Abstract: A manifold can include a manifold body including a fluid passage allowing a fluid to flow and a port provided to discharge the fluid from the fluid passage, a pipe inserted into the port of the manifold body, and including a pipe fluid passage connected to the fluid passage when the pipe is inserted into the port, a nut member inserted into the port and coupled to the manifold body while supporting the pipe, and a sealing member provided to receive a sensing dye inside the sealing member and to discharge the sensing dye out of the port through the fluid flowing of the port from the fluid passage or the pipe fluid passage.

Abstract: Methods, apparatus, and system to measure and control respiration of a perishable commodity in a vacuum chamber, including for purposes of extending a shelf life of a perishable commodity therein, including.

Abstract: In accordance with an exemplary embodiment of the present invention, an assembly for supporting substrate, the assembly comprising: a support frame having at least one insertion hole recessed from one surface of the support frame, the insertion hole having an inner movement hole and a screw hole positioned outside the inner movement hole; and a substrate support member including a shaft body inserted into the insertion hole with one end of the shaft body and a pin shaft connected to the shaft body to support the substrate in contact, wherein the shaft body having an inner screw body inserted into the insertion hole and positioned in the inner movement hole and a connection body disposed between the inner screw body and the pin shaft and positioned in the screw hole, wherein the inner diameter of the screw hole is smaller than the diameter of the inner movement hole and the outer diameter of the inner screw body, the inner screw body is capable of passing through the screw hole by rotation.

Abstract: Methods, apparatus, and system for storing perishable products in a vacuum container. An atmosphere control system is coupled to the vacuum container for measuring and maintaining controlled atmospheric conditions within the vacuum container. The atmosphere control system includes a plurality of monitors configured to monitor atmospheric conditions within the vacuum container. The atmosphere control system further includes a vacuum pump configured to reduce total absolute pressure in the vacuum chamber to below a total gas pressure limit, an ozone generator configured to generate gaseous ozone, and an inlet valve coupled to the ozone generator and configured to admit an ozone-containing gas into the vacuum container.

Abstract: This disclosure relates to a stimulus-responsive dynamic meta-holographic device. According to an aspect of the disclosure, a stimulus-responsive dynamic meta-holographic device can be provided, which includes a metasurface in which a plurality of nanostructures are provided; wherein in the metasurface is provided a liquid crystal layer comprising a plurality of cells that may be altered in arrangements by outer stimulus, wherein the liquid crystal layer, is configured to alter the polarization state of the transmitted beam penetrating the liquid crystal layer as the arrangements of the cells are altered by outer stimulus.

Abstract: Methods, apparatus, and system for storing perishable products in a vacuum container. An atmosphere control system is coupled to the vacuum container for measuring and maintaining controlled atmospheric conditions within the vacuum container. The atmosphere control system includes a plurality of monitors configured to monitor atmospheric conditions within the vacuum container. The atmosphere control system further includes a vacuum pump configured to reduce total absolute pressure in the vacuum chamber to below a total gas pressure limit, an ozone generator configured to generate gaseous ozone, and an inlet valve coupled to the ozone generator and configured to admit an ozone-containing gas into the vacuum container.

Abstract: Disclosed herein is a plane heater that generates heat by using graphene or the like as the conductive heat generation material thereof. The plane heater includes: a nonconductor substrate; a heat generation material applied to the nonconductor substrate; and a pair of electrodes configured to generate resistance heat in the heat generation material. The pair of electrodes include a first electrode configured to be connected to one pole of a power source, and a second electrode configured to be connected to the other pole of the power source. The sectional areas of at least some portions of the first electrode and the second electrode are determined such that a plurality of electric circuits formed by the first electrode, the heat generation material, and the second electrode can have the theoretically same resistance.

Abstract: Disclosed herein is a plane heater that generates heat by using graphene or the like as the conductive heat generation material thereof. The plane heater includes: a nonconductor substrate; a heat generation material applied to the nonconductor substrate; and a pair of electrodes configured to generate resistance heat in the heat generation material. The pair of electrodes include a first electrode configured to be connected to one pole of a power source, and a second electrode configured to be connected to the other pole of the power source. The sectional areas of at least some portions of the first electrode and the second electrode are determined such that a plurality of electric circuits formed by the first electrode, the heat generation material, and the second electrode can have the theoretically same resistance.

Abstract: The present invention disclosed herein relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus in which a substrate is processed at a high pressure and a low pressure. The present invention discloses a substrate processing apparatus including: a process chamber having an inner space; a substrate support on which a substrate is seated on a top surface thereof; an inner lid part which is installed to be vertically movable in the inner space and of which a portion is in close contact with the bottom surface of the process chamber to define a sealed processing space in which the substrate support is disposed; a gas supply part configured to supply a process gas to the processing space; and an inner lid driving part configured to drive the vertical movement of the inner lid part.

Abstract: The present invention disclosed herein relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus that performs substrate processing through a pressure change between a high pressure and a low pressure. The present invention discloses a substrate processing apparatus including; a process chamber (100) comprising a chamber body (110) which has an opened upper portion, in which an installation groove (130) is defined at a central side of a bottom surface (120) thereof, and which comprises a gate (111) for loading/unloading a substrate (1) is disposed at one side thereof and a top lid (140) coupled to the upper portion of the chamber body (110) to define an inner space, a substrate support (200) installed to be inserted into the installation groove (130) of the chamber body (110) and having a top surface on which the substrate (1) is seated.

Abstract: The present invention disclosed herein relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus in which a substrate is processed at a high pressure and a low pressure. The present invention discloses a substrate processing apparatus including: a process chamber (100) which has an inner space and in which an installation groove (130) is defined at a central side on a bottom surface (120); a substrate support (200) installed to be inserted into the installation groove (130) and having a top surface on which the substrate is seated; an inner lid part (300) which is installed to be movable vertically in the inner space and descends so that a portion thereof is in close contact with the bottom surface (120) adjacent to the installation groove (130) to define a sealed processing space (S2) in which the substrate support (200) is disposed therein.

Abstract: In accordance with an exemplary embodiment of the present invention, an apparatus for processing substrate comprising: a support plate; an antenna disposed in parallel to one surface of the support plate and having 1st to n-th turns (n=an integer greater than 3) wound along one direction from an inner end; and a distance control unit capable of adjusting separation distances formed between the 1st to n-th turns.

Abstract: In accordance with an exemplary embodiment, a substrate processing apparatus includes: a tube assembly having an inner space in which substrates are processed and assembled by laminating a plurality of laminates, each of which includes an injection part and an exhaust hole; a substrate holder configured to support the plurality of substrates in a multistage manner in the inner space; a supply line connected to one injection part of the plurality of laminates to supply a process gas; and an exhaust line connected to one of a plurality of exhaust holes to exhaust the process gas, and the substrate processing apparatus that has a simple structure and induces a laminar flow of the process gas to uniformly supply the process gas to a top surface of the substrate.

Abstract: In accordance with an exemplary embodiment of the present invention, an assembly for supporting substrate, the assembly comprising: a support frame having at least one insertion hole recessed from one surface of the support frame, the insertion hole having an inner movement hole and a screw hole positioned outside the inner movement hole; and a substrate support member including a shaft body inserted into the insertion hole with one end of the shaft body and a pin shaft connected to the shaft body to support the substrate in contact, wherein the shaft body having an inner screw body inserted into the insertion hole and positioned in the inner movement hole and a connection body disposed between the inner screw body and the pin shaft and positioned in the screw hole, wherein the inner diameter of the screw hole is smaller than the diameter of the inner movement hole and the outer diameter of the inner screw body, the inner screw body is capable of passing through the screw hole by rotation.

Abstract: Disclosed herein is a plane heater that generates heat by using graphene or the like as the conductive heat generation material thereof. The plane heater includes: a nonconductor substrate; a heat generation material applied to the nonconductor substrate; and a pair of electrodes configured to generate resistance heat in the heat generation material. The pair of electrodes include a first electrode configured to be connected to one pole of a power source, and a second electrode configured to be connected to the other pole of the power source. The sectional areas of at least some portions of the first electrode and the second electrode are determined such that a plurality of electric circuits formed by the first electrode, the heat generation material, and the second electrode can have the theoretically same resistance.

Abstract: A heat treatment apparatus for high-quality graphene synthesis comprises an upper roll chamber, a deposition chamber connected to the upper roll chamber to deposit graphene on a catalytic metal film, and a lower roll chamber mounted on a lower portion of the deposition chamber. The upper roll chamber includes a supply roller and the lower roll chamber includes a lower direction shifting roller shifting a direction of the catalytic metal film supplied from the supply roller. In the deposition chamber, a catalytic metal film at a supply side transferred from the supply roller to the lower direction shifting roller and a catalytic metal film at a discharge side transferred from the lower direction shifting roller to a winding roller are passed, and a heater portion is mounted around the catalytic metal film at the supply side and the catalytic metal film at the discharge side.

Abstract: Methods, apparatus, and system to measure and control respiration of a perishable commodity in a vacuum chamber, including for purposes of extending a shelf life of a perishable commodity therein, including.

Abstract: A semiconductor package sawing device is provided that includes a semiconductor package sawing unit, an automatic tool providing portion disposed adjacent to the semiconductor package sawing unit, and a semiconductor package alignment portion. The automatic tool providing portion includes a transfer unit for transferring a chuck unit to the semiconductor package sawing unit.

Abstract: Disclosed herein is a plane heater that generates heat by using graphene or the like as the conductive heat generation material thereof. The plane heater includes: a nonconductor substrate; a heat generation material applied to the nonconductor substrate; and a pair of electrodes configured to generate resistance heat in the heat generation material. The pair of electrodes include a first electrode configured to be connected to one pole of a power source, and a second electrode configured to be connected to the other pole of the power source. The sectional areas of at least some portions of the first electrode and the second electrode are determined such that a plurality of electric circuits formed by the first electrode, the heat generation material, and the second electrode can have the theoretically same resistance.

Abstract: Disclosed herein is a plane heater that generates heat by using graphene or the like as the conductive heat generation material thereof. The plane heater includes: a nonconductor substrate; a heat generation material applied to the nonconductor substrate; and a pair of electrodes configured to generate resistance heat in the heat generation material. The pair of electrodes include a first electrode configured to be connected to one pole of a power source, and a second electrode configured to be connected to the other pole of the power source. The sectional areas of at least some portions of the first electrode and the second electrode are determined such that a plurality of electric circuits formed by the first electrode, the heat generation material, and the second electrode can have the theoretically same resistance.