The acousto-optic modulator includes an anti-reflection layer, comprised of at least two coating layers having different refractive indices, formed on the light incident/emitting surface of an ultrasonic medium for modulating a light beam incident from an optical source.

Abstract: An apparatus for separating an incident light beam from a light source into three light beams having different colors by a mirror mechanism constructed in a particular way. The apparatus separates white-light into three colors of red, green, and blue and includes a first dichroic mirror, a wide band high-reflection mirror, a second dichroic mirror, and a material of air or gas. The first dichroic mirror allows only a light beam with a first wavelength to penetrate and reflects light beams with other wavelengths, from the incident light beam. The wide band high-reflection mirror reflects the light beam reflected from the first dichroic mirror within the material, and is positioned such that it is parallel to the first dichroic mirror and is spaced therefrom by a predetermined interval.

Abstract: An acousto-optic modulator having an ultrasonic medium for controlling light from a light source by diffracting the light and a transducer portion having electrodes for generating an acoustic wave in the ultrasonic medium, wherein the transducer portion includes two transducers each having an electrode. The AOM is provided with two electrodes by using two transducers, thereby facilitating impedance matching with a driver. The two transducers may be installed so that their polarization directions are opposite to each other, thereby obtaining maximum power transfer to the ultrasonic medium.

Abstract: An audio/video synchronizer for a digital TV is disclosed including: a system decoder for parsing an input data packet and outputting compressed data of audio and video signals and PTS/DTS and PCR or SCR; an audio/video decoder for decoding the compressed data output from the system decoder, outputting a DTS for the video or audio frame to be decoded, and outputting a decoding ready signal indicating that decoding of the video or audio frame is finished, and a PTS of corresponding data; a frame memory for storing the audio/video data from the audio/video decoder; a clock generator for dividing an input clock into a predetermined value to generate horizontal and vertical sync signals and a PCM clock of the audio signal; an audio/video playing portion for playing the data decoded in the audio/video decoder according to the decoding ready signal in synchronization with the vertical and horizontal sync signals from the clock generator and the audio PCM clock, and outputting the PTS of a picture played and the aud

Abstract: An integrated circuit for generating a melody and ring comprises a starting voltage detector a frequency discriminator a controller a ring/melody data ROM an oscillator/frequency doubler a frequency divider a tempo/rhythm generator a chord generator an original-melody generator and an envelope output part. A ring circuit and melody circuit are formed together in one chip, thereby can reduce the prime cost of the telephone by generating selectively a ring signal in a ring mode or a melody signal in a melody mode.