Patents by Inventor Yoshihito Kobayashi

Yoshihito Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6066822
    Abstract: A semiconductor device testing system is provided efficiently utilizes a plurality of semiconductor device testing apparatus. More particularly, a host computer controls a plurality of semiconductor device testing apparatuses and a dedicated classifying machine. A storage information memory stores storage information of each semiconductor device such as a number assigned to each tested semiconductor device such as a number assigned to each tested semiconductor device, the test results of each semiconductor device, and is provided in the host computer. Without sorting the tested devices or with the sorting operation of the tested devices into only two categories in a handler part of each testing apparatus, the tested devices are transferred from the test tray to a general-purpose tray, and during this transfer operation, the storage information of each device is stored in the storage information memory.
    Type: Grant
    Filed: March 27, 1997
    Date of Patent: May 23, 2000
    Assignee: Advantest Corporation
    Inventors: Shin Nemoto, Yoshihito Kobayashi, Hiroo Nakamura, Takeshi Onishi, Hiroki Ikeda
  • Patent number: 5973493
    Abstract: A mechanism for positioning IC devices to be tested aligned in a test tray of an automatic handler for an IC test system capable of reducing a time for transferring the test tray from a supply area to a test head area which has a plurality of test contactors and from a test head area to a discharge area is disclosed. The mechanism includes a stopper which determines the first stop position of the test tray when said test tray contacts with the outer surface of the test tray and the second stop position of the test tray when said stopper contacts with the end surface of a groove being provided with on its side portion of the test tray to receive and engage with the projection of the stopper.
    Type: Grant
    Filed: October 3, 1996
    Date of Patent: October 26, 1999
    Assignee: Advantest Corp.
    Inventors: Hiroto Nakamura, Makoto Sagawa, Yoshihito Kobayashi
  • Patent number: 5814432
    Abstract: In a method of forming patterns for use in manufacturing electronic devices, a radiation-sensitive layer is formed on a semiconductor substrate by coating a radiation-sensitive composition containing a compound which generates acid by chemical radiation and a compound which has one bond capable of being decomposed by the acid generated. Then, an area of the radiation-sensitive layer adjacent to a predetermined pattern-formation area is irradiated. Subsequently, a surface of the radiation-sensitive layer is treated with a basic compound and washed, thereby inactivating the acid generated in the irradiation area. Thereafter, the predetermined pattern-formation area of the radiation sensitive layer treated with the basic compound is irradiated, followed by applying heat treatment to the substrate. Last, the radiation-sensitive layer is developed. With the method, a fine pattern having a rectangular cross-section together with suppressing size alteration caused by scattered light can be formed.
    Type: Grant
    Filed: November 1, 1995
    Date of Patent: September 29, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Yoshihito Kobayashi
  • Patent number: 5772387
    Abstract: An IC transfer system can be used in conjunction with either a tray type magazine or a rod-shaped magazine. A device reinspection method in the IC test handler reinspects the DUT stored in the magazine without human intervention, sorts in accordance with the test results, and stores in the magazine and the customer tray. For this purpose, a tray supply section transfers a user tray (170) to a test tray (180), whereas a magazine supply section (152) and a pick carrier section (112) transfer a rod-shaped magazine (150) to the test tray (180). An inspection setting sets the number of reinspections, the classification of inspection results, and the storage tray/magazine. The DUT (215) is loaded (203) from the magazine to the test tray (180) and is tested (204). After testing (204), a judgement is made whether or not the reinspection mode is effective.
    Type: Grant
    Filed: June 30, 1995
    Date of Patent: June 30, 1998
    Assignee: Advantest Corp.
    Inventors: Hiroto Nakamura, Yoshihito Kobayashi, Katsuhiko Suzuki
  • Patent number: 5635832
    Abstract: An IC carrier for loading thereon and transporting a device under test is used in an IC handler. The IC carrier is capable of easily and reliably loading thereon and positioning in place a device under test even the device under test having a reduced pitch between lead pins thereof. A box-like housing open in the top is formed and the bottom wall thereof has two generally parallel contact holes in the form of elongated slots, these two contact holes being spaced from each other by a spacing corresponding to that between two arrays of lead pins of the device under test. Each of the contact holes has a length corresponding to that of the associated lead pin array and a width sufficient to receive the associated lead pin array. Carrier guides are formed one adjacent each of opposite longitudinal ends of each of the contact holes and extend upwardly to a predetermined height from the bottom floor of the housing.
    Type: Grant
    Filed: February 8, 1996
    Date of Patent: June 3, 1997
    Assignee: Advantest Corporation
    Inventors: Akihiko Ito, Yoshihito Kobayashi
  • Patent number: 5625287
    Abstract: An automatic handler for an IC test system is disclosed which is capable of reducing a time for transferring IC devices to be tested from a supply area to a test head area and from the test head area to a discharge area. The automatic handler includes a test tray for loading the IC devices to be tested in which the IC devices to be tested are aligned in the test tray with a shorter distance with one another than a distance between test contactors in the test head area, a pair of positioning stoppers provided in the test head area along a moving direction of the test tray in which the positioning stoppers are spaced by the distance equal to the distance of the IC devices to be tested in the test tray. In the automatic handler, the distance of the contactors is adjusted to an integer multiple of the distance of the IC devices to be tested in the test tray.
    Type: Grant
    Filed: March 27, 1995
    Date of Patent: April 29, 1997
    Assignee: Advantest Corporation
    Inventors: Hiroto Nakamura, Makoto Sagawa, Yoshihito Kobayashi
  • Patent number: 5580702
    Abstract: Disclosed herein is a resist for forming patterns, which is greatly sensitive to ultraviolet rays an ionizing radiation, and which can therefore form a high-resolution resist pattern if exposed to ultra violet rays or an unionizing radiation. Hence, the resist is useful in a method of manufacturing semicon ductor devices having high integration densities. The resist comprises tert-butoxycarbonyl methoxypolyhydroxy styrene and an o-quinonediazide compound.
    Type: Grant
    Filed: December 13, 1994
    Date of Patent: December 3, 1996
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Rumiko Hayase, Yasunobu Onishi, Hirokazu Niki, Noahiko Oyasato, Yoshihito Kobayashi, Shuzi Nayase
  • Patent number: 5403695
    Abstract: Disclosed herein is a resist for forming patterns, which is greatly sensitive to ultraviolet rays an ionizing radiation, and which can therefore form a high-resolution resist pattern if exposed to ultra violet rays or an unionizing radiation. Hence, the resist is useful in a method of manufacturing semicon ductor devices having high integration densities. The resist comprises tert-butoxycarbonyl methoxypolyhydroxy styrene and an o-quinonediazide compound.
    Type: Grant
    Filed: April 30, 1992
    Date of Patent: April 4, 1995
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Rumiko Hayase, Yasunobu Onishi, Hirokazu Niki, Naohiko Oyasato, Yoshihito Kobayashi, Shuzi Hayase
  • Patent number: 5326675
    Abstract: A radiation-sensitive layer comprising as a main component a radiation-sensitive composition containing a compound capable of generating an acid when exposed to a chemical radiation and a compound having at least one linkage decomposable by an acid is formed on a substrate. An acidic coating layer is formed on the radiation-sensitive layer. The radiation-sensitive layer and the acidic coating layer are pattern-exposed to a chemical radiation. The radiation-sensitive layer and the acidic coating layer are baked and developed by using an aqueous alkaline solution to obtain a pattern comprising lines and spaces, each having a predetermined width. A fine pattern of a rectangular sectional shape can be formed without producing eaves caused by a surface inhibition layer layer, which is produced on the film surface.
    Type: Grant
    Filed: December 9, 1992
    Date of Patent: July 5, 1994
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hirokazu Niki, Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Akitoshi Kumagae, Kazuo Sato, Masataka Miyamura, Yoshihito Kobayashi
  • Patent number: 5279921
    Abstract: Disclosed is a pattern formation resist which can be exposed with deep UV, has a high dry etching resistance, has a large allowance in a development manipulation using an aqueous alkali solution, and can form a fine pattern having a good sectional shape. The resist comprises an alkali-soluble polymer and a compound represented by the following formula (I) and simultaneously containing, in a single molecule, a substituent which decomposes with an acid and a group which produces an acid with deep UV: ##STR1## wherein the substituent which decomposes with an acid is present in at least one of R.sub.1 to R.sub.4, and when R.sub.1 to R.sub.4 have a group except for the substituent which decomposes with an acid, R.sub.1 represents a nonsubstituted or substituted aliphatic hydrocarbon group, each of R.sub.2 and R.sub.3 independently represents a hydrogen atom or a non-substituted or substituted aliphatic hydrocarbon group, and R.sub.4 represents a nonsubstituted or substituted aliphatic hydrocarbon group.
    Type: Grant
    Filed: November 27, 1991
    Date of Patent: January 18, 1994
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yasunobu Onishi, Yoshihito Kobayashi, Hirokazu Niki
  • Patent number: 5261775
    Abstract: In IC test equipment which has an input magazine support station for supporting a magazine discharged from an input magazine stocker and an output magazine support station for supporting a magazine into which IC elements tested in a testing station are loaded, a magazine inverting device is provided between the input magazine stocker and the input magazine support station, for turning the magazine through 90 or 180 degrees about its lengthwise direction, an IC inverting device is provided between the testing station and the output magazine support station, for turning an IC element through 90 or 180 degrees about the direction of its travel, and an IC diverter is provided whereby the orientation of the inverted IC relative to the direction of its travel is reversed and is then discharged into the magazine supported at the output magazine support station.
    Type: Grant
    Filed: September 30, 1991
    Date of Patent: November 16, 1993
    Assignee: Advantest Corporation
    Inventor: Yoshihito Kobayashi
  • Patent number: 5100768
    Abstract: A photosensitive composition contains an alkali-soluble polymer having a phenol skeleton in its structure and a heterocyclic compound represented by formula (I-1) or (I-2), formula (II-1) or (II-2), any of formulas (III-1) to (III-8), any of formulas (IV-1) to (IV-12), or any of formulas (V-1) to (V-4) described in the claims and specification. A photosensitive composition containing a heterocyclic compound represented by formula (I-1) or (I-2), any of formulas (III-1) to (III-8), any of formulas (IV-1) to (IV-12), or any of formulas (V-1) to (V-4) can be suitably used as a negative resist. A photosensitive composition containing a heterocyclic compound represented by formula (II-1) or (II-2) can be suitably used as a positive resist. A photosensitive composition containing an alkali-soluble polymer having a phenol skeleton in its structure and a polymer having a nitrogen-containing heterocyclic compound as a polymeric unit is also included in this invention.
    Type: Grant
    Filed: May 4, 1990
    Date of Patent: March 31, 1992
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hirokazu Niki, Yasunobu Onishi, Yoshihito Kobayashi, Rumiko Hayase
  • Patent number: 5091282
    Abstract: This invention includes a photosensitive composition containing an alkali-soluble resin and a compound represented by formula (I), (II) or (III) described in the claims and the specification, a photosensitive composition containing an alkali-soluble polymer, a compound represented by formula (IV) described in the claims and the specification and a basic compound, and a photosensitive composition containing an alkali-soluble polymer, a compound represented by formula (VI) described in the claims and the specification and a compound which produces an acid upon radiation of light.
    Type: Grant
    Filed: April 3, 1990
    Date of Patent: February 25, 1992
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yasunobu Onishi, Hirokazu Niki, Yoshihito Kobayashi, Rumiko Hayase, Toru Ushirogouchi
  • Patent number: 5091810
    Abstract: This invention provides a floating type magnetic head comprising a slider which has at least two rail-like floating parts, and a head core attached on a side of the slider. The magnetic head is characterized in that the head core is attached to the slider in a manner a window thereof for wiring protrudes from the rear end of the slider or the slider end facing downstream in the advancing direction of a magnetic recording medium or a side of the slider adjacent to the window is partially cut out on the rear end thereof. Such structure simplifies winding operation. Another feature of this invention magnetic head lies in that the magnetic gap of the head core is positioned at outermost location of the head to thereby increase recording capacity on a recording medium.
    Type: Grant
    Filed: May 25, 1990
    Date of Patent: February 25, 1992
    Assignee: TDK Corporation
    Inventors: Masao Kakizaki, Yoshihito Kobayashi, Hiroshi Yagi
  • Patent number: 4760924
    Abstract: Magazines, each loaded in series with IC elements to be tested, are stacked and such stacked magazines are arranged in columns. The lowermost magazines of the stacked magazines of the respective columns are simultaneously brought down by a takeout mechanism onto a magazine receiver, and the magazines on the magazine receiver are simultaneously but intermittently fed by intermittent stepping means in the direction of their arrangement. The outermost one of the magazines on the magazine receiver is loaded at an IC element receiving position. The IC elements from the magazine are supplied to a testing station, wherein they are tested, and the tested IC elements are sorted in a sorting station according to their test results and respectively then loaded into IC element receiving magazines in an accumulating station. The accumulating station has an IC receiving magazine stocker room in which IC element receiving magazines are stacked, and an empty magazine stocker room in which empty magazines are stacked.
    Type: Grant
    Filed: June 2, 1987
    Date of Patent: August 2, 1988
    Assignee: Takeda Riken Co., Ltd.
    Inventors: Hiroshi Sato, Yoshihito Kobayashi
  • Patent number: 4715501
    Abstract: Magazines, each loaded in series with IC elements to be tested, are stacked and such stacked magazines are arranged in columns. The lowermost magazines of the stacked magazines of the respective columns are simultaneously brought down by a takeout mechanism onto a magazine receiver, and the magazines on the magazine receiver are simultaneously but intermittently fed by intermittent stepping means in the direction of their arrangement. The outermost one of the magazines on the magzine receiver is loaded at an IC element receiving position. The IC elements from the magazine are supplied to a testing station, wherein they are tested, and the tested IC elements are sorted in a sorting station according to their test results and respectively then loaded into IC element receiving magazines in an accumulating station. The accumulating station has an IC receiving magazine stocker room in which IC element receiving magazines are stacked, and an empty magazine stocker room in which empty magazines are stacked.
    Type: Grant
    Filed: June 27, 1985
    Date of Patent: December 29, 1987
    Assignee: Takeda Riken Co., Ltd.
    Inventors: Hiroshi Sato, Yoshihito Kobayashi
  • Patent number: RE35821
    Abstract: A radiation-sensitive layer comprising as a main component a radiation-sensitive composition containing a compound capable of generating an acid when exposed to a chemical radiation and a compound having at least one linkage decomposable by an acid is formed on a substrate. An acidic coating layer is formed on the radiation-sensitive layer. The radiation-sensitive layer and the acidic coating layer are pattern-exposed to a chemical radiation. The radiation-sensitive layer and the acidic coating layer are baked and developed by using an aqueous alkaline solution to obtain a pattern comprising lines and spaces, each having a predetermined width. A fine pattern of a rectangular sectional shape can be formed without producing eaves caused by a surface inhibition layer layer, which is produced on the film surface.
    Type: Grant
    Filed: April 29, 1996
    Date of Patent: June 9, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hirokazu Niki, Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Akitoshi Kumagae, Kazuo Sato, Masataka Miyamura, Yoshihito Kobayashi