Patents by Inventor Yongmei Chen

Yongmei Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100055103
    Abstract: The present invention relates generally to antibodies cross-reactive with IL-17A and IL-17F, and bispecific anti-IL-17A/F and their uses.
    Type: Application
    Filed: August 26, 2009
    Publication date: March 4, 2010
    Inventors: YONGMEI CHEN, YAN (HELEN) HU, WENJUN OUYANG, SCOTT STAWICKI, YAN WU
  • Publication number: 20090311635
    Abstract: Methods to pattern features in a substrate layer by exposing a photoresist layer more than once. In one embodiment, a single reticle may be exposed more than once with an overlay offset implemented between successive exposures to reduce the half pitch of the reticle. In particular embodiments, these methods may be employed to reduce the half pitch of the features printed with 65 nm generation lithography equipment to achieve 45 nm lithography generation CD and pitch performance.
    Type: Application
    Filed: December 19, 2008
    Publication date: December 17, 2009
    Inventors: HUI W. CHEN, CHORNG-PING CHANG, YONGMEI CHEN, HUIXIONG DAI, JIAHUA YU, SUSIE X. YANG, XUMOU XU, CHRISTOPHER D. BENCHER, RAYMOND HOIMAN HUNG, MICHAEL P. DUANE, CHRISTOPHER SIU WING NGAI, JEN SHU, KENNETH MACWILLIAMS
  • Publication number: 20090263972
    Abstract: A method and apparatus are provided to form spacer materials adjacent substrate structures. In one embodiment, a method is provided for processing a substrate including placing a substrate having a substrate structure adjacent a substrate surface in a deposition chamber, depositing a spacer layer on the substrate structure and substrate surface, and etching the spacer layer to expose the substrate structure and a portion of the substrate surface, wherein the spacer layer is disposed adjacent the substrate structure. The spacer layer may comprise a boron nitride material. The spacer layer may comprise a base spacer layer and a liner layer, and the spacer layer may be etched in a two-step etching process.
    Type: Application
    Filed: March 31, 2009
    Publication date: October 22, 2009
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Mihaela Balseanu, Christopher D. Bencher, Yongmei Chen, Li Yan Miao, Victor Nguyen, Isabelita Roflox, Li-Qun Xia, Derek R. Witty
  • Publication number: 20090068739
    Abstract: A cell culture scaffold containing a gel having a network structure comprised of a synthetic polymer such that cultured cells spread in a shorter time and the number of adsorbed cultured cells per unit area is larger than in the case of using a gel having a network structure comprised of polyacrylic acid, while taking advantage of synthetic polymers with low manufacturing cost, easy quality control and no risk of virus infection in cultured cell. Used as the cell culture scaffold is a gel containing a synthetic polymer obtained by polymerization or copolymerization of a monomer having a sulfonic group such as p-styrenesulfonic acid sodium salt (NaSS) and 2-acrylamide-2-methylpropane sulfonic acid sodium salt (NaAMPS).
    Type: Application
    Filed: August 29, 2008
    Publication date: March 12, 2009
    Applicant: NATIONAL UNIVERSITY CORPORATION, HOKKAIDO UNIVERSITY
    Inventors: Jian Ping Gong, Yoshihito Osada, Yongmei Chen
  • Patent number: 7435594
    Abstract: A cell culture scaffold containing a gel having a network structure comprised of a synthetic polymer such that cultured cells spread in a shorter time and the number of adsorbed cultured cells per unit area is larger than in the case of using a gel having a network structure comprised of polyacrylic acid, while taking advantage of synthetic polymers with low manufacturing cost, easy quality control and no risk of virus infection in cultured cell. Used as the cell culture scaffold is a gel containing asynthetic polymer obtained by polymerization or copolymerization of a monomer having a sulfonic group such as p-styrenesulfonic acid sodium salt (NaSS) and 2-acrylamide-2-methylpropane sulfonic acid sodium salt (NaAMPS).
    Type: Grant
    Filed: February 4, 2005
    Date of Patent: October 14, 2008
    Assignee: Hokkaido University
    Inventors: Jian Ping Gong, Yoshihito Osada, Yongmei Chen
  • Publication number: 20060003442
    Abstract: A cell culture scaffold containing a gel having a network structure comprised of a synthetic polymer such that cultured cells spread in a shorter time and the number of adsorbed cultured cells per unit area is larger than in the case of using a gel having a network structure comprised of polyacrylic acid, while taking advantage of synthetic polymers with low manufacturing cost, easy quality control and no risk of virus infection in cultured cell. Used as the cell culture scaffold is a gel containing asynthetic polymer obtained by polymerization or copolymerization of a monomer having a sulfonic group such as p-styrenesulfonic acid sodium salt (NaSS) and 2-acrylamide-2-methylpropane sulfonic acid sodium salt (NaAMPS).
    Type: Application
    Filed: February 4, 2005
    Publication date: January 5, 2006
    Inventors: Jian Gong, Yoshihito Osada, Yongmei Chen